Patents by Inventor Satoru Yamashita

Satoru Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210310844
    Abstract: A control unit 3 of a flow rate control system 1 comprises: a recording unit 31 for recording measured values of a pressure sensor P and a temperature sensor T, a storage unit 32 for storing volume data between a first valve V1 and a second valve V2 corresponding to the measured value of the pressure sensor P, and an arithmetic unit 33 for calculating a flow rate based on a first pressure value P1 and a first temperature value T1 measured after opening the first valve V1 and the second valve V2 to flow a gas and then closing the first valve V1 and the second valve V2 simultaneously in a state where the gas is flowing; a second pressure value P2 and a second temperature value T2 measured after opening the first valve V1 and the second valve V2 to flow a gas, closing the second valve V2 in a state where the gas is flowing, and then closing the first valve V1 after a predetermined time ?t has elapsed; and a volume value V between the first valve V1 and the second valve V2 which corresponds to the second pressure
    Type: Application
    Filed: July 16, 2019
    Publication date: October 7, 2021
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Satoru YAMASHITA, Masayoshi KAWASHIMA, Masahiko TAKIMOTO, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 10876870
    Abstract: A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: December 29, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Risako Miyoshi, Norihiko Amikura, Kazuyuki Miura, Masaaki Nagase, Satoru Yamashita, Yohei Sawada, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20200159257
    Abstract: A fluid control system (1) comprises: a first valve (21) provided downstream of a flow rate controller (10), a flow rate measuring device (30) provided downstream of the first valve (21) and having a second valve (22), an open/close detector (26) provided to the second valve (22), and a controller (25) for controlling an open/close operation of the first valve (21) and the second valve (22), and the controller (25) controls the open/close operation of the first valve (21) in response to a signal output from the open/close detector (26).
    Type: Application
    Filed: July 24, 2018
    Publication date: May 21, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Satoru YAMASHITA, Yohei SAWADA, Masaaki NAGASE, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 10646844
    Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: May 12, 2020
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Katsuyuki Sugita, Takatoshi Nakatani, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda, Keiji Hirao
  • Patent number: 10604840
    Abstract: To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: March 31, 2020
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20200088561
    Abstract: The liquid level meter according to the present invention includes a resistive temperature detector, a temperature measuring body located above it, a temperature detecting unit detecting temperatures of the resistive temperature detector and the temperature measuring body, a current controlling unit determining a current value to be flowed through the resistive temperature detector so that the resistive temperature detector and the temperature measuring body become a predetermined temperature difference, a power supply unit supplying the current of the determined current value to the resistive temperature detector, and a liquid level detecting unit detecting a position of a liquid level.
    Type: Application
    Filed: December 22, 2017
    Publication date: March 19, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Satoru YAMASHITA, Katsuyuki SUGITA, Kaoru HIRATA, Masaaki NAGASE, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20190212176
    Abstract: A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method of an embodiment, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
    Type: Application
    Filed: January 3, 2019
    Publication date: July 11, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Risako MIYOSHI, Norihiko AMIKURA, Kazuyuki MIURA, Masaaki NAGASE, Satoru YAMASHITA, Yohei SAWADA, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 9994955
    Abstract: The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: June 12, 2018
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20180071702
    Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.
    Type: Application
    Filed: April 11, 2016
    Publication date: March 15, 2018
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Masaaki NAGASE, Kaoru HIRATA, Katsuyuki SUGITA, Takatoshi NAKATANI, Satoru YAMASHITA, Kouji NISHINO, Nobukazu IKEDA, Keiji HIRAO
  • Publication number: 20170327949
    Abstract: [Problem] To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. [Means for Resolution] The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.
    Type: Application
    Filed: November 2, 2015
    Publication date: November 16, 2017
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20150322567
    Abstract: The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
    Type: Application
    Filed: November 20, 2013
    Publication date: November 12, 2015
    Inventors: Atsushi Hidaka, Masaaki Nagase, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 8724974
    Abstract: A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: May 13, 2014
    Assignees: Fujikin Incorporated, Tohoku University
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Masaaki Nagase, Satoru Yamashita, Atsushi Hidaka, Ryousuke Dohi, Kouji Nishino, Nobukazu Ikeda, Keiji Hirao
  • Publication number: 20130084059
    Abstract: A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure 13 that is provided inside the vaporizer and partitions the liquid material inside the chamber into a plurality of sections, and liquid distribution portions 20 that are provided at the lower portion of the partition wall structure 13 and that allow liquid distribution among the sections partitioned by the partition wall structure 13, and the partition wall structure includes a grid-like, honeycomb-shaped, mesh-like, or pipe-shaped partition wall.
    Type: Application
    Filed: August 1, 2012
    Publication date: April 4, 2013
    Applicants: TOHOKU UNIVERSITY, FUJIKIN INCORPORATED
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Masaaki Nagase, Satoru Yamashita, Atsushi Hidaka, Ryousuke Dohi, Kouji Nishino, Nobukazu Ikeda, Keiji Hirao
  • Patent number: 7096479
    Abstract: An optical information recording medium 10 is composed of at least a reflective layer 2, a first protective layer 3, a phase-change type optical recording layer 4 and a second protective layer 5 being sequentially laminated on a substrate 1. The optical information recording medium 10 is conducted to record information by changing a phase of the phase-change type optical recording layer 4 by irradiating light from the second protective layer 5 side. The phase-change type optical recording layer 4 further contains at least Ti, In, Ge, Sb and Te. When each content amount of the Ti, In, Ge, Sb and Te is defined as v, w, x, y and z in atomic percent respectively, each content amount of v, w, x, y and z in atomic percent satisfies following relations: 0.3?v?4, 0.3?w?3, 3.4?x?14.5, 2.1?y/z?4 and 98.8?v+w+x+y+z?100.?.
    Type: Grant
    Filed: February 13, 2004
    Date of Patent: August 22, 2006
    Assignee: Victor Company of Japan, Ltd.
    Inventors: Osamu Akutsu, Masaru Hatakeyama, Satoru Yamashita
  • Publication number: 20040194122
    Abstract: An optical information recording medium 10 is composed of at least a reflective layer 2, a first protective layer 3, a phase-change type optical recording layer 4 and a second protective layer 5 being sequentially laminated on a substrate 1. The optical information recording medium 10 is conducted to record information by changing a phase of the phase-change type optical recording layer 4 by irradiating light from the second protective layer 5 side. The phase-change type optical recording layer 4 further contains at least Ti, In, Ge, Sb and Te. When each content amount of the Ti, In, Ge, Sb and Te is defined as v, w, x, y and z in atomic percent respectively, each content amount of v, w, x, y and z in atomic percent satisfies following relations: 0.3≦v≦4, 0.3≦w≦3, 3.4≦x≦14.5, 2.1≦y/z≦4 and v+w+x+y+z≦100.
    Type: Application
    Filed: February 13, 2004
    Publication date: September 30, 2004
    Applicant: VICTOR COMPANY OF JAPAN, LTD.
    Inventors: Osamu Akutsu, Masaru Hatakeyama, Satoru Yamashita
  • Patent number: 5778485
    Abstract: A cleaning apparatus for cleaning a probe card having a contact element to be brought into electrical contact with a pad of a circuit to be inspected, comprises a conductive brush to be brought into contact at least with the contact element to clean the probe card, and a gas blow mechanism for intermittently blowing gas to the brush. The conductive brush is vibrated by the gas blow, and a particle adhered from the probe card is removed by the vibrating brush and the gas jet.
    Type: Grant
    Filed: December 5, 1995
    Date of Patent: July 14, 1998
    Assignee: Tokyo Electron Limited
    Inventors: Kunio Sano, Satoru Yamashita
  • Patent number: 5690998
    Abstract: The present invention relates to a probe needle wherein a conductive film is formed over a first insulating film formed around the outer periphery of a rod-like member through which a signal current flows, a second insulating film is formed over the outer periphery of the conductive film, and the conductive film is grounded. Since the rod-like member through which a signal current flows is thereby shielded, it is not affected by noise, and mutual crosstalk between signal currents is also prevented. Moreover, since ill effects caused by mutual contact with other probe needles is prevented by the second insulating film, reliable and stable measurement is possible.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: November 25, 1997
    Assignees: Tokyo Electron Kabushiki kaisha, Tokyo Electron Yamanashi Kabushiki Kaisha
    Inventors: Yasushi Nagasawa, Satoru Yamashita, Masahiko Matsudo
  • Patent number: 5532613
    Abstract: The present invention relates to a probe needle wherein a conductive film is formed over a first insulating film formed around the outer periphery of a rod-like member through which a signal current flows, a second insulating film is formed over the outer periphery of the conductive film, and the conductive film is grounded. Since the rod-like member through which a signal current flows is thereby shielded, it is not affected by noise, and mutual crosstalk between signal currents is also prevented. Moreover, since ill effects caused by mutual contact with other probe needles is prevented by the second insulating film, reliable and stable measurement is possible.
    Type: Grant
    Filed: April 14, 1994
    Date of Patent: July 2, 1996
    Assignees: Tokyo Electron Kabushiki Kaisha, Tokyo Electron Yamanashi Kabushiki Kaisha
    Inventors: Yasushi Nagasawa, Satoru Yamashita, Masahiko Matsudo
  • Patent number: 5525911
    Abstract: A probe card is electrically connected to a tester, electrically contacted and connected to circuits to be tested, and used to transmit test signals between the tester and the circuits. It includes a plate assembly having a printed board and an earth plate insulated from each other. Probe assemblies are supported by the plate assembly and are substantially vertically contacted at their foremost ends with pads of the circuits to be tested. Each probe assembly includes a center conductor having a sharpened tip contacted with the pad of the circuit to be tested. A holder conductor shrouds the center conductor while leaving the front end portion thereof not enclosed, and having electrical continuity with the center conductor. A dielectric shrouds the holder conductor, a peripheral conductor coaxially arranged around the holder conductor with the dielectric interposed between them, and a sheath enclosing the peripheral conductor.
    Type: Grant
    Filed: August 4, 1994
    Date of Patent: June 11, 1996
    Assignees: Tokyo Electron Limited, Tokyo Electron Yamanashi Limited, Junkosha Co., Ltd.
    Inventors: Hiroshi Marumo, Satoru Yamashita, Nobuyuki Negishi, Shoichi Kanai
  • Patent number: D806031
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: December 26, 2017
    Assignees: FLYCONVER CO., LTD., WEI BLUE XIN GROUP CO., LTD.
    Inventors: Hiroyuki Shamoto, Satoru Yamashita