Patents by Inventor Sergio Fukuda Shoji
Sergio Fukuda Shoji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11615973Abstract: A substrate carrier is described that uses a proportional thermal fluid delivery system. In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel. A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.Type: GrantFiled: October 17, 2019Date of Patent: March 28, 2023Assignee: Applied Materials, Inc.Inventors: Phillip Criminale, Justin Phi, Dan A. Marohl, Sergio Fukuda Shoji, Brad L. Mays
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Publication number: 20220130642Abstract: Methods and apparatus for processing a substrate are provided herein. For example, apparatus can include a first voltage/current (V/I) probe configured to connect to an input side of a matching network of the processing chamber and a second V/I probe configured to connect to an output side of the matching network and a processor coupled to the first V/I probe and the second V/I probe and configured to, based on a phase gap between a V and I of an RF signal detected by at least one of the first V/I probe or the second V/I probe at a target frequency, detect a minimum phase gap between the V and I, and control at least one of impedance tuning of the matching network or process control of the processing chamber using at least one of a peak or RMS of V, I and phase measured at the target frequency or under sweeping frequency.Type: ApplicationFiled: October 23, 2020Publication date: April 28, 2022Inventors: Katsumasa KAWASAKI, Kartik RAMASWAMY, Yue GUO, Chunlei ZHANG, Sergio Fukuda SHOJI, Jorge ZANINOVICH, Smbat KARTASHYAN
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Patent number: 10930540Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.Type: GrantFiled: November 5, 2019Date of Patent: February 23, 2021Assignee: Applied Materials, Inc.Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
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Publication number: 20200411355Abstract: Embodiments of a plug for use in an electrostatic chuck are provided herein. In some embodiments, a plug for use in an electrostatic chuck includes a polymer sleeve having a central opening; a core press-fit in the central opening of the polymer sleeve and having a gas flow channel disposed therethrough; a cap disposed on the polymer sleeve and covering the core, the cap having a through hole through the cap; and an annular channel disposed between the core and the cap, wherein the core, the cap, and the annular channel define a gas flow path through the plug.Type: ApplicationFiled: June 12, 2020Publication date: December 31, 2020Inventors: Hamid NOORBAKHSH, Anwar HUSAIN, Kartik RAMASWAMY, Sergio Fukuda SHOJI, Reyn Tetsuro WAKABAYASHI
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Patent number: 10854425Abstract: Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.Type: GrantFiled: February 2, 2016Date of Patent: December 1, 2020Assignee: Applied Materials, Inc.Inventors: Chetan Mahadeswaraswamy, Walter R Merry, Sergio Fukuda Shoji, Chunlei Zhang, Yashaswini Pattar, Duy D Nguyen, Tina Tsong, Shane C Nevil, Douglas A Buchberger, Jr., Fernando M Silveira, Brad L Mays, Kartik Ramaswamy, Hamid Noorbakhsh
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Patent number: 10854427Abstract: Methods for RF pulse reflection reduction are provided herein. In some embodiments, a method for processing a substrate in a plasma enhanced substrate processing system using multi-level pulsed RF power includes; receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a plurality of RF generators, using the master RF generator to generate a transistor-transistor logic (TTL) signal having a base frequency and a first duty cycle, setting a multiplier for each RF generator, dividing the first duty cycle into a high level interval and a low level interval, determining a frequency command set for each RF generator and sending the frequency command set to each RF generator, wherein the frequency command set includes a frequency set point for each RF generator; and providing the plurality of pulsed RF power waveforms from the plurality of RF generators to a process chamber.Type: GrantFiled: August 30, 2018Date of Patent: December 1, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Katsumasa Kawasaki, Justin Phi, Kartik Ramaswamy, Sergio Fukuda Shoji, Daisuke Shimizu
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Patent number: 10784132Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.Type: GrantFiled: February 6, 2019Date of Patent: September 22, 2020Assignee: Applied Materials, Inc.Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
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Patent number: 10745807Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.Type: GrantFiled: May 21, 2019Date of Patent: August 18, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Kartik Ramaswamy, Roland Smith, Brad L. Mays
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Publication number: 20200075290Abstract: Methods for RF pulse reflection reduction are provided herein. In some embodiments, a method for processing a substrate in a plasma enhanced substrate processing system using multi-level pulsed RF power includes; receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a plurality of RF generators, using the master RF generator to generate a transistor-transistor logic (TTL) signal having a base frequency and a first duty cycle, setting a multiplier for each RF generator, dividing the first duty cycle into a high level interval and a low level interval, determining a frequency command set for each RF generator and sending the frequency command set to each RF generator, wherein the frequency command set includes a frequency set point for each RF generator; and providing the plurality of pulsed RF power waveforms from the plurality of RF generators to a process chamber.Type: ApplicationFiled: August 30, 2018Publication date: March 5, 2020Inventors: KATSUMASA KAWASAKI, JUSTIN PHI, KARTIK RAMASWAMY, SERGIO FUKUDA SHOJI, DAISUKE SHIMIZU
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Publication number: 20200066566Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.Type: ApplicationFiled: November 5, 2019Publication date: February 27, 2020Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
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Publication number: 20200051839Abstract: A substrate carrier is described that uses a proportional thermal fluid delivery system. In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel. A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.Type: ApplicationFiled: October 17, 2019Publication date: February 13, 2020Inventors: Phillip Criminale, Justin Phi, Dan A. Marohl, Sergio Fukuda Shoji, Brad L. Mays
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Patent number: 10504765Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.Type: GrantFiled: April 24, 2017Date of Patent: December 10, 2019Assignee: Applied Materials, Inc.Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
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Patent number: 10490429Abstract: A substrate carrier is described that uses a proportional thermal fluid delivery system. In one example the apparatus includes a heat exchanger to provide a thermal fluid to a fluid channel of a substrate carrier and to receive the thermal fluid from the fluid channel, the thermal fluid in the fluid channel to control the temperature of the carrier during substrate processing. A proportional valve controls the rate of flow of thermal fluid from the heat exchanger to the fluid channel. A temperature controller receives a measured temperature from a thermal sensor of the carrier and controls the proportional valve in response to the measured temperature to adjust the rate of flow.Type: GrantFiled: November 26, 2014Date of Patent: November 26, 2019Assignee: Applied Materials, Inc.Inventors: Phillip Criminale, Justin Phi, Dan A. Marohl, Sergio Fukuda Shoji, Brad L. Mays
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Publication number: 20190271082Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.Type: ApplicationFiled: May 21, 2019Publication date: September 5, 2019Inventors: Haitao WANG, Hamid NOORBAKHSH, Chunlei ZHANG, Sergio Fukuda SHOJI, Kartik RAMASWAMY, Roland SMITH, Brad L. MAYS
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Patent number: 10378108Abstract: Embodiments of the present disclosure relate to a showerhead assembly for use in a processing chamber. The showerhead assembly includes a porous insert disposed in a space defined between a gas distribution plate and a base plate to moderate the corrosive radicals resulting from plasma ignition to reduce particle issues and metal contamination in the chamber. The porous insert is a conductive material, such as metal, used to reduce the gap electrical field strength, or may be a dielectric material such as ceramic, polytetrafluoroethylene, polyamide-imide, or other materials with a low dielectric loss and high electrical field strength under conditions of high frequency and strong electric fields. As such, the electrical breakdown threshold is enhanced. The porous insert may reduce and/or eliminate showerhead backside plasma ignition and may include multiple concentric narrow rings that cover gas holes of the gas distribution plate.Type: GrantFiled: July 26, 2016Date of Patent: August 13, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Haitao Wang, Hamid Noorbakhsh, Chunlei Zhang, Sergio Fukuda Shoji, Kartik Ramaswamy, Roland Smith, Brad L. Mays
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Publication number: 20190189481Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.Type: ApplicationFiled: February 6, 2019Publication date: June 20, 2019Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
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Patent number: 10242893Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.Type: GrantFiled: June 20, 2017Date of Patent: March 26, 2019Assignee: Applied Materials, Inc.Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
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Publication number: 20180366359Abstract: A method and apparatus for de-chucking a workpiece is described that uses a swing voltage sequence. One example pertains to a method that includes applying a mechanical force from an electrostatic chuck against the back side of a workpiece that is electrostatically clamped to the chuck, applying a sequence of voltage pulses with a same polarity to the electrodes, each pulse of the sequence having a lower voltage than the preceding pulse, each pulse of the sequence having a lower voltage than the preceding pulse, and determining whether the workpiece is released from the chuck after the sequence of additional voltage pulses and if the workpiece is not released then repeating applying the sequence of voltage pulses.Type: ApplicationFiled: June 20, 2017Publication date: December 20, 2018Inventors: Haitao Wang, Wonseok Lee, Sergio Fukuda Shoji, Chunlei Zhang, Kartik Ramaswamy
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Publication number: 20180308736Abstract: Embodiments include an electrostatic chuck assembly having an electrostatic chuck mounted on an insulator. The electrostatic chuck and insulator may be within a chamber volume of a process chamber. In an embodiment, a ground shield surrounds the electrostatic chuck and the insulator, and a gap between the ground shield and the electrostatic chuck provides an environment at risk for electric field emission. A dielectric filler can be placed within the gap to reduce a likelihood of electric field emission. The dielectric filler can have a flexible outer surface that covers or attaches to the electrostatic chuck, or an interface between the electrostatic chuck and the insulator Other embodiments are also described and claimed.Type: ApplicationFiled: April 24, 2017Publication date: October 25, 2018Inventors: Kartik Ramaswamy, Anwar Husain, Haitao Wang, Evans Yip Lee, Jaeyong Cho, Hamid Noorbakhsh, Kenny L. Doan, Sergio Fukuda Shoji, Chunlei Zhang
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Publication number: 20180142354Abstract: Embodiments of the present invention provide apparatus and methods for reducing non-uniformity and/or skews during substrate processing. One embodiment of the present invention provides a flow equalizer assembly for disposing between a vacuum port and a processing volume in a processing chamber. The flow equalizing assembly includes a first plate having at least one first opening, and a second plate having two or more second openings. The first and second plates define a flow redistributing volume therebetween, and the at least one first opening and the two or more second openings are staggered.Type: ApplicationFiled: January 19, 2018Publication date: May 24, 2018Inventors: Sergio Fukuda SHOJI, Hamid NOORBAKHSH, Jong Mun KIM, Jason DELLA ROSA, Ajit BALAKRISHNA