Patents by Inventor Sang-Hyun Yun

Sang-Hyun Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220207475
    Abstract: According to various example embodiments, a data management method of an electronic device includes obtaining selection information on or regarding a first product, obtaining selection information on a second product corresponding to the first product based on the selection information on the first product, identifying purchase information about the first product and the second product, transmitting the purchase information about the first product to a first server related to delivery of the first product and transmitting the purchase information about the second product to a second server, and transmitting activation-related information of the second product to the second server in response to delivery status information of the first product, wherein the first product includes a physical product requiring delivery, and the second product includes an insurance product for the first product.
    Type: Application
    Filed: March 9, 2021
    Publication date: June 30, 2022
    Inventors: Ki Woong Jang, Deqian Li, Cui Jie, Yong Geon Kim, Nam Woong Cho, Tae Hoon Kim, Pil Woo Kim, Ming Zhang, Qingqing Bai, Sang Ryul Kim, Jeong Min Yun, Hae Yeon Lee, Prakash Kadel, Ku Kang, Chang Hyun Park, Hyun Bo Kang, Da Young Lee
  • Patent number: 10859921
    Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: December 8, 2020
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun-Ho Sim, Sang-Hyun Yun, Hi-Kuk Lee, Hyun-Seok Kim
  • Patent number: 10205767
    Abstract: Provided is a management system for a big data processing device that includes a system management master node and at least one system management agent node communicatively coupled to the system management master node over a network. A first request-based communication path may be provided for transmitting data from a system management agent node to the system management master node and a second response-based communication path is provided for transmitting data from the system management master node to the system management agent node. The system management agent node may be configured to detect whether an instruction is included in a response received over the second communication path.
    Type: Grant
    Filed: September 24, 2014
    Date of Patent: February 12, 2019
    Assignee: LG CNS CO., LTD.
    Inventors: Joo Youl Lee, Seung Kab Rho, Seok Keun Oh, Sang Hyun Yun, Su Yeon Lee
  • Patent number: 9921488
    Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
    Type: Grant
    Filed: February 3, 2015
    Date of Patent: March 20, 2018
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jun-Ho Sim, Jung-In Park, Ki-Beom Lee, Hi-Kuk Lee, Hyun-Seok Kim, Kab-Jong Seo, Sang-Hyun Yun, Sang-Hyun Lee, Jung-Chul Heo, Jong-Joo Kim, Chang-Hoon Kim
  • Patent number: 9835951
    Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: December 5, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae Hyuk Chang, Sang Hyun Yun, Ki Beom Lee, Hi Kuk Lee
  • Patent number: 9746780
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
    Type: Grant
    Filed: June 19, 2015
    Date of Patent: August 29, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Hyun-Seok Kim, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Jung-Chul Heo, Kab-Jong Seo, Ki-Beom Lee, Jun-Ho Sim
  • Patent number: 9690204
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: June 27, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sang-Hyun Lee, Hyun-Seok Kim, Jung-Chul Heo, Hi-Kuk Lee, Sang-Hyun Yun, Ki-Beom Lee, Chang-Hoon Kim, Jung-In Park, Kab-Jong Seo, Jun-Ho Sim, Jae-Hyuk Chang
  • Patent number: 9645450
    Abstract: Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: May 9, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae Hyuk Chang, Hi Kuk Lee, Cha-Dong Kim, Sang Hyun Yun, Jung-In Park, Chang Hoon Kim, Ki Beom Lee
  • Patent number: 9594307
    Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: March 14, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Cha-Dong Kim, Hoon Kang, Chang-Hoon Kim, Sang-Hyun Yun, Jung-In Park, Woo-Yong Sung, Ki-Beom Lee, Hi-Kuk Lee, Jae-Hyuk Chang
  • Patent number: 9436098
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: September 6, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jung-Chul Heo, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Sang-Hyun Yun, Ki-Beom Lee, Hyun-Seok Kim, Kab-Jong Seo, Jun-Ho Sim, Byoung-Min Yun, Sang-Don Jang, Jae-Young Jang, Chang-Hoon Kim
  • Publication number: 20160209756
    Abstract: Embodiments of the present invention provide a roll-to-roll exposure system having a reference mark array and alignment scope units for precisely measuring the position and orientation of an object on a flexible multilayered circuit film. A roll-to-roll exposure system according to an exemplary embodiment of the present invention includes: a plurality of rolls configured to move a flexible multilayered circuit film having an object positioned thereon; alignment scope units positioned so as to be spaced apart from each other and proximate to the rolls; and at least one exposure unit positioned so as to be spaced proximate to the rolls and spaced apart from sides of the alignment scope units, in which one of the rolls has a reference mark array on its surface.
    Type: Application
    Filed: November 5, 2015
    Publication date: July 21, 2016
    Inventors: Jae Hyuk CHANG, Sang Hyun YUN, Ki Beom LEE, Hi Kuk LEE
  • Patent number: 9366975
    Abstract: A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: June 14, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hi Kuk Lee, Sang Don Jang, Jae Hyuk Chang, Hyang-Shik Kong, Cha-Dong Kim, Chang Hoon Kim, Jung-In Park, Sang Hyun Yun
  • Patent number: 9335631
    Abstract: A photosensitive resin composition includes an acid-labile resin of about 5 wt % to about 25 wt %, a monomer of about 5 wt % to about 10 wt %, a photoacid generator of about 5 wt % to about 10 wt %, a photoreaction accelerator of about 1 wt % to about 5 wt %, and a solvent of about 50 wt % to about 84 wt %, wherein the acid-labile resin comprises a repeating unit containing an acid group, and a protecting group configured to protect the repeating unit.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: May 10, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Ki-Beom Lee, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Chang-Hoon Kim, Jung-In Park
  • Publication number: 20160116847
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
    Type: Application
    Filed: June 19, 2015
    Publication date: April 28, 2016
    Inventors: Hyun-Seok Kim, Sang-Hyun Yun, Hi-Kuk Lee, Jae-Hyuk Chang, Sang-Hyun Lee, Jung-In Park, Jung-Chul Heo, Kab-Jong Seo, Ki-Beom Lee, Jun-Ho Sim
  • Publication number: 20160091796
    Abstract: A maskless exposure device includes an exposure head that includes a digital micro-mirror device configured to reflect a source beam received from an exposure source to a substrate to scan an exposure beam to the substrate, and a system control part configured to control the digital micro-mirror device using a graphic data system file. The graphic data system file includes data of an align-key. The align-key includes an X-align-key that extends in a direction parallel to a scan direction of the exposure head, and has a bar shape in a plan view, and a Y-align-key disposed adjacent to the X-align-key that has a frame shape in a plan view.
    Type: Application
    Filed: June 12, 2015
    Publication date: March 31, 2016
    Inventors: JUN-HO SIM, SANG-HYUN YUN, HI-KUK LEE, HYUN-SEOK KIM
  • Publication number: 20160077449
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
    Type: Application
    Filed: March 2, 2015
    Publication date: March 17, 2016
    Inventors: Jung-Chul HEO, Hi-Kuk LEE, Jae-Hyuk CHANG, Sang-Hyun LEE, Jung-In PARK, Sang-Hyun YUN, Ki-Beom LEE, Hyun-Seok KIM, Kab-Jong SEO, Jun-Ho SIM, Byoung-Min YUN, Sang-Don JANG, Jae-Young JANG, Chang-Hoon KIM
  • Publication number: 20160054660
    Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
    Type: Application
    Filed: March 20, 2015
    Publication date: February 25, 2016
    Inventors: Sang-Hyun Lee, Hyun-Seok Kim, Jung-Chul Heo, Hi-Kuk Lee, Sang-Hyun Yun, Ki-Beom Lee, Chang-Hoon Kim, Jung-In Park, Kab-Jong Seo, Jun-Ho Sim, Jae-Hyuk Chang
  • Publication number: 20160048081
    Abstract: A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
    Type: Application
    Filed: February 3, 2015
    Publication date: February 18, 2016
    Inventors: JUN-HO SIM, JUNG-IN PARK, KI-BEOM LEE, HI-KUK LEE, HYUN-SEOK KIM, KAB-JONG SEO, SANG-HYUN YUN, SANG-HYUN LEE, JUNG-CHUL HEO, JONG-JOO KIM, CHANG-HOON KIM
  • Publication number: 20150248062
    Abstract: A method for digitally exposing a substrate includes generating first horizontal pattern area graphic data and second horizontal pattern area graphic data, where the first horizontal pattern area graphic data corresponds to a first pattern, and the second horizontal pattern area graphic data corresponds to a second pattern, generating a second light incident into the substrate by changing a light path of a first light based on the first horizontal pattern area graphic data and the second horizontal pattern area graphic data, and forming a first pattern on the substrate from the first horizontal pattern area graphic data and a second pattern on the substrate spaced apart in a first direction from the first pattern from the second horizontal pattern area graphic data by exposing the substrate with the second light in a second direction perpendicular to the first direction in a plan view.
    Type: Application
    Filed: August 14, 2014
    Publication date: September 3, 2015
    Inventors: SANG-HYUN YUN, HYUN-SEOK KIM, HI-KUK LEE, JUNG-IN PARK, JAE-HYUK CHANG, CHANG-HOON KIM, KI-BEOM LEE
  • Publication number: 20150205212
    Abstract: A light exposure device is provided. The light exposure device includes a light source, a light modulation part, and a projection optical part. The light modulation part modulates the light based on a predetermined exposure pattern. The projection optical part projects the light from the light modulation part onto a substrate. The projection optical part includes a first optical part, a hole arrangement part, and a second optical part. The first optical part receives the light from the light modulation part. The first optical part includes a plurality of first lenses. The hole arrangement part emits the light from the first optical part. The second optical part emits the light from the hole arrangement part onto the substrate. The second optical part includes a plurality of second lenses. At least one of the first lenses and the second lenses is a transreflective lens.
    Type: Application
    Filed: July 2, 2014
    Publication date: July 23, 2015
    Inventors: KI-BEOM LEE, HI-KUK LEE, CHA-DONG KIM, CHANG-HOON KIM, JUNG-IN PARK, KAB-JONG SEO, JUN-HO SIM, SANG-HYUN YUN, JAE-HYUK CHANG, HYUN-SEOK KIM, SANG-HYUN LEE