Patents by Inventor Sandeep Mehta

Sandeep Mehta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10380519
    Abstract: A device may identify a ticket associated with an issue, a user associated with resolving the issue, and a particular business process including a particular business process step associated with the issue. The device may present information regarding a particular business process workflow, corresponding to the particular business process, associated with a business process steps. The device may identify the particular business process step from the business process steps, and may identify a particular technical solution corresponding to the particular business process step. The device may present information regarding a particular technical solution workflow, corresponding to the particular technical solution, associated with technical solution steps. The device may identify a particular technical solution step, from the technical solution steps, associated with resolving the issue.
    Type: Grant
    Filed: March 26, 2015
    Date of Patent: August 13, 2019
    Assignee: Accenture Global Services Limited
    Inventors: Arpan Shukla, Bhaskar Ghosh, Rajendra T. Prasad, Vijayaraghavan Koushik, Siddharth Mehta, Priya Athreyee, Sandeep Rathod
  • Patent number: 9755583
    Abstract: Enhancing the intermodulation performance of an RF power amplifier by determining a coarse time delay represented by an integer TI; determining a reference point for a transmitted signal waveform of the RF power amplifier; shifting the waveform by a set of offsets including a plurality of non-integer fractional steps; correlating the transmitted signal waveform with a feedback signal waveform to obtain a respective correlation value for each of corresponding fractional steps; obtaining an accurate fractional delay value by selecting a fractional step having a highest respective correlation value; applying the obtained correct fractional delay value to the transmitted signal waveform to provide a compensated transmitted signal waveform and combining the compensated transmitted signal waveform with the feedback signal waveform to reduce at least one intermodulation product of the RF power amplifier.
    Type: Grant
    Filed: October 1, 2014
    Date of Patent: September 5, 2017
    Assignee: Nokia Solutions and Networks Oy
    Inventors: Shavantha Kularatna, Christian Reichl, Bjoern Jelonnek, Alan Pereira, Glenn Schedeen, Sandeep Mehta
  • Publication number: 20160254788
    Abstract: Enhancing the intermodulation performance of an RF power amplifier by determining a coarse time delay represented by an integer TI; determining a reference point for a transmitted signal waveform of the RF power amplifier; shifting the waveform by a set of offsets including a plurality of non-integer fractional steps; correlating the transmitted signal waveform with a feedback signal waveform to obtain a respective correlation value for each of corresponding fractional steps; obtaining an accurate fractional delay value by selecting a fractional step having a highest respective correlation value; applying the obtained correct fractional delay value to the transmitted signal waveform to provide a compensated transmitted signal waveform and combining the compensated transmitted signal waveform with the feedback signal waveform to reduce at least one intermodulation product of the RF power amplifier.
    Type: Application
    Filed: October 1, 2014
    Publication date: September 1, 2016
    Inventors: Shavantha KULARATNA, Christian REICHL, Bjoern JELONNEK, Alan PEREIRA, Glenn SCHEDEEN, Sandeep MEHTA
  • Patent number: 9099423
    Abstract: A method of forming a semiconductor material incorporating an electrical dopant is disclosed. In one aspect, a method of incorporating dopant in a semiconductor film comprises forming a first semiconductor material incorporating the dopant at a first dopant concentration and preferentially etching a portion of the first semiconductor material, wherein etching leaves a first etched semiconductor material incorporating the dopant at a second dopant concentration higher than the first dopant concentration.
    Type: Grant
    Filed: December 30, 2013
    Date of Patent: August 4, 2015
    Assignee: ASM IP HOLDING B.V.
    Inventors: Keith Doran Weeks, John Tolle, Matthew G. Goodman, Sandeep Mehta
  • Patent number: 9054652
    Abstract: Enhancing the intermodulation performance of an RF power amplifier by determining a coarse time delay represented by an integer T1; determining a reference point for a transmitted signal waveform of the RF power amplifier; shifting the waveform by a set of offsets comprising a plurality of non-integer fractional steps from (T1?Xd) to (T1+Xd) where T1 is the integer and Xd is a non-integer fractional step size value for defining fractional steps about the integer T1 such that the non-integer fractional steps progress in a positive direction as well as a negative direction; correlating the transmitted signal waveform with a feedback signal waveform to obtain a respective correlation value for each of corresponding fractional steps; obtaining an accurate fractional delay value by selecting a fractional step having a highest respective correlation value; applying the obtained correct fractional delay value to the transmitted signal waveform to provide a compensated transmitted signal waveform, and combining the c
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 9, 2015
    Assignee: Nokia Solutions and Networks Oy
    Inventors: Shavantha Kularatna, Christian Reichl, Bjoern Jelonnek, Glenn Schedeen, Sandeep Mehta
  • Publication number: 20150091643
    Abstract: Enhancing the intermodulation performance of an RF power amplifier by determining a coarse time delay represented by an integer T1; determining a reference point for a transmitted signal waveform of the RF power amplifier; shifting the waveform by a set of offsets comprising a plurality of non-integer fractional steps from (T1?Xd) to (T1+Xd) where T1 is the integer and Xd is a non-integer fractional step size value for defining fractional steps about the integer T1 such that the non-integer fractional steps progress in a positive direction as well as a negative direction; correlating the transmitted signal waveform with a feedback signal waveform to obtain a respective correlation value for each of corresponding fractional steps; obtaining an accurate fractional delay value by selecting a fractional step having a highest respective correlation value; applying the obtained correct fractional delay value to the transmitted signal waveform to provide a compensated transmitted signal waveform, and combining the c
    Type: Application
    Filed: October 2, 2013
    Publication date: April 2, 2015
    Applicant: Nokia Solutions and Networks Oy
    Inventors: Shavantha Kularatna, Christian Reichl, Bjoern Jelonnek, Glenn Schedeen, Sandeep Mehta
  • Patent number: 8954795
    Abstract: A method for responding to a failure of hardware locus of at a communication installation having a plurality of control apparatuses for controlling a plurality of processes distributed among a plurality of hardware loci, the hardware loci including at least one spare hardware locus, includes the steps of: (a) Shifting control of a failed process from an initial control apparatus to an alternate control apparatus located at an alternate hardware locus than the failed hardware locus. The failed process is a respective process controlled by the initial control apparatus located at the failed hardware locus. (b) Relocating the respective control apparatuses located at the failed hardware locus to a spare hardware locus. (c) Shifting control of the failed process from the alternate control apparatus to the initial control apparatus relocated at the spare hardware locus.
    Type: Grant
    Filed: November 15, 2011
    Date of Patent: February 10, 2015
    Assignee: Constellation Technologies LLC
    Inventor: Sandeep Mehta
  • Publication number: 20150014816
    Abstract: A method of forming a semiconductor material incorporating an electrical dopant is disclosed. In one aspect, a method of incorporating dopant in a semiconductor film comprises forming a first semiconductor material incorporating the dopant at a first dopant concentration and preferentially etching a portion of the first semiconductor material, wherein etching leaves a first etched semiconductor material incorporating the dopant at a second dopant concentration higher than the first dopant concentration.
    Type: Application
    Filed: December 30, 2013
    Publication date: January 15, 2015
    Applicant: ASM IP Holding B.V.
    Inventors: Keith Doran Weeks, John Tolle, Matthew G. Goodman, Sandeep Mehta
  • Publication number: 20150006954
    Abstract: A method for responding to a failure of hardware locus of at a communication installation having a plurality of control apparatuses for controlling a plurality of processes distributed among a plurality of hardware loci, the hardware loci including at least one spare hardware locus, includes the steps of: (a) Shifting control of a failed process from an initial control apparatus to an alternate control apparatus located at an alternate hardware locus than the failed hardware locus. The failed process is a respective process controlled by the initial control apparatus located at the failed hardware locus. (b) Relocating the respective control apparatuses located at the failed hardware locus to a spare hardware locus. (c) Shifting control of the failed process from the alternate control apparatus to the initial control apparatus relocated at the spare hardware locus.
    Type: Application
    Filed: September 15, 2014
    Publication date: January 1, 2015
    Inventor: Sandeep Mehta
  • Publication number: 20140081700
    Abstract: A method and system for capturing research decision flow in a Research and Development (R&D) activity are provided. The method includes defining an objective of the R&D activity and determining one or more requirements for fulfilling the objective of the R&D activity. Furthermore, the method also includes defining a set of tests to verify that the requirements are satisfied or the risks have been mitigated. Furthermore, the method also includes developing a task plan to satisfy the one or more requirements and mitigate one or more risks of the set of risks. Furthermore, the method also includes linking the objective, the one or more requirements, the set of risks and the task plan, to generate a linked information record. In an additional embodiment, the method includes identifying a set of risks associated with failure to satisfy the one or more requirements.
    Type: Application
    Filed: November 21, 2013
    Publication date: March 20, 2014
    Applicant: INSPIRD, Inc.
    Inventor: Sandeep MEHTA
  • Patent number: 8620702
    Abstract: A method and system for capturing research decision flow in a Research and Development (R&D) activity are provided. The method includes defining an objective of the R&D activity and determining one or more requirements for fulfilling the objective of the R&D activity. Further, the method includes identifying a set of risks associated with failure to satisfy the one or more requirements. Furthermore, the method also includes developing a task plan to satisfy the one or more requirements and mitigate one or more risks of the set of risks. Furthermore, the method also includes linking the objective, the one or more requirements, the set of risks and the task plan, to generate a linked information record.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: December 31, 2013
    Assignee: NSPIRD, Inc.
    Inventor: Sandeep Mehta
  • Publication number: 20120252835
    Abstract: The present disclosure describes a stable composition of Temsirolimus for parenteral administration. The composition includes BHA or BHT as anti-oxidants and alcoholic solvent. The pH of the composition is below 5.0. The composition also can include a chelating agent and/or a surfactant. A method of producing the composition is also described.
    Type: Application
    Filed: March 27, 2012
    Publication date: October 4, 2012
    Applicant: ASTRON RESEARCH LIMITED
    Inventors: Harsh RAJPUT, Sandeep MEHTA, Pankaj PATEL, Bhavesh PATEL, Ashish SEHGAL, Jayanta Kumar MANDAL
  • Publication number: 20120060055
    Abstract: A method for responding to a failure of hardware locus of at a communication installation having a plurality of control apparatuses for controlling a plurality of processes distributed among a plurality of hardware loci, the hardware loci including at least one spare hardware locus, includes the steps of: (a) Shifting control of a failed process from an initial control apparatus to an alternate control apparatus located at an alternate hardware locus than the failed hardware locus. The failed process is a respective process controlled by the initial control apparatus located at the failed hardware locus. (b) Relocating the respective control apparatuses located at the failed hardware locus to a spare hardware locus. (c) Shifting control of the failed process from the alternate control apparatus to the initial control apparatus relocated at the spare hardware locus.
    Type: Application
    Filed: November 15, 2011
    Publication date: March 8, 2012
    Applicant: ROCKSTAR BIDCO, LP
    Inventor: Sandeep Mehta
  • Patent number: 8074111
    Abstract: A method for responding to a failure of hardware locus of at a communication installation having a plurality of control apparatuses for controlling a plurality of processes distributed among a plurality of hardware loci, the hardware loci including at least one spare hardware locus, includes the steps of: (a) Shifting control of a failed process from an initial control apparatus to an alternate control apparatus located at an alternate hardware locus than the failed hardware locus. The failed process is a respective process controlled by the initial control apparatus located at the failed hardware locus. (b) Relocating the respective control apparatuses located at the failed hardware locus to a spare hardware locus. (c) Shifting control of the failed process from the alternate control apparatus to the initial control apparatus relocated at the spare hardware locus.
    Type: Grant
    Filed: September 18, 2006
    Date of Patent: December 6, 2011
    Assignee: Nortel Networks, Ltd.
    Inventor: Sandeep Mehta
  • Patent number: 7993698
    Abstract: Techniques for temperature-controlled ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for temperature-controlled ion implantation. The apparatus may comprise at least one thermal sensor adapted to measure a temperature of a wafer during an ion implantation process inside an end station of an ion implanter. The apparatus may also comprise a thermal conditioning unit coupled to the end station. The apparatus may further comprise a controller in communication with the thermal sensor and the thermal conditioning unit, wherein the controller compares the measured temperature to a desired wafer temperature and causes the thermal conditioning unit to adjust the temperature of the wafer based upon the comparison.
    Type: Grant
    Filed: September 23, 2006
    Date of Patent: August 9, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Julian Blake, Jonathan England, Scott Holden, Steven R. Walther, Reuel Liebert, Richard S. Muka, Ukyo Jeong, Jinning Liu, Kyu-Ha Shim, Sandeep Mehta
  • Patent number: 7886342
    Abstract: A computer implemented web based access control facility for a distributed environment, which allows users to request for access, take the request through appropriate approval work flow and finally make it available to the users and applications. This program also performs an automatic task of verifying the health of data, access control data as well as the entitlements, to avoid malicious user access. The system also provides an active interface to setup a backup, to delegate the duty in absence. Thus this system provides a comprehensive facility to grant, re-certify and control the entitlements and users in a distributed environment.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: February 8, 2011
    Assignee: International Business Machines Corporation
    Inventors: Rahul Jindani, Vinod Kannoth, Deepak Kanwar, Rinku Kanwar, Jay Krishnamurthy, Gregory L. McKee, Sandeep Mehta, Penny J. Peachey-Kountz, Ravi K. Ravipati
  • Publication number: 20100063859
    Abstract: A method and system for capturing research decision flow in a Research and Development (R&D) activity are provided. The method includes defining an objective of the R&D activity and determining one or more requirements for fulfilling the objective of the R&D activity. Further, the method includes identifying a set of risks associated with failure to satisfy the one or more requirements. Furthermore, the method also includes developing a task plan to satisfy the one or more requirements and mitigate one or more risks of the set of risks. Furthermore, the method also includes linking the objective, the one or more requirements, the set of risks and the task plan, to generate a linked information record.
    Type: Application
    Filed: September 9, 2008
    Publication date: March 11, 2010
    Inventor: Sandeep Mehta
  • Patent number: 7544957
    Abstract: A method includes receiving an input signal representative of a desired two-dimensional non-uniform dose pattern for a front surface of a workpiece, driving the workpiece relative to an ion beam to distribute the ion beam across the front surface of the workpiece, and controlling at least one parameter of an ion implanter when the ion beam is incident on the front surface of the workpiece to directly create the desired two-dimensional non-uniform dose pattern in one pass of the front surface of workpiece relative to the ion beam. The beam may be a scanned beam or a ribbon beam. An ion implanter is also provided.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: June 9, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Steven R. Walther, Sandeep Mehta
  • Patent number: 7544959
    Abstract: Methods and apparatus that introduce, within the ion implant chamber or an isolated chamber in communication therewith, the capability to remove contaminants and oxide surface layers on a wafer surface prior to ion implantation, are disclosed. The mechanisms for removal of contaminants include conducting: a low energy plasma etch, heating the wafer and application of ultraviolet illumination, either in combination or individually. As a result, implantation can occur immediately after the cleaning/preparation process without the contamination potential of exposure of the wafer to an external environment. The preparation allows for the removal of surface contaminants, such as water vapor, organic materials and surface oxides.
    Type: Grant
    Filed: April 8, 2008
    Date of Patent: June 9, 2009
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Steven R. Walther, Sandeep Mehta, Naushad Variam, Ukyo Jeong
  • Publication number: 20090070403
    Abstract: A computer implemented web based access control facility for a distributed environment, which allows users to request for access, take the request through appropriate approval work flow and finally make it available to the users and applications. This program also performs an automatic task of verifying the health of data, access control data as well as the entitlements, to avoid malicious user access. The system also provides an active interface to setup a backup, to delegate the duty in absence. Thus this system provides a comprehensive facility to grant, re-certify and control the entitlements and users in a distributed environment.
    Type: Application
    Filed: June 9, 2008
    Publication date: March 12, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Rahul JINDANI, Vinod Kannoth, Deepak Kanwar, Rinku Kanwar, Jay Krishnamurthy, Gregory L. McKee, Sandeep Mehta, Penny J. Peachey-Kountz, Ravi K. Ravipati