Patents by Inventor Sam R. Turner

Sam R. Turner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10669451
    Abstract: A roof structure comprises a roof membrane and a roof substrate. A first surface of the roof membrane is adhered to the roof substrate by a two component adhesive, the adhesive being capable of adhering the first surface of the roof membrane to the roof substrate without the use of a high VOC solvent. The two component adhesive includes a Michael donor and a Michael acceptor, and the Michael donor and the Michael acceptor react to form an adhesive film.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: June 2, 2020
    Assignee: Carlisle Construction Materials, LLC
    Inventors: Daniel J. Cotsakis, William J. Schneider, Michael J. Scanish, Anil G. Shenoy, Timothy E. Long, Sam Richard Turner, Alison R. Schultz
  • Publication number: 20190185717
    Abstract: A roof structure comprises a roof membrane and a roof substrate. A first surface of the roof membrane is adhered to the roof substrate by a two component adhesive, the adhesive being capable of adhering the first surface of the roof membrane to the roof substrate without the use of a high VOC solvent. The two component adhesive includes a Michael donor and a Michael acceptor, and the Michael donor and the Michael acceptor react to form an adhesive film.
    Type: Application
    Filed: February 21, 2019
    Publication date: June 20, 2019
    Inventors: Daniel J. Cotsakis, William J. Schneider, Michael J. Scanish, Anil G. Shenoy, Timothy E. Long, Sam Richard Turner, Alison R. Schultz
  • Publication number: 20020119266
    Abstract: This invention is directed to a polymer-clay nanocomposite, products produced from the nanocomposite, and a process for preparing a polymer-clay nanocomposite. The polymer-clay nanocomposite comprises (a) a matrix polymer, (b) an amorphous oligomer, and (c) a layered clay material.
    Type: Application
    Filed: December 1, 2000
    Publication date: August 29, 2002
    Inventors: Shriram Bagrodia, Linda G. Bernard, Gary W. Connell, John W. Gilmer, Tie Lan, James C. Matayabas, Jeffrey T. Owens, Vasiliki Psihogios, Emerson E. Sharpe, Sam R. Turner
  • Patent number: 5624987
    Abstract: This invention relates to a polyester composition comprising a blend of:(A) 99.5 to 75 weight % of a copolyester having an inherent viscosity of 0.1 to 1.2 dL/g and having a melting point in excess of 250.degree. C., comprising:(a) one or more dicarboxylic acids, and(b) a glycol component comprising at least 80 mole % 1,4-cyclohexanedimethanol; and(B) 0.5 to 25 weight % of one or more polyalkylene ethers,wherein the weight percentages of all components in said blend total 100 weight %.
    Type: Grant
    Filed: September 15, 1995
    Date of Patent: April 29, 1997
    Inventors: Andrew E. Brink, Sam R. Turner, Gerald T. Keep
  • Patent number: 4933466
    Abstract: Cyclic imides are prepared by reacting carbon monoxide with an ortho dihalide aromatic compound or a cis-1,2-vinyl dihalide and an amine in the presence of palladium catalyst and a base. The process is preferably conducted in the presence of a dipolar aprotic solvent as a liquid reaction medium.Acyclic imides are prepared by reacting CO with an activated halide and an amide (primary or secondary) in the presence of a Pd catalyst and a base.
    Type: Grant
    Filed: January 17, 1989
    Date of Patent: June 12, 1990
    Assignee: Eastman Kodak Company
    Inventors: Robert J. Perry, Sam R. Turner
  • Patent number: 4933391
    Abstract: Living polymers endcapped with a silicon containing group can be prepared by reacting a living, anionic polymer with an endcapping agent such as p-(chloromethylphenyl)trimethoxysilane. Such materials possess narrow molecular weight distributions, predictable molecular weights, and high functionality. The functionality is controlled by employing either a monofunctional (f=1) or difunctional (f=2) initiator. The endcapped, unifunctional products of this invention can serve as stable precursors for the preparation of soluble, branched polymers, and the difunctional products of this invention serve as efficient, water curable coatings.
    Type: Grant
    Filed: February 16, 1989
    Date of Patent: June 12, 1990
    Assignee: Eastman Kodak Company
    Inventors: Timothy E. Long, Sam R. Turner
  • Patent number: 4795692
    Abstract: Radiation-sensitive interpolymers comprising 10-90 mole % of a polymerized maleimide monomer are useful as resists having high sensitivity to E-beams or X-rays.
    Type: Grant
    Filed: February 2, 1987
    Date of Patent: January 3, 1989
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Kristine M. Kolterman, Sam R. Turner
  • Patent number: 4663268
    Abstract: There is disclosed a resist comprising a radiation-sensitive sensitizer that produces, with a binder, imagewise differential solubility when imagewise exposed.
    Type: Grant
    Filed: February 24, 1986
    Date of Patent: May 5, 1987
    Assignee: Eastman Kodak Company
    Inventors: Sam R. Turner, Conrad G. Houle
  • Patent number: 4240987
    Abstract: There is disclosed a process for the direct iodination of polyarylidene compounds to provide highly pure para-substituted diiodo derivatives. The polyarylidene compound is reacted with iodine in the presence of an oxidant, unreactive with the aromatic nucleus, in a reaction medium containing a solvent for the polyarylidene compound, a catalyst and water. The reaction medium is recovered for reuse in subsequent reactions by the removal of spent oxidant which, in the preferred embodiment, is based upon the temperature dependent differences in solubility between the diiodo derivative and the spent oxidant.
    Type: Grant
    Filed: October 29, 1979
    Date of Patent: December 23, 1980
    Assignee: Xerox Corporation
    Inventors: Trevor I. Martin, Paul Szabo, Sam R. Turner
  • Patent number: 4225692
    Abstract: Disclosed are electron acceptor monomers of the formula: ##STR1## wherein R is ##STR2## R' is hydrogen or methyl; X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene; anda and b can range from 0 to 3; with the proviso that at least one of R is ##STR3## and polymers prepared therefrom. These monomers and polymers are suitable for use in electrophotographic devices and methods.
    Type: Grant
    Filed: May 4, 1977
    Date of Patent: September 30, 1980
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4172933
    Abstract: Disclosed are monomers of the formula: ##STR1## wherein R is ##STR2## R' is hydrogen or methyl; R" is alkyl of 1-10 carbon atoms;X and Y are independently selected from the group consisting of NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene;A and a' can range from 0-3; andN is 1-10.These monomers can be readily polymerized to polymers suitable for use in electophotographic imaging members and methods.
    Type: Grant
    Filed: May 23, 1977
    Date of Patent: October 30, 1979
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4161490
    Abstract: Disclosed are electron acceptor monomers of the formula: ##STR1## wherein R is ##STR2## R' is hydrogen or methyl; X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene; and a and b can range from 0 to 3;With the proviso that at least one of R is ##STR3## AND POLYMERS PREPARED THEREFROM. These monomers and polymers are suitable for use in electrophotographic devices and methods.
    Type: Grant
    Filed: September 13, 1978
    Date of Patent: July 17, 1979
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4153802
    Abstract: Disclosed are electron acceptor monomers of the formula: ##STR1## wherein R is ##STR2## or --H; R' is hydrogen or methyl;X and Y are independently selected from the group consisting of --NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene; andA and b can range from 0 to 3; with the proviso that at least one of R is ##STR3## and polymers prepared therefrom. These monomers and polymers are suitable for use in electrophotographic devices and methods.
    Type: Grant
    Filed: May 4, 1977
    Date of Patent: May 8, 1979
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4143225
    Abstract: Disclosed are monomers of the formula: ##STR1## WHEREIN R is ##STR2## R' is hydrogen or methyl; R" is alkyl of 1-10 carbon atoms;X and Y are independently selected from the group consisting of NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene;a and a' can range from 0-3; andn is 1-10.These monomers can be readily polymerized to polymers suitable for use in electrophotographic imaging members and methods.
    Type: Grant
    Filed: May 23, 1977
    Date of Patent: March 6, 1979
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4129581
    Abstract: Disclosed are monomers of the formula: ##STR1## WHEREIN R is ##STR2## R' is hydrogen or methyl;R" is alkyl of 1-10 carbon atoms;X and Y are independently selected from the group consisting of NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene;A and a' can range from 0-3; andN is 1-10.These monomers can be readily polymerized to polymers suitable for use in electrophotographic imaging members and methods.
    Type: Grant
    Filed: May 23, 1977
    Date of Patent: December 12, 1978
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4122113
    Abstract: Process for preparation of monomers of the formula ##STR1## WHEREIN R is hydrogen or methyl; X and Y are independently selected from the group consisting of NO.sub.2, halogen, --CN and --CF.sub.3 ; andm and n can range from 0 to 3.Typical monomers embraced by the above formula can be prepared by Lewis Acid catalyzed esterification of methacrylic acid with a diazo derivative of an electron acceptor such as 9-diazo-2,4,7-trinitrofluorenone. These monomers can be used with other binders or polymerized by standard, free-radical techniques to polymers capable of forming self-supporting films which are useful in electrophotographic imaging members and methods.
    Type: Grant
    Filed: April 20, 1977
    Date of Patent: October 24, 1978
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4116691
    Abstract: Disclosed are monomers of the formula: ##STR1## R' is hydrogen or methyl; R" is alkyl of 1-10 carbon atoms;X and Y are independently selected from the group consisting of NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene;a and a' can range from 0-3; andn is 1-10.These monomers can be readily polymerized to polymers suitable for use in electrophotographic imaging members and methods.
    Type: Grant
    Filed: May 23, 1977
    Date of Patent: September 26, 1978
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4098984
    Abstract: Process for preparation of monomers of the formula ##STR1## wherein R is hydrogen or methyl;X and Y are independently selected from the group consisting of NO.sub.2, halogen, --CN and --CF.sub.3 ; andm and n can range from 0 to 3.Typical monomers embraced by the above formula can be prepared by Lewis Acid catalyzed esterification of methacrylic acid with a diazo derivative of an electron acceptor such as 9-diazo-2,4,7-trinitrofluorenone. These monomers can be used with other binders or polymerized by standard, free-radical techniques to polymers capable of forming self-supporting films which are useful in electrophotographic imaging members and methods.
    Type: Grant
    Filed: April 20, 1977
    Date of Patent: July 4, 1978
    Assignee: Xerox Corporation
    Inventor: Sam R. Turner
  • Patent number: 4075012
    Abstract: Method for achieving free radical initiated copolymerization of an addition monomer having pendant therefrom a strong donor group with an addition monomer having pendant therefrom a strong acceptor group. Copolymers prepared according to this method can be represented by the following formula: ##STR1## WHEREIN R is hydrogen or methyl;R' is hydrogen or methyl;R" is hydrogen or methyl;R'" is alkyl of 1-10 carbon atoms;R'.sup.v is selected from the group consisting of --NO.sub.2, halogen, --CN and --CF.sub.3 ;X and Y are independently selected from the group consisting of hydrogen, chlorine, bromine, alkyl of 1-4 carbon atoms and phenyl;Z is oxygen or dicyanomethylene;a and b can range from 0-4; andn and m can range from about 5 to about 95 percent.The polymeric compositions prepared according to this method are suitable for use in electrophotography either alone as the primary photoresponsive entity or in combination with other photoconductive materials.
    Type: Grant
    Filed: August 20, 1976
    Date of Patent: February 21, 1978
    Assignee: Xerox Corporation
    Inventors: Sam R. Turner, Milan Stolka
  • Patent number: 4063947
    Abstract: Composite photoconductive insulating films comprising a thin layer of photoconductive materials having substantial spectral response in the visible region of the electromagnetic spectrum and a substantially colorless insulating layer contiguous therewith comprising a minor portion of electronically inert binder in a major portion of an electronically active oligomer of the formula: ##STR1## R' is hydrogen or methyl; R" is alkyl of 1-10 carbon atoms;X and Y are independently selected from the group consisting of NO.sub.2, halogen, cyano and --CF.sub.3 ;Z is oxygen or dicyanomethylene;a and a' can range from 0-3;m is 1-10; andn is in the range of from about 3 to about 25.
    Type: Grant
    Filed: October 29, 1975
    Date of Patent: December 20, 1977
    Assignee: Xerox Corporation
    Inventors: John M. Pochan, Sam R. Turner