Patents by Inventor Shepard D. Johnson

Shepard D. Johnson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7563695
    Abstract: A method, system and scan lens for use therein are provided for high-speed, laser-based, precise laser trimming at least one electrical element along a trim path. The method includes generating a pulsed laser output with a laser, the output having one or more laser pulses at a repetition rate. A fast rise/fall time, pulse-shaped q-switched laser or an ultra-fast laser may be used. Beam shaping optics may be used to generate a flat-top beam profile. Each laser pulse has a pulse energy, a laser wavelength within a range of laser wavelengths, and a pulse duration. The wavelength is short enough to produce desired short-wavelength benefits of small spot size, tight tolerance, high absorption and reduced or eliminated heat-affected zone (HAZ) along the trim path, but not so short so as to cause microcracking. In this way, resistance drift after the trimming process is reduced.
    Type: Grant
    Filed: January 25, 2007
    Date of Patent: July 21, 2009
    Assignee: GSI Group Corporation
    Inventors: Bo Gu, Jonathan S. Ehrmann, Joseph V. Lento, Bruce L. Couch, Yun Fee Chu, Shepard D. Johnson
  • Publication number: 20090095722
    Abstract: The present invention relates to the field of laser processing methods and systems, and specifically, to laser processing methods and systems for laser processing multi-material devices. Systems and methods may utilize high speed deflectors to improve processing energy window and/or improve processing speed. In some embodiments, a deflector is used for non-orthogonal scanning of beam spots. In some embodiment, a deflector is used to implement non-synchronous processing of target structures.
    Type: Application
    Filed: September 18, 2008
    Publication date: April 16, 2009
    Applicant: GSI GROUP CORPORATION
    Inventors: Jonathan S. Ehrmann, Joseph J. Griffiths, James J. Cordingley, Donald J. Svetkoff, Shepard D. Johnson, Michael Plotkin
  • Publication number: 20080284837
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Application
    Filed: July 1, 2008
    Publication date: November 20, 2008
    Applicant: GSI Group Corporation
    Inventors: James J. Cordingley, Jonathan S. Ehrmann, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 7407861
    Abstract: A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. The number of resistance measurements are limited by using non-measurement cuts, using non-sequential collinear cutting, using spot fan-out parallel cutting, and using a retrograde scanning technique for faster collinear cuts. Non-sequential cutting is also used to manage thermal effects and calibrated cuts are used for improved accuracy. Test voltage is controlled to avoid resistor damage.
    Type: Grant
    Filed: May 18, 2005
    Date of Patent: August 5, 2008
    Assignee: GSI Group Corporation
    Inventors: Bruce L. Couch, Jonathan S. Ehrmann, Yun Fee Chu, Joseph V. Lento, Shepard D. Johnson
  • Patent number: 7394476
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: July 1, 2008
    Assignee: GSI Group Corporation
    Inventors: James J. Cordingley, Jonathan S. Ehrmann, Joseph J. Griffiths, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 7382389
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Grant
    Filed: November 7, 2006
    Date of Patent: June 3, 2008
    Assignee: GSI Lumonics Corporation
    Inventors: James J. Cordingley, Jonathan S. Ehrmann, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 7358157
    Abstract: A method, system and scan lens system are provided for high-speed, laser-based, precise laser trimming at least one electrical element. The method includes generating a pulsed laser output having one or more laser pulses at a repetition rate. Each laser pulse has a pulse energy, a laser wavelength within a range of laser wavelengths, and a pulse duration. The method further includes selectively irradiating the at least one electrical element with the one or more laser pulses focused into at least one spot having a non-uniform intensity profile along a direction and a spot diameter as small as about 6 microns to about 15 microns so as to cause the one or more laser pulses to selectively remove material from the at least one element and laser trim the at least one element while avoiding substantial microcracking within the at least one element.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: April 15, 2008
    Assignee: GSI Group Corporation
    Inventors: Bo Gu, Joseph V. Lento, Jonathan S. Ehrmann, Bruce L. Couch, Yun Fee Chu, Shepard D. Johnson
  • Publication number: 20080029491
    Abstract: A method is disclosed for on-the-fly processing at least one structure of a group of structures with a pulsed laser output. The method includes the steps of relatively positioning the group of structures and the pulsed laser output axis with non-constant velocity, and applying the pulsed laser output to the at least one structure of the group of structures during the step of relatively positioning the group of structures and the pulsed laser output axis with non-constant velocity.
    Type: Application
    Filed: September 15, 2006
    Publication date: February 7, 2008
    Applicant: GSI Group Corporation
    Inventors: Shepard D. Johnson, Bo Gu
  • Patent number: 6951995
    Abstract: A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. The number of resistance measurements are limited by using non-measurement cuts, using non-sequential collinear cutting, using spot fan-out parallel cutting, and using a retrograde scanning technique for faster collinear cuts. Non-sequential cutting is also used to manage thermal effects and calibrated cuts are used for improved accuracy. Test voltage is controlled to avoid resistor damage.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: October 4, 2005
    Assignee: GSI Lumonics Corp.
    Inventors: Bruce L. Couch, Jonathan S. Ehrmann, Yun Fee Chu, Joseph V. Lento, Shepard D. Johnson
  • Publication number: 20040134894
    Abstract: A laser-based system for processing target material within a microscopic region without causing undesirable changes in electrical or physical characteristics of at least one material surrounding the target material, the system includes a seed laser, an optical amplifier, and a beam delivery system. The seed laser for generating a sequence of laser pulses having a first pre-determined wavelength. The optical amplifier for amplifying at least a portion of the sequence of pulses to obtain an amplified sequence of output pulses. The beam delivery system for delivering and focusing at least one pulse of the amplified sequence of pulses onto the target material. The at least one output pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond. The pulse duration being within a thermal processing range.
    Type: Application
    Filed: October 10, 2003
    Publication date: July 15, 2004
    Inventors: Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
  • Publication number: 20040134896
    Abstract: A laser-based method of removing a target link structure of a circuit fabricated on a substrate includes generating a pulsed laser output at a pre-determined wavelength less than an absorption edge of the substrate. The laser output includes at least one pulse having a pulse duration in the range of about 10 picoseconds to less than 1 nanosecond, the pulse duration being within a thermal laser processing range. The method also includes delivering and focusing the laser output onto the target link structure. The focused laser output has sufficient power density at a location within the target structure to reduce the reflectivity of the target structure and efficiently couple the focused laser output into the target structure to remove the link without damaging the substrate.
    Type: Application
    Filed: October 10, 2003
    Publication date: July 15, 2004
    Inventors: Bo Gu, Donald V. Smart, James J. Cordingley, Joohan Lee, Donald J. Svetkoff, Shepard D. Johnson, Jonathan S. Ehrmann
  • Publication number: 20040009618
    Abstract: A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. The number of resistance measurements are limited by using non-measurement cuts, using non-sequential collinear cutting, using spot fan-out parallel cutting, and using a retrograde scanning technique for faster collinear cuts. Non-sequential cutting is also used to manage thermal effects and calibrated cuts are used for improved accuracy. Test voltage is controlled to avoid resistor damage.
    Type: Application
    Filed: March 26, 2003
    Publication date: January 15, 2004
    Inventors: Bruce L. Couch, Jonathan S. Ehrmann, Yun Fee Chu, Joseph V. Lento, Shepard D. Johnson
  • Publication number: 20020167581
    Abstract: A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.
    Type: Application
    Filed: March 27, 2002
    Publication date: November 14, 2002
    Inventors: James J. Cordingley, Jonathan S. Ehrmann, David M. Filgas, Shepard D. Johnson, Joohan Lee, Donald V. Smart, Donald J. Svetkoff
  • Patent number: 5991004
    Abstract: A focus shift sensor includes a light source which directs light through a first grating to form a pattern of light. The pattern is directed through the lens which images the pattern at a second grating. The two gratings have different periods such that the second grating generates a pattern of Moire fringes which are projected onto a CCD array. The second grating is preferably tilted with respect to the plane of the image of the pattern from the first grating such that only a portion of the second grating is within the range of focus of the lens. As a result, a pattern of shortened Moire fringes is produced. As the range of focus shifts along the second grating, the Moire fringes move along the CCD array. The movement of the fringes is tracked and the system is adjusted to maintain the location of the focal plane of the lens at a desired location.
    Type: Grant
    Filed: April 3, 1996
    Date of Patent: November 23, 1999
    Assignee: MRS Technology, Inc.
    Inventors: John D. Wallace, Shepard D. Johnson
  • Patent number: 5483345
    Abstract: A system for aligning substrates when preparing flat panel displays by lithography. A spherical reflector (imaging mirror) is used to focus a small geometric object, such as a cross, etched at the center of the reflector. The cross is projected toward a beam splitter and is then reflected onto the mirror which, in turn, images it on the surface of the substrate being used in the lithographic process. This optical system, which has a numerical aperture of about 0.05 radians, provides maximum depth of field with essentially no aberrations, and produces a relatively large probe image on a large alignment mark.The surface of the substrate carries a grid of stepped patterns as an alignment mark. The steps diffract the light received, and the diffracted light passes through a lens system to a sensor associated with the lens system. The amount of light diffracted is dependent upon where the image strikes the steps in the grid.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: January 9, 1996
    Assignee: MRS Technology, Inc.
    Inventors: J. Casey Donaher, David S. Holbrook, Shepard D. Johnson, James A. Sozanski
  • Patent number: 4586837
    Abstract: A printer includes a print mechanism defining a print region and a removable ink ribbon cartridge. The cartridge includes a body and two arms which are spaced apart and pivotally attached to the body with an ink ribbon across the gap between the ends of the arms in the print region. The printer includes an arm moving mechanism for moving the arms about their pivots on the body of the cartridge so that the portion of the ribbon in the print region can be moved laterally.One of the arms is formed with a first indicator which cooperates with a sensing system on the printer to indicate the lateral position of the ribbon in the print region. The sensing system can also determine whether the cartridge is installed correctly in the printer. A second indicator is located on the arm and the sensing system can detect the position of this second indicator to indicate the type of ribbon in the cartridge.
    Type: Grant
    Filed: August 27, 1984
    Date of Patent: May 6, 1986
    Assignee: International Business Machines Corp.
    Inventors: Shepard D. Johnson, Andrew French, Allan E. Ellis, Dennis R. Hedrick, Charles D. Helfenberger