Patents by Inventor Seung-Hyun Ahn

Seung-Hyun Ahn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist stripper compositions
    Patent number: 6589719
    Abstract: A photoresist stripper composition is made up of a mixture of an acetic acid ester, &ggr;-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: July 8, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-Hyun Ahn, Sang-Mun Chon, Hoe-Sik Chung, Mi-Sook Jeon, Eun-Mi Bae, Baik-Soon Choi, Ok-Seok Jang
  • PHOTORESIST STRIPPER COMPOSITIONS
    Publication number: 20030113673
    Abstract: A photoresist stripper composition is made up of a mixture of an acetic acid ester, &ggr;-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).
    Type: Application
    Filed: April 5, 2002
    Publication date: June 19, 2003
    Inventors: Seung-Hyun Ahn, Sang-Mun Chon, Hoe-Sik Chung, Mi-Sook Jeon, Eun-Mi Bae, Baik-Soon Choi, Ok-Seok Jang