Patents by Inventor Shigeaki Kato

Shigeaki Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10398836
    Abstract: A clamping device comprising: a one end portion having a locked part at a tip and an other end portion having a locking part capable of locking the locked part, wherein the one end portion or the other end portion has an interfering part, and when the one end portion is further pressed with the locked part being locked by the locking part, the interfering part interferes with an appropriate part and prevents further movement of the locked part.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: September 3, 2019
    Assignee: Nikkiso Company Limited
    Inventors: Ryo Kato, Shigeaki Funamura
  • Patent number: 10322278
    Abstract: A clamping device is provided in which an other end portion is prevented from being excessively displaced in the transition from a clamped state to an unclamped state. A clamping device includes a one end portion having a locked part at a tip, an other end portion having a locking part capable of locking the locked part, a middle portion continuous with the one end portion and with the other end portion, and an insertion hole (H1, H2) allowing a flexible tube T to be inserted therethrough. An unclamped state is established when the locked part locked is unlocked by bending the other end portion such that the other end portion is displaced from the one end portion. The clamping device is configured to clamp the flexible tube T in a clamped state where a first projection and a second projection are positioned close to each other and to intercept a flow of a fluid at a clamped position.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: June 18, 2019
    Assignee: Nikkiso Company Limited
    Inventors: Ryo Kato, Shigeaki Funamura
  • Patent number: 8767212
    Abstract: In at least one embodiment, a flow cytometer includes a flow cell defining a sheath flow encompassing a dyed biological particle, a first optical source irradiating first light onto the flow cell, a second optical source irradiating second light onto the flow cell downstream where the first light is irradiated, a first optical detector detecting scattered light or fluorescence from the biological particle to output a first electrical signal corresponding thereto, a plurality of second optical detectors arranged along the flow cell, each of the second optical detectors detecting fluorescence from the biological particle to output a second electrical signal corresponding thereto, and a signal processor summing the second electrical signals output from the plurality of the second optical detectors in a plurality of time windows estimated based upon when the first optical detector detects the scattered light or the fluorescence, thereby to increase the second electrical signals of the fluorescence from the biolog
    Type: Grant
    Filed: October 4, 2010
    Date of Patent: July 1, 2014
    Assignee: Bay Bioscience Kabushiki Kaisha
    Inventors: Masahiko Kanda, Shigeaki Kato, Sari Fujiyama, Kei Izumikawa, Toshihiro Chikanishi
  • Patent number: 8609389
    Abstract: The present invention provides an improved type protease which comprises an amino acid sequence that is at least 75% identical to SEQ ID NO:3, said improved type protease has at least one mutation selected from the group consisting of: (A) replacement of glutamine corresponding to glutamine at position 265 in SEQ ID NO: 3 with an acidic amino acid; and (B) replacement of glutamine at position 266 in SEQ ID NO: 3 with an acidic amino acid, and wherein said improved type protease has milk-clotting activity.
    Type: Grant
    Filed: March 19, 2010
    Date of Patent: December 17, 2013
    Assignee: Meito Sangyo Co., Ltd.
    Inventors: Kazunori Harada, Hiroyuki Kobayashi, Taro Suga, Hiroyuki Yamaguchi, Akira Tsunoda, Shigeaki Kato
  • Patent number: 8475623
    Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.
    Type: Grant
    Filed: August 2, 2012
    Date of Patent: July 2, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
  • Patent number: 8455413
    Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR1R2 or the like, provided that W and Z are not both hydrogen atoms. R1 and R2 each represents a hydrogen atom, a hydrocarbyl or a hydrocarbylcarbonyl or the like, and n and m each represents an integer of 0 to 5.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: June 4, 2013
    Assignee: KH Neochem Co., Ltd.
    Inventors: Satoshi Hiyoshi, Shingo Nakayama, Nobuhito Amemiya, Shigeaki Kato, Toshihiro Inayama, Yukihiro Isogai, Ichiro Minami, Shigeyuki Mori
  • Publication number: 20120292290
    Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.
    Type: Application
    Filed: August 2, 2012
    Publication date: November 22, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
  • Patent number: 8257601
    Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: September 4, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
  • Patent number: 8124539
    Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.
    Type: Grant
    Filed: August 4, 2010
    Date of Patent: February 28, 2012
    Assignee: Tokyo Electron Limited
    Inventors: Shosuke Endoh, Noriyuki Iwabuchi, Shigeaki Kato, Tomoya Okubo, Jun Hirose, Koichi Nagakura, Chishio Koshimizu, Kazuki Denpoh
  • Publication number: 20120040436
    Abstract: The present invention provides an improved type protease which comprises an amino acid sequence that is at least 75% identical to SEQ ID NO:3, said improved type protease has at least one mutation selected from the group consisting of: (A) replacement of glutamine corresponding to glutamine at position 265 in SEQ ID NO: 3 with an acidic amino acid; and (B) replacement of glutamine at position 266 in SEQ ID NO: 3 with an acidic amino acid, and wherein said improved type protease has milk-clotting activity.
    Type: Application
    Filed: March 19, 2010
    Publication date: February 16, 2012
    Applicant: Meito Sangyo Co., Ltd.
    Inventors: Kazunori Harada, Hiroyuki Kobayashi, Taro Suga, Hiroyuki Yamaguchi, Akira Tsunoda, Shigeaki Kato
  • Patent number: 8030016
    Abstract: The present invention relates to a screening method for a compound and includes a step of detecting binding between a vitamin D receptor and CDP. A novel method enabling screening in vitro of a compound having strong bone forming action and low side effects, a compound participating in osteoblast differentiation and selected by the method of screening, a therapeutic agent containing the compound for diseases intervening in the increase in vitamin D-mediated transcriptional activity by a complex of a vitamin D receptor and CDP, and a kit for performing the screening method are provided.
    Type: Grant
    Filed: July 30, 2007
    Date of Patent: October 4, 2011
    Assignees: Teijin Pharma Limited, The University of Tokyo
    Inventors: Eiji Ochiai, Kazuyoshi Yamaoka, Ken-ichiro Takagi, Yu Tsushima, Shigeaki Kato, Hirochika Kitagawa, Ichiro Takada
  • Publication number: 20110176127
    Abstract: In at least one embodiment, a flow cytometer includes a flow cell defining a sheath flow encompassing a dyed biological particle, a first optical source irradiating first light onto the flow cell, a second optical source irradiating second light onto the flow cell downstream where the first light is irradiated, a first optical detector detecting scattered light or fluorescence from the biological particle to output a first electrical signal corresponding thereto, a plurality of second optical detectors arranged along the flow cell, each of the second optical detectors detecting fluorescence from the biological particle to output a second electrical signal corresponding thereto, and a signal processor summing the second electrical signals output from the plurality of the second optical detectors in a plurality of time windows estimated based upon when the first optical detector detects the scattered light or the fluorescence, thereby to increase the second electrical signals of the fluorescence from the biolog
    Type: Application
    Filed: October 4, 2010
    Publication date: July 21, 2011
    Inventors: Masahiko Kanda, Shigeaki Kato, Sari Fujiyama, Kei Izumikawa, Toshihiro Chikanishi
  • Publication number: 20110171830
    Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.
    Type: Application
    Filed: March 28, 2011
    Publication date: July 14, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: SEIICHI KAISE, NORIYUKI IWABUCHI, SHIGEAKI KATO, HIROSHI NAKAMURA, TAKESHI YOKOUCHI, MARIKO SHIBATA, AKIRA OBI
  • Publication number: 20110000883
    Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.
    Type: Application
    Filed: August 4, 2010
    Publication date: January 6, 2011
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shosuke Endoh, Noriyuki Iwabuchi, Shigeaki Kato, Tomoya Okubo, Jun Hirose, Koichi Nagakura, Chishio Koshimizu, Kazuki Denpoh
  • Publication number: 20100298183
    Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR1R2 or the like, provided that W and Z are not both hydrogen atoms. R1 and R2 each represents a hydrogen atom, a hydrocarbyl or a hydrocarbylcarbonyl or the like, and n and m each represents an integer of 0 to 5.
    Type: Application
    Filed: May 7, 2008
    Publication date: November 25, 2010
    Applicant: KYOWA HAKKO CHEMICAL CO., LTD.
    Inventors: Satoshi Hiyoshi, Shingo Nakayama, Nobuhito Amemiya, Shigeaki Kato, Toshihiro Inayama, Yukihiro Isogai, Ichiro Minami, Shigeyuki Mori
  • Patent number: 7555406
    Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: June 30, 2009
    Assignee: Tokyo Electron Limited
    Inventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
  • Patent number: 7386423
    Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: June 10, 2008
    Inventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
  • Publication number: 20060090703
    Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.
    Type: Application
    Filed: November 1, 2005
    Publication date: May 4, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
  • Patent number: 6954716
    Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).
    Type: Grant
    Filed: July 4, 2001
    Date of Patent: October 11, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
  • Publication number: 20050186617
    Abstract: A system in which a ligand is formed by the expression of a polypeptide that converts a ligand precursor into a ligand, and the ligand thus formed binds to a nuclear receptor to thereby induce the expression of a reporter gene located downstream of the target sequence is constructed. Searching a gene library using this system can isolate a gene encoding a polypeptide capable of converting a ligand precursor into a ligand. This system, which takes the advantage of the transcriptional regulatory function of a nuclear receptor, enables screening a ligand that binds to a nuclear receptor and to examine whether or not a test compound is a ligand that binds to the nuclear receptor, and also screening genes that encode polypeptides capable of converting an inactive form of a wide range of transcriptional regulatory factors into an active form.
    Type: Application
    Filed: March 24, 2005
    Publication date: August 25, 2005
    Inventors: Shigeaki Kato, Ken-Ichi Takeyama, Sachiko Kitanaka