Patents by Inventor Sanjay Bhat

Sanjay Bhat has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11221599
    Abstract: Disclosed are systems and methods for adjusting environmental conditions based on automatically and manually generated requests. A commissioned unit comprising at least one IP luminaire (140, 150), transmits a signal comprising one or more identification codes. The signal may be, for example, a coded light signal. An environment control device (160) receives the signal, detects user input indicating one or more preferred environmental conditions, and transmits an environment control request comprising the one or more preferred environmental conditions. An environment manager module (110) receives the environment control request, generates an environment control command using the control request, and transmits the environment control command to one or more commissioned units to alter environmental conditions in a space in accordance with the user input.
    Type: Grant
    Filed: February 19, 2020
    Date of Patent: January 11, 2022
    Assignee: SIGNIFY HOLDING B.V.
    Inventors: Mark Henricus Verberkt, Jurgen Mario Vangeel, Lokesh Narayan, Wijnand Johannes Rietman, Simon Dingle, Jules Martinus Adrianus Gerardus De Laat, Sanjay Bhat, Tony Petrus Van Endert, Michael Petrus Franciscus Verschoor, Petrus Johannes Lenoir
  • Publication number: 20210400199
    Abstract: A method for switching between a first lens and a second lens in an electronic device includes displaying, by the electronic device, a first frame showing a field of view (FOV) of the first lens; detecting, by the electronic device, an event that causes the electronic device to transition from displaying the first frame to displaying a second frame showing a FOV of the second lens; generating, by the electronic device and based on the detecting the event, at least one intermediate frame for transitioning from the first frame to the second frame; and switching, by the electronic device and based on the detecting the event, from the first lens to the second lens and displaying the second frame, wherein the at least one intermediate frame is displayed after the displaying the first frame and before the displaying the second frame while the switching is performed.
    Type: Application
    Filed: August 10, 2021
    Publication date: December 23, 2021
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Raviprasad Mohan KINI, Gururaj BHAT, Pavan SUDHEENDRA, Girish KULKARNI, Vineeth Thanikonda MUNIRATHNAM, Sanjay Narasimha MURTHY, Balvinder SINGH
  • Publication number: 20210333703
    Abstract: Extreme ultraviolet (EUV) mask blanks and methods for their manufacture, and production systems therefor are disclosed. The method for forming an EUV mask blank comprises smoothing out surface defects on a surface of a substrate.
    Type: Application
    Filed: April 20, 2021
    Publication date: October 28, 2021
    Applicant: Applied Materials, Inc
    Inventors: Wen Xiao, Vibhu Jindal, Weimin Li, Sanjay Bhat, Azeddine Zerrade
  • Publication number: 20210272785
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Application
    Filed: May 11, 2021
    Publication date: September 2, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Patent number: 11037769
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Grant
    Filed: May 6, 2020
    Date of Patent: June 15, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Publication number: 20210173295
    Abstract: Provided herein are apparatus, systems and methods for processing reticle blanks. A reticle processing system includes a support assembly having a plate coupled to a frame, and a carrier base assembly supported on the support assembly. The carrier base assembly comprises a wall extending from a top surface of the carrier base and defining a containment region for a reticle.
    Type: Application
    Filed: December 3, 2020
    Publication date: June 10, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal
  • Publication number: 20210172054
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising a deposition ring assembly comprising an inner and outer deposition ring which reduces particle defects.
    Type: Application
    Filed: December 3, 2020
    Publication date: June 10, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal
  • Publication number: 20210124253
    Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture, and production systems therefor are disclosed. A method for forming an EUV mask blank comprises placing a substrate in a multi-cathode physical vapor deposition chamber, depositing a multilayer stack, removing the substrate from the chamber and passivating the PVD chamber.
    Type: Application
    Filed: October 22, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Herng Yau Yoong, Wen Xiao, Vibhu Jindal, Shuwei Liu, Sanjay Bhat, Azeddine Zerrade
  • Publication number: 20210124252
    Abstract: Methods for the manufacture of extreme ultraviolet (EUV) mask blanks and production systems therefor are disclosed. A method for forming an EUV mask blank comprises forming a bilayer on a portion of a multi-cathode PVD chamber interior and then forming a multilayer stack of Si/Mo on a substrate in the multi-cathode PVD chamber.
    Type: Application
    Filed: October 22, 2020
    Publication date: April 29, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Sanjay Bhat, Shiyu Liu, Binni Varghese, Vibhu Jindal, Azeddine Zerrade
  • Publication number: 20210032742
    Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.
    Type: Application
    Filed: July 30, 2020
    Publication date: February 4, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Shiyu Liu, Sanjay Bhat, Shuwei Liu, Wen Xiao
  • Publication number: 20210014077
    Abstract: Disclosed are systems and methods for cloud-based monitoring and control of physical environments. A system comprises a computing cloud with at least one processor configured to execute one or more application modules and a data analytics module for analyzing diagnostic and environmental metric data. The system further comprises a building server communicatively coupled with the computing cloud, at least one gateway communicatively coupled with the building server, and at least one system device communicatively coupled with the at least one gateway. The at least one system device generates environmental metric data for further analysis and display, and the data is communicated to the computing cloud by way of the at least one gateway and the at least one building server.
    Type: Application
    Filed: September 30, 2020
    Publication date: January 14, 2021
    Inventors: SANJAY BHAT, LEE BROWN, MARCIN GRAMZA, MARCIN KLECHA, LOKESH NARAYAN RAJ URS, NATARAJAN GANAPATHY SUBRAMANIAN, WIJNAND JOHANNES RIETMAN, JURGEN MARIO VANGEEL, MARK HENRICUS VERBERKT, ROBERT ADRIANUS HENDRIK VAN TWIST
  • Patent number: 10826717
    Abstract: Disclosed are systems and methods for cloud-based monitoring and control of physical environments. A system comprises a computing cloud with at least one processor configured to execute one or more application modules and a data analytics module for analyzing diagnostic and environmental metric data. The system further comprises a building server communicatively coupled with the computing cloud, at least one gateway communicatively coupled with the building server, and at least one system device communicatively coupled with the at least one gateway. The at least one system device generates environmental metric data for further analysis and display, and the data is communicated to the computing cloud by way of the at least one gateway and the at least one building server.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: November 3, 2020
    Assignee: SIGNIFY HOLDING B.V.
    Inventors: Sanjay Bhat, Lee Brown, Marcin Gramza, Marcin Klecha, Lokesh Narayan Raj Urs, Natarajan Ganapathy Subramanian, Wijnand Johannes Rietman, Jurgen Mario Vangeel, Mark Henricus Verberkt, Robert Adrianus Hendrik Van Twist
  • Publication number: 20200335331
    Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200332412
    Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).
    Type: Application
    Filed: April 16, 2020
    Publication date: October 22, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200277696
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Vibhu Jindal, Sanjay Bhat
  • Publication number: 20200277698
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Wen Xiao, Sanjay Bhat
  • Publication number: 20200277697
    Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.
    Type: Application
    Filed: February 26, 2020
    Publication date: September 3, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Wen Xiao
  • Patent number: 10763091
    Abstract: Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: September 1, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Vibhu Jindal, Sanjay Bhat, Majeed A. Foad
  • Publication number: 20200266039
    Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.
    Type: Application
    Filed: May 6, 2020
    Publication date: August 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Sanjay Bhat, Vibhu Jindal, Vishwas Kumar Pandey
  • Publication number: 20200241409
    Abstract: Physical vapor deposition target assemblies, PVD chambers including target assemblies and methods of manufacturing EUV mask blanks using such target assemblies are disclosed. The target assembly includes a target shield adjacent the target and surrounding the peripheral edges of the target, the target shield comprising an insulating material and a non-insulating outer peripheral fixture to secure the target shield to the assembly.
    Type: Application
    Filed: January 23, 2020
    Publication date: July 30, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Wen Xiao, Sanjay Bhat, Shuwei Liu, Vibhu Jindal