Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.

Abstract: A superstrate for planarizing a substrate. The superstrate includes a body having a first side having a contact surface and a second side having a central portion and a peripheral portion surrounding the central portion. The peripheral portion includes a recessed region.

Abstract: A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.

Abstract: A method, comprising retaining a superstrate with a superstrate chuck; applying a pressure to deflect the superstrate toward a substrate, deflection of the superstrate being gradually extended along a radial direction; maintaining a vacuum applied to a perimeter of the superstrate and continuously retaining the superstrate with the chuck while the deflecting the superstrate by the pressure; releasing the vacuum from the perimeter of the superstrate; and releasing the superstrate from the chuck.

Abstract: A method is provided, comprising creating at least one crack at a point on an edge of a stack of at least a substrate and a superstrate; propagating the crack along the periphery; and moving the superstrate relative to the substrate to complete separation of the superstrate from the substrate.

Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.

Abstract: A chuck for retaining a superstrate or a template. The chuck comprises a geometric structure formed on a surface of the chuck. The geometric structure includes at least one of a rounded edge portion and a roughened surface portion, such that an intensity variation of light transmitting through the geometric structure and an area of the chuck adjacent to the geometric structure is reduced.

Abstract: A method is provided, comprising creating at least one crack at a point on an edge of a stack of at least a substrate and a superstrate; propagating the crack along the periphery; and moving the superstrate relative to the substrate to complete separation of the superstrate from the substrate.

Abstract: A method, comprising retaining a superstrate with a superstrate chuck; applying a pressure to deflect the superstrate toward a substrate, deflection of the superstrate being gradually extended along a radial direction; maintaining a vacuum applied to a perimeter of the superstrate and continuously retaining the superstrate with the chuck while the deflecting the superstrate by the pressure; releasing the vacuum from the perimeter of the superstrate; and releasing the superstrate from the chuck.

Abstract: A chuck is provided. The chuck comprises a plurality of lands protruding from a surface of the chuck, the lands defining a series of zones; and a trenched recessed from the surface of the chuck in at least one of the zones.

Abstract: A method, a system, and a controller for imprinting. Apply droplets of a formable material to imprint region of substrate. A partial pressure of formable material develops at a fluid-gas interface. A portion of an imprinting surface of a mesa on a template at an initial contact time is brought into contact with the droplets. The droplets merge and flow towards an imprint edge interface. A first gas flows in the imprint region prior to the initial contact time. A second gas flows into the imprint edge interface and region between the template and the substrate after the initial contact time. The template and the flow of the second gas reduces the partial pressure of the formable material below a vapor pressure of the formable material in a portion of the gap region adjacent to the fluid-gas interface at the imprint edge interface.

Abstract: A light source, a shaping system using the light source, and a method of using the light source in a shaping system. The light source may comprise one or more actinic energy sources; and a light guide plate. The light guide plate may have at least: a light output face; an input edge; and a back surface facing opposite the light output face. Wherein, the input edge of the light guide plate may be arranged to receive UV light from the one or more actinic energy sources. Wherein, the light guide plate may have a plurality of scattering features that are configured to scatter UV light received from the input edge. Wherein, the back surface may reflect UV light towards the light output face and is transparent to non-UV light.

Abstract: A light source, a shaping system using the light source, and a method of using the light source in a shaping system. The light source may comprise one or more actinic energy sources; and a light guide plate. The light guide plate may have at least: a light output face; an input edge; and a back surface facing opposite the light output face. Wherein, the input edge of the light guide plate may be arranged to receive UV light from the one or more actinic energy sources. Wherein, the light guide plate may have a plurality of scattering features that are configured to scatter UV light received from the input edge. Wherein, the back surface may reflect UV light towards the light output face and is transparent to non-UV light.

Abstract: A fluid dispenser apparatus includes a fluid dispenser having plurality of nozzles aligned in a first longitudinal direction. A dispenser shield is positioned relative to the plurality of nozzles, the dispenser shield configured to form an aperture aligned in the first longitudinal direction with the plurality of nozzles. The plurality of nozzles are configured to dispense fluid towards a substrate. The dispenser shield is further positioned such that fluid dispensed from a first subset of the plurality of nozzles passes through the aperture while fluid dispensed from a second subset of the plurality nozzles is captured by the dispenser shield.

Abstract: An apparatus may include a substrate holder configured to hold a substrate. The substrate holder may include a first chucking region having a first area and an adjacent region extending from the chucking region. The apparatus may also include a superstrate holder configured to hold a superstrate. The superstrate holder may include a second chucking region having a second area. The second area may be larger than the first area and the superstrate holder faces the substrate holder forming a first gap between the adjacent region surface and the superstrate and a second gap between the substrate and the superstrate. The apparatus may also include a gas supply system between the first gap and the second gap. The superstrate holder may alter a shape of the held superstrate to decrease the first gap and increase the second gap.

Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for aligning a template and a substrate, the method including obtaining a moiré image based on an interaction of light between corresponding features of the template and the substrate, the moiré image including a plurality of moiré fringe strips; compressing each moiré fringe strip of the moiré image by an optical lens array based on a pixel height of an acquisition device, the acquisition device including one or more line scan cameras; processing the compressed moiré image by each of the line scan cameras of the acquisition device to determine a misalignment between the template and the substrate; and based on the determined misalignment, adjusting a relative positioning between the template and the substrate.

Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.

Abstract: A method, a system, and a controller for imprinting. Apply droplets of a formable material to imprint region of substrate. A partial pressure of formable material develops at a fluid-gas interface. A portion of an imprinting surface of a mesa on a template at an initial contact time is brought into contact with the droplets. The droplets merge and flow towards an imprint edge interface. A first gas flows in the imprint region prior to the initial contact time. A second gas flows into the imprint edge interface and region between the template and the substrate after the initial contact time. The template and the flow of the second gas reduces the partial pressure of the formable material below a vapor pressure of the formable material in a portion of the gap region adjacent to the fluid-gas interface at the imprint edge interface.

Abstract: Methods, systems, and apparatus for identifying a non-rectangular shape outline of a first field of a substrate, the first field directly adjacent to a second field; adjusting an exposure profile of an ultraviolet light beam based on the non-rectangular shape outline of the first field to provide a non-rectangular exposure profile of the ultraviolet light beam; disposing a polymerizable composition on the first field of the substrate; contacting the polymerizable composition in the first field with an imprint lithography template; and while contacting the polymerizable composition in the first field with the imprint lithography template, directing the ultraviolet light beam having the non-rectangular exposure profile towards the substrate such that the ultraviolet light beam irradiates only the first field of the substrate.

Abstract: Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for aligning a template and a substrate, the method including obtaining a moiré image based on an interaction of light between corresponding features of the template and the substrate, the moiré image including a plurality of moiré fringe strips; compressing each moiré fringe strip of the moiré image by an optical lens array based on a pixel height of an acquisition device, the acquisition device including one or more line scan cameras; processing the compressed moiré image by each of the line scan cameras of the acquisition device to determine a misalignment between the template and the substrate; and based on the determined misalignment, adjusting a relative positioning between the template and the substrate.