Patents by Inventor Sang Won Bae

Sang Won Bae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10377948
    Abstract: An etching composition selectively removes a titanium nitride film from a stacked conductive film structure including a titanium nitride (TiN) film and a tantalum nitride (TaN) film. The etching composition configured to etch titanium nitride (TiN) includes 5 wt % to 30 wt % of hydrogen peroxide, 15 wt % to 50 wt % of acid compound, and 0.001 wt % to 5 wt % of corrosion inhibitor, with respect to a total weight of the etching composition, wherein the acid compound includes at least one of phosphoric acid (H3PO4), nitric acid (HNO3), hydrochloric acid (HCl), hydroiodic acid (HI), hydrobromic acid (HBr), perchloric acid (HNO4), silicic acid (H2SiO3), boric acid (H3BO3), acetic acid (CH3COOH), propionic acid (C2H5COOH), lactic acid (CH3CH(OH)COOH), and glycolic acid (HOCH2COOH).
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: August 13, 2019
    Assignees: Samsung Electronics Co., Ltd., Soulbrain Co., Ltd.
    Inventors: Hyo Sun Lee, Ho Young Kim, Sang Won Bae, Min Goo Kim, Jung Hun Lim, Yong Jae Choi
  • Patent number: 10362130
    Abstract: A method and apparatus for an adaptive Hypertext Transfer Protocol (HTTP) streaming service using metadata of content are provided. The metadata may include a minBufferTime attribute indicating a minimum amount of initially buffered media content. A terminal may receive content from a server before playback of the content, and may buffer the content by at least the minimum amount. The metadata may include a range attribute that designates a range of a target indicated by a Uniform Resource Locator (URL). The terminal may receive bytes designated by the range attribute from the URL, and may play back the content using the received bytes.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: July 23, 2019
    Assignee: IDEAHUB INC.
    Inventors: Truong Cong Thang, Jin Young Lee, Seong Jun Bae, Jung Won Kang, Soon Heung Jung, Sang Taick Park, Won Ryu, Jae Gon Kim
  • Patent number: 10354802
    Abstract: A ceramic electronic component includes a body including dielectric layers and a plurality of internal electrodes disposed to face each other while having each of the dielectric layers interposed therebetween; and external electrodes including a connection portion disposed on end surfaces of the body opposing each other and band portions extending onto portions of upper and lower surfaces of the body from the connection portion, wherein the external electrodes include electrode layers connected to the plurality of internal electrodes, conductive resin layers disposed on the electrode layers, Ni plating layers disposed on the conductive resin layers, and Sn plating layers disposed on the Ni plating layers, and tc1 is 0.5 ?m or more and tc2/tc1 is 1.2 or less, in which a thickness of the Ni plating layer in the connection portion is “tc1” and a thickness of the Ni plating layer in the band portion is tc2.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: July 16, 2019
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Bum Chul Bae, Woo Chul Shin, Sang Soo Park, Ki Won Kim, Dong Hwi Shin
  • Patent number: 10356145
    Abstract: A method and apparatus for an adaptive Hypertext Transfer Protocol (HTTP) streaming service using metadata of content are provided. The metadata of the content may be efficiently divided for a purpose of use of a terminal based on general media information or specific media information, and may be transmitted to the terminal. A group may include one or more representations of content. The metadata may include a group element, and the group element may provide a summary of attributes of one or more representations included in the group.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: July 16, 2019
    Assignee: IDEAHUB, INC.
    Inventors: Truong Cong Thang, Jin Young Lee, Seong Jun Bae, Jung Won Kang, Soon Heung Jung, Sang Taick Park, Won Ryu
  • Publication number: 20190210004
    Abstract: The present invention relates to a magnetic cesium adsorbent, a preparation method therefor, and a cesium removal method using the same, the preparation method comprising the steps of: (a) preparing a metal hexacyanoferrate; and (b) hydrothermally reacting the metal hexacyanoferrate so as to prepare a metal hexacyanoferrate having a rhombohedral crystal structure.
    Type: Application
    Filed: July 4, 2017
    Publication date: July 11, 2019
    Applicant: KOREA ATOMIC ENERGY RESEARCH INSTITUTE
    Inventors: Tae Hong PARK, Young Jin CHO, Sang Eun BAE, Sang Ho LIM, Jai Il PARK, Young Sang YOUN, Jei Won YEON
  • Publication number: 20190181211
    Abstract: A display device, includes: a display area including an upper side, a lower side, a left side, a right side, and inclined corner portions where the upper, lower, left, and right sides meet; a demultiplexing circuit unit adjacent to the lower side of the display area and the corner portion connected thereto; and a scan transmission line which extends toward the display area from an outer side of the left side and overlaps with the demultiplexing circuit unit outside the corner portion, wherein the demultiplexing circuit unit includes a demultiplexer transistor, and the scan transmission line is formed of a different conductive layer from an electrode of a demultiplexer transistor.
    Type: Application
    Filed: October 30, 2018
    Publication date: June 13, 2019
    Inventors: Han Sung BAE, Se Ho KIM, Sun Ja KWON, Dong Wook KIM, Jun Yong AN, Sang Moo CHOI, Jun Won CHOI
  • Patent number: 10286750
    Abstract: An apparatus is provided for simultaneously measuring interior temperature and fine dust in a vehicle. The apparatus measures interior temperature of a vehicle and fine dust in the air simultaneously by controlling flow rate of the interior air through a structure for changing air flow rate and making a division between a temperature sensing region and a dust sensing region based on a flow rate difference that occurs based on the structure for changing air flow rate.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: May 14, 2019
    Assignees: Hyundai Motor Company, Kia Motors Corporation
    Inventors: June Kyu Park, Dong Won Yeon, Jong Sik Bae, Jae Won Heo, Sang Yeop Lee
  • Publication number: 20190136132
    Abstract: A composition for etching may include phosphoric acid, an ammonium-based compound, at least one of hydrochloric acid or a polyphosphate-based compound, and a silicon-containing compound.
    Type: Application
    Filed: May 7, 2018
    Publication date: May 9, 2019
    Applicant: SOULBRAIN CO., LTD.
    Inventors: HOON HAN, SANG WON BAE, YOUNG TAEK HON, JAEWAN PARK, JINUK LEE, JUNGHUN LIM
  • Publication number: 20180148645
    Abstract: An etching composition selectively removes a titanium nitride film from a stacked conductive film structure including a titanium nitride (TiN) film and a tantalum nitride (TaN) film. The etching composition configured to etch titanium nitride (TiN) includes 5 wt % to 30 wt % of hydrogen peroxide, 15 wt % to 50 wt % of acid compound, and 0.001 wt % to 5 wt % of corrosion inhibitor, with respect to a total weight of the etching composition, wherein the acid compound includes at least one of phosphoric acid (H3PO4), nitric acid (HNO3), hydrochloric acid (HCl), hydroiodic acid (HI), hydrobromic acid (HBr), perchloric acid (HNO4), silicic acid (H2SiO3), boric acid (H3BO3), acetic acid (CH3COOH), propionic acid (C2H5COOH), lactic acid (CH3CH(OH)COOH), and glycolic acid (HOCH2COOH).
    Type: Application
    Filed: November 10, 2017
    Publication date: May 31, 2018
    Applicants: Samsung Electronics Co., Ltd., Soulbrain Co., Ltd.
    Inventors: Hyo Sun LEE, Ho Young KIM, Sang Won BAE, Min Goo KIM, Jung Hun LIM, Yong Jae CHOI
  • Publication number: 20180145376
    Abstract: An electrode assembly is provided. The electrode assembly has a plurality of electrode plates having one or both sides of each of the electrode plates that are coated with an electrode active material and are stacked with a separator interposed between the respective electrode plates. The separator includes a surplus outer periphery of a size greater than the outer periphery of an electrode plate, an electrode tab which extends from the outer periphery of the electrode plate and protrudes outwardly beyond the outer periphery of the separator is formed on each electrode plate, and at least some of the separators forming the electrode assembly have an insulation-enhancing part for suppressing heat shrinkage of a separator formed in the surplus outer peripheries thereof which are adjacent to the respective electrode tabs.
    Type: Application
    Filed: November 22, 2017
    Publication date: May 24, 2018
    Inventors: Hye Dam Jo, Jong Hun Kim, Hyun Wook Kim, Sang Won Bae, Ji Hee Bae, Jang Hyuk Hong
  • Patent number: 9972696
    Abstract: The present disclosure relates to an etchant, a method of making an etchant, an etching method and a method of fabricating a semiconductor device using the same. The etching method includes supplying an etchant on an etch-target layer to etch the etch-target layer in a wet etch manner. The etchant contains a basic compound and a sugar alcohol, and the basic compound contains ammonium hydroxide or tetraalkyl ammonium hydroxide. In the etchant, the sugar alcohol has 0.1 to 10 parts by weight for every 100 parts by weight of the basic compound.
    Type: Grant
    Filed: August 5, 2016
    Date of Patent: May 15, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hoyoung Kim, Sang Won Bae, Jae-Jik Baek, Wonsang Choi
  • Patent number: 9677002
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: June 13, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang Won Bae, Yongsun Ko, Byoungho Kwon, Bo yun Kim, Hongjin Kim, Sungoh Park, Kuntack Lee, Hyosan Lee, Sol Han
  • Publication number: 20170084719
    Abstract: The present disclosure relates to an etchant, a method of making an etchant, an etching method and a method of fabricating a semiconductor device using the same. The etching method includes supplying an etchant on an etch-target layer to etch the etch-target layer in a wet etch manner. The etchant contains a basic compound and a sugar alcohol, and the basic compound contains ammonium hydroxide or tetraalkyl ammonium hydroxide. In the etchant, the sugar alcohol has 0.1 to 10 parts by weight for every 100 parts by weight of the basic compound.
    Type: Application
    Filed: August 5, 2016
    Publication date: March 23, 2017
    Inventors: Hoyoung KIM, SANG WON BAE, Jae-Jik BAEK, Wonsang CHOI
  • Publication number: 20170062242
    Abstract: A chemical liquid supply apparatus includes a nozzle unit including a nozzle arm and an injection nozzle mounted in an end of the nozzle arm, a chemical liquid supply unit including a first chemical liquid tank accommodating a first chemical liquid and a second chemical liquid tank accommodating a second chemical liquid, and supplying the first chemical liquid and the second chemical liquid to the nozzle unit, and a mixer unit provided in the nozzle unit and discharging a process fluid by mixing the first chemical liquid and the second chemical liquid, wherein the mixer unit includes an in-line mixer mixing the first chemical liquid and the second chemical liquid that are continually injected from the chemical liquid supply unit, and a mixer pipe extending from the in-line mixer to the injection nozzle.
    Type: Application
    Filed: June 3, 2016
    Publication date: March 2, 2017
    Inventors: YOUNG-HOO KIM, IL-SANG LEE, IN-GI KIM, KYOUNG-HWAN KIM, HYO-SAN LEE, SANG-WON BAE, TAE-HONG KIM, YONG-JUN CHOI
  • Publication number: 20160368030
    Abstract: Disclosed is a substrate processing system including a nozzle to supply a chemical solution containing a mixture of first and second solutions onto a substrate loaded on a supporter of a process chamber, a chemical solution supplying system to supply the chemical solution to the nozzle, and a controller to control the chemical solution supplying system. The chemical solution supplying system may include a mixing tank mixing a plurality of chemicals to produce the first solution, a supply tank receiving the first solution from the mixing tank and producing the chemical solution, a connection line to connect the mixing tank to the supply tank, and a valve and a pump on the connection line. The pump is controlled to allow the first solution to be supplied into the supply tank at a predetermined supply amount per stroke.
    Type: Application
    Filed: April 29, 2016
    Publication date: December 22, 2016
    Inventors: Ingi KIM, Kyoung Hwan KIM, SeokHoon KIM, Sang Won BAE, Jung-Min OH, Kuntack LEE, Hyosan LEE
  • Patent number: 9394509
    Abstract: A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2?), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: July 19, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-Won Bae, Yong-Sun Ko, Seok-Hoon Kim, In-Gi Kim, Jung-Min Oh, Kun-Tack Lee, Hyo-San Lee, Ji-Hoon Jeong, Yong-Jhin Cho
  • Patent number: 9368647
    Abstract: Etching compositions are provided. The etching composition includes a phosphoric acid, ammonium ions and a silicon compound material. The silicon compound material includes a silicon atom, at least one selected from the group of a nitrogen atom, a phosphorus atom and a sulfur atom combined with the silicon atom, and at least two oxygen atoms combined with the silicon atom. Methods utilizing the etching compositions are also provided.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: June 14, 2016
    Assignees: Samsung Electronics Co., Ltd., Soulbrain Co., Ltd.
    Inventors: Young-Taek Hong, Jinuk Lee, Junghun Lim, Jaewan Park, Chanjin Jeong, Hoon Han, Seonghwan Park, Yanghwa Lee, Sang Won Bae, Daehong Eom, Byoungmoon Yoon, Jihoon Jeong, Kyunghyun Kim, Kyounghwan Kim, ChangSup Mun, Se-Ho Cha, Yongsun Ko
  • Publication number: 20160032185
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Application
    Filed: October 9, 2015
    Publication date: February 4, 2016
    Inventors: Sang Won BAE, Yongsun KO, Byoungho KWON, Bo yun KIM, Hongjin KIM, Sungoh PARK, Kuntack LEE, Hyosan LEE, Sol HAN
  • Publication number: 20150348799
    Abstract: Etching compositions are provided. The etching composition includes a phosphoric acid, ammonium ions and a silicon compound material. The silicon compound material includes a silicon atom, at least one selected from the group of a nitrogen atom, a phosphorus atom and a sulfur atom combined with the silicon atom, and at least two oxygen atoms combined with the silicon atom. Methods utilizing the etching compositions are also provided.
    Type: Application
    Filed: August 12, 2015
    Publication date: December 3, 2015
    Inventors: Young Taek Hong, Jinuk Lee, Junghun Lim, Jaewan Park, Chanjin Jeong, Hoon Han, Seonghwan Park, Yanghwa Lee, Sang Won Bae, Daehong Eom, Byoungmoon Yoon, Jihoon Jeong, Kyunghyun Kim, Kyounghwan Kim, ChangSup Mun, Se-Ho Cha, Yongsun Ko
  • Publication number: 20150299629
    Abstract: A cleaning solution composition includes an organic solvent in which a metal fluoride does not dissolve, at least one fluoride compound that generates bifluoride (HF2?), and deionized water, wherein the deionized water may be included in a concentration of 1.5 wt % or lower based on the total weight of the cleaning solution composition.
    Type: Application
    Filed: November 17, 2014
    Publication date: October 22, 2015
    Inventors: Sang-Won Bae, Yong-Sun Ko, Seok-Hoon Kim, In-Gi Kim, Jung-Min Oh, Kun-Tack Lee, Hyo-San Lee, Ji-Hoon Jeong, Yong-Jhin Cho