Patents by Inventor Ryosuke Taniguchi

Ryosuke Taniguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220268533
    Abstract: In cooling/heating cycles of a heat exchanger, to prevent cracks that tend to occur in a brazed portion between an end portion of a horizontal cross-section of a tube and a header plate. An end portion cover body is provided for an end portion of a tank main body or a header to cover hereby an end portion in a longer side direction of an opening end portion of a flat tube.
    Type: Application
    Filed: June 26, 2020
    Publication date: August 25, 2022
    Inventors: Yosuke TANIGUCHI, Ryosuke MAEDA
  • Publication number: 20220155687
    Abstract: A resist composition is provided comprising (A) a sulfurane or selenurane compound, (B) an organic solvent, and (C) a base polymer comprising repeat units having an acid labile group. By virtue of the acid diffusion inhibitory function of the compound, the resist composition forms a resist pattern having improved LWR and CDU when it is processed by lithography using high-energy radiation.
    Type: Application
    Filed: November 11, 2021
    Publication date: May 19, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Ryosuke Taniguchi
  • Publication number: 20220113626
    Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
    Type: Application
    Filed: May 27, 2021
    Publication date: April 14, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoya Inoue, Satoshi Watanabe, Ryosuke Taniguchi, Masahiro Fukushima
  • Patent number: 11215926
    Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: January 4, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Masaki Ohashi, Ryosuke Taniguchi, Koji Hasegawa
  • Publication number: 20210395195
    Abstract: An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(?O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.
    Type: Application
    Filed: May 27, 2021
    Publication date: December 23, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Satoshi Watanabe, Ryosuke Taniguchi, Naoya Inoue
  • Publication number: 20210363412
    Abstract: An object of the present invention is to provide a diverting agent which does not completely dissolve in water and seawater in an ultra-low temperature to low temperature range (5° C. to 30° C.) for a certain period of time (about 5 minutes to 3 hours), and is quickly dissolved and removed after a certain period of time in an excavation method using a hydraulic fracturing method. The present invention relates to a diverting agent containing a polyvinyl alcohol-based resin having 2.3 mol % to 15 mol % of a hydrophilic modifying group in a molecular structure thereof.
    Type: Application
    Filed: August 9, 2021
    Publication date: November 25, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yasuhiro HIRANO, Ryosuke TANIGUCHI, Chizuko FURO
  • Publication number: 20210363413
    Abstract: An object of the invention is to provide a diverting agent which has solubility in water that can be controlled excellently and which does not easily dissolve at an early stage of filling of fractures in a well in excavation method using a hydraulic fracturing method and dissolves in water and can be easily removed after filling is no longer needed. The diverting agent of the invention contains powdery polyvinyl alcohol-based resins having an average particle diameter of 800 to 2000 ?m.
    Type: Application
    Filed: August 9, 2021
    Publication date: November 25, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yasuhiro HIRANO, Ryosuke TANIGUCHI, Chizuko FURO
  • Publication number: 20210363411
    Abstract: A diverting agent of the present invention contains a polyvinyl alcohol-based resin, wherein when the diverting agent is added to a 0.48 mass % aqueous solution of guar gum to prepare a mixed solution having a concentration of 12 mass %, a dispersion liquid obtained by dispersing the mixed solution at 30° C.
    Type: Application
    Filed: August 9, 2021
    Publication date: November 25, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Shusaku MANDAI, Yasuhiro HIRANO, Ryosuke TANIGUCHI, Chizuko FURO, Kenji FURUI, Kenji SHINOHARA, Ken SATO
  • Publication number: 20210309911
    Abstract: An object of the present invention is to provide a diverting agent that exhibits sufficient filling properties against a fracture in a well because of swelling without completely dissolution for a certain period of time (about 30 minutes to 5 hours), and that quickly dissolves and be removed even at a low temperature of 40° C. to 60° C. after a certain period of time has passed. The present invention relates to a diverting agent containing a modified polyvinyl alcohol-based resin.
    Type: Application
    Filed: June 22, 2021
    Publication date: October 7, 2021
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Yasuhiro HIRANO, Takahiro SAKA, Ryosuke TANIGUCHI, Chizuko FURO
  • Publication number: 20210309909
    Abstract: An object of the present invention is to provide a diverting agent that does not completely dissolve for a certain period of time (about 5 minutes to 3 hours) and has high cohesiveness between particles. The present invention relates to a diverting agent containing a polyvinyl alcohol-based resin having a degree of saponification of 65 mol % to 95 mol %.
    Type: Application
    Filed: June 21, 2021
    Publication date: October 7, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yasuhiro HIRANO, Takahiro SAKA, Ryosuke TANIGUCHI, Chizuko FURO
  • Publication number: 20210309910
    Abstract: An object of the present invention is to provide a diverting agent that can exhibit sufficient filling properties against a fracture in a well in an excavation method using a hydraulic fracturing method, and that is excellent in solubility after a predetermined period of time has passed. The diverting agent of the present invention contains a polyvinyl alcohol-based resin having an average polymerization degree of 1000 or more.
    Type: Application
    Filed: June 21, 2021
    Publication date: October 7, 2021
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yasuhiro HIRANO, Takahiro SAKA, Ryosuke TANIGUCHI, Chizuko FURO
  • Patent number: 10921710
    Abstract: A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: February 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Kazuhiro Katayama
  • Publication number: 20200301274
    Abstract: A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.
    Type: Application
    Filed: February 24, 2020
    Publication date: September 24, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryosuke TANIGUCHI, Satoshi WATANABE, Masaki OHASHI, Naoya INOUE
  • Publication number: 20200301275
    Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.
    Type: Application
    Filed: February 24, 2020
    Publication date: September 24, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryosuke TANIGUCHI, Satoshi WATANABE, Takayuki FUJIWARA, Naoya INOUE
  • Publication number: 20200283400
    Abstract: An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.
    Type: Application
    Filed: February 25, 2020
    Publication date: September 10, 2020
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Ryosuke Taniguchi, Takeru Watanabe, Yoshinori Matsui
  • Patent number: 10310376
    Abstract: A polymer comprising recurring units containing a specific lactone ring and having an alkyl group on ?-butyrolactone skeleton of fused ring lactone and an alkyl ester substituent group intervening between the lactone structure and the polymer backbone is provided. A resist composition comprising the polymer as base resin is improved in such properties as DOF margin and MEF and quite effective for precise micropatterning.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: June 4, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Koji Hasegawa, Kenji Yamada
  • Patent number: 10248022
    Abstract: A sulfonium compound having formula (1) exerts a satisfactory acid diffusion control function wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved resolution, LWR, MEF and CDU.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: April 2, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Ryosuke Taniguchi
  • Publication number: 20190064665
    Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.
    Type: Application
    Filed: August 22, 2018
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Ryo Mitsui, Masaki Ohashi, Ryosuke Taniguchi, Koji Hasegawa
  • Publication number: 20190033715
    Abstract: A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.
    Type: Application
    Filed: July 27, 2018
    Publication date: January 31, 2019
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Kazuhiro Katayama
  • Patent number: 10180626
    Abstract: On use of a sulfonium salt of specific structure as PAG, acid diffusion is suppressed. A resist composition comprising the sulfonium salt forms a pattern with improved lithography properties including EL, MEF and LWR when processed by lithography.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: January 15, 2019
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Ryosuke Taniguchi