Abstract: A scan type exposure method and apparatus in which a projection optical system projects, at a projection station, a portion of a pattern of an original onto a region on a substrate, an original stage moves the original relative to the projection optical system in an original scanning direction, a first substrate stage moves the substrate relative to the projection optical system in a substrate scanning direction, a second substrate stage moves the substrate relative to the projection optical system in an optical axis direction of the projection optical system, a synchronism controller controls, in the projection of the original onto the substrate through the projection optical system, synchronism between the movement of the original stage in the original scanning direction and the movement of the first substrate stage in the substrate scanning direction, a measuring device measures a position of the surface of the substrate with respect to the optical axis direction at a measurement point spaced from the proj

Abstract: It is an object to provide a compact, lightweight, and inexpensive stage apparatus. A stage apparatus for moving a stage in a predetermined direction includes a stage accelerating/decelerating thrust generation unit arranged along the moving direction, a stage speed control thrust generation unit arranged to be parallel to the stage accelerating/decelerating thrust generation unit, an accelerating unit for generating a stage accelerating thrust at a portion corresponding to the stage accelerating interval of the accelerating/decelerating thrust generation unit, a decelerating unit for generating a stage decelerating thrust at a portion corresponding to the stage decelerating interval of the accelerating/decelerating thrust generation unit, and a speed control unit for controlling the stage thrust generated by the speed control thrust generation unit at least within a predetermined range between the accelerating interval and the decelerating interval.

Abstract: An exposure method includes the steps of illuminating an original with exposure light having a size b with respect to a scan direction, and projecting a pattern of the illuminated original onto a substrate with a projection magnification N.sub.op, and scanning the original and the substrate In the scan direction at a speed ratio N.sub.st different from the projection magnification N.sub.op wherein the speed ratio N.sub.st corresponds to the ratio between the speed of the substrate and the speed of the original and, when the minimum linewidth of an image of the pattern with respect to the scan direction is denoted by .DELTA.l. a relation 0<.vertline.N.sub.op -N.sub.st .vertline..multidot.b<.DELTA.l is satisfied.

Abstract: An optical component moving device having a driving portion and guiding portion, for moving an optical component, wherein the driving portion includes fluid enclosure system being expandable and contractible and the guiding portion includes a leaf spring.

Abstract: A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.

Abstract: A mask includes a mask substrate on which a mask pattern is formed, a frame for supporting the mask substrate, and at least one alignment mark formed on the frame. The alignment mark is used for positioning the mask substrate on the frame. The invention also includes a method for making a mask comprising the steps of forming at least one alignment mark at a predetermined position on a mask frame, forming a mask pattern on a mask substrate at a predetermined position with respect to the alignment mark, and joining the mask substrate and the mask frame to form a mask. In addition, the method can include the step of joining the mask substrate and the frame in a predetermined positional relationship on the basis of the position of the alignment mark.

Abstract: An exposure apparatus in which a portion of a pattern of a reticle is projected onto a wafer and in which the reticle and the wafer are scanned synchronously such that the pattern of the reticle is transferred to the wafer. The apparatus includes a reticle stage and a wafer stage for scanningly moving the reticle and the wafer, respectively, a measuring system for measuring a deviation of the reticle stage relative to the wafer stage in a predetermined direction other than the direction of scanning movement, and an adjusting device for adjusting the wafer stage on the basis of the measurement by the measuring system. In one aspect, the measuring system includes a laser interferometer. In another aspect, a frame member is provided for supporting the stages, and a flow passageway is provided in the frame member for flowing therethrough a temperature adjusting medium. In yet another aspect, the present invention is directed to an exposure method for the manufacture of microdevices.

Abstract: A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head.

Abstract: A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction.

Abstract: In an X-ray lithographic system comprising a plurality of X-ray exposure apparatus which use an SOR radiation source apparatus as a common illumination light source, an exposure apparatus usable for duplicating an X-ray mask is connected to at least one beam line. The beam line is longer than the other wafer exposure beam lines so that the divergence angle is small (i.e., the resolving power for exposure transfer is higher). Thus, the X-ray mask can precisely be manufactured at low cost.

Abstract: A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.

Abstract: A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.

Abstract: A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head. The recording apparatus further having a blower which introduces air and directs an air stream through the apparatus and past a full page width recording head. The air stream directs ink mist generated by the printhead through a recording medium discharge port such that ink mist is removed from the apparatus body by riding the air stream or by adhering to the recording medium.

Abstract: A movable stage apparatus suitable for a semiconductor exposure apparatus or the like has a stage, a first driving mechanism for moving the stage in a predetermined direction, and a second driving mechanism for moving the stage by a minute amount in the predetermined direction. One of the mover and stator of the second driving mechanism is substantially fixed to the stage and the other is substantially movable with the movement of the stage by the first driving mechanism.

Abstract: A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure.

Abstract: A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head.

Abstract: A recorder comprises a recording device housing for housing a device for forming a record on record medium at a record position and a relatively movable stacker for stacking record media recorded by the recording device and having an open side for removing the stacked media. A convex area on the bottom of the stacker extends othogonally to the length of the stacker at a position spaced from the lengthwise center of the stacker toward the open side. The convex portion inhibits movement of the stacked media which could occur through shocks received by the recorder.

Abstract: An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.

Abstract: A wafer cooling device includes a wafer chuck; a heat exchanger having an internal structure for circulation of cooling water therethrough; and a flexible heat pipe for providing heat communication between the wafer chuck and the heat exchanger.

Abstract: An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.