Abstract: Disclosed is a supporting structure for supporting an optical element in an optical system, particularly for use in a semiconductor exposure apparatus. The supporting structure includes a first holding member having at least two supporting portions for supporting a peripheral portion of the optical system, and a second holding member for supporting the optical element, wherein the second holding member is connected to the first holding member, between the at least two supporting portions of the first holding member, through an elastic member.

Abstract: A supporting structure for supporting an optical element includes a first supporting member for supporting the optical element, and a second supporting member for supporting the first supporting member. The value of a thermal expansion coefficient of the first supporting member is between those of the optical element and the second supporting member.

Abstract: A supporting structure for supporting an optical element. The supporting structure includes a first supporting member for supporting the optical element, a second supporting member arranged in an outer diameter side of the first supporting member for supporting the first supporting member, and an elastic member placed between the first supporting member and the second supporting member in the radial direction of the optical element. The inner diameter side of the elastic member is connected to the first supporting member while an outer diameter side of the elastic member is connected to the second supporting member. The elastic member is elastically deformable in the radial direction.

Abstract: A supporting structure for supporting an optical element includes a first supporting member for supporting the optical element, and a second supporting member for supporting the first supporting member. The value of a thermal expansion coefficient of the first supporting member is between those of the optical element and the second supporting member.

Abstract: A driving device includes a first member, an annular second member arranged outside the first member, an annular first plate for connecting the first and second members to each other, and an annular second plate for connecting the first and second members to each other. The first and second members are moved relative to each other by supplying or exhausting a fluid into or from a space surrounded by the first and second members and the first and second plates. Also, at least one of (i) an inner diameter a1 of a portion of the second member at which the second member is connected to the first plate is different from an inner diameter a2 of a portion of the second member at which the second member is connected to the second plate and (ii) an outer diameter b1 of a portion of the first member at which the first member is connected to the first plate is different from an outer diameter b2 of a portion of the first member at which the first member is connected to the second plate.

Abstract: Disclosed is a supporting structure for supporting an optical element in an optical system, particularly for use in a semiconductor exposure apparatus. The supporting structure includes a first holding member having at least two supporting portions for supporting a peripheral portion of the optical system, and a second holding member for supporting the optical element, wherein the second holding member is connected to the first holding member, between the at least two supporting portions of the first holding member, through an elastic member.

Abstract: A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.

Abstract: A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.

Abstract: A stage system includes a stage being movable in a predetermined direction, a first unit for applying a force to the stage in the predetermined direction, a moving mechanism for moving one of the first unit and a structure including the first unit, a first measuring system for measuring at least one of the position and movement amount of the stage, and a second measuring system for measuring at least one of the position and movement amount of one of the first unit and the structure, wherein the stage is controlled on the basis of a measured value of the first measuring system, and wherein the moving system is controlled on the basis of a measured value of the second measuring system.

Abstract: A stage system includes a stage mechanism having a movable stage and a stage supporting member for carrying the movable stage thereon, and a countermass mechanism having a movable countermass and a countermass supporting member for carrying the countermass thereon, wherein the stage supporting member and the countermass supporting member are supported separately or with vibration isolated.

Abstract: A stage system includes a stage mechanism having a movable stage and a stage supporting member for carrying the movable stage thereon, and a countermass mechanism having a movable countermass and a countermass supporting member for carrying the countermass thereon, wherein the stage supporting member and the countermass supporting member are supported separately or with vibration isolated.

Abstract: It is an object of the present invention to provide a supporting structure of optical elements, in which lens surface deformation due to the strain produced during assembling can be reduced and stable and high resolution with small aberration can be obtained, and an optical apparatus such as an exposure apparatus constructed by using the supporting structure, and a method for manufacturing a semiconductor device constructed from the optical apparatus, etc.

Abstract: A linear motor includes a stator, a movable element scanningly movable for a predetermined stroke, relative to the stator, and an electromagnetic device for producing a drive force for moving the movable element in a scan direction and in a direction perpendicular to the scan direction. The electromagnetic device includes a coil unit and a magnetic unit. The coil unit has at least two first coils disposed in a predetermined stroke along the scan direction, for producing a force in the scan direction and a second coil disposed in a predetermined stroke for producing a force in a direction perpendicular to the scan direction.

Abstract: A projection and exposure apparatus includes an optical member, a holding member for holding the optical member with a gap between the optical member and the holding member, and a powder charged in the gap between the optical member and the holding member, such that the optical member and the holding member are maintained in a spaced-apart relationship.

Abstract: An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via dampers. The plurality of struts of the base frame are joined at their upper ends to increase the rigidity of the base frame, thereby reducing vibration caused by acceleration and deceleration of the reticle stage.

Abstract: A scanning exposure apparatus for projecting a portion of a pattern of an original onto a substrate in a slit-like shape through a projection optical system and for scanningly moving the original and the substrate perpendicular to an optical axis of the projection optical system, to thereby print the pattern of the original on the substrate. The apparatus includes a masking device for restricting an exposure area on the original, a drive device for moving the masking device in accordance with a scan of the original and the substrate and a controller for controlling the drive device so that acceleration of the masking device is completed before a start of the exposure and for initiating deceleration of the masking device after completion of the exposure.

Abstract: A linear motor includes a single-phase coil, a plurality of polyphase coils each of which is shorter than the single-phase coil and wound to be parallel to the single-phase coil, a first permanent magnet movable relative to the single-phase coil and the plurality of polyphase coils in an axial direction of the single-phase coil, a first yoke consisting of a ferromagnetic substance and extending through the single-phase coil in the axial direction, a second yoke consisting of a ferromagnetic substance and having, outside the single-phase coil, a portion arranged to be parallel to the first yoke, to form a closed magnetic circuit together with the first yoke and the first permanent magnet such that the closed magnetic circuit circulates magnetic fluxes from the first permanent magnet across a winding of the single-phase coil, and a second permanent magnet for connecting the first and second yokes.

Abstract: A reflection system, includes a reflecting member having a mirror-finished reflection surface of a spherical shape; and a base member having a base surface of a predetermined shape; and wherein the reflection member and the base member are adhered to each other with one of the bottom surface of the reflection member and the base surface of the base member being made to follow the other to cause deformation of the spherical shape, whereby the reflection surface is formed into an aspherical shape.

Abstract: A scanning exposure apparatus wherein a portion of a pattern of an original is projected onto a substrate through a projection optical system and the original and substrate are scanningly moved relative to the projection optical system, whereby the pattern of the original is transferred onto the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting device for supporting the base at three positions, through a damper device and a pillar device. The three positions define an approximately isosceles triangle, and the scan direction is parallel to a straight line that connects a point of intersection of isosceles sides of the triangle and a gravity center thereof.

Abstract: An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.