Patents by Inventor Sansaptak DASGUPTA

Sansaptak DASGUPTA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10811526
    Abstract: A semiconductor device includes a silicon pillar disposed on a substrate, the silicon pillar has a sidewall. A group III-N semiconductor material is disposed on the sidewall of the silicon pillar. The group III-N semiconductor material has a sidewall. A doped source structure and a doped drain structure are disposed on the group III-N semiconductor material. A polarization charge inducing layer is disposed on the sidewall of the group III-N semiconductor material between the doped drain structure and the doped source structure. A plurality of portions of gate dielectric layer is disposed on the sidewalls of the group III-N semiconductor material and between the polarization charge inducing layer. A plurality of resistive gate electrodes separated by an interlayer dielectric layer are disposal adjacent to each of the plurality of portions of the gate dielectric layer. A source metal layer is disposed below and in contact with the doped source structure.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: October 20, 2020
    Assignee: Intel Corporation
    Inventors: Han Wui Then, Marko Radosavljevic, Sansaptak Dasgupta
  • Patent number: 10804879
    Abstract: Techniques are disclosed for forming high frequency film bulk acoustic resonator (FBAR) devices having multiple resonator thicknesses on a common substrate. A piezoelectric stack is formed in an STI trench and overgrown onto the STI material. In some cases, the piezoelectric stack can include epitaxially grown AlN. In some cases, the piezoelectric stack can include single crystal (epitaxial) AlN in combination with polycrystalline (e.g., sputtered) AlN. The piezoelectric stack thus forms a central portion having a first resonator thickness and end wings extending from the central portion having a different resonator thickness. Each wing may also have different thicknesses. Thus, multiple resonator thicknesses can be achieved on a common substrate, and hence, multiple resonant frequencies on that same substrate. The end wings can have metal electrodes formed thereon, and the central portion can have a plurality of IDT electrodes patterned thereon.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: October 13, 2020
    Assignee: Intel Corporation
    Inventors: Sansaptak Dasgupta, Bruce A. Block, Paul B. Fischer, Han Wui Then, Marko Radosavljevic
  • Patent number: 10804214
    Abstract: Integrated circuit structures configured with low loss transmission lines are disclosed. The structures are implemented with group III-nitride (III-N) semiconductor materials, and are well-suited for use in radio frequency (RF) applications where high frequency signal loss is a concern. The III-N materials are effectively used as a conductive ground shield between a transmission line and the underlying substrate, so as to significantly suppress electromagnetic field penetration at the substrate. In an embodiment, a group III-N polarization layer is provided over a gallium nitride layer, and an n-type doped layer of indium gallium nitride (InzGa1-zN) is provided over or adjacent to the polarization layer, wherein z is in the range of 0.0 to 1.0. In addition to providing transmission line ground shielding in some locations, the III-N materials can also be used to form one or more active and/or passive components (e.g., power amplifier, RF switch, RF filter, RF diode, etc).
    Type: Grant
    Filed: June 27, 2016
    Date of Patent: October 13, 2020
    Assignee: Intel Corporation
    Inventors: Han Wui Then, Sansaptak Dasgupta, Marko Radosavljevic
  • Patent number: 10804359
    Abstract: Techniques are disclosed for producing integrated circuit structures that include one or more geometrically manipulated polarization layers. The disclosed structures can be formed, for instance, using spacer erosion methods in which more than one type of spacer material is deposited on a polarization layer, and the spacer materials and underlying regions of the polarization layer may then be selectively etched in sequence to provide a desired profile shape to the polarization layer. Geometrically manipulated polarization layers as disclosed herein may be formed to be thinner in regions closer to the gate than in other regions, in some embodiments. The disclosed structures may eliminate the need for a field plate and may also be configured with polarization layers that are shorter in lateral length than polarization layers of uniform thickness without sacrificing performance capability. Additionally, the disclosed techniques may provide increased voltage breakdown without sacrificing Ron.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: October 13, 2020
    Assignee: Intel Corporation
    Inventors: Marko Radosavljevic, Han Wui Then, Sansaptak Dasgupta, Sanaz Gardner, Seung Hoon Sung
  • Patent number: 10804386
    Abstract: A gate stack structure is disclosed for inhibiting charge leakage in III-V transistor devices. The techniques are particularly well-suited for use in enhancement-mode MOSHEMTs, but can also be used in other transistor designs susceptible to charge spillover and unintended channel formation in the gate stack. In an example embodiment, the techniques are realized in a transistor having a III-N gate stack over a gallium nitride (GaN) channel layer. The gate stack is configured with a relatively thick barrier structure and wide bandgap III-N materials to prevent or otherwise reduce channel charge spillover resulting from tunneling or thermionic processes at high gate voltages. The barrier structure is configured to manage lattice mismatch conditions, so as to provide a robust high performance transistor design. In some cases, the gate stack is used in conjunction with an access region polarization layer to induce two-dimensional electron gas (2DEG) in the channel layer.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: October 13, 2020
    Assignee: Intel Corporation
    Inventors: Sansaptak Dasgupta, Han Wui Then, Marko Radosavljevic, Sanaz K. Gardner, Seung Hoon Sung
  • Publication number: 20200321445
    Abstract: Techniques are disclosed herein for ferroelectric-based field-effect transistors (FETs) with threshold voltage (VT) switching for enhanced RF switch transistor on-state and off-state performance. Employing a ferroelectric gate dielectric layer that can switch between two ferroelectric states enables a higher VT during the transistor off-state (VT,hi) and a lower VT during the transistor on-state (VT,lo). Accordingly, the transistor on-state resistance (Ron) can be maintained low due to the available relatively high gate overdrive (Vg,on?VT,lo) while still handling a relatively high maximum RF power in the transistor off-state due to the high VT,hi ?Vg,off value. Thus, the Ron of an RF switch transistor can be improved without sacrificing maximum RF power, and/or vice versa, the maximum RF power can be improved without sacrificing the Ron. A ferroelectric layer (e.g., including HfxZryO) can be formed between a transistor gate dielectric layer and gate electrode to achieve such benefits.
    Type: Application
    Filed: June 22, 2020
    Publication date: October 8, 2020
    Applicant: INTEL CORPORATION
    Inventors: HAN WUI THEN, SANSAPTAK DASGUPTA, MARKO RADOSAVLJEVIC
  • Publication number: 20200313649
    Abstract: Techniques are disclosed for forming high frequency film bulk acoustic resonator (FBAR) devices using epitaxially grown piezoelectric films. In some cases, the piezoelectric layer of the FBAR may be an epitaxial III-V layer such as an aluminum nitride (AlN) or other group III material-nitride (III-N) compound film grown as a part of a III-V material stack, although any other suitable piezoelectric materials can be used. Use of an epitaxial piezoelectric layer in an FBAR device provides numerous benefits, such as being able to achieve films that are thinner and higher quality compared to sputtered films, for example. The higher quality piezoelectric film results in higher piezoelectric coupling coefficients, which leads to higher Q-factor of RF filters including such FBAR devices. Therefore, the FBAR devices can be included in RF filters to enable filtering high frequencies of greater than 3 GHz, which can be used for 5G wireless standards, for example.
    Type: Application
    Filed: May 26, 2020
    Publication date: October 1, 2020
    Applicant: INTEL CORPORATION
    Inventors: HAN WUI THEN, SANSAPTAK DASGUPTA, MARKO RADOSAVLJEVIC
  • Publication number: 20200312970
    Abstract: Field-effect transistors with buried gates and methods of manufacturing the same are disclosed. An example apparatus includes a source, a drain, and a semiconductor material positioned between the source and the drain. The example apparatus further includes a first gate positioned adjacent the semiconductor material. The example apparatus also includes a second gate positioned adjacent the semiconductor material. A portion of the semiconductor material is positioned between the first and second gates.
    Type: Application
    Filed: December 27, 2017
    Publication date: October 1, 2020
    Applicant: Intel Corporation
    Inventors: Han Wui Then, Paul Fischer, Marko Radosavljevic, Sansaptak Dasgupta
  • Publication number: 20200312991
    Abstract: Field-effect transistors and methods of manufacturing the same are described herein. An example field-effect transistor includes a substrate, a source above the substrate, a semiconductor region above the source, a drain above semiconductor region, a polarization layer disposed on the semiconductor region between the drain and an end of the semiconductor region, and a gate above the source adjacent the end of the semiconductor region.
    Type: Application
    Filed: December 27, 2017
    Publication date: October 1, 2020
    Applicant: Intel Corporation
    Inventors: Han Wui Then, Marko Radosavljevic, Sansaptak Dasgupta
  • Publication number: 20200312961
    Abstract: Disclosed herein are IC structures, packages, and devices that include thin-film transistors (TFTs) integrated on the same substrate/die/chip as III-N devices, e.g., III-N transistors. In various aspects, TFTs integrated with III-N transistors have a channel and source/drain materials that include one or more of a crystalline material, a polycrystalline semiconductor material, or a laminate of crystalline and polycrystalline materials. In various aspects, TFTs integrated with III-N transistors are engineered to include one or more of 1) graded dopant concentrations in their source/drain regions, 2) graded dopant concentrations in their channel regions, and 3) thicker and/or composite gate dielectrics in their gate stacks.
    Type: Application
    Filed: March 28, 2019
    Publication date: October 1, 2020
    Applicant: Intel Corporation
    Inventors: Han Wui Then, Nidhi Nidhi, Paul B. Fischer, Rahul Ramaswamy, Walid M. Hafez, Samuel Jack Beach, Xiaojun Weng, Johann Christian Rode, Marko Radosavljevic, Sansaptak Dasgupta
  • Patent number: 10790332
    Abstract: Techniques to fabricate an RF filter using 3 dimensional island integration are described. A donor wafer assembly may have a substrate with a first and second side. A first side of a resonator layer, which may include a plurality of resonator circuits, may be coupled to the first side of the substrate. A weak adhesive layer may be coupled to the second side of the resonator layer, followed by a low-temperature oxide layer and a carrier wafer. A cavity in the first side of the resonator layer may expose an electrode of the first resonator circuit. An RF assembly may have an RF wafer having a first and a second side, where the first side may have an oxide mesa coupled to an oxide layer. A first resonator circuit may be then coupled to the oxide mesa of the first side of the RF wafer.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: September 29, 2020
    Assignee: Intel Corporation
    Inventors: Bruce A. Block, Paul B. Fischer, Nebil Tanzi, Gregory Chance, Han Wui Then, Sansaptak Dasgupta, Marko Radosavljevic
  • Publication number: 20200295166
    Abstract: Techniques are disclosed for forming a heterojunction bipolar transistor (HBT) that includes a laterally grown epitaxial (LEO) base layer that is disposed between corresponding emitter and collector layers. Laterally growing the base layer of the HBT improves electrical and physical contact between electrical contacts to associated portions of the HBT device (e.g., a collector). By improving the quality of electrical and physical contact between a layer of an HBT device and corresponding electrical contacts, integrated circuits using HBTs are better able to operate at gigahertz frequency switching rates used for modern wireless communications.
    Type: Application
    Filed: September 30, 2016
    Publication date: September 17, 2020
    Applicant: INTEL CORPORATION
    Inventors: SANSAPTAK DASGUPTA, MARKO RADOSAVLJEVIC, HAN WUI THEN, PAUL B. FISCHER
  • Publication number: 20200294932
    Abstract: IC structures that include transmission line structures to be integrated with III-N devices are disclosed. An example transmission line structure includes a transmission line of an electrically conductive material provided above a stack of a III-N semiconductor material and a polarization material. The transmission line structure further includes means for reducing electromagnetic coupling between the line and charge carriers present below the interface of the polarization material and the III-N semiconductor material. In some embodiments, said means include a shield material of a metal or a doped semiconductor provided over portions of the polarization material that are under the transmission line. In other embodiments, said means include dopant atoms implanted into the portions of the polarization material that are under the transmission line, and into at least an upper portion of the III-N semiconductor material under such portions of the polarization material.
    Type: Application
    Filed: March 15, 2019
    Publication date: September 17, 2020
    Applicant: Intel Corporation
    Inventors: Han Wui Then, Marko Radosavljevic, Sansaptak Dasgupta, Nidhi Nidhi, Paul B. Fischer, Rahul Ramaswamy, Walid M. Hafez, Johann Christian Rode
  • Publication number: 20200295172
    Abstract: Disclosed herein are IC structures, packages, and device assemblies with III-N transistors that include additional materials, referred to herein as “stressor materials,” which may be selectively provided over portions of polarization materials to locally increase or decrease the strain in the polarization material. Providing a compressive stressor material may decrease the tensile stress imposed by the polarization material on the underlying portion of the III-N semiconductor material, thereby decreasing the two-dimensional electron gas (2DEG) and increasing a threshold voltage of a transistor. On the other hand, providing a tensile stressor material may increase the tensile stress imposed by the polarization material, thereby increasing the 2DEG and decreasing the threshold voltage. Providing suitable stressor materials enables easier and more accurate control of threshold voltage compared to only relying on polarization material recess.
    Type: Application
    Filed: March 11, 2019
    Publication date: September 17, 2020
    Applicant: Intel Corporation
    Inventors: Sansaptak Dasgupta, Marko Radosavljevic, Han Wui Then, Nidhi Nidhi, Rahul Ramaswamy, Paul B. Fischer, Walid M. Hafez, Johann Christian Rode
  • Patent number: 10777671
    Abstract: Embodiments of the invention include a semiconductor device and methods of forming such devices. In an embodiment, the semiconductor device includes a source region, a drain region, and a channel region formed between the source region and drain region. In an embodiment, a first interlayer dielectric (ILD) may be formed over the channel region, and a first opening is formed through the first ILD. In an embodiment, a second ILD may be formed over the first ILD, and a second opening is formed through the second ILD. Embodiments of the invention include the second opening being offset from the first opening. Embodiments may also include a gate electrode formed through the first opening and the second opening. In an embodiment, the offset between the first opening and the second opening results in the formation of a field plate and a spacer that reduces a gate length of the semiconductor device.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: September 15, 2020
    Assignee: Intel Corporation
    Inventors: Han Wui Then, Sansaptak Dasgupta, Marko Radosavljevic
  • Patent number: 10777672
    Abstract: Embodiments of this disclosure are directed to a multi-gate gallium nitride (GaN) transistor and methods of making the same. The multi-gate GaN transistor includes a gallium nitride layer. The GaN transistor includes two or more gate electrodes between a drain electrode and a source electrode. A polarization layer is located between the first gate electrode and the second gate electrode, the polarization layer forming a two dimensional electron gas (2DEG) within the GaN layer, the 2DEG electrically coupling the first gate electrode and the second gate electrode.
    Type: Grant
    Filed: March 28, 2016
    Date of Patent: September 15, 2020
    Assignee: Intel Corporation
    Inventors: Han Wui Then, Sansaptak Dasgupta, Marko Radosavljevic
  • Publication number: 20200286789
    Abstract: A complementary metal oxide semiconductor (CMOS) device that includes a gallium nitride n-type MOS and a silicon P-type MOS is disclosed. The device includes silicon 111 substrate, a gallium nitride transistor formed in a trench in the silicon 111 substrate, the gallium nitride transistor comprising a source electrode, a gate electrode, and a drain electrode. The device further includes a silicon/polysilicon layer formed over the gallium nitride transistor.
    Type: Application
    Filed: May 27, 2020
    Publication date: September 10, 2020
    Applicant: Intel Corporation
    Inventors: Marko Radosavljevic, Sansaptak Dasgupta, Valluri R. Rao, Han Wui Then
  • Patent number: 10770575
    Abstract: Vertical Group III-N devices and their methods of fabrication are described. In an example, a semiconductor structure includes a doped buffer layer above a substrate, and a group III-nitride (III-N) semiconductor material disposed on the doped buffer layer, the group III-N semiconductor material having a sloped sidewall and a planar uppermost surface. A drain region is disposed adjacent to the doped buffer layer. An insulator layer is disposed on the drain region. A polarization charge inducing layer is disposed on and conformal with the group III-N semiconductor material, the polarization charge inducing layer having a first portion disposed on the sloped sidewall of the group III-N semiconductor material and a second portion disposed on the planar uppermost surface of the group III-N semiconductor material. A gate structure is disposed on the first portion of the polarization charge inducing layer.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: September 8, 2020
    Assignee: Intel Corporation
    Inventors: Sansaptak Dasgupta, Han Wui Then, Marko Radosavljevic, Pavel M. Agababov
  • Patent number: 10770551
    Abstract: A P-i-N diode structure includes a group III-N semiconductor material disposed on a substrate. An n-doped raised drain structure is disposed on the group III-N semiconductor material. An intrinsic group III-N semiconductor material is disposed on the n-doped raised drain structure. A p-doped group III-N semiconductor material is disposed on the intrinsic group III-N semiconductor material. A first electrode is connected to the p-doped group III-N semiconductor material. A second electrode is electrically coupled to the n-doped raised drain structure. In an embodiment, a group III-N transistor is electrically coupled to the P-i-N diode. In an embodiment, a group III-N transistor is electrically isolated from the P-i-N diode. In an embodiment, a gate electrode and an n-doped raised drain structure are electrically coupled to the n-doped raised drain structure and the second electrode of the P-i-N diode to form the group III-N transistor.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: September 8, 2020
    Assignee: Intel Corporation
    Inventors: Han Wui Then, Sansaptak Dasgupta, Marko Radosavljevic
  • Publication number: 20200279939
    Abstract: Methods, apparatus, systems and articles of manufacture are disclosed for transistors including first and second semiconductor materials between source and drain regions. An example apparatus includes a first semiconductor material and a second semiconductor material adjacent the first semiconductor material. The example apparatus further includes a source proximate the first semiconductor material and spaced apart from the second semiconductor material. The example apparatus also includes a drain proximate the second semiconductor material and spaced apart from the first semiconductor material. The example apparatus includes a gate located between the source and the drain.
    Type: Application
    Filed: January 12, 2018
    Publication date: September 3, 2020
    Applicant: Intel Corporation
    Inventors: Sansaptak Dasgupta, Marko Radosavljevic, Han Wui Then