Patents by Inventor Shi-Yong Yi

Shi-Yong Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • THINNER COMPOSITION AND METHOD OF REMOVING PHOTORESIST USING THE SAME
    Publication number: 20080214422
    Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
    Type: Application
    Filed: May 12, 2008
    Publication date: September 4, 2008
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seung-Hyun AHN, Eun-Mi BAE, Baik-Soon CHOI, Sang-Mun CHON, Dae-Joung KIM, Kwang-sub YOON, Sang-Kyu PARK, Jae-Ho KIM, Shi-Yong YI, Kyoung-Mi KIM, Yeu-Young YOUN
  • Thinner composition and method of removing photoresist using the same
    Patent number: 7387988
    Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: June 17, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-Hyun Ahn, Eun-Mi Bae, Baik-Soon Choi, Sang-Mun Chon, Dae-Joung Kim, Kwang-Sub Yoon, Sang-Kyu Park, Jae-Ho Kim, Shi-Yong Yi, Kyoung-Mi Kim, Yeu-Young Youn
  • Silazane compound amd methods for using the same
    Patent number: 7070910
    Abstract: An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.
    Type: Grant
    Filed: January 12, 2005
    Date of Patent: July 4, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoung-Mi Kim, Yeu-Young Youn, Jae-Ho Kim, Young-Ho Kim, Shi-Yong Yi
  • Polymeric tetrahedral carbon films, methods of forming the same and methods of forming fine patterns using the same
    Publication number: 20060115772
    Abstract: The present invention provides polymeric films including polymers having an sp3 carbon main frame including a tetrahedral center atom. Methods of forming the same, hard marks including the same and methods of forming fine patterns using the same are also provided.
    Type: Application
    Filed: November 18, 2005
    Publication date: June 1, 2006
    Inventors: Jung-Hwan Hah, Yool Kang, Man-Hyoung Ryoo, Shi-Yong Yi, Sang-Gyun Woo
  • Thinner composition and method of removing photoresist using the same
    Publication number: 20050176607
    Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.
    Type: Application
    Filed: February 4, 2005
    Publication date: August 11, 2005
    Inventors: Seung-Hyun Ahn, Eun-Mi Bae, Baik-Soon Choi, Sang-Mun Chon, Dae-Joung Kim, Kwang-Sub Yoon, Sang-Kyu Park, Jae-Ho Kim, Shi-Yong Yi, Kyoung-Mi Kim, Yeu-Young Youn
  • Silazane compound and methods for using the same
    Publication number: 20050164126
    Abstract: An adhesive compound for use with a photoresist, the compound represented in accordance with the following chemical formula, A method for forming a photoresist pattern using the adhesive compound is also disclosed.
    Type: Application
    Filed: January 12, 2005
    Publication date: July 28, 2005
    Inventors: Kyoung-Mi Kim, Yeu-Young Youn, Jae-Ho Kim, Young-Ho Kim, Shi-Yong Yi