Abstract: A heat-exchanger fixing plate fixes a side portion of a heat exchanger to a housing panel of an air-conditioning apparatus, the heat exchanger including a heat radiation fin and a heat transfer tube. The heat-exchanger fixing plate includes a heat-exchanger support portion facing the side portion of the heat exchanger, and having an insertion hole through which a hairpin portion of the heat transfer tube of the heat exchanger is inserted; and a housing-panel fixing portion separate from and fitted to the heat-exchanger support portion fastened with a screw to the housing panel such that the heat exchanger is fixed to the housing panel. The housing-panel fixing portion is made of material having a higher mechanical strength than that of the heat-exchanger support portion, and the heat-exchanger support portion is made of the material having a lower friction coefficient than that of the housing-panel fixing portion.

Abstract: A diverting agent is provided which has solubility in water that can be controlled excellently and which does not easily dissolve at an early stage of filling of fractures in a well in excavation method using a hydraulic fracturing method and dissolves in water and can be easily removed after filling is no longer needed. The diverting agent contains powdery polyvinyl alcohol-based resins having an average particle diameter of 800 to 2000 ?m.

Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: A diverting agent of the present invention contains a polyvinyl alcohol-based resin, wherein when the diverting agent is added to a 0.48 mass % aqueous solution of guar gum to prepare a mixed solution having a concentration of 12 mass %, a dispersion liquid obtained by dispersing the mixed solution at 30° C.

Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.

Abstract: A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.

Abstract: An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity.

Abstract: A resist composition is provided comprising (A) a sulfurane or selenurane compound, (B) an organic solvent, and (C) a base polymer comprising repeat units having an acid labile group. By virtue of the acid diffusion inhibitory function of the compound, the resist composition forms a resist pattern having improved LWR and CDU when it is processed by lithography using high-energy radiation.

Abstract: An onium salt containing an anion having formula (A1) and a cation having formula (A1-a), (A1-b) or (A1-c) is provided. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: A resist composition comprising a sulfonium compound of specific structure as PAG has excellent lithography performance factors such as minimal defects, high sensitivity, improved LWR and CDU, and is a quite effective resist material for precise micropatterning.

Abstract: An onium salt having a partial structure of formula (A) is provided wherein Ra1 and Ra2 are hydrogen or a C1-C10 hydrocarbyl group in which hydrogen may be substituted by halogen and —CH2— may be replaced by —O— or —C(?O)—, both Ra1 and Ra2 are not hydrogen at the same time, Ra1 and Ra2 may bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.

Abstract: An object of the present invention is to provide a diverting agent which does not completely dissolve in water and seawater in an ultra-low temperature to low temperature range (5° C. to 30° C.) for a certain period of time (about 5 minutes to 3 hours), and is quickly dissolved and removed after a certain period of time in an excavation method using a hydraulic fracturing method. The present invention relates to a diverting agent containing a polyvinyl alcohol-based resin having 2.3 mol % to 15 mol % of a hydrophilic modifying group in a molecular structure thereof.

Abstract: A diverting agent of the present invention contains a polyvinyl alcohol-based resin, wherein when the diverting agent is added to a 0.48 mass % aqueous solution of guar gum to prepare a mixed solution having a concentration of 12 mass %, a dispersion liquid obtained by dispersing the mixed solution at 30° C.

Abstract: An object of the invention is to provide a diverting agent which has solubility in water that can be controlled excellently and which does not easily dissolve at an early stage of filling of fractures in a well in excavation method using a hydraulic fracturing method and dissolves in water and can be easily removed after filling is no longer needed. The diverting agent of the invention contains powdery polyvinyl alcohol-based resins having an average particle diameter of 800 to 2000 ?m.

Abstract: An object of the present invention is to provide a diverting agent that exhibits sufficient filling properties against a fracture in a well because of swelling without completely dissolution for a certain period of time (about 30 minutes to 5 hours), and that quickly dissolves and be removed even at a low temperature of 40° C. to 60° C. after a certain period of time has passed. The present invention relates to a diverting agent containing a modified polyvinyl alcohol-based resin.

Abstract: An object of the present invention is to provide a diverting agent that can exhibit sufficient filling properties against a fracture in a well in an excavation method using a hydraulic fracturing method, and that is excellent in solubility after a predetermined period of time has passed. The diverting agent of the present invention contains a polyvinyl alcohol-based resin having an average polymerization degree of 1000 or more.

Abstract: An object of the present invention is to provide a diverting agent that does not completely dissolve for a certain period of time (about 5 minutes to 3 hours) and has high cohesiveness between particles. The present invention relates to a diverting agent containing a polyvinyl alcohol-based resin having a degree of saponification of 65 mol % to 95 mol %.

Abstract: A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.

Abstract: A chemically-amplified negative resist composition includes: (A) an acid generator containing an onium salt (s) shown by the following formula(e) (A-1) and/or (A-2); and (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2). Thus, the present invention provides: a chemically-amplified negative resist composition which provides a pattern with high sensitivity, low LWR and CDU, and favorable profile; and a resist patterning process using the composition.

Abstract: A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.