Patents by Inventor Shahedul Hoque
Shahedul Hoque has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240021404Abstract: Systems and methods of imaging a sample using a tilted charged-particle beam. The apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged-particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.Type: ApplicationFiled: November 17, 2021Publication date: January 18, 2024Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Xuedong LIU, Shahedul HOQUE, Xiaoyu JI, Hermanus Adrianus DILLEN
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Patent number: 11798780Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: December 28, 2021Date of Patent: October 24, 2023Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 11749497Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.Type: GrantFiled: August 5, 2021Date of Patent: September 5, 2023Assignee: Hitachi High-Tech CorporationInventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
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Patent number: 11694873Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.Type: GrantFiled: October 10, 2022Date of Patent: July 4, 2023Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
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Publication number: 20230178328Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.Type: ApplicationFiled: March 18, 2021Publication date: June 8, 2023Applicant: ASML Netherlands B.V.Inventors: Yongxin WANG, Zhonghua DONG, Xiaoyu JI, Shahedul HOQUE, Weiming REN, Xuedong LIU, Guofan YE, Kuo-Chin CHIEN
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Publication number: 20230030651Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.Type: ApplicationFiled: October 10, 2022Publication date: February 2, 2023Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
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Patent number: 11515120Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.Type: GrantFiled: September 21, 2018Date of Patent: November 29, 2022Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Yoshifumi Sekiguchi, Shin Imamura, Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda
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Publication number: 20220122804Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 11239052Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: June 12, 2020Date of Patent: February 1, 2022Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Publication number: 20210375583Abstract: A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.Type: ApplicationFiled: August 5, 2021Publication date: December 2, 2021Inventors: Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA, Makoto SUZUKI
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Publication number: 20210319977Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.Type: ApplicationFiled: April 8, 2021Publication date: October 14, 2021Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
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Patent number: 11139144Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample.Type: GrantFiled: March 24, 2017Date of Patent: October 5, 2021Assignee: Hitachi High-Tech CorporationInventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
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Publication number: 20210183614Abstract: A charged particle beam apparatus using a light guide that improves light utilization efficiency includes a detector including a scintillator for emitting light when a charged particle is incident, a light receiving element, and a light guide for guiding the light from the scintillator to the light receiving element. The light guide includes: an incident surface that faces a light emitting surface of the scintillator and to which the light emitted by the scintillator is incident; an emitting surface that is configured to emit light; and a reflecting surface that is inclined with respect to the incident surface so that the light from the incident surface is reflected toward the emitting surface. The emitting surface is smaller than the incident surface. A slope surface is provided between the incident surface and the emitting surface, faces the reflecting surface, and is inclined with respect to the incident surface.Type: ApplicationFiled: September 21, 2018Publication date: June 17, 2021Applicant: HITACHI HIGH-TECH CORPORATIONInventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Shunsuke MIZUTANI, Shahedul HOQUE, Uki IKEDA
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Patent number: 10984979Abstract: The disclosure provides a charged particle detector including a scintillator that emits light with stable intensity and obtains high light emission intensity regardless of an energy of an incident electron. The disclosure provides the charged particle detector including: a first light-emitting part (21) in which a layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and a layer containing GaN are alternately laminated; a second light-emitting part (23) in which the layer containing Ga1-x-yAlxInyN (where 0?x<1, 0?y<1) and the layer containing GaN are alternately laminated; and a non-light-emitting part (22) that is interposed between the first light-emitting part (21) and the second light-emitting part (23) (see FIG. 2).Type: GrantFiled: January 25, 2018Date of Patent: April 20, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Shin Imamura, Takashi Ohshima, Tomonobu Tsuchiya, Hajime Kawano, Shahedul Hoque, Shunsuke Mizutani, Makoto Suzuki
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Patent number: 10984981Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.Type: GrantFiled: August 31, 2018Date of Patent: April 20, 2021Assignee: Hitachi High-Tech CorporationInventors: Hideki Itai, Kumiko Shimizu, Wataru Mori, Hajime Kawano, Shahedul Hoque
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Patent number: 10872745Abstract: A charged-particle beam system comprises: a charged-particle beam device containing a detection unit for detecting electrons generated by irradiating a sample with a charged-particle beam released from a charged particle source; and a signal detection unit in which a detection signal from the detection unit is input through a wiring. The signal detection unit comprises: a separation unit for separating into a rising signal and a falling signal the detection signal from the detection unit; a falling signal processing unit for at least eliminating ringing in the falling signal; and a combination unit generating and delivering a combined signal produced by combining the rising signal, which has been separated by the separation unit, with the falling signal wherefrom the ringing has been eliminated by the falling signal processing unit.Type: GrantFiled: March 27, 2017Date of Patent: December 22, 2020Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Akio Yamamoto, Kazuki Ikeda, Wen Li, Hiroyuki Takahashi, Shahedul Hoque, Shunsuke Mizutani
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Publication number: 20200312615Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: June 12, 2020Publication date: October 1, 2020Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Patent number: 10755890Abstract: An object of the invention is to provide a charged particle beam apparatus capable of achieving both acquisition of an image having high resolution of an inspection target pattern and suppression of a beam irradiation amount when a specific pattern is an inspection target from a highly integrated pattern group.Type: GrantFiled: March 29, 2018Date of Patent: August 25, 2020Assignee: Hitachi High-Tech CorporationInventors: Shinya Ueno, Hiroshi Nishihama, Shaungqi Dong, Shahedul Hoque, Susumu Koyama
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Patent number: 10720306Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: February 14, 2019Date of Patent: July 21, 2020Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Publication number: 20200203120Abstract: A charged particle beam device includes a scintillator and a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.Type: ApplicationFiled: January 24, 2020Publication date: June 25, 2020Inventors: Yoshifumi SEKIGUCHI, Shin IMAMURA, Hajime KAWANO, Shahedul HOQUE