Patents by Inventor Seok Won Cho

Seok Won Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11945744
    Abstract: Disclosed are a method and apparatus for reusing wastewater. The method for reusing wastewater disclosed herein includes: generating a mixed wastewater by mixing multiple types of wastewater (S20); performing a first purification by passing the mixed wastewater through a flocculation-sedimentation unit (S40); performing a second purification by passing an effluent of the flocculation-sedimentation unit through a membrane bioreactor (MBR) (S60); performing a third purification by passing an effluent of the MBR through a reverse-osmosis membrane unit (S80); and reusing an effluent of the reverse-osmosis membrane unit as cooling water or industrial water (S100).
    Type: Grant
    Filed: April 14, 2023
    Date of Patent: April 2, 2024
    Assignees: SAMSUNG ENGINEERING CO., LTD., SAMSUNG ELECTRONICS CO., LTD
    Inventors: Seok Hwan Hong, Dae Soo Park, Seung Joon Chung, Yong Xun Jin, Jae Hyung Park, Jae Hoon Choi, Jae Dong Hwang, Jong Keun Yi, Su Hyoung Cho, Kyu Won Hwang, June Yurl Hur, Je Hun Kim, Ji Won Chun
  • Patent number: 11938247
    Abstract: Provided are a method for fabricating a human nasal turbinate-derived mesenchymal stem cell-based 3D bioprinted construct, and a use thereof, wherein the human nasal turbinate-derived mesenchymal stem cell-based, 3D bioprinted construct is advantageous over conventional mesenchymal stem cell-based, 3D bioprinted constructs in that the former can survive and proliferate stably in vitro and/or in vivo and shows high osteogenic differentiation ability as well, therefore is expected to make a great contribution to the practical use of cellular therapeutic agents.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: March 26, 2024
    Assignee: CATHOLIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
    Inventors: Sung Won Kim, Jung Yeon Lim, Sun Hwa Park, Byeong Gon Yoon, Dong-Woo Cho, Jinah Jang, Seok Won Kim
  • Publication number: 20230290734
    Abstract: Provided is a semiconductor architecture including a carrier substrate, alignment marks provided in the carrier substrate, the alignment marks being provided from a first surface of the carrier substrate to a second surface of the carrier substrate, a first semiconductor device provided on the first surface of the carrier substrate based on the alignment marks, a second semiconductor device provided on the second surface of the carrier substrate based on the alignment marks and aligned with the first semiconductor device.
    Type: Application
    Filed: May 18, 2023
    Publication date: September 14, 2023
    Applicant: SMSUNG ELECTRONICS CO., LTD.
    Inventors: Seok Won CHO, Ki-Il Kim, Kang Ill Seo
  • Patent number: 11694968
    Abstract: Provided is a semiconductor architecture including a carrier substrate, alignment marks provided in the carrier substrate, the alignment marks being provided from a first surface of the carrier substrate to a second surface of the carrier substrate, a first semiconductor device provided on the first surface of the carrier substrate based on the alignment marks, a second semiconductor device provided on the second surface of the carrier substrate based on the alignment marks and aligned with the first semiconductor device.
    Type: Grant
    Filed: January 25, 2021
    Date of Patent: July 4, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD
    Inventors: Seok Won Cho, Ki-Il Kim, Kang Ill Seo
  • Publication number: 20230146776
    Abstract: Provided is a compound for an organic electric device, an organic electric device using the same, and an electronic device including the organic electric device. Further provided is an organic electric device having high luminous efficiency, low driving voltage, and high heat resistance can be provided, and color purity and lifespan of the organic electric device can be improved.
    Type: Application
    Filed: March 4, 2021
    Publication date: May 11, 2023
    Applicant: DUK SAN NEOLUX CO., LTD.
    Inventors: Seok Won CHO, Jin Ho YUN, Yong Wook PARK, Young Hoon KANG, Min Ji JO
  • Publication number: 20220157737
    Abstract: Provided is a semiconductor architecture including a carrier substrate, alignment marks provided in the carrier substrate, the alignment marks being provided from a first surface of the carrier substrate to a second surface of the carrier substrate, a first semiconductor device provided on the first surface of the carrier substrate based on the alignment marks, a second semiconductor device provided on the second surface of the carrier substrate based on the alignment marks and aligned with the first semiconductor device.
    Type: Application
    Filed: January 25, 2021
    Publication date: May 19, 2022
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seok Won Cho, Ki-Il Kim, Kang Ill Seo
  • Patent number: 11236691
    Abstract: Disclosed herein is a method of predicting engine knocking, which includes calculating initial pressure in cylinder based on operating data and pressure in intake manifold measured using manifold absolute pressure sensor, calculating pressure at spark timing in the cylinder by interpreting compression process as polytropic process based on the calculated initial pressure in the cylinder, calculating heat release rate for individual operating conditions based on the calculated pressure in the cylinder at spark timing, calculating pressure change in the cylinder based on the calculated heat release rate, calculating unburned gas temperature in adiabatic compression process based on the calculated pressure change in the cylinder, and determining whether knock occurs by calculating ignition delay based on the calculated unburned gas temperature and calculating unburned gas mass fraction at crank angle at the end of the ignition delay.
    Type: Grant
    Filed: June 15, 2021
    Date of Patent: February 1, 2022
    Assignee: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Kyoung Doug Min, Chi Heon Song, Seok Won Cho, Young Bok Lee, Ji Hwan Park
  • Publication number: 20210388788
    Abstract: Disclosed herein is a method of predicting engine knocking, which includes calculating initial pressure in cylinder based on operating data and pressure in intake manifold measured using manifold absolute pressure sensor, calculating pressure at spark timing in the cylinder by interpreting compression process as polytropic process based on the calculated initial pressure in the cylinder, calculating heat release rate for individual operating conditions based on the calculated pressure in the cylinder at spark timing, calculating pressure change in the cylinder based on the calculated heat release rate, calculating unburned gas temperature in adiabatic compression process based on the calculated pressure change in the cylinder, and determining whether knock occurs by calculating ignition delay based on the calculated unburned gas temperature and calculating unburned gas mass fraction at crank angle at the end of the ignition delay.
    Type: Application
    Filed: June 15, 2021
    Publication date: December 16, 2021
    Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Kyoung Doug MIN, Chi Heon SONG, Seok Won CHO, Young Bok LEE, Ji Hwan PARK
  • Patent number: 10290509
    Abstract: Example embodiments relate to a method for fabricating a semiconductor device. The method for fabricating a semiconductor device includes stacking on a substrate an etching target layer, a first mask layer, and a photoresist layer, irradiating extreme ultraviolet (EUV) radiation on the photoresist layer to form a photoresist pattern, patterning the first mask layer to form a first mask pattern using the photoresist pattern as an etching mask, and patterning the etching target layer to form a target pattern using the first mask pattern as an etching mask. The first mask layer includes at least one of a silicon layer and a titanium oxide layer.
    Type: Grant
    Filed: February 27, 2017
    Date of Patent: May 14, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Nam-Gun Kim, Sangmin Lee, Sinhae Do, Seok-Won Cho, Taeseop Choi, Kon Ha
  • Patent number: 10096603
    Abstract: A method of fabricating a semiconductor device includes forming first cell patterns on a substrate, forming a first layer relative to the first cell patterns, and forming a second cell pattern and a peripheral pattern on the first layer. The second cell pattern includes first holes in a cell region and the peripheral pattern is located in a peripheral region. The method also includes filling the first holes, removing the second cell pattern to expose pillars, and forming second holes. Each of the second holes corresponds to adjacent cell spacers of the pillars. The method also includes removing the pillars to form third holes corresponding to respective ones of the cell spacers, and etching the substrate using the cell spacers, the first cell patterns, and the peripheral pattern as etch masks to form a trench.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: October 9, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Heejung Kim, Seok-Won Cho, Joonsoo Park, SoonMok Ha
  • Patent number: 9957619
    Abstract: A phosphate solution for a zinc or zinc-based alloy plated steel sheet, and a zinc or zinc-based alloy plated steel sheet using the same are provided. The phosphate solution for a zinc or zinc-based alloy plated steel sheet contains a molybdenum (Mo) ion, a calcium (Ca) ion and a phosphate ion. A zinc or zinc-based alloy plated steel sheet includes a base steel sheet, a zinc-based or zinc alloy-based plating layer formed on the base steel sheet, and a phosphate film formed on the zinc-based or zinc alloy-based plating layer. The phosphate film contains a molybdenum compound, Ca and a phosphate. A pitting phenomenon occurring at the time of treating a steel sheet with a phosphate is prevented, and excellent corrosion resistance is exhibited on a phosphate film.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: May 1, 2018
    Assignee: POSCO
    Inventors: Young-Jin Kwak, Kyung-Hoon Nam, Yong-Hwa Jung, Tae-Yeob Kim, Dong-Yoeul Lee, Seok-Won Cho, Young-Ra Lee, Mun-Jong Eom, Woo-Sung Jung, Seok-Jun Hong, Jae-Kyu Min, Hong-Kyun Sohn
  • Publication number: 20180033637
    Abstract: Example embodiments relate to a method for fabricating a semiconductor device. The method for fabricating a semiconductor device includes stacking on a substrate an etching target layer, a first mask layer, and a photoresist layer, irradiating extreme ultraviolet (EUV) radiation on the photoresist layer to form a photoresist pattern, patterning the first mask layer to form a first mask pattern using the photoresist pattern as an etching mask, and patterning the etching target layer to form a target pattern using the first mask pattern as an etching mask. The first mask layer includes at least one of a silicon layer and a titanium oxide layer.
    Type: Application
    Filed: February 27, 2017
    Publication date: February 1, 2018
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Nam-Gun KIM, Sangmin LEE, Sinhae DO, Seok-Won CHO, Taeseop CHOI, Kon HA
  • Publication number: 20170053920
    Abstract: A method of fabricating a semiconductor device includes forming first cell patterns on a substrate, forming a first layer relative to the first cell patterns, and forming a second cell pattern and a peripheral pattern on the first layer. The second cell pattern includes first holes in a cell region and the peripheral pattern is located in a peripheral region. The method also includes filling the first holes, removing the second cell pattern to expose pillars, and forming second holes. Each of the second holes corresponds to adjacent cell spacers of the pillars. The method also includes removing the pillars to form third holes corresponding to respective ones of the cell spacers, and etching the substrate using the cell spacers, the first cell patterns, and the peripheral pattern as etch masks to form a trench.
    Type: Application
    Filed: August 8, 2016
    Publication date: February 23, 2017
    Inventors: Heejung KIM, Seok-Won CHO, Joonsoo PARK, SoonMok HA
  • Publication number: 20150329972
    Abstract: A phosphate solution for a zinc or zinc-based alloy plated steel sheet, and a zinc or zinc-based alloy plated steel sheet using the same are provided. The phosphate solution for a zinc or zinc-based alloy plated steel sheet contains a molybdenum (Mo) ion, a calcium (Ca) ion and a phosphate ion. A zinc or zinc-based alloy plated steel sheet includes a base steel sheet, a zinc-based or zinc alloy-based plating layer formed on the base steel sheet, and a phosphate film formed on the zinc-based or zinc alloy-based plating layer. The phosphate film contains a molybdenum compound, Ca and a phosphate. A pitting phenomenon occurring at the time of treating a steel sheet with a phosphate is prevented, and excellent corrosion resistance is exhibited on a phosphate film.
    Type: Application
    Filed: December 28, 2012
    Publication date: November 19, 2015
    Applicant: POSCO
    Inventors: Young-Jin KWAK, Kyung-Hoon NAM, Yong-Hwa JUNG, Tae-Yeob KIM, Dong-Yoeul LEE, Seok-Won CHO, Young-Ra LEE, Mun-Jong EOM, Woo-Sung JUNG, Seok-Jun HONG, Jae-Kyu MIN, Hong-Kyun SOHN
  • Publication number: 20090037261
    Abstract: Optimizing search engine advertising inventory includes storing a plurality of advertisements for a plurality of advertising techniques in an inventory database. The system and method includes, in response to a user search request, selecting one or more advertisements from the inventory database to be displayed in a selected advertising technique based on user click activity, advertisement performance data and the plurality of advertisements, selected for a search results page having the selected advertisement disposed thereon. The system and method thereby determines prospective inventory content for the inventory database based on the selected advertisements and advertising techniques. This prospective inventory content may be used to optimize storage of advertisements and advertising sales techniques, such as giving sales people an indication of which advertising techniques to be marketed or sold.
    Type: Application
    Filed: July 30, 2007
    Publication date: February 5, 2009
    Inventor: Seok Won Cho
  • Publication number: 20090037375
    Abstract: Optimizing search advertising on a search results page in response to a search request includes the search engine determining advertisements for inclusion with the search results, where the advertisements include different advertisement techniques. The method includes selecting one or more of the advertisements for inclusion with the search results page, which may be from different advertising techniques. Additionally, the selection of the advertisements may be based on user click activity, advertisement performance data and the plurality of advertisements, where the advertisements are associated with the different techniques. Thereupon, search result page includes selected advertisements optimized for the benefit of the sponsor and page revenue.
    Type: Application
    Filed: July 30, 2007
    Publication date: February 5, 2009
    Inventor: Seok Won Cho
  • Patent number: 6458633
    Abstract: A thin film transistor and a method for fabricating the same are disclosed, in which an offset region is affected or biased by a gate voltage to increase on-current, thereby improving on/off characteristic of a device. A first semiconductor layer is formed on a substrate, and insulating layer patterns are formed at both ends of the first semiconductor layer. A second semiconductor layer is formed on the first semiconductor layer and the insulating layer patterns. A gate insulating film is formed on the first and second semiconductor layers and the insulating layer patterns, and an active layer formed on the gate insulating film.
    Type: Grant
    Filed: December 1, 1999
    Date of Patent: October 1, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventor: Seok Won Cho
  • Patent number: 6312992
    Abstract: Thin film transistor and method for fabricating the same, is disclosed, in which a channel width of the thin film transistor is made greater in a narrow area for improving an on/off performance of the thin film transistor, the thin film transistor including a source electrode formed on a substrate, a columnar conductive layer connected to the source electrode, a drain electrode formed on the conductive layer, a gate insulating film formed to cover the conductive layer and the drain electrode, a gate electrode formed on the gate insulating film surrounding the conductive layer, and an insulting film formed between the source electrode and the gate electrode.
    Type: Grant
    Filed: September 23, 1998
    Date of Patent: November 6, 2001
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventor: Seok Won Cho
  • Patent number: 6100566
    Abstract: A multi-layer semiconductor having a semiconductor substrate, a first gate electrode formed over the substrate, first source and drain electrodes in the substrate on both sides of first and second gate electrodes, the second source and drain electrodes connected to the semiconductor layer. The method includes the steps of forming the first gate electrode over the semiconductor substrate with a first insulating layer inbetween, forming the first source and the first drain electrodes in the substrate on both sides of the first gate electrodes, forming a semiconductor layer over the first gate electrode with a second insulating layer therebetween, forming a second gate electrode on the semiconductor layer, and forming second source, and drain electrodes connected to the semiconductor layer.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: August 8, 2000
    Assignee: LG Semicon Co., Ltd.
    Inventor: Seok Won Cho
  • Patent number: 6060726
    Abstract: A CMOS device includes a first conductivity type semiconductor substrate having an active region, the active region including two second conductivity type of impurity regions and a first channel region between the two second conductivity type impurity regions, a field insulation region on the semiconductor substrate for electrical isolation of the active region from other adjacent active regions, a second conductivity type semiconductor layer on the field insulation layer, the semiconductor layer including two first conductivity type impurity regions and a second channel region between the two first conductivity type impurity regions, and a gate electrode over the first channel region in the active region and the second channel region in the semiconductor layer.
    Type: Grant
    Filed: April 22, 1999
    Date of Patent: May 9, 2000
    Assignee: LG Semicon Co., Ltd.
    Inventor: Seok-Won Cho