Patents by Inventor Shahedul Hoque

Shahedul Hoque has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240021404
    Abstract: Systems and methods of imaging a sample using a tilted charged-particle beam. The apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged-particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.
    Type: Application
    Filed: November 17, 2021
    Publication date: January 18, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Weiming REN, Xuedong LIU, Shahedul HOQUE, Xiaoyu JI, Hermanus Adrianus DILLEN
  • Patent number: 11798780
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Grant
    Filed: December 28, 2021
    Date of Patent: October 24, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
  • Patent number: 11749497
    Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: September 5, 2023
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
  • Patent number: 11694873
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Grant
    Filed: October 10, 2022
    Date of Patent: July 4, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
  • Publication number: 20230178328
    Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.
    Type: Application
    Filed: March 18, 2021
    Publication date: June 8, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: Yongxin WANG, Zhonghua DONG, Xiaoyu JI, Shahedul HOQUE, Weiming REN, Xuedong LIU, Guofan YE, Kuo-Chin CHIEN
  • Publication number: 20230030651
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Application
    Filed: October 10, 2022
    Publication date: February 2, 2023
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
  • Patent number: 11515120
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: November 29, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
  • Publication number: 20220122804
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Application
    Filed: December 28, 2021
    Publication date: April 21, 2022
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
  • Patent number: 11239052
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: February 1, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
  • Publication number: 20210375583
    Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.
    Type: Application
    Filed: August 5, 2021
    Publication date: December 2, 2021
    Inventors: Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA, Makoto SUZUKI
  • Publication number: 20210319977
    Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
    Type: Application
    Filed: April 8, 2021
    Publication date: October 14, 2021
    Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
  • Patent number: 11139144
    Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: October 5, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
  • Publication number: 20210183614
    Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.
    Type: Application
    Filed: September 21, 2018
    Publication date: June 17, 2021
    Applicant: HITACHI HIGH-TECH CORPORATION
    Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
  • Patent number: 10984981
    Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: April 20, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hideki Itai, Kumiko Shimizu, Wataru Mori, Hajime Kawano, Shahedul Hoque
  • Patent number: 10984979
    Abstract: The disclosure provides a charged particle detector including a scintillator that emits light with stable intensity and obtains high light emission intensity regardless of an energy of an incident electron. The disclosure provides the charged particle detector including: a first light-emitting part (21) in which a layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and a layer containing GaN are alternately laminated; a second light-emitting part (23) in which the layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and the layer containing GaN are alternately laminated; and a non-light-emitting part (22) that is interposed between the first light-emitting part (21) and the second light-emitting part (23) (see FIG. 2).
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: April 20, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Shin Imamura, Takashi Ohshima, Tomonobu Tsuchiya, Hajime Kawano, Shahedul Hoque, Shunsuke Mizutani, Makoto Suzuki
  • Patent number: 10872745
    Abstract: A charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a signal detection unit in which a detection signal from the detection unit is input through a wiring. The signal detection unit comprises: a separation unit for separating into a rising signal and a falling signal the detection signal from the detection unit; a falling signal processing unit for at least eliminating ringing in the falling signal; and a combination unit generating and delivering a combined signal produced by combining the rising signal, which has been separated by the separation unit, with the falling signal wherefrom the ringing has been eliminated by the falling signal processing unit.
    Type: Grant
    Filed: March 27, 2017
    Date of Patent: December 22, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akio Yamamoto, Kazuki Ikeda, Wen Li, Hiroyuki Takahashi, Shahedul Hoque, Shunsuke Mizutani
  • Publication number: 20200312615
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Application
    Filed: June 12, 2020
    Publication date: October 1, 2020
    Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
  • Patent number: 10755890
    Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: August 25, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shinya Ueno, Hiroshi Nishihama, Shaungqi Dong, Shahedul Hoque, Susumu Koyama
  • Patent number: 10720306
    Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.
    Type: Grant
    Filed: February 14, 2019
    Date of Patent: July 21, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
  • Publication number: 20200203120
    Abstract: A charged particle beam device includes a scintillator and a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.
    Type: Application
    Filed: January 24, 2020
    Publication date: June 25, 2020
    Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Hajime KAWANO, Shahedul HOQUE