Abstract: Methods of cleaning a PVD chamber component, for example, process kit components are disclosed. The method comprises at least one of directing a jet of pressurized fluid at a surface of the PVD chamber component, directing pressurized carbon dioxide at the surface of the PVD chamber component, placing the PVD chamber component in a liquid and producing ultrasonic waves in the liquid to further remove contaminants from the surface of the PVD chamber component, using a plasma to clean the surface of the PVD chamber component, subjecting the PVD chamber component to a thermal cycle by heating up to a peak temperature of at least 50° C.

Abstract: Disclosed are systems and methods for cloud-based monitoring and control of physical environments. A system comprises a computing cloud with at least one processor configured to execute one or more application modules and a data analytics module for analyzing diagnostic and environmental metric data. The system further comprises a building server communicatively coupled with the computing cloud, at least one gateway communicatively coupled with the building server, and at least one system device communicatively coupled with the at least one gateway. The at least one system device generates environmental metric data for further analysis and display, and the data is communicated to the computing cloud by way of the at least one gateway and the at least one building server.

Abstract: Disclosed are systems and methods for cloud-based monitoring and control of physical environments. A system comprises a computing cloud with at least one processor configured to execute one or more application modules and a data analytics module for analyzing diagnostic and environmental metric data. The system further comprises a building server communicatively coupled with the computing cloud, at least one gateway communicatively coupled with the building server, and at least one system device communicatively coupled with the at least one gateway. The at least one system device generates environmental metric data for further analysis and display, and the data is communicated to the computing cloud by way of the at least one gateway and the at least one building server.

Abstract: A physical vapor deposition chamber comprising a rotating substrate support having a rotational axis, a first cathode having a radial center positioned off-center from a rotational axis of the substrate support is disclosed. A process controller comprising one or more process configurations selected from one or more of a first configuration to determine a rotation speed (v) for a substrate support to complete a whole number of rotations (n) around the rotational axis of the substrate support in a process window time (t) to form a layer of a first material on a substrate, or a second configuration to rotate the substrate support at the rotation speed (v).

Abstract: A physical vapor deposition chamber comprising a tilting substrate support is described. Methods of processing a substrate are also provided comprising tilting at least one of the substrate and the target to improve the uniformity of the layer on the substrate from the center of the substrate to the edge of the substrate. Process controllers are also described which comprise one or more process configurations causing the physical deposition chamber to perform the operations of rotating a substrate support within the physical deposition chamber and tilting the substrate support at a plurality of angles with respect to a horizontal axis.

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed.

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.

Abstract: Physical vapor deposition processing chambers and methods of processing a substrate such as an EUV mask blank in a physical vapor deposition chamber are disclosed. An electric field and a magnetic field are utilized to deflect particles from a substrate being processed in the chamber.

Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.

Abstract: Physical vapor deposition target assemblies, PVD chambers including target assemblies and methods of manufacturing EUV mask blanks using such target assemblies are disclosed. The target assembly includes a target shield adjacent the target and surrounding the peripheral edges of the target, the target shield comprising an insulating material and a non-insulating outer peripheral fixture to secure the target shield to the assembly.

Abstract: Physical vapor deposition target assemblies and methods of manufacturing such target assemblies are disclosed. An exemplary target assembly comprises a flow pattern including a plurality of arcs and bends fluidly connected to an inlet end and an outlet end.

Abstract: Disclosed are systems and methods for adjusting environmental conditions based on automatically and manually generated requests. A commissioned unit comprising at least one IP luminaire (140, 150), transmits a signal comprising one or more identification codes. The signal may be, for example, a coded light signal. An environment control device (160) receives the signal, detects user input indicating one or more preferred environmental conditions, and transmits an environment control request comprising the one or more preferred environmental conditions. An environment manager module (110) receives the environment control request, generates an environment control command using the control request, and transmits the environment control command to one or more commissioned units to alter environmental conditions in a space in accordance with the user input.

Abstract: Disclosed are systems and methods for adjusting environmental conditions based on automatically and manually generated requests. A commissioned unit comprising at least one IP luminaire (140, 150), transmits a signal comprising one or more identification codes. The signal may be, for example, a coded light signal. An environment control device (160) receives the signal, detects user input indicating one or more preferred environmental conditions, and transmits an environment control request comprising the one or more preferred environmental conditions. An environment manager module (110) receives the environment control request, generates an environment control command using the control request, and transmits the environment control command to one or more commissioned units to alter environmental conditions in a space in accordance with the user input.

Abstract: A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising one or more of contours that reduce particle defects, temperature control and or measurement and and/or voltage particle traps to reduce processing defects.

Abstract: A deposition system and a method of operation thereof are disclosed. A PVD chamber is disclosed comprising a plurality of cathode assemblies, a rotating shield below the plurality of cathode assemblies to expose one of the plurality cathode assemblies through the shroud and through a shield hole of the shield, the shield comprising a top surface including a raised peripheral frame. A shield mount sized and shaped to engage with the raised peripheral frame to secure the shield mount to the shield secures the shield mount to the shield.

Abstract: A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.

Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.

Abstract: Disclosed are systems and methods for cloud-based monitoring and control of physical environments. A system comprises a computing cloud with at least one processor configured to execute one or more application modules and a data analytics module for analyzing diagnostic and environmental metric data. The system further comprises a building server communicatively coupled with the computing cloud, at least one gateway communicatively coupled with the building server, and at least one system device communicatively coupled with the at least one gateway. The at least one system device generates environmental metric data for further analysis and display, and the data is communicated to the computing cloud by way of the at least one gateway and the at least one building server.

Abstract: Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a plasma sputter chamber are disclosed. The magnetron comprises a plurality of elongate magnets arranged in a pattern where there is an unbalance ratio greater than 1 and less than 3.