Patents by Inventor Scott L. Battle
Scott L. Battle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200340110Abstract: A tray for a vaporization vessel that includes a tray having a side wall, a bottom plate, one or more apertures that extend through the bottom plate, and a duct that extends through and from the bottom plate. The tray configured to support a solid reagent to be vaporized. A method of assembling the tray that includes forming a first tray that has the side wall and the bottom plate. A vaporization vessel that includes one or more of the trays.Type: ApplicationFiled: April 23, 2020Publication date: October 29, 2020Inventors: Bryan C. HENDRIX, Scott L. BATTLE, David J. ELDRIDGE, John N. GREGG, Jacob THOMAS, Manuel F. GONZALES, Kenney R. JORDAN, Benjamin H. OLSON
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Patent number: 10526697Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: GrantFiled: February 28, 2016Date of Patent: January 7, 2020Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Scott L. Battle, John M. Cleary
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Patent number: 10465286Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may include an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: GrantFiled: October 17, 2016Date of Patent: November 5, 2019Assignee: ENTEGRIS, INC.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Patent number: 10392700Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.Type: GrantFiled: March 28, 2015Date of Patent: August 27, 2019Assignee: ENTEGRIS, INC.Inventors: Thomas H. Baum, Robert L. Wright, Jr., Bryan C. Hendrix, Scott L. Battle, John M. Cleary
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Patent number: 10385452Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: GrantFiled: May 31, 2013Date of Patent: August 20, 2019Assignee: ENTEGRIS, INC.Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges
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Publication number: 20190186003Abstract: The invention is directed to a vaporizer or ampoule assembly with an improved vaporizer vessel body and support tray assembly configuration located therein that together increase the vaporizable material utilization and uniformity.Type: ApplicationFiled: December 10, 2018Publication date: June 20, 2019Inventors: David James ELDRIDGE, John M. CLEARY, Jacob THOMAS, Scott L. BATTLE, Thomas CHATTERTON, John GREGG, Bryan C. HENDRIX, Thomas H. BAUM
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Publication number: 20190177840Abstract: A chemical delivery system includes a bulk container, a run/refill chamber, a first conduit and a second conduit. The bulk container stores a precursor. The run/refill chamber includes a plurality of spaced tubes having a plurality of surfaces for receiving the precursor in vapor form and storing the precursor in solid form. The first conduit connects the bulk container to the run/refill chamber for transporting the precursor from the bulk container to the run/refill chamber in vapor form. The second conduit connects the run/refill chamber to a deposition chamber for transporting the precursor from the run/refill chamber to the deposition chamber in vapor form.Type: ApplicationFiled: December 5, 2018Publication date: June 13, 2019Inventors: David James ELDRIDGE, David PETERS, Robert WRIGHT, JR., Bryan C. HENDRIX, Scott L. BATTLE, John GREGG
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Publication number: 20190120433Abstract: The invention is directed to a vaporizer or ampoule assembly with improved heat transfer between a vaporizer vessel body and at least one support tray located therein. In particular, there is provided a heat transfer enhancing member that is disposed between a vessel body and support tray. In one example of a heat transfer enhancing member or assembly there is included a heat conductive mesh or liner around totally or partially around the support tray that is wedged in between the support tray and the interior diameter or wall of the vessel body. In a related embodiment, the heat transfer enhancing member includes an expandable support tray sidewall to increase physical contact between the support tray and the vessel body interior wall.Type: ApplicationFiled: October 17, 2018Publication date: April 25, 2019Inventors: Bryan C. HENDRIX, Scott L. BATTLE, John N. GREGG
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Patent number: 9997362Abstract: A cobalt deposition process, including: volatilizing a cobalt precursor selected from among CCTBA, CCTMSA, and CCBTMSA, to form a precursor vapor; and contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms an electrode, capping layer, encapsulating layer, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel display, or solar panel.Type: GrantFiled: March 26, 2015Date of Patent: June 12, 2018Assignee: Entegris, Inc.Inventors: Thomas H. Baum, Scott L. Battle, David W. Peters, Philip S. H. Chen
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Publication number: 20180044787Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.Type: ApplicationFiled: February 28, 2016Publication date: February 15, 2018Inventors: Thomas H. BAUM, Robert L. WRIGHT, Jr., Scott L. BATTLE, John M. CLEARY
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Publication number: 20170342557Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.Type: ApplicationFiled: March 28, 2015Publication date: November 30, 2017Inventors: Thomas H. BAUM, Robert L. WRIGHT, Jr., Bryan C. HENDRIX, Scott L. BATTLE, John M. CLEARY
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Patent number: 9637395Abstract: A tungsten precursor useful for forming tungsten-containing material on a substrate, e.g., in the manufacture of microelectronic devices. The tungsten precursor is devoid of fluorine content, and may be utilized in a solid delivery process or other vapor deposition technique, to form films such as elemental tungsten for metallization of integrated circuits, or tungsten nitride films or other tungsten compound films that are useful as base layers for subsequent elemental tungsten metallization.Type: GrantFiled: September 26, 2013Date of Patent: May 2, 2017Assignee: Entegris, Inc.Inventors: Weimin Li, David W. Peters, Scott L. Battle, William Hunks
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Publication number: 20170032973Abstract: A cobalt deposition process, including: volatilizing a cobalt precursor selected from among CCTBA, CCTMSA, and CCBTMSA, to form a precursor vapor; and contacting the precursor vapor with a substrate under vapor deposition conditions effective for depositing on the substrate (i) high purity, low resistivity cobalt or (ii) cobalt that is annealable by thermal annealing to form high purity, low resistivity cobalt. Such cobalt deposition process can be used to manufacture product articles in which the deposited cobalt forms an electrode, capping layer, encapsulating layer, diffusion layer, or seed for electroplating of metal thereon, e.g., a semiconductor device, flat-panel display, or solar panel.Type: ApplicationFiled: March 26, 2015Publication date: February 2, 2017Inventors: Thomas H. Baum, Scott L. Battle, David W. Peters, Philip S.H. Chen
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Publication number: 20170029946Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: October 17, 2016Publication date: February 2, 2017Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20160369402Abstract: Cobalt precursors are described, having application for vapor deposition of cobalt on substrates, such as in atomic layer deposition (ALD) and chemical vapor deposition (CVD) processes for forming interconnects, capping structures, and bulk cobalt conductors, in the manufacture of integrated circuitry and thin film products.Type: ApplicationFiled: February 19, 2015Publication date: December 22, 2016Inventors: Thomas H. Baum, Scott L. Battle, John M. Cleary, David W. Peters, Philip S.H. Chen
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Patent number: 9469898Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: GrantFiled: July 31, 2015Date of Patent: October 18, 2016Assignee: ENTEGRIS, INC.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150337436Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: July 31, 2015Publication date: November 26, 2015Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150251920Abstract: A tungsten precursor useful for forming tungsten-containing material on a substrate, e.g., in the manufacture of microelectronic devices. The tungsten precursor is devoid of fluorine content, and may be utilized in a solid delivery process or other vapor deposition technique, to form films such as elemental tungsten for metallization of integrated circuits, or tungsten nitride films or other tungsten compound films that are useful as base layers for subsequent elemental tungsten metallization.Type: ApplicationFiled: September 26, 2013Publication date: September 10, 2015Applicant: ENTEGRIS, INC.Inventors: Weimin Li, David W. Peters, Scott L. Battle, William Hunks
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Publication number: 20150218696Abstract: Vaporizable material is supported within a vessel to promote contact of an introduced gas with the vaporizable material, and produce a product gas including vaporized material. A heating element supplies heat to a wall of the vessel to heat vaporizable material disposed therein. The vessel may comprise an ampoule having a removable top. Multiple containers defining multiple material support surfaces may be stacked disposed within a vessel in thermal communication with the vessel. A tube may be disposed within the vessel and coupled to a gas inlet. Filters, flow meters, and level sensors may be further provided. Product gas resulting from contact of introduced gas with vaporized material may be delivered to atomic layer deposition (ALD) or similar process equipment. At least a portion of source material including a solid may be dissolved in a solvent, followed by removal of solvent to yield source material (e.g., a metal complex) disposed within the vaporizer.Type: ApplicationFiled: April 14, 2015Publication date: August 6, 2015Applicant: Entegris, Inc.Inventors: John N. Gregg, Scott L. Battle, Jeffrey I. Banton, Donn K. Naito, Ravi K. Laxman
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Publication number: 20150191819Abstract: Systems, reagent support trays, particle suppression devices, and methods are disclosed. In one aspect, a system includes a vaporizer vessel having one or more interior walls enclosing an interior volume and a plurality of reagent support trays configured to be vertically stackable within the interior volume. Each of the plurality of reagent support trays is configured to be vertically stackable within the interior volume to form a stack of reagent support trays. One or more of the plurality of reagent support trays is configured to redirect a flow of a gas passing between adjacent reagent support trays in the stack of reagent support trays to cause the flow of gas to interact with the source reagent material in a particular reagent support tray before passing into a next of the plurality of reagent support trays in the stack of reagent support trays.Type: ApplicationFiled: May 31, 2013Publication date: July 9, 2015Inventors: Bryan C. Hendrix, John N. Gregg, Scott L. Battle, Donn K. Naito, Kyle Bartosh, John M. Cleary, Sebum Cheon, Jordan Hodges