Patents by Inventor Satish Rao

Satish Rao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7001578
    Abstract: A family of discrete and uniformly sized silicon nanoparticles, including 1 (blue emitting), 1.67 (green emitting), 2.15 (yellow emitting), 2.9 (red emitting) and 3.7 nm (infrared emitting) nanoparticles, and a method that produces the family. The nanoparticles produced by the method of the invention are highly uniform in size. A very small percentage of significantly larger particles are produced, and such larger particles are easily filtered out. The method for producing the silicon nanoparticles of the invention utilizes a gradual advancing electrochemical etch of bulk silicon, e.g., a silicon wafer. The etch is conducted with use of an appropriate intermediate or low etch current density. An optimal current density for producing the family is ˜10 milli Ampere per square centimeter (10 mA/cm2). Higher current density favors 1 nm particles, and lower the larger particles.
    Type: Grant
    Filed: April 22, 2004
    Date of Patent: February 21, 2006
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Munir H. Nayfeh, Gennadey Belomoin, Satish Rao, Joel Therrien, Sahraoui Chaieb
  • Publication number: 20040197255
    Abstract: A family of discrete and uniformly sized silicon nanoparticles, including 1 (blue emitting), 1.67 (green emitting), 2.15 (yellow emitting), 2.9 (red emitting) and 3.7 nm (infrared emitting) nanoparticles, and a method that produces the family. The nanoparticles produced by the method of the invention are highly uniform in size. A very small percentage of significantly larger particles are produced, and such larger particles are easily filtered out. The method for producing the silicon nanoparticles of the invention utilizes a gradual advancing electrochemical etch of bulk silicon, e.g., a silicon wafer. The etch is conducted with use of an appropriate intermediate or low etch current density. An optimal current density for producing the family is ˜10 milli Ampere per square centimeter (10 mA/cm2). Higher current density favors 1 nm particles, and lower the larger particles.
    Type: Application
    Filed: April 22, 2004
    Publication date: October 7, 2004
    Applicant: The Board of Trustees of the University of Illinois
    Inventors: Munir H. Nayfeh, Gennadiy Belomoin, Satish Rao, Joel Therrien, Sahraoui Chaieb
  • Patent number: 6743406
    Abstract: A family of discrete and uniformly sized silicon nanoparticles, including 1 (blue emitting), 1.67 (green emitting), 2.15 (yellow emitting), 2.9 (red emitting) and 3.7 nm (infrared emitting) nanoparticles, and a method that produces the family. The nanoparticles produced by the method of the invention are highly uniform in size. A very small percentage of significantly larger particles are produced, and such larger particles are easily filtered out. The method for producing the silicon nanoparticles of the invention utilizes a gradual advancing electrochemical etch of bulk silicon, e.g., a silicon wafer. The etch is conducted with use of an appropriate intermediate or low etch current density. An optimal current density for producing the family is ˜10 milli Ampere per square centimeter (10 mA/cm2). Higher current density favors 1 nm particles, and lower the larger particles.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: June 1, 2004
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Munir H. Nayfeh, Gennadey Belomoin, Satish Rao, Joel Therrien, Sahraoui Chaieb
  • Publication number: 20020070121
    Abstract: A family of discrete and uniformly sized silicon nanoparticles, including 1 (blue emitting), 1.67 (green emitting), 2.15 (yellow emitting), 2.9 (red emitting) and 3.7 nm (infrared emitting) nanoparticles, and a method that produces the family. The nanoparticles produced by the method of the invention are highly uniform in size. A very small percentage of significantly larger particles are produced, and such larger particles are easily filtered out. The method for producing the silicon nanoparticles of the invention utilizes a gradual advancing electrochemical etch of bulk silicon, e.g., a silicon wafer. The etch is conducted with use of an appropriate intermediate or low etch current density. An optimal current density for producing the family is ˜10 milli Ampere per square centimeter (10 mA/cm2). Higher current density favors 1 nm particles, and lower the larger particles.
    Type: Application
    Filed: November 21, 2001
    Publication date: June 13, 2002
    Applicant: The Board of Trustees of the University of Illinois
    Inventors: Munir H. Nayfeh, Gennadiy Belomoin, Satish Rao, Joel Therrien, Sahraoui Chaieb
  • Patent number: 5924984
    Abstract: An apparatus for sensing muscular activity of the rectosigmoid region, rectum, and the anorectal canal of a subject is disclosed. This apparatus includes an elongate probe having a distal end opposing a proximal end which is configured for insertion into the patient's anorectal canal and includes a pressure sensor, an electromyography sensor, and a stimulus balloon. Multiple pressure sensors may be included to evaluate muscular activity in the anorectal canal. In addition, pressure sensors may be distributed along the length of the probe to simultaneously measure the response of other portions of the anorectal canal besides the anal sphincter muscle. A pressure sensor is also located inside the stimulus balloon for monitoring intraballoon pressure.
    Type: Grant
    Filed: January 30, 1997
    Date of Patent: July 20, 1999
    Assignee: University of Iowa Research Foundation
    Inventor: Satish Rao
  • Patent number: 5465379
    Abstract: Different components of a computer are interconnected by a free space optical mesh-connected bus network using wavelength division multiple access. The network includes optical elements, such as cylindrical lens or mirrors, to transform a spot of light emitted by a source into a stripe of light that illuminates a row or column of detectors, of which one is tuned to the wavelength of the light for selection. By a succession of such networks appropriately oriented, routing in different perpendicular directions through the network is achieved, whereby any two nodes in a two-dimensional array of nodes can be interconnected.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: November 7, 1995
    Assignee: NEC Research Institute, Inc.
    Inventors: Yao Li, Satish Rao