Patents by Inventor Satoshi Katayama

Satoshi Katayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5409909
    Abstract: A triazolo-1,4-di-azepine compound of the below given formula and a pharmacologically acceptable salt thereof are disclosed and useful in the pharmaceutical field, especially to treat allergic diseases: ##STR1## in which R1 and R2 are hydrogen or an alkyl, R3 is hydrogen or a halogen, R4 is hydrogen or an alkyl, X is --OCO--, --NHCO--, --CO-- or others and Y is a cycloalkyl, a cycloalkylalkyl, an alkynyl or others.
    Type: Grant
    Filed: March 18, 1994
    Date of Patent: April 25, 1995
    Assignee: Eisai Co., Ltd.
    Inventors: Kazuo Okano, Shuhei Miyazawa, Richard S. J. Clark, Shinya Abe, Tetsuya Kawahara, Naoyuki Kimomura, Osamu Asano, Hiroyuki Yoshimura, Mitsuaki Miyamoto, Yoshimori Sakuma, Kenzo Muramoto, Hiroshi Obaishi, Koukichi Harada, Hajime Tsunoda, Satoshi Katayama, Kouji Yamada, Shigeru Souda, Yoshimasa Machida, Kouichi Katayama, Isao Yamatsu
  • Patent number: 5393636
    Abstract: The present invention provides a process for producing a practical toner for the development of an electrostatic image which has an effect of preventing an offset phenomenon and has low-temperature fixing properties. The process for producing a toner of the present invention comprises the steps of dissolving a high-molecular polymer in a vinyl monomer, mixing the resultant solution with another toner material, and then carrying out suspension polymerization. Preferable examples of the high-molecular polymer include a polymer having a structure unit represented by the formula ##STR1## wherein R.sup.1 is hydrogen or a methyl group, and R.sup.2 is a straight-chain or branched alkyl group having 1 to 20 carbon atoms,and a polymer having a structure unit represented by the formula ##STR2## wherein R.sup.3 is hydrogen or a methyl group, and X is hydrogen, a methyl group, a halogen atom or a methoxy group.
    Type: Grant
    Filed: June 7, 1994
    Date of Patent: February 28, 1995
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Jun Sugita, Kazushige Morita, Satoshi Katayama, Hiroshi Sugimura, Satoshi Nishigaki, Kazuhiro Emoto
  • Patent number: 5391448
    Abstract: An electrophotographic photoconductor comprising a conductive support, an undercoating layer formed on the conductive support, and a photosensitive layer laminated on the undercoating layer, wherein the undercoating layer comprises non-conductive titanium oxide particles and a polyamide resin, the non-conductive titanium oxide particles being 80 to 99 wt % of the undercoating layer, and the undercoating layer has a thickness of 0.5 to 4.8 .mu.m.
    Type: Grant
    Filed: June 21, 1993
    Date of Patent: February 21, 1995
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Katayama, Yoshihide Shimoda, Makoto Kurokawa
  • Patent number: 5382579
    Abstract: A triazolo-1,4-azepine compound of the below given formulas and a pharmacologically acceptable salt thereof are disclosed and useful in the pharmaceutical field, especially to allergic diseases. ##STR1## in which R1 and R2 are hydrogen or an alkyl, R3 is hydrogen or a halogen, R4 is hydrogen or an alkyl, X is --OCO--, --NHCO--, --CO-- or others and Y is a cycloalkyl, a cycloalkylalkyl, an alkynyl or others.
    Type: Grant
    Filed: August 26, 1991
    Date of Patent: January 17, 1995
    Assignee: Eisai Co., Ltd.
    Inventors: Kazuo Okano, Shuhei Miyazawa, Richard S. J. Clark, Shinya Abe, Tetsuya Kawahara, Naoyuki Shimomura, Osamu Asano, Hiroyuki Yoshimura, Mitsuaki Miyamoto, Yoshimori Sakuma, Kenzo Muramoto, Hiroshi Obaishi, Koukichi Harada, Hajime Tsunoda, Satoshi Katayama, Kouji Yamada, Shigeru Souda, Yoshimasa Machida, Kouichi Katayama, Isao Yamatsu
  • Patent number: 5372677
    Abstract: After a silicon nitride film (2) is etched by using a first resist pattern (3A) as a mask before coating a second resist (4) superposing on the first resist pattern (3A), a surface layer portion of the first resist pattern (3A) is subjected to a plasma treatment by using oxygen (O.sub.2). A properties changed layer in the surface layer portion of the first resist pattern (3A) is removed or modified to improve the adhesion between the second resist (4) and the first resist pattern (3A), and the stripping of the second resist (4) is prevented.
    Type: Grant
    Filed: December 16, 1992
    Date of Patent: December 13, 1994
    Assignee: Kawasaki Steel Corporation
    Inventors: Satoshi Katayama, Kenichi Nitta, Katsuhiko Iimura
  • Patent number: 5304553
    Abstract: A triazolo-1,4-di-azepine compound of the below given formula and a pharmacologically acceptable salt thereof are disclosed and useful in the pharmaceutical field, especially to allergic diseases, ##STR1## in which R.sup.1 and R.sup.2 are hydrogen or an alkyl, R.sup.3 is hydrogen or a halogen, R.sup.4 is hydrogen or an alkyl, X is --OCO--, --NHCO--, --CO-- or others and Y is a cycloalkyl, a cycloalkylalkyl, an alkynyl or others.
    Type: Grant
    Filed: May 28, 1993
    Date of Patent: April 19, 1994
    Assignee: Eisai Co., Ltd.
    Inventors: Kazuo Okano, Shuhei Miyazawa, Richar S. J. Clark, Shinya Abe, Tetsuya Kawahara, Naoyuki Shimomura, Osamu Asano, Hiroyuki Yoshimura, Mitsuaki Miyamoto, Yoshimori Sakuma, Kenzo Muramoto, Hiroshi Obaishi, Koukichi Harada, Hajime Tsunoda, Satoshi Katayama, Kouji Yamada, Shigeru Souda, Yoshimasa Machida, Kouichi Katayama, Isao Yamatsu
  • Patent number: 5221671
    Abstract: A triazolo-1,4-di-azepine compound of the below given formulas and a pharmacologically acceptable salt thereof are disclosed and useful in the pharmaceutical field, especially to allergic diseases. ##STR1## in which R1 and R2 are hydrogen or an alkyl, R3 is hydrogen or a halogen, R4 is hydrogen or an alkyl, X is --OCO--, --NHCO--, --CO-- or others and Y is a cycloalkyl, a cycloalkylalkyl, an alkynyl or others.
    Type: Grant
    Filed: October 17, 1991
    Date of Patent: June 22, 1993
    Assignee: Eisai Co., Ltd.
    Inventors: Kazuo Okano, Shuhei Miyazawa, Richard S. J. Clark, Shinya Abe, Tetsuya Kawahara, Naoyuki Shimomura, Osamu Asano, Hiroyuki Yoshimura, Mitsuaki Miyamoto, Yoshimori Sakuma, Kenzo Muramoto, Hiroshi Obaishi, Koukichi Harada, Hajime Tsunoda, Satoshi Katayama, Kouji Yamada, Shigeru Souda, Yoshimasa Machida, Kouichi Katayama, Isao Yamatsu
  • Patent number: 5116706
    Abstract: 1,2,4,5-Benzoylenebis(naphto[1,8-de]pyrimidine) compounds of the followig formula (I) or (II): ##STR1## wherein R and R' are, the same or different, hydrogen atom, a halogen atom, hydroxyl group, nitro group, cyano group, an alkyl group which may be substituted, an alkoxyl group which may be substituted, an aryl group which may be substituted, an aralkyl group which may be substituted, a carboxyl group which may be esterified or a carbamoyl group which may be substituted and m and n each are an integer from 1 to 6, and photosensitive members for electrophotography having a photosensitive layer containing them.
    Type: Grant
    Filed: October 31, 1990
    Date of Patent: May 26, 1992
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yoshimi Kojima, Satoshi Katayama, Yoshihide Shimoda, Hiroshi Sugimura, Eiji Imada
  • Patent number: 4983741
    Abstract: 1,2,4,5-Benzoylenebis(naphtho[2,3-d]imidazole compounds of the following formula (I) or (II): ##STR1## wherein R and R' each are a hydrogen atom, a halogen atom, a hydroxyl group, a carboxyl group which may be esterified, a sulfonic acid group which may be esterified, a lower alkyl group, a lower alkenyl group, a lower alkoxy group, an aryl group which may be substituted, an aralkyl group which may be substituted, a carbamoyl group which may be substituted or a sulfamoyl group which may be substituted and m and n each are an integer of 1 or 2, and photosensitive members for electrophotography having a photosensitive layer containing these compounds.
    Type: Grant
    Filed: December 8, 1988
    Date of Patent: January 8, 1991
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Katayama, Eiji Imada, Shuhei Tsuchimoto
  • Patent number: 4963451
    Abstract: 1,2,4,5-Benzoylenebis(anthraquinone[1,2-d]imidazole) compounds represented by following general formula (1) or (2) ##STR1## wherein R and R' each are hydrogen atom, a halogen atom, hydroxyl group, a lower alkyl group, a lower alkoxy group or an aryl group which may be substituted and m and n each are an integer of 1 or 2, and photosensitive members for electrophotography having a photosensitive layer containing them.
    Type: Grant
    Filed: September 22, 1989
    Date of Patent: October 16, 1990
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Katayama, Yoshihide Shimoda, Hiroshi Sugimura, Eiji Imada, Shuhei Tsuchimoto
  • Patent number: 4929623
    Abstract: A benzothiazol compound having the formula is disclosed and is effective to inhibit the production of leukotriene. It is useful against allergy, asthma, affections of the skin, allergic rhinitis and affection of a cardiovascular system. ##STR1## in which R20 is ester or amide and --NR5R6 is amino in variety.
    Type: Grant
    Filed: June 16, 1988
    Date of Patent: May 29, 1990
    Assignee: Eisai Co., Ltd.
    Inventors: Shinya Abe, Mitsuaki Miyamoto, Masayuki Tanaka, Kozo Akasaka, Kenji Hayashi, Tetsuya Kawahara, Satoshi Katayama, Yoshinori Sakuma, Takeshi Suzuki, Isao Yamatsu
  • Patent number: 4908457
    Abstract: 1,2,4,5-benzoylenebis(anthraquinone[1,2-d]imidazole) compounds represented by following general formula (1) or ##STR1## wherein R and R' each are hydrogen atom, a halogen atom, hydroxyl group, a lower alkyl group, a lower alkoxy group or an aryl group which may be substituted and m and n each are an integer of 1 or 2, and photosensitive members for electrophotography having a photosensitive layer containing them.
    Type: Grant
    Filed: December 7, 1988
    Date of Patent: March 13, 1990
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Satoshi Katayama, Yoshihide Shimoda, Hiroshi Sugimura, Eiji Imada, Shuhei Tsuchimoto
  • Patent number: 4208426
    Abstract: Novel pyranochromone derivatives having the general formula: ##STR1## wherein R.sub.1 represents hydrogen atom, an alkali metal or an alkyl group containing 1-4 carbon atoms; R.sub.2, R.sub.3 and R.sub.4 represent hydrogen atom or an alkyl group containing 1-4 carbon atoms respectively, provided that both R.sub.3 and R.sub.4 are not hydrogen atom at the same time; R.sub.5 and R.sub.6 represent an alkyl group containing 1-4 carbon atoms respectively; and R.sub.7 represents hydrogen atom, hydroxyl group, an alkyl group containing 1-4 carbon atoms or an alkoxyl group containing 1-4 carbon atoms. The novel medicaments comprising predominantly the above derivative are effective for the treatment of allergic diseases.
    Type: Grant
    Filed: July 24, 1978
    Date of Patent: June 17, 1980
    Assignee: Eisai Co., Ltd.
    Inventors: Norio Minami, Shizumasa Kijima, Satoshi Katayama, Hiroshi Shionoya