Abstract: To group plural applications and integrally manage their presence information. A presence server includes plural clients that receive services from application servers providing plural services, and a presence information that manages presence information of applications and group information. The presence server receives presence information registration from the application clients, updates presence information of all applications having the same group ID as that of an application of presence information registration source in an application type registration table according to the content of registered presence information, and reflects its result in a presence information table.

Abstract: To group plural applications and integrally manage their presence information. A presence server includes plural clients that receive services from application servers providing plural services, and a presence information that manages presence information of applications and group information. The presence server receives presence information registration from the application clients, updates presence information of all applications having the same group ID as that of an application of presence information registration source in an application type registration table according to the content of registered presence information, and reflects its result in a presence information table.

Abstract: The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been brought in from the entrance/exit of the process tube to a prescribed position therein. This thermal processing method and an apparatus therefor is characterized in that, when the workpiece is moved to the prescribed position, it is first moved to a proximity position that is closer to the heat source than the prescribed position, then it is returned therefrom to the prescribed position.

Abstract: The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been brought in from the entrance/exit of the process tube to a prescribed position therein. This thermal processing method and an apparatus therefor is characterized in that, when the workpiece is moved to the prescribed position, it is first moved to a proximity position that is closer to the heat source than the prescribed position, then it is returned therefrom to the prescribed position.

Abstract: A heat treatment apparatus including a flat heat source having a plural number of ring-shaped heating units of different diameters arranged concentrically and so as to face a processing surface of a semiconductor wafer for example, a heat control portion which performs either independent or batch control of a plural number of ring-shaped heating units, a process tube which houses the object for processing, and a movement mechanism which brings a processing surface of the object for processing and the flat heat source into relative proximity. By this configuration, it is possible to have fast heat treatment such as oxidation and diffusion processing, or CVD processing, to a uniform temperature for the entire processing surface of a flat object for processing.

Abstract: The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been brought in from the entrance/exit of the process tube to a prescribed position therein. This thermal processing method and an apparatus therefor is characterized in that, when the workpiece is moved to the prescribed position, it is first moved to a proximity position that is closer to the heat source than the prescribed position, then it is returned therefrom to the prescribed position.

Abstract: The present invention relates to a vortex type furnace for burning powder. The furnace includes a first body, at least one air-supply pipe for generating a vortex, and at least one powder-supply pipe for feeding powder to be burned in said first body. The first body includes an elongated combustion chamber of a polygonal, elliptical, or circular cross section. The first body has an axis therealong, an ignition burner at an end thereof, and an exhaust port at another end thereof. The air-supply pipe generates a vortex around the center axis in the first body. The air-supply pipe, which opens at the internal peripheral surface of said furnace, is disposed quasi-tangentially or generally colinear with the internal peripheral surface of said first body. The powder-supply pipe, which opens at the internal surface of said first body, is disposed to be spaced apart from said air-supply pipe.

Abstract: The present invention relates to combustion devices such as incineration furnaces and the like, and in particular, relates to combustion devices which include a combustion gas cooling device by means of which slag, combustion by-products and the like are rapidly cooled and thereby converted to nonadhering fly ash. By converting slag to nonadhering fly ash, the accumulation of slag in downstream exhaust processing equipment is diminished, and hence, the necessity of halting the operation of the combustion apparatus in order to remove the accumulated slag is eliminated, thereby improving the efficiency of operations.