Abstract: There is disclosed an apparatus configured to provide a chart of content items to a plurality of user devices. The apparatus is configured to enable individual users to temporarily access one or more content items listed in the chart. The apparatus comprises a user device interface configured to communicate with user device applications and a permissions module configured to define user access permissions, including temporary user access permissions, relating to individual ones of the one or more items of content. The apparatus also provides a distribution module configured to implement permissions defined in the permission module in relation to user devices by making available one or more items of content listed in the chart to at least one user device application.

Abstract: An apparatus includes an electrode and a heating element attached to the electrode. A heat sink is between the electrode and the heating element. A mirror is between the heat sink and the heating element. An aperture reflector surrounds the mirror and the heating element.

Abstract: An apparatus includes an electrode and a first channel segment within the electrode. A second channel segment is within the electrode, wherein the second channel segment is parallel to the first channel segment. A third channel segment is within the electrode. The third channel segment connects the first channel segment and the second channel segment, and the third channel segment includes a continuously smooth radial bend. A heating element is attached to the electrode.

Abstract: A disc valve assembly for control of a flow of hydraulic fluid in a hydraulic fluid system may include a disc element comprising an inlet facing side and a second side opposite to the inlet facing side, and flow pathways configured as a plurality of different pressure zones with the flow pathways extending axially along a longitudinal axis of the disc element from at or adjacent to the inlet facing side to the second side. A valve housing houses the disc element and includes porting configured as part of the plurality of different pressure zones respectively in fluid communication with the flow pathways of the disc element. The disc element is configured to rotate to control a flow of hydraulic fluid through the disc valve assembly. The different pressure zones are isolated from each other using a plurality of annular sealing rings located on the inlet facing side of the disc element.

Abstract: A device includes a housing unit and a number of magnets. The housing unit includes a number of holes therein. The magnets are positioned in the holes. The magnets have a same pole orientation. It is appreciated that the magnets are positioned in the holes to form a mechanically balanced and magnetically unbalanced structure.

Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.

Abstract: The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.

Abstract: An apparatus includes a gas input and a cooling plate. A groove surrounds the gas input and less than one hundred percent of the cooling plate. An inflatable seal is in the groove.

Abstract: An apparatus includes a cooling plate with a central opening. The central opening within the cooling plate is positioned to be opposite an opening in a workpiece when the cooling plate is positioned at a target location opposite the workpiece. The cooling plate is configured to absorb heat from a gas heated by the workpiece. A diffuser is in the central opening of the cooling plate. The diffuser is configured to receive a gas from a gas input. The diffuser is further configured to slow a flow of the gas and output the gas into the workpiece opening.

Abstract: A system includes a cooling plate coupled to a first disk holder and to a second disk holder. The first disk holder and the second disk holder are each shaped to be removably coupled to respective inner diameter surfaces of disks such that, when coupled, each disk is positioned a distance from the cooling plate.

Abstract: Various embodiments disclosed relate to cement activator compositions for treatment of subterranean formations. In various embodiments, the present invention provides a method of treating a subterranean formation including placing in the subterranean formation a liquid cement activator composition including water, an alkali sulfate salt, a polyphosphate salt, and a stabilizer polymer.

Abstract: Various embodiments disclosed relate to compatibilized resin-cement composite compositions and methods of using the same. In various embodiments, the present invention provides a method of treating a subterranean formation that includes placing in the subterranean formation a resin-cement composite composition. The resin-cement composite composition includes a resin, a cement, and a substituted or unsubstituted poly(alkylamine) compatibilizer.

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

Abstract: A capacitive discharge welding system includes at least one capacitive discharge-based power supply that is adapted to provide alternate polarity pulses from a first weld to a subsequent weld, and to be compatible with iron-core transformers used for alternating current resistance welding; at least one iron core transformer adapted to receive electrical discharges from the capacitive discharge-based power supply; a polarity switching network that includes at least two sets of silicon controlled rectifiers that are arranged in pairs for facilitating current flow in alternate directions; a pair of engagable, properly biased shunt diodes that are operative to shunt reflected current for protecting the silicon controlled rectifiers when the system is in use; and a control network configured for simultaneous engagement of the properly biased shunt diodes and firing the silicon controlled rectifiers for current flow; and tracking polarity for assuring that subsequent pulses use opposite direction current flow for p

Abstract: A method includes moving a sensor and an article at a first speed to position the sensor into a reference position relative to an article fixture. The sensor and the article are moved at a second speed as the sensor approaches the reference position. It is determined when the sensor is in the reference position, wherein the sensor is configured to be in the reference position when a contact is established between the sensor and a surface of the article fixture. The article is moved by a predetermined increment relative to the reference position to position the article in a target position in response to determining that the sensor is in the reference position.

Abstract: Provided herein is an apparatus including a loader configured to position a workpiece in a holding fixture. In some embodiments, the holding fixture includes an opening configured to removably receive the workpiece therein and hold the workpiece in a target position within the opening. The apparatus also includes position detecting means configured to translate a sensor to a predetermined location relative to the holding fixture and further configured to translate the workpiece by a predetermined increment relative to the predetermined location to position the workpiece in the target position.

Abstract: A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.

Abstract: A chemical vapor deposition source that includes at least one plate to which first and second electrical connection posts are coupled. The chemical vapor deposition source also includes a filament having a first end and a second end. The first end of the filament is electrically connected to the first electrical connection post and the second end of the filament is electrically connected to the second electrical connection post. The chemical vapor deposition source further includes at least one filament holder electrically insulated from the at least one plate. The at least one filament holder holds a portion of the filament between the first end and the second end.

Abstract: The embodiments disclose an apparatus including at least two carbon source deposition tools for emitting electrons, at least two reflective polarity rear button permanent magnets integrated into the carbon source deposition tools for reflecting emitted electrons, and at least two paired polarity Helmholtz coils integrated into the carbon source deposition tools for forming uniform parallel magnetic field lines for confining the emitted electrons to uniformly deposit carbon onto the surfaces of a two-sided media disk.

Abstract: Provided herein is an apparatus including a loader configured to position a workpiece in a holding fixture. In some embodiments, the holding fixture includes an opening configured to removably receive the workpiece therein and hold the workpiece in a target position within the opening. The apparatus also includes position detecting means configured to translate a sensor to a predetermined location relative to the holding fixture and further configured to translate the workpiece by a predetermined increment relative to the predetermined location to position the workpiece in the target position.