Abstract: An electron emission device includes a first substrate with an electron emission region, and a second substrate with a light emitting region. The light emitting region emits light in response to electrons emitted from the electron emission region to produce images. A phosphor layer is formed with a predetermined pattern. A black layer is formed with a predetermined pattern at a non-light-emitting region within the phosphor layer pattern on the second substrate. The black layer includes a first region of chromium oxide or an oxide of chromium and one or more metals selected from the group consisting of indium, tin, indium-tin, copper, antimony, titanium, manganese, cobalt, nickel, zinc, lead, chromium, and combinations thereof. The first region is formed on an anode. A second region of metallic chromium is formed on the first region, and a third region of chromium oxide is formed on the second region.

Abstract: A polymer for a chemically amplified negative photoresist and a photoresist composition are provided. A representative polymer of the invention is a compound of formula 5: wherein: R1 through R5 and R14 through R17 are defined as set fourth in the specification, and a, b, c, and d represent the mole ratios of each monomer, wherein a has a value of 0-0.5, b has a value of 0-0.9, c has a value of 0-0.3, and d has a value of 0-0.3, provided that a+b+c+d=1; and n represents the degree of polymerization of each polymer, and has a value of at least 2.

Abstract: Disclosed are a monomer, a polymer for a photoresist, a photoresist composition and a phosphor layer for a cathode ray tube.

Abstract: A polymer for a chemically amplified negative photoresist and a photoresist composition are provided.

Abstract: Disclosed are a monomer, a polymer for a photoresist, a photoresist composition and a phosphor layer for a cathode ray tube.

Abstract: A filming solution contains a copolymerized emulsion having more than 70 wt % of butyl methacrylate and more than one species of monomer, and more than one species of additive. Preferably, the monomer is selected from the group consisting of acrylic acid derivative, methacrylic acid derivative, styrene, acrylamide, and acrylonitrile.

Abstract: A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.

Abstract: A process for preparing a black matrix comprising the steps of producing a developed substrate by coating, drying, exposing and developing a photoresist on the inside of a substrate, producing a dried substrate by drying the developed substrate several times, coating a dye on the dried substrate and then drying the board, coating graphite on the dried substrate, and etching the graphite-coated substrate. This method makes it possible to perfectly etch the black matrix dot and increase volatility in fluorescent coating.