Abstract: A method of fabricating a monolithic device, preferably a micromechanical device, from a wafer (20) by carefully selecting the composition of two or more layers of photoresist (52,54). The present invention comprises choosing compatible photoresist layers to avoid generating defects in the layers of photoresist which could allow a wet chemical HF acid etch process to damage an underlying micromechanical device. The present invention allows a very strong solution of hydrofluoric acid to be utilized to remove particles and debris after a partial-saw process, and to remove a damaged portion of an underlying CMOS layer (22) at a region (68) proximate a kerf (62). Using an HF solution having a concentration of about 6% is desired. The present invention substantially improves the yield of micromechanical devices.

Abstract: Angiotensin I converting enzyme inhibitors A-58365 factors A, B, and C are produced by culturing Streptomyces chromofuscus NRRL 15098 under submerged aerobic fermentation conditions and are isolated and purified from the acidic filtered fermentation broth via chromatography, in particular HPLC. The factors are useful hypotensive agents.

Abstract: Angiotensin I converting enzyme inhibitor A-58365 factor A is produced in enhanced yields by culturing Streptomyces chromofuscus NRRL 15098 under submerged aerobic fermentation conditions in a proline supplemented aqueous nutrient culture medium containing assimilable sources of carbon, nitrogen and inorganic salts.