Patents by Inventor Seth J. Bamesberger

Seth J. Bamesberger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Low contact imprint lithography template chuck system for improved overlay correction
    Patent number: 9778578
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Grant
    Filed: November 7, 2014
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • LOW CONTACT IMPRINT LITHOGRAPHY TEMPLATE CHUCK SYSTEM FOR IMPROVED OVERLAY CORRECTION
    Publication number: 20150131072
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Applicants: TOSHIBA CORPORATION, CANON NANOTECHNOLOGIES, INC.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger