Patents by Inventor Seiichi Watanabe

Seiichi Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5804033
    Abstract: The present invention relates to a microwave plasma processing method and apparatus. According to the present invention, the microwaves are introduced into the electric discharge means in correspondence with only the traveling direction thereof, whereby uniformity in a plasma density distribution corresponding to the surface to-be-processed of the sample can be sharply enhanced, so that the sample processed by utilizing such plasma can attain an enhanced processing homogeneity within the surface to be processed. In addition, homogeneity and stability of the plasma are improved by inserting a cavity resonator between the microwave generator and plasma processing (plasma generating) chamber, and coupling the cavity resonator and plasma processing chamber such that microwaves substantially only of a desired mode (e.g., TE.sub.11) pass into the plasma processing chamber. Such coupling to provide microwaves substantially only of circular TE.sub.
    Type: Grant
    Filed: March 10, 1993
    Date of Patent: September 8, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Saburo Kanai, Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata, Muneo Furuse, Tetsunori Kaji
  • Patent number: 5785807
    Abstract: The present invention relates to a microwave plasma processing method and apparatus. More particularly, it relates to a microwave plasma processing method and apparatus of the type wherein a waveguide section includes electric discharge means isolated from a waveguide for the propagation of microwaves and having a plasma generation region therein, which method and apparatus are well suited for subjecting samples, such as semiconductor device substrates, to an etching process, a film forming process, etc. According to the present invention, the microwaves are introduced into the electric discharge means in correspondence with only the traveling direction thereof, whereby uniformity in a plasma density distribution corresponding to the surface to-be-processed of the sample can be sharply enhanced, so that the sample processed by utilizing such plasma can attain an enhanced processing homogeneity within the surface to-be-processed.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: July 28, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Saburo Kanai, Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata
  • Patent number: 5775594
    Abstract: A sprayer according to the present invention is suitable for a sprayer of type which is mounted to a neck portion of a container and pumps up liquid contained in the container to spray the liquid. The term "spray" includes a meaning of spraying the liquid in the atomized state by making the liquid into fine particles and a meaning of spraying the liquid in the foamed state by further making the fine particles mixed with air. A collision plate 50 is disposed in front of a discharge nozzle 21 so that the spray state when the collision plate 50 is in the closed state and that when the collision plate 50 is in the opened state are different from each other.
    Type: Grant
    Filed: July 15, 1996
    Date of Patent: July 7, 1998
    Assignee: Yoshino Kogyosho Co., Ltd.
    Inventors: Takaharu Tasaki, Shigeru Hayakawa, Mitsuhiro Sasazaki, Chitoshi Okawara, Seiichi Watanabe, Shigeru Akutsu
  • Patent number: 5766526
    Abstract: An injection molding method and apparatus in which an injection molding metal mold having a valve gate 7 mechanically opening and closing a gate facing an injection molding cavity is used, and the timing of closing the valve gate is set with reference to a melted resin pressure in the injection molding cavity during a holding pressure step in a molding process. The molding method and apparatus result in high accuracy molded products by utilizing a valve gate system in the injection molding of thin products, and also result in molded products having less variations among cavities even in the case where a plurality of products are molded at the same time.
    Type: Grant
    Filed: April 12, 1995
    Date of Patent: June 16, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Seiichi Watanabe
  • Patent number: 5761016
    Abstract: A magnetic disk cartridge includes a magnetic disk, a cassette shell encasing the magnetic disk, and a disk-shaped center core which supports the magnetic disk and is adapted for rotation by a turntable equipped with an annular chucking magnet. A magnetic head access opening is formed in one side surface of the cassette shell, a center portion of the center core is formed with a center hole for engagement by a center locating pin of the turntable, and a peripheral portion of the center core is formed with a step-like annular chucking region whose level differs from that at the mouth of the center hole. The chucking region is adapted to make surface contact with the annular chucking magnet. The structure enables the chucking magnet to strongly attract and reliably secure the center core, thereby preventing slippage during high-speed rotation, and to prevent rotational vibration owing to unbalanced loading.
    Type: Grant
    Filed: September 4, 1996
    Date of Patent: June 2, 1998
    Assignees: Fuji Photo Film Co., Ltd., Iomega Corporation
    Inventor: Seiichi Watanabe
  • Patent number: 5731938
    Abstract: A magnetic head device comprising:a magnetic circuit which includes a head core unit, a back core and a coil;the head core unit including a first core made from a magnetic material and a second core made from a magnetic material, and forming a magnetic gap between the first core and the second core;the back core made from a magnetic material and jointed to the first core and the second core so as to form back gaps;the coil arranged on the first core;a first holder which is bonded to the first core and the second core at two locations of the side of the magnetic gap and the side of the back gaps so as to hold the magnetic circuit; anda second holder which is bonded to the first core and the second core at the magnetic gap side so as to hold the magnetic circuit, and which is substantially of a square pillar.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: March 24, 1998
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Naoto Sugawara, Seiichi Watanabe, Seiichi Handa
  • Patent number: 5705004
    Abstract: A process for producing a magnetic disk cartridge comprises the steps of moistening liners to be attached to inner surfaces of a cassette shell to face a magnetic disk rotatably encased in the cassette shell, thereby expanding the liners, and attaching the moistened and expanded liners to the inner surfaces of the cassette shell. Since the liners shrink upon drying, they remain taut irrespective of changes in the use environment.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: January 6, 1998
    Assignees: Fuji Photo Film Co., Ltd., Iomega Corporation
    Inventor: Seiichi Watanabe
  • Patent number: 5689393
    Abstract: A magnetic disk cartridge comprises a cassette shell and a magnetic disk, which is incorporated in the cassette shell such that it can rotate. The cassette shell is provided with an opening for insertion of a magnetic head, through which the magnetic head for magnetically recording and reproducing signals is to be inserted from the exterior such that the magnetic head can be brought into contact with the surfaces of the magnetic disk or can be brought to positions close to the surfaces of the magnetic disk. The opening for insertion of the magnetic head is formed in a side surface of the cassette shell, which side surface is parallel to an axis of rotation of the magnetic disk. A shutter member for opening and closing the opening for insertion of the magnetic head by moving along the side surface of the cassette shell is located only in the side surface of the cassette shell.
    Type: Grant
    Filed: November 20, 1995
    Date of Patent: November 18, 1997
    Assignees: Fuji Photo Film Co., Ltd., Iomega Corporation
    Inventor: Seiichi Watanabe
  • Patent number: 5646489
    Abstract: A plasma processing apparatus has a waveguide along which microwaves are propagated from a microwave generator to a plasma-forming region in a low-pressure processing chamber. The waveguide has a large cross-sectional area, to enable a large region of plasma to be achieved. Uniformity and stability of the plasma are improved by a mode restrictor which inhibits mixing of propagation modes which is otherwise liable to occur in a wide waveguide. The mode restrictor consists of electrically conductive dividers which divide the waveguide cross-section into an array of sub-guides before the plasma-forming region.
    Type: Grant
    Filed: May 2, 1995
    Date of Patent: July 8, 1997
    Assignee: Hitachi, Ltd.
    Inventors: Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Kazuo Nojiri, Hiromichi Enami, Tetsunori Kaji, Seiichi Watanabe, Yoshifumi Ogawa
  • Patent number: 5599505
    Abstract: A chemical analysis film cartridge has a box-like cartridge body in which a plurality of chemical analysis films are stacked. The chemical analysis films are taken out one by one through a take-out port formed in one end of the cartridge body. The take-out port has a first opening portion which is opened through a first side wall of the cartridge body and through which one chemical analysis film can be passed and a second opening portion which opened through one end face of the cartridge body. A first engagement portion is formed on the outer surface of the first side wall near the first opening portion and a second engagement portion is formed on the outer surface of a second side wall opposed to the first side wall. A capping member having third and fourth engagement portions is removably mounted on the cartridge body to cover the first and second opening portions of the take-out port with the third and fourth engagement portions respectively engaged with the first and second engagement portions.
    Type: Grant
    Filed: September 13, 1995
    Date of Patent: February 4, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasushi Fujisaki, Yoshihiro Seto, Seiichi Watanabe, Kaoru Terashima
  • Patent number: 5583320
    Abstract: A reinforcement for a flexible printed circuit board, which can sufficiently prevent the flexible printed circuit board thus reinforced from being warped when heated during the assembly process of electronic components or other procedures. The reinforcement according to the present invention is used to adhere to a flexible printed circuit board 1. The reinforcement according to the present invention comprises an internal material 21 having a bending neutral surface at the center of the thickness thereof, and an external material 22 having the same Young's modulus as that of an insulating substrate 11 of the flexible printed circuit board 1, bonded to one side of the internal material 21. The other side of the internal material 21 acts as an adhesive surface to the flexible printed circuit board 1.
    Type: Grant
    Filed: March 29, 1995
    Date of Patent: December 10, 1996
    Assignee: Nitto Denko Corporation
    Inventors: Fuyuki Eriguchi, Toshihiko Sugimoto, Seiichi Watanabe
  • Patent number: 5580420
    Abstract: A microwave penetrating window and a cavity which are substantially equal in diameter to a plasma generating chamber are successively connected to the plasma generating chamber and microwaves are introduced via the cavity into the plasma generating chamber. A processing gas in the plasma generating chamber is converted into a plasma by means of the microwaves introduced into the plasma generating chamber and the microwaves in specific modes are resonated in between a microwave reflective interface with the plasma generated in the plasma generating chamber and the reflective edge face of the cavity. The microwaves in the specific modes are thus formed in the cavity and the energy of the microwaves in the specific modes is increased by resonance. The boosted energy is added to the plasma and the plasma is densified accordingly. Moreover, a plasma excellent in uniformity and stability can be generated by resonating the microwaves in the specific modes in the presence of a uniform electromagnetic field.
    Type: Grant
    Filed: September 16, 1994
    Date of Patent: December 3, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Katsuya Watanabe, Tetsunori Kaji, Naoyuki Tamura, Kenji Nakata, Hiroyuki Shichida, Seiichi Watanabe, Sadayuki Okudaira, Keizo Suzuki
  • Patent number: 5556651
    Abstract: An injection molded metal mold is provided to eliminate defects such as appearance defects of molded products, functional defects of products, or the like, caused by formation of a concave portion in a surface opposite to a gate as a metal mold is used over a long period of time. An injection molding metal mold 1 in which when a melted resin is injected first from a gate into an injection cavity, the rate of resin at the gate is not less than 5 m/sec, and the distance between the gate 5 and a portion opposite to the gate is 0.2 mm to 2.0 mm. In the mold, an exchangeable gate-opposition metal mold member, in the form of an ejection pin, is buried in the portion opposite to the gate. Further an injection molding method using this metal mold is provided. The forward end of an ejection pin bites into a plastic molded product so that the molded product is held ejected when the metal mold is opened.
    Type: Grant
    Filed: April 13, 1995
    Date of Patent: September 17, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Seiichi Watanabe, Morio Fujiwara
  • Patent number: 5536472
    Abstract: A chemical analysis element cartridge includes a box-like cartridge body in which a plurality of chemical analysis elements are stacked and are taken out through an element take-out port formed at one end of the cartridge body. A pressing member is slidably received in the cartridge body and is brought into contact with the stack of the elements on the side remote from the element take-out port to push the stack of the elements toward the element take-out port. The cartridge body is provided at least in one side wall thereof with a slit which extends in the direction of stack of the elements and the pressing member is provided with an external force receiving portion which is laterally interlocked with an urging member disposed outside the cartridge body through the slit and receives a force for urging the pressing member toward the element take-out port from the urging member.
    Type: Grant
    Filed: November 16, 1994
    Date of Patent: July 16, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kaoru Terashima, Yoshihiro Seto, Shigeru Tezuka, Seiichi Watanabe, Yoshihiko Abe
  • Patent number: 5520771
    Abstract: The present invention relates to a microwave plasma processing method and apparatus. More particularly, it relates to a microwave plasma processing method and apparatus of the type wherein a waveguide section includes electric discharge means isolated from a waveguide for the propagation of microwaves and having a plasma generation region therein, which method and apparatus are well suited for subjecting samples, such as semiconductor device substrates, to an etching process, a film forming process, etc.According to the present invention, the microwaves are introduced into the electric discharge means in correspondence with only the traveling direction thereof, whereby uniformity in a plasma density distribution corresponding to the surface to-be-processed of the sample can be sharply enhanced, so that the sample processed by utilizing such plasma can attain an enhanced processing homogeneity within the surface to-be-processed.
    Type: Grant
    Filed: May 18, 1995
    Date of Patent: May 28, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Saburo Kanai, Yoshinao Kawasaki, Kazuaki Ichihashi, Seiichi Watanabe, Makoto Nawata
  • Patent number: 5472657
    Abstract: In a method for injection molding a plastic shutter for a magnetic disk cartridge, the shutter having windows corresponding to an opening formed in a magnetic disk cartridge and being substantially U-shaped in section, the diameter of an injection cylinder for injecting molten resin for forming the shutter is determined according to the following equation:D.sup.2 =A.times.C.times.M / .pi.where D is the diameter (mm) of the injection cylinder, C is the number of the plastic shutters molded simultaneously with one metal mold, M is the volume (cm.sup.3) of the plastic shutter, and A is the cylinder coefficient of the injection cylinder and is limited as follows:130.ltoreq.A.ltoreq.510.The inventive method is considerably stable, being free from the difficulties that short shot occurs with the metal mold, and the resultant shutter is deformed near the gate of the metal mold, or bent in its entirety.
    Type: Grant
    Filed: July 28, 1994
    Date of Patent: December 5, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Seiichi Watanabe, Tadashi Irie, Naoyoshi Chino
  • Patent number: 5433789
    Abstract: A plasma processing apparatus has a waveguide along which microwaves are propagated from a microwave generator to a plasma-forming region in a low-pressure processing chamber. The waveguide has a large cross-sectional area, to enable a large region of plasma to be achieved. Uniformity and stability of the plasma are improved by a mode restrictor which inhibits mixing of propagation modes which is otherwise liable to occur in a wide waveguide. The mode restrictor consists of electrically-conductive dividers which divide the waveguide cross-section into an array of sub-guides before the plasma-forming region.
    Type: Grant
    Filed: January 28, 1993
    Date of Patent: July 18, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Yutaka Kakehi, Yoshinao Kawasaki, Keizo Suzuki, Kazuo Nojiri, Hiromichi Enami, Tetsunori Kaji, Seiichi Watanabe, Yoshifumi Ogawa
  • Patent number: 5409857
    Abstract: An integrated circuit is formed thereof a conductive wiring pattern. On the conductive wiring semiconductor layer is directly formed in a form of amorphous on the substrate. The amorphous semiconductor layer is annealed to form a polycrystalline structure while avoiding influence of annealing heat for the substrate. In the polycrystalline semiconductor layer is formed a semiconductor element, such as MOS transistor, MIS transistor, TFT and so forth. The semiconductor element is directly connected to the wiring pattern on the substrate.
    Type: Grant
    Filed: September 7, 1989
    Date of Patent: April 25, 1995
    Assignee: Sony Corporation
    Inventors: Seiichi Watanabe, Setsuo Usui
  • Patent number: 5389329
    Abstract: A molding method and a mold for molding a plastic shutter, wherein a plate-like member with a free end is extended into a molding cavity to define an injection together with at least two opposed planar plates. A thrust member, which is movable in the direction of thickness of the plate-like member and which applies a thrust force to the plate-like member, is provided close to the free end of the plate-like member. In a state where the amount of movement of the thrust member is adjusted to within a predetermined range as viewed in the thickness direction of the plate-like member, on the basis of the position where the forward end of the thrust means comes in contact with the plate-like member, molten resin is injected into the injection space, thereby forming the plastic shutter.
    Type: Grant
    Filed: September 27, 1993
    Date of Patent: February 14, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Seiichi Watanabe, Tadashi Irie
  • Patent number: 5276386
    Abstract: In a microwave plasma generating method and apparatus according to the present invention, a slow wave structure is disposed in the propagation region of microwaves, and the microwaves are introduced at a delayed phase velocity into a discharge chamber so that treating gases are transformed into plasma. Thus, the phase velocity of the microwaves is adjusted to a relatively low velocity, at which charged particles are distributed most densely in the plasma, so that the energy may be efficiently transformed to many more charged particles in the plasma. Thus, the plasma of high density is generated to improve a plasma treating rate.
    Type: Grant
    Filed: March 14, 1991
    Date of Patent: January 4, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Seiichi Watanabe, Makoto Nawata, Ryooji Fukuyama, Yutaka Kakehi, Saburo Kanai, Yoshinao Kawasaki