Patents by Inventor Seiji Morita

Seiji Morita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220143928
    Abstract: An NC device, which is a numerical control device, includes: a program analyzing unit that analyzes a machining program to obtain a movement path along which to move a supply position of a material on a workpiece; a storage temperature extracting unit that extracts, from data on surface temperature of the workpiece, storage temperature in an area including the movement path on the workpiece; a layering volume calculating unit that calculates a volume of a layer forming an object on the basis of a relation between the storage temperature and a volume of the material that solidifies at the storage temperature in a given time; and a layering shape changing unit that changes a shape of the layer on the basis of the volume of the layer.
    Type: Application
    Filed: June 25, 2019
    Publication date: May 12, 2022
    Applicant: Mitsubishi Electric Corporation
    Inventors: Seiji UOZUMI, Nobuhiro SHINOHARA, Daiji MORITA, Nobuyuki SUMI
  • Patent number: 11320736
    Abstract: A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.
    Type: Grant
    Filed: September 6, 2018
    Date of Patent: May 3, 2022
    Assignee: KIOXIA CORPORATION
    Inventors: Ryosuke Yamamoto, Seiji Morita, Norikatsu Sasao, Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura
  • Publication number: 20220055254
    Abstract: According to one embodiment, a template for imprint patterning processes comprises a template substrate having a first surface and a pedestal on the first surface of the template substrate, the pedestal having a second surface spaced from the first surface in a first direction perpendicular to the first surface. A pattern is disposed on the second surface. The pedestal has a sidewall between the first surface and the second surface that is at an angle of less than 90° to the second surface.
    Type: Application
    Filed: November 4, 2021
    Publication date: February 24, 2022
    Inventors: Kei KOBAYASHI, Anupam MITRA, Seiji MORITA, Hirokazu KATO
  • Patent number: 11217431
    Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: January 4, 2022
    Assignee: KIOXIA CORPORATION
    Inventors: Ryuichi Saito, Seiji Morita, Ryosuke Yamamoto
  • Patent number: 11192282
    Abstract: According to one embodiment, a template for imprint patterning processes comprises a template substrate having a first surface and a pedestal on the first surface of the template substrate, the pedestal having a second surface spaced from the first surface in a first direction perpendicular to the first surface. A pattern is disposed on the second surface. The pedestal has a sidewall between the first surface and the second surface that is at an angle of less than 90° to the second surface.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: December 7, 2021
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Kei Kobayashi, Anupam Mitra, Seiji Morita, Hirokazu Kato
  • Patent number: 11140551
    Abstract: An aircraft cabin audio communication system includes: a plurality of aircraft smart cabin headsets, each including a microphone and an earpiece. The earpiece includes a speaker; a first biometric sensor disposed on a first button; a second biometric sensor disposed on a second button; a third biometric sensor disposed on a third button; a wireless transceiver; a power button; and a processor that: performs device authentication of the aircraft smart cabin headset based on a device identifier of the aircraft smart cabin headset; performs first authentication based on first biometric data obtained from the first biometric sensor; establishes user connection with cabin speakers; performs second authentication based on second biometric data obtained from the second biometric sensor; and transmits information that comprises a connection request to a cockpit terminal of the aircraft through the wireless transceiver.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: October 5, 2021
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Renato Seiji Morita
  • Patent number: 10904686
    Abstract: A method of acoustic tuning includes: outputting, with a first speaker among a plurality of speakers in different locations on an aircraft cabin, a first sound; detecting, with a plurality of microphones in different locations of the cabin, first reflected sounds of the first sound; outputting, with a second speaker among the plurality of speakers, a second sound; detecting, with the plurality of microphones, second reflected sounds of the second sound; comparing, with a server connected to the speakers and the microphones, the first sound and the second sound with each of the first reflected sounds and each of the second reflected sounds, respectively; and adjusting an output gain and frequency phase of each of the plurality of speakers based on the comparisons between the first sound and each of the first reflected sounds and between the second sound and each of the second reflected sounds.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: January 26, 2021
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Renato Seiji Morita, Victor-Daniel Gheorghian
  • Patent number: 10879067
    Abstract: In one embodiment, a pattern forming method includes forming a first film on a substrate. The method further includes supplying energy to the first film to form a first region to which the energy have been supplied, and a second region including at least a region to which the energy has not been supplied. The method further includes impregnating at least the first region out of the first and second region with metal atoms. The method further includes developing the first film after impregnating the first region with the metal atoms to remove the second region while leaving the first region.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: December 29, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Seiji Morita, Takashi Sato, Ryosuke Yamamoto
  • Patent number: 10811268
    Abstract: According to one embodiment, a substrate processing apparatus comprises a chamber for a substrate that has a target film thereon. The apparatus includes a first gas introducing unit to introduce a precursor gas into the chamber, a second gas introducing unit that introduces a etching gas for etching the target film into the chamber, and a controller configured to control the first gas introducing unit and the second gas introducing unit to cause the first gas and the second gas to be alternately introduced to the chamber.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: October 20, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Yusuke Kasahara, Shinichi Ito, Seiji Morita, Ryosuke Yamamoto, Ryuichi Saito
  • Patent number: 10811252
    Abstract: A pattern-forming method includes forming a first film above a material to be processed, processing the first film into a pattern to be formed in the material to be processed, providing a second film on the first film and the material to be processed, supplying a precursor containing at least one of a metal material or a semiconductor material to the second film, removing the first film, and processing the material to be processed using the second film impregnated with at least one of the metal material and the semiconductor material, as a mask.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: October 20, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Ryosuke Yamamoto, Ryuichi Saito, Seiji Morita, Ryoichi Suzuki, Takeharu Motokawa, Shinichi Ito, Soichi Inoue
  • Publication number: 20200310735
    Abstract: An aircraft cabin system includes: a cabin server that stores an application and a graphical attribute; and a plurality of modular displays connected to the cabin server via a network. Each of the modular displays includes: a modular display dock hardwired to the network; and a modular display body that is detachably attached and electrically connected to the modular display dock. The modular display body includes: a touch screen that displays a GUI; and a processor. The processor sends, to the cabin server, a request for the application and the graphical attribute when the modular display body is coupled to the modular display dock, the cabin server sends, to the modular display body via the modular display dock, the application and the graphical attribute in response to the request.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 1, 2020
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Victor-Daniel Gheorghian, Renato Seiji Morita
  • Publication number: 20200314646
    Abstract: An aircraft cabin audio communication system includes: a plurality of aircraft smart cabin headsets, each including a microphone and an earpiece. The earpiece includes a speaker; a first biometric sensor disposed on a first button; a second biometric sensor disposed on a second button; a third biometric sensor disposed on a third button; a wireless transceiver; a power button; and a processor that: performs device authentication of the aircraft smart cabin headset based on a device identifier of the aircraft smart cabin headset; performs first authentication based on first biometric data obtained from the first biometric sensor; establishes user connection with cabin speakers; performs second authentication based on second biometric data obtained from the second biometric sensor; and transmits information that comprises a connection request to a cockpit terminal of the aircraft through the wireless transceiver.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 1, 2020
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Renato Seiji Morita
  • Publication number: 20200314573
    Abstract: A method of acoustic tuning includes: outputting, with a first speaker among a plurality of speakers in different locations on an aircraft cabin, a first sound; detecting, with a plurality of microphones in different locations of the cabin, first reflected sounds of the first sound; outputting, with a second speaker among the plurality of speakers, a second sound; detecting, with the plurality of microphones, second reflected sounds of the second sound; comparing, with a server connected to the speakers and the microphones, the first sound and the second sound with each of the first reflected sounds and each of the second reflected sounds, respectively; and adjusting an output gain and frequency phase of each of the plurality of speakers based on the comparisons between the first sound and each of the first reflected sounds and between the second sound and each of the second reflected sounds.
    Type: Application
    Filed: July 3, 2019
    Publication date: October 1, 2020
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Renato Seiji Morita, Victor-Daniel Gheorghian
  • Publication number: 20200270379
    Abstract: A resin composition for molding having excellent heat resistance, hardness, cost-effectiveness, and biodegradability is provided by using an amorphous resin material component extracted from plant-derived wood. The resin composition is a hemicellulose monomer obtained by applying a methacrylation reaction or acrylation reaction to a hemicellulose or hemicellulose derivative and has a molecular structure in which a methacrylic group or acryloyl group is bonded to the hemicellulose or hemicellulose derivative. This hemicellulose monomer has excellent injection moldability.
    Type: Application
    Filed: December 5, 2019
    Publication date: August 27, 2020
    Inventors: Seiji Morita, Jin Nasukawa, Kenichi Sato, Laksmi Kusumawardhani
  • Publication number: 20200270430
    Abstract: A resin composition for molding having excellent heat resistance, hardness, cost-effectiveness and biodegradability is provided by using amorphous resin material components extracted from plant-derived wood. The resin composition includes a first resin including a hemicellulose or a hemicellulose derivative and a second resin including polymethylmethacrylate (PMMA, acrylic), polycarbonate (PC), cyclo olefin polymer (COP), cyclo olefin copolymer (COC), polypropylene (PP), polyethylene (PE), polyethylene terephthalate (PET), or polystyrene (PS) and has excellent injection moldability.
    Type: Application
    Filed: December 5, 2019
    Publication date: August 27, 2020
    Inventors: Seiji Morita, Jin Nasukawa, Kenichi Sato, Laksmi Kusumawardhani
  • Patent number: 10755689
    Abstract: An aircraft cabin system includes a plurality of modular displays disposed in an cabin and a server connected to each of the modular displays. Each of the plurality of modular displays includes a microphone that captures ambient noise in the cabin and a speaker that emits a noise reduction sound. The server instructs each of the plurality of modular displays to capture the ambient noise during a preselected flight phase. The server receives, from each of the plurality of modular displays, a digital ambient noise signal generated based on the ambient noise. The server generates for each of the plurality of modular displays a digital ambient noise reduction signal with an inverted phase of the digital ambient noise signal and a dynamic amplitude that is calculated to yield a highest level of ambient noise reduction. The server sends the digital ambient noise reduction signal to each of the plurality of modular displays.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: August 25, 2020
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Sasha Dean-Bhïyan, Renato Seiji Morita, Victor-Daniel Gheorghian
  • Publication number: 20200090926
    Abstract: In one embodiment, a pattern forming method includes forming a first film on a substrate. The method further includes supplying energy to the first film to form a first region to which the energy have been supplied, and a second region including at least a region to which the energy has not been supplied. The method further includes impregnating at least the first region out of the first and second region with metal atoms. The method further includes developing the first film after impregnating the first region with the metal atoms to remove the second region while leaving the first region.
    Type: Application
    Filed: February 21, 2019
    Publication date: March 19, 2020
    Applicant: TOSHIBA MEMORY CORPORATION
    Inventors: Seiji Morita, Takashi Sato, Ryosuke Yamamoto
  • Publication number: 20190341229
    Abstract: In one embodiment, a method of manufacturing a semiconductor device includes forming a first film on a substrate. The method further includes housing the substrate provided with the first film in a chamber, and introducing a first gas into the chamber. The method further includes generating plasma discharge of the first gas in the chamber or applying radiation to the first gas in the chamber. The method further includes introducing a second gas containing a metal component into the chamber to cause the metal component to infiltrate into the first film after the generation of the plasma discharge or the application of the radiation is started.
    Type: Application
    Filed: July 17, 2019
    Publication date: November 7, 2019
    Applicant: Toshiba Memory Corporation
    Inventors: Ryuichi SAITO, Seiji MORITA, Ryosuke YAMAMOTO
  • Publication number: 20190287809
    Abstract: According to one embodiment, a substrate processing apparatus comprises a chamber for a substrate that has a target film thereon. The apparatus includes a first gas introducing unit to introduce a precursor gas into the chamber, a second gas introducing unit that introduces a etching gas for etching the target film into the chamber, and a controller configured to control the first gas introducing unit and the second gas introducing unit to cause the first gas and the second gas to be alternately introduced to the chamber.
    Type: Application
    Filed: August 13, 2018
    Publication date: September 19, 2019
    Inventors: Yusuke KASAHARA, Shinichi ITO, Seiji MORITA, Ryosuke YAMAMOTO, Ryuichi SAITO
  • Patent number: 10407542
    Abstract: In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: September 10, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Kei Kobayashi, Seiji Morita