Abstract: It is an object to prevent deterioration of reflectance of a reflection layer composed of silver or a silver alloy, resulting from heat-caused migration of silver. The reflector for projection type display apparatuses which display image light beams emitted and reflected by a light source, modulated for light intensity by a display device and magnified by a projection lens, wherein the reflector is provided, on the reflection surface side, with a reflection layer composed at least of silver or a silver alloy, and a layer comprising inorganic particles and a binder composed of a silicon compound; and a light source and image display device which use the reflector.

Abstract: According to the present invention, the amount of usage of a heat conductive member for fixing a self-luminous flat display panel to a metallic chassis member disposed at the back of the display panel is reduced in the thickness direction as well as in the surface direction. The invention further provides a technique for efficiently radiating heat from the display panel, suppressing cost increase. To this end, in the invention, the heat conductive member is a hot-melt adhesive having adhesion at room temperature and filled with a heat conduction imparting agent, and the display panel is fixed to the chassis member by a plurality of heat conducting sections of the heat conductive member formed discretely ranging from 0.3 to 0.8 mm in thickness.

Abstract: The invention provides a technique enabling an image of high quality to be displayed while decreasing an effect of an outside light proceeding toward a back surface of PDP through a through hole for mounting an electric circuit on a chassis. A flat panel display of the invention includes a display panel, a metallic chassis having a through hole and joints for connecting the back surface of the display panel and the chassis to each other. The joints are on the back surface of the display panel distant from each other in a predetermined direction, and one of the joints is arranged at a position corresponding to the through hole of the chassis.

Abstract: The object of the present invention is to provide an optical part having an anti-reflecting membrane which is low in resistance and high in adhesion and is sharply improved in light transmittance by reducing reflectance of light, and a display apparatus using the same. According to the present invention, there are provided an optical part which transmits or partially reflects light, wherein a light receiving face or a light outgoing face has an anti-reflecting membrane which comprises inorganic oxide particles and a binder, has a thickness of 60-190 nm, and has pores of 5-200 nm in size, and a display device using the same.

Abstract: An optical material having a reflecting membrane, an enhanced reflecting membrane, or an anti-reflecting membrane formed with coating is provided. The optical material includes an optical material matrix, and a first inorganic compound layer and a second inorganic compound layer which are alternately stacked on the optical material matrix, wherein the first inorganic compound layer is formed of a titanium compound having a hydrolysable residue and oilophilic smectite and has a refractive index higher than the refractive index of the optical material matrix, and wherein the second inorganic compound layer includes silicon oxide and has a refractive index lower than the refractive index of the optical material matrix.

Abstract: The present invention is directed to the provision of a reflecting mirror that suppresses decreases in the resolution performance and contrast performance by decreasing the mean surface roughness. In a projection type image display apparatus including a projector lens that expansion projects the image light from an image generating source and a reflecting mirror that guides the image light from the projector lens to the back face of the screen, according to the present invention, a silver reflecting surface (2) is formed on the substrate (1) of the reflecting mirror, a protective layer (3) of a transparent resin is formed thereon, and the mean surface roughness of the silver reflecting layer is made to be 1.8 nm or less.

Abstract: The invention provides a technique enabling an image of high quality to be displayed while decreasing an effect of an outside light proceeding toward a back surface of PDP through a through hole for mounting an electric circuit on a chassis. A flat panel display of the invention includes a display panel, a metallic chassis having a through hole and joints for connecting the back surface of the display panel and the chassis to each other. The joints are on the back surface of the display panel distant from each other in a predetermined direction, and one of the joints is arranged at a position corresponding to the through hole of the chassis.

Abstract: According to the present invention, the amount of usage of a heat conductive member for fixing a self-luminous flat display panel to a metallic chassis member disposed at the back of the display panel is reduced in the thickness direction as well as in the surface direction. The invention further provides a technique for efficiently radiating heat from the display panel, suppressing cost increase. To this end, in the invention, the heat conductive member is a hot-melt adhesive having adhesion at room temperature and filled with a heat conduction imparting agent, and the display panel is fixed to the chassis member by a plurality of heat conducting sections of the heat conductive member formed discretely ranging from 0.3 to 0.8 mm in thickness.

Abstract: The object of the present invention is to provide an optical part having an anti-reflecting membrane which is low in resistance and high in adhesion and is sharply improved in light transmittance by reducing reflectance of light, and a display apparatus using the same. According to the present invention, there are provided an optical part which transmits or partially reflects light, wherein a light receiving face or a light outgoing face has an anti-reflecting membrane which comprises inorganic oxide particles and a binder, has a thickness of 60-190 nm, and has pores of 5-200 nm in size, and a display device using the same.

Abstract: It is an object to prevent deterioration of reflectance of a reflection layer composed of silver or a silver alloy, resulting from heat-caused migration of silver. The reflector for projection type display apparatuses which display image light beams emitted and reflected by a light source, modulated for light intensity by a display device and magnified by a projection lens, wherein the reflector is provided, on the reflection surface side, with a reflection layer composed at least of silver or a silver alloy, and a layer comprising inorganic particles and a binder composed of a silicon compound; and a light source and image display device which use the reflector.

Abstract: The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended. Further, the present sizing-dressing is carried out jointly with processing of a wafer to thereby enable improvement of throughput of the apparatus as well as maintenance of a processing rate. The present apparatus and method are effective for planarization of various substrate surfaces having irregularities.

Abstract: The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended. Further, the present sizing-dressing is carried out jointly with processing of a wafer to thereby enable improvement of throughput of the apparatus as well as maintenance of a processing rate. The present apparatus and method are effective for planarization of various substrate surfaces having irregularities.

Abstract: In the present invention, there is disclosed a reflective mirror whose contrast or resolution performance is equal to that of a surface mirror of a glass mirror for general use and which does not have any problem in reliability of resistance to environment and whose color shift or brightness performance is inhibited from being degraded. For this, in the present invention, a reflective film is formed on a glass substrate by use of silver mirror reaction, and a topcoat is formed of a colorless/transparent resin. At this time, a wavelength of a crest of a ripple indicated by a reflectance characteristic is constituted to substantially agree with that of a green luminescent line. Accordingly, a back projection type video display device which is satisfactory in the contrast or resolution performance can be prepared.

Abstract: The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended. Further, the present sizing-dressing is carried out jointly with processing of a wafer to thereby enable improvement of throughput of the apparatus as well as maintenance of a processing rate. The present apparatus and method are effective for planarization of various substrate surfaces having irregularities.

Abstract: The present invention is directed to the provision of a reflecting mirror that suppresses decreases in the resolution performance and contrast performance by decreasing the mean surface roughness. In a projection type image display apparatus including a projector lens that expansion projects the image light from an image generating source and a reflecting mirror that guides the image light from the projector lens to the back face of the screen, according to the present invention, a silver reflecting surface (2) is formed on the substrate (1) of the reflecting mirror, a protective layer (3) of a transparent resin is formed thereon, and the mean surface roughness of the silver reflecting layer is made to be 1.8 nm or less.

Abstract: The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended. Further, the present sizing-dressing is carried out jointly with processing of a wafer to thereby enable improvement of throughput of the apparatus as well as maintenance of a processing rate. The present apparatus and method are effective for planarization of various substrate surfaces having irregularities.

Abstract: An object of the present invention is to obtain corrosion resistance performance which is more excellent than that of a conventional reflection mirror. To achieve the object, according to the invention, in a reflection mirror 30 having a metal plating film 2 and a top-coat layer 3 on a flat surface of a base plate 1, a silver reflection film 2 is formed by metal plating on the flat surface of the base plate 1. After that, by removing the reflective film on the side face of the base plate 1 or preventing the reflective film from being formed on the side face of the base plate 1 from the beginning, the side portion of the junction face between the base plate 1 and the reflective film 2 is completely covered with the top-coat film 3.

Abstract: In the present invention, there is disclosed a reflective mirror whose contrast or resolution performance is equal to that of a surface mirror of a glass mirror for general use and which does not have any problem in reliability of resistance to environment and whose color shift or brightness performance is inhibited from being degraded. For this, in the present invention, a reflective film is formed on a glass substrate by use of silver mirror reaction, and a topcoat is formed of a colorless/transparent resin. At this time, a wavelength of a crest of a ripple indicated by a reflectance characteristic is constituted to substantially agree with that of a green luminescent line. Accordingly, a back projection type video display device which is satisfactory in the contrast or resolution performance can be prepared.

Abstract: A film formed on a surface of a wafer on which an integrated circuit is to be constructed can be planarized by using a fixed abrasive tool regardless of the width of elements of a pattern underlying the film. The fixed abrasive tool is liable to form scratches in the surface of the film. A planarizing process of the present invention employs a fixed abrasive tool containing substances harder than the film to be planarized in a content of 10 ppm or below and having a mean pore diameter of 0.2 &mgr;m or below.

Abstract: The present invention relates to a polishing apparatus, and a semiconductor manufacturing method using the apparatus. Dressing of a grindstone surface is ground by sizing processing whereby dressing of a tool surface can be done while preventing occurrence of cracks on the grindstone surface which is the cause for occurrence of scratches. Further, flatness of the surface of a dressing tool can be guaranteed because of sizing cutting-in; even if a thick grindstone of a few centimeters is used, the flatness can be maintained to the end; and processing with less in-face unevenness can be always carried out. Therefore, the life of the dressing tool can be greatly extended.