Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

Abstract: A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.

Abstract: An extrusion molding method of a resin-molded article is provided. A resin extrusion molding apparatus includes an extruder, a die, a sizing device, a take-up device and a cutting machine. During the resin-molded article is extrusion-molded, a replacement die is made to stand by at a standby position laterally adjacent to the die and a replacement sizing unit is made to stand by at a standby position laterally adjacent to a sizing unit which coincides with an extrusion line of the sizing device. After the resin extrusion molding apparatus is stopped, the die is detached from the extruder and the replacement die is moved to and attached to the extruder, and the sizing unit is moved to a position laterally deviated from the extrusion line and the replacement sizing unit is moved to a position which coincides with the extrusion line. Upper and lower endless rotary bodies of the take-up device are laterally moved to make one of a plurality of supporting faces of pads coincide with the extrusion line.

Abstract: An exposure method includes generating a reticle exposure pattern based on a target pattern, performing a lithography simulation based on the reticle exposure pattern to generate a simulation pattern that simulates a resist pattern formed by reticle exposure, generating differential data between the target pattern and the simulation pattern, generating a first electron-beam exposure pattern based on the differential data, generating a reticle based on the reticle exposure pattern, performing an optical exposure process with respect to a resist by use of the reticle, and performing an electron-beam exposure process with respect to the resist based on the first electron-beam exposure pattern.

Abstract: A pattern verification apparatus includes a correction section creating a plurality of first data pieces; a determination section performing light intensity simulation to create a plurality of plots, determine whether or not each of the plurality of simulation result plots falls within an allowable range, and recognize two or more simulation result plots which do not fall within the allowable range as a plurality of second data pieces; an extraction section extracting a reference pattern of the plurality of original design patterns corresponding to the plurality of second data pieces; and a classifying section classifying the plurality of second data pieces into categories of the reference pattern.

Abstract: A semiconductor device includes a substrate, a circuit pattern formed on the substrate, and a plurality of dummy patterns formed on the substrate in addition to the circuit pattern, wherein the plurality of dummy patterns include a plurality of marker dummy patterns in an array thereof, the marker dummy patterns being distinguishable from other dummy patterns and are distributed irregularly in the array of the dummy patterns.

Abstract: A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

Abstract: A semiconductor device includes a substrate, a circuit pattern formed on the substrate, and a plurality of dummy patterns formed on the substrate in addition to the circuit pattern, wherein the plurality of dummy patterns include a plurality of marker dummy patterns in an array thereof, the marker dummy patterns being distinguishable from other dummy patterns and are distributed irregularly in the array of the dummy patterns.

Abstract: A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

Abstract: A liquid crystal display apparatus of the invention includes a pair of substrates and a liquid crystal layer sandwiched between the pair of substrates with alignment films formed at interfaces between the liquid crystal layer and the respective substrates. The alignment films regulate aligning conditions of liquid crystal in the liquid crystal layer. In the liquid crystal display apparatus, the liquid crystal layer includes two or more liquid crystal layer regions of different aligning conditions, and at least one of the alignment films has surface tensions which are different from each other in surface regions thereof corresponding to the respective liquid crystal layer regions of different aligning conditions.

Abstract: A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.

Abstract: A liquid crystal display device includes: a first substrate; a second substrate; a liquid crystal layer interposed between the first and the second substrates; a plurality of electrodes for applying a voltage to the liquid crystal layer; a first alignment film provided on a surface of the first substrate in contact with the liquid crystal layer; a second alignment film provided on a surface of the second substrate in contact with the liquid crystal layer; and a plurality of pixels. The liquid crystal layer in each of the pixels includes first and second liquid crystal regions, liquid crystal molecules in the first and the second liquid crystal regions have an identical twisting direction.

Abstract: A liquid crystal aligning agent comprising a polyamic acid containing an aliphatic and/or alicyclic hydrocarbon group and a polyimide containing an aliphatic and/or alicyclic hydrocarbon group; and a liquid crystal display device using the liquid crystal aligning agent. This liquid crystal aligning agent gives a liquid crystal aligning film which has good liquid crystal aligning property and in which pretilt angle can be changed by radiation with a small energy and which is suitable for domain-divided alignment type liquid crystal display having a wide view angle.

Abstract: A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.

Abstract: A liquid crystal display apparatus of the invention includes a pair of substrates and a liquid crystal layer sandwiched between the pair of substrates with alignment films formed at interfaces between the liquid crystal layer and the respective substrates. The alignment films regulate aligning conditions of liquid crystal in the liquid crystal layer. In the liquid crystal display apparatus, the liquid crystal layer includes two or more liquid crystal layer regions of different aligning conditions, and at least one of the alignment films has surface tensions which are different from each other in surface regions thereof corresponding to the respective liquid crystal layer regions of different aligning conditions.

Abstract: A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.

Abstract: The method of cleaning an exhaust gas containing nitrogen oxides including disposing an exhaust gas cleaner comprising a heat-resistant, porous body, which may support a catalyst consisting essentially of (a) at least one of alkali metal elements; (b) at least one of elements selected from the group consisting of Cu, Co, Mn and V, (c) at least one of rare earth elements, in a flow path of the exhaust gas, spraying a liquid hydrocarbon into a stream of the exhaust gas on the upstream side of the exhaust gas cleaner, thereby causing atomized and gasified hydrocarbon to function as a reducing agent for reducing the nitrogen oxides in the exhaust gas.

Abstract: A liquid crystal aligning agent comprising a polyamic acid containing an aliphatic and/or alicyclic hydrocarbon group and a polyimide containing an aliphatic and/or alicyclic hydrocarbon group; and a liquid crystal display device using the liquid crystal aligning agent. This liquid crystal aligning agent gives a liquid crystal aligning film which has good liquid crystal aligning property and in which pretilt angle can be changed by radiation with a small energy and which is suitable for domain-divided alignment type liquid crystal display having a wide view angle.

Abstract: A liquid crystal display device which includes a pair of substrates; a liquid crystal layer sandwiched between the pair of substrates; and an electrode for applying a voltage to the liquid crystal layer is disclosed. The liquid crystal layers includes liquid crystal molecules, and is divided into a plurality of regions having different twist angles from one another.

Abstract: The liquid crystal display apparatus of the invention includes a first substrate and a second substrate disposed so as to face each other, a liquid crystal layer sandwiched between the first substrate and the second substrate, a first alignment film formed between the liquid crystal layer and theist substrate, and a second alignment film formed between the liquid crystal layer and the second substrate.