Patents by Inventor Seong Hwan Park

Seong Hwan Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist removing compositions
    Publication number: 20040202969
    Abstract: A photoresist polymer remover composition for removing photoresist residuals generated from etching or ashing sub-processes. The disclosed photoresist polymer remover composition includes: (a) 5% to 15% of sulfuric acid based on the total weight of said composition, (b) 1% to 5% of hydrogen peroxide or 0.0001% to 0.05% of ozone based on the total weight of said composition, (c) 0.1% to 5% of acetic acid based on the total weight of said composition, (d) 0.0001% to 0.5% of ammonium fluoride based on the total weight of said composition and (e) remaining amount of water.
    Type: Application
    Filed: November 20, 2003
    Publication date: October 14, 2004
    Inventors: Seong Hwan Park, Chang Hwan Lee, Sam Young Cho, Wy Yong Kim, Suk Il Yoon