Patents by Inventor Scott J. H. Limb

Scott J. H. Limb has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7559619
    Abstract: A digital lithography system including a droplet source (printhead) for selectively ejecting liquid droplets of a phase-change masking material, and an imaging system for capturing (generating) image data representing printed features formed by the ejected liquid droplets. The system also includes a digital control system that detects defects in the printed features, for example, by comparing the image data with stored image data. The digital control system then modifies the printed feature to correct the defect, for example, by moving the printhead over the defect and causing the printhead to eject droplets onto the defect's location. In one embodiment, a single-printhead secondary printer operates in conjunction with a multi-printhead main printer to correct defects.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: July 14, 2009
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Steven E. Ready, William S. Wong, Scott J. H. Limb
  • Patent number: 6156435
    Abstract: Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas.
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: December 5, 2000
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Scott J. H. Limb, Edward F. Gleason, Herbert H. Sawin, David J. Edell
  • Patent number: 6153269
    Abstract: Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas.
    Type: Grant
    Filed: March 29, 1999
    Date of Patent: November 28, 2000
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Scott J. H. Limb, Edward F. Gleason, Herbert H. Sawin, David J. Edell
  • Patent number: 5888591
    Abstract: Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas.
    Type: Grant
    Filed: May 6, 1996
    Date of Patent: March 30, 1999
    Assignee: Massachusetts Institute of Technology
    Inventors: Karen K. Gleason, Scott J.H. Limb, Edward F. Gleason, Herbert H. Sawin, David J. Edell