Abstract: A spectroscopic analysis method having improved accuracy and correlation, a method for fabricating a semiconductor device using the same, and a substrate process system using the same are provided. The spectroscopic analysis method includes receiving plasma light emitted from plasma to generate an emission spectrum, detecting n (here, n is a natural number of 2 or more) peak wavelengths from the emission spectrum, generating a plurality of correlation factor time series from correlation factors between the peak wavelengths, filtering the plurality of correlation factor time series, and analyzing the plasma, using the filtered correlation factor time series.

Abstract: A plasma processing apparatus includes; a housing including a first side wall and a second side wall, wherein the housing defines a processing region in which plasma is generated, an optical source unit disposed on the first side wall in alignment with the viewing window, wherein the optical source unit is configured to irradiate the processing region with incident light through the viewing window, a reflector disposed on the second side wall of the housing, wherein the reflector reflects a portion of the incident light irradiating the processing region to generate reflected light, a spectrometer configured to receive the reflected light from the reflector through the viewing window and the optical source unit and a controller configured to determine density of the active species gas within the processing region in relation to the incident light and the reflected light.

Abstract: A spectroscopic analysis method having improved accuracy and correlation, a method for fabricating a semiconductor device using the same, and a substrate process system using the same are provided. The spectroscopic analysis method includes receiving plasma light emitted from plasma to generate an emission spectrum, detecting n (here, n is a natural number of 2 or more) peak wavelengths from the emission spectrum, generating a plurality of correlation factor time series from correlation factors between the peak wavelengths, filtering the plurality of correlation factor time series, and analyzing the plasma, using the filtered correlation factor time series.

Abstract: According to an embodiment of the present disclosure, a resource management device for managing virtualized resources may be configured to: define at least one resource block including an allocated size of at least one type of resource; determine a resource block type and a resource block quantity required for a service; determine, based on the resource block type and the resource block quantity, a first server for executing the service from a server pool including a plurality of servers; and execute a first process on the first server according to the service.

Abstract: The present invention provides a backlight module comprising a light emitting unit including a light source and a light guide plate transmitting light from the light source; a light guide unit accumulatively placed on the top of the light emitting unit and transmitting the light to the upper part of the light guide unit; a mold frame containing the light emitting unit and the light guide unit and having a space between the side of the light guide unit and the mold frame; and a shielding portion formed at the side of the light guide unit to prevent light leakage transmitting from the side of the light guide unit to the outside of the light guide unit.

Abstract: The present invention provides an integrated optical sheet module where an optical sheet is integrally formed without a diffusion sheet, a condensing sheet and a reflective polarizing sheet thereby reducing the overall thickness and improving the viewing angle, so that a manufacturing process can be simplified and significantly improve the left to right viewing angle while minimizing the brightness drop by forming the first base film having the viewing angle improvement component on the bottom surface with a haze characteristic.

Abstract: The present disclosure relates to an optical sheet having improved optical properties and minimized surface spots. According to one aspect of the present disclosure, provided is an optical sheet comprising: a first prism sheet which has a plurality of prisms parallel in a first direction formed on one surface thereof; and a diffusion sheet which is positioned at the surface side into which light of the first prism sheet is incident and has a plurality of protrusions formed on the surface facing the first prism sheet.

Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

Abstract: The present invention provides an integrated optical sheet module where an optical sheet is integrally formed without a diffusion sheet, a condensing sheet and a reflective polarizing sheet thereby reducing the overall thickness and improving the viewing angle, so that a manufacturing process can be simplified and significantly improve the left to right viewing angle while minimizing the brightness drop by forming the first base film having the viewing angle improvement component on the bottom surface with a haze characteristic.

Abstract: The present invention provides a backlight module comprising a light emitting unit including a light source and a light guide plate transmitting light from the light source; a light guide unit accumulatively placed on the top of the light emitting unit and transmitting the light to the upper part of the light guide unit; a mold frame containing the light emitting unit and the light guide unit and having a space between the side of the light guide unit and the mold frame; and a shielding portion formed at the side of the light guide unit to prevent light leakage transmitting from the side of the light guide unit to the outside of the light guide unit.

Abstract: Disclosed herein are a microwave probe capable of precisely detecting a plasma state in a plasma process, a plasma monitoring system including the probe, and a method of fabricating a semiconductor device using the system. The microwave probe includes a body extending in one direction and a head which is connected to one end of the body and has a flat plate shape. In addition, in the plasma process, the microwave probe is non-invasively coupled to a chamber such that a surface of the head contacts an outer surface of a viewport of the chamber, and the microwave probe applies a microwave into the chamber through the head and receives signals generated inside the chamber through the head.

Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.

Abstract: A semiconductor substrate measuring apparatus includes a light source unit generating irradiation light including light in a first wavelength band and light in a second wavelength band. An optical unit irradiates the irradiation light on a measurement object and condenses reflected light. A light splitting unit splits the reflected light, condensed in the optical unit, into a first optical path and a second optical path. A first detecting unit is disposed on the first optical path and detects first interference light in the first wavelength band in the reflected light. A second detecting unit is disposed on the second optical path and detects second interference light in the second wavelength band in the reflected light. A controlling unit calculates at least one of a surface shape or a thickness of the measurement object. The controlling unit calculates a temperature of the measurement object.

Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

Abstract: An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

Abstract: Methods for fabricating semiconductor devices are provided including forming a stacked structure including a first mold layer and a second mold layer on a substrate; forming a first photoresist pattern on the stacked structure; etching the second mold layer using the first photoresist pattern as a mask; forming a second photoresist pattern by etching a portion of the first photoresist pattern; measuring a first fringe signal generated by an interference phenomenon between first reflected lights reflected from the first photoresist pattern; forming a stepped structure by etching the second mold layer and the first mold layer which is exposed, using the second photoresist pattern as a mask; measuring a second fringe signal generated by an interference phenomenon between second reflected lights reflected from the second mold layer; calculating a third fringe signal by summing the first fringe signal and the second fringe signal; calculating and a first etch rate of an upper surface of the first photoresist patte

Abstract: The present disclosure relates to an optical sheet having improved optical properties and minimized surface spots. According to one aspect of the present disclosure, provided is an optical sheet comprising: a first prism sheet which has a plurality of prisms parallel in a first direction formed on one surface thereof; and a diffusion sheet which is positioned at the surface side into which light of the first prism sheet is incident and has a plurality of protrusions formed on the surface facing the first prism sheet.