Patents by Inventor Seung-Hoon Sung

Seung-Hoon Sung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130341704
    Abstract: Nanowire-based gate all-around transistor devices having one or more active nanowires and one or more inactive nanowires are described herein. Methods to fabricate such devices are also described. One or more embodiments of the present invention are directed at approaches for varying the gate width of a transistor structure comprising a nanowire stack having a distinct number of nanowires. The approaches include rendering a certain number of nanowires inactive (i.e. so that current does not flow through the nanowire), by severing the channel region, burying the source and drain regions, or both. Overall, the gate width of nanowire-based structures having a plurality of nanowires may be varied by rendering a certain number of nanowires inactive, while maintaining other nanowires as active.
    Type: Application
    Filed: December 30, 2011
    Publication date: December 26, 2013
    Inventors: Willy Rachmady, Van H. Le, Ravi Pillarisetty, Jack T. Kavalieros, Robert S. Chau, Seung Hoon Sung
  • Publication number: 20130071297
    Abstract: A microplasma device includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel. At least one of the electrodes is encapsulated within the thick metal oxide layer. A method of fabricating a microcavity or microchannel plasma device includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide.
    Type: Application
    Filed: June 20, 2012
    Publication date: March 21, 2013
    Applicant: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
  • Patent number: 8179032
    Abstract: The invention provides microcavity plasma devices and arrays that are formed in layers that also seal the plasma medium, i.e., gas(es) and/or vapors. No separate packaging layers are required and additional packaging can be omitted if it is desirable to do so. A preferred microcavity plasma device includes first and second thin layers that are joined together. A half ellipsoid microcavity or plurality of half ellipsoid microcavities is defined in one or both of the first and second thin layers, and electrodes are arranged with respect to the microcavity to excite a plasma within said microcavities upon application of a predetermined voltage to the electrodes. A method for forming a microcavity plasma device having a plurality of half or full ellipsoid microcavities in one or both of first and second thin layers is also provided by a preferred embodiment. The method includes defining a pattern of protective polymer on the first thin layer.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: May 15, 2012
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Seung Hoon Sung
  • Publication number: 20100072893
    Abstract: The invention provides microcavity plasma devices and arrays that are formed in layers that also seal the plasma medium, i.e., gas(es) and/or vapors. No separate packaging layers are required and additional packaging can be omitted if it is desirable to do so. A preferred microcavity plasma device includes first and second thin layers that are joined together. A half ellipsoid microcavity or plurality of half ellipsoid microcavities is defined in one or both of the first and second thin layers, and electrodes are arranged with respect to the microcavity to excite a plasma within said microcavities upon application of a predetermined voltage to the electrodes. A method for forming a microcavity plasma device having a plurality of half or full ellipsoid microcavities in one or both of first and second thin layers is also provided by a preferred embodiment. The method includes defining a pattern of protective polymer on the first thin layer.
    Type: Application
    Filed: September 23, 2008
    Publication date: March 25, 2010
    Applicant: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Seung Hoon Sung
  • Patent number: 7615926
    Abstract: Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.
    Type: Grant
    Filed: June 12, 2007
    Date of Patent: November 10, 2009
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: J. Gary Eden, Sung-Jin Park, Paul A. Tchertchian, Seung Hoon Sung
  • Publication number: 20080129185
    Abstract: Microcavity plasma devices and arrays of microcavity plasma devices are provided that have a reduced excitation voltage. A trigger electrode disposed proximate to a microcavity reduce the excitation voltage required between first and second electrodes to ignite a plasma in the microcavity when gas(es) or vapor(s) (or combinations thereof) are contained within the microcavity. The invention also provides symmetrical microplasma devices and arrays of microcavity plasma devices for which current waveforms are the same for each half-cycle of the voltage driving waveform. Additionally, the invention also provides devices that have standoff portions and voids that can reduce cross talk. The devices are preferably also used with a trigger electrode.
    Type: Application
    Filed: June 12, 2007
    Publication date: June 5, 2008
    Inventors: J.Gary Eden, Sung-Jin Park, Paul A. Tchertchian, Seung Hoon Sung
  • Patent number: 7337079
    Abstract: An apparatus and method for high-resolution reflectometry that operates simultaneously in both the time and frequency domains, utilizing time-frequency signal analysis and a chirp signal multiplied by a Gaussian time envelope. The Gaussian envelope provides time localization, while the chirp allows one to excite the system under test with a swept sinewave covering a frequency band of interest. High resolution in detection of the reflected signal is provided by a time-frequency cross correlation function. The high-accuracy localization of faults in a wire/cable can be achieved by measurement of time delay offset obtained from the frequency offset of the reflected signal. The apparatus enables one to execute an automated diagnostic procedure of a wire/cable under test by control of peripheral devices.
    Type: Grant
    Filed: July 7, 2003
    Date of Patent: February 26, 2008
    Inventors: Jin-Bae Park, Yong-June Shin, Jong-Gwan Yook, Edward J. Powers, Eun-Seok Song, Joo-Won Kim, Tok-Son Choe, Seung-Hoon Sung
  • Publication number: 20060097730
    Abstract: An apparatus and method for high-resolution reflectometry that operates simultaneously in both the time and frequency domains, utilizing time-frequency signal analysis and a chirp signal multiplied by a Gaussian time envelope. The Gaussian envelope provides time localization, while the chirp allows one to excite the system under test with a swept sinewave covering a frequency band of interest. High resolution in detection of the reflected signal is provided by a time-frequency cross correlation function. The high-accuracy localization of faults in a wire/cable can be achieved by measurement of time delay offset obtained from the frequency offset of the reflected signal. The apparatus enables one to execute an automated diagnostic procedure of a wire/cable under test by control of peripheral devices.
    Type: Application
    Filed: July 7, 2003
    Publication date: May 11, 2006
    Inventors: Jin-Bae Park, Yong-June Shin, Jong-Qwan Yook, Edward Powers, Eun-Seok Song, Joo-Won Kim, Tok-Son Choe, Seung-Hoon Sung