Patents by Inventor Shigeaki Kato
Shigeaki Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8767212Abstract: In at least one embodiment, a flow cytometer includes a flow cell defining a sheath flow encompassing a dyed biological particle, a first optical source irradiating first light onto the flow cell, a second optical source irradiating second light onto the flow cell downstream where the first light is irradiated, a first optical detector detecting scattered light or fluorescence from the biological particle to output a first electrical signal corresponding thereto, a plurality of second optical detectors arranged along the flow cell, each of the second optical detectors detecting fluorescence from the biological particle to output a second electrical signal corresponding thereto, and a signal processor summing the second electrical signals output from the plurality of the second optical detectors in a plurality of time windows estimated based upon when the first optical detector detects the scattered light or the fluorescence, thereby to increase the second electrical signals of the fluorescence from the biologType: GrantFiled: October 4, 2010Date of Patent: July 1, 2014Assignee: Bay Bioscience Kabushiki KaishaInventors: Masahiko Kanda, Shigeaki Kato, Sari Fujiyama, Kei Izumikawa, Toshihiro Chikanishi
-
Patent number: 8609389Abstract: The present invention provides an improved type protease which comprises an amino acid sequence that is at least 75% identical to SEQ ID NO:3, said improved type protease has at least one mutation selected from the group consisting of: (A) replacement of glutamine corresponding to glutamine at position 265 in SEQ ID NO: 3 with an acidic amino acid; and (B) replacement of glutamine at position 266 in SEQ ID NO: 3 with an acidic amino acid, and wherein said improved type protease has milk-clotting activity.Type: GrantFiled: March 19, 2010Date of Patent: December 17, 2013Assignee: Meito Sangyo Co., Ltd.Inventors: Kazunori Harada, Hiroyuki Kobayashi, Taro Suga, Hiroyuki Yamaguchi, Akira Tsunoda, Shigeaki Kato
-
Patent number: 8475623Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.Type: GrantFiled: August 2, 2012Date of Patent: July 2, 2013Assignee: Tokyo Electron LimitedInventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
-
Patent number: 8455413Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR1R2 or the like, provided that W and Z are not both hydrogen atoms. R1 and R2 each represents a hydrogen atom, a hydrocarbyl or a hydrocarbylcarbonyl or the like, and n and m each represents an integer of 0 to 5.Type: GrantFiled: May 7, 2008Date of Patent: June 4, 2013Assignee: KH Neochem Co., Ltd.Inventors: Satoshi Hiyoshi, Shingo Nakayama, Nobuhito Amemiya, Shigeaki Kato, Toshihiro Inayama, Yukihiro Isogai, Ichiro Minami, Shigeyuki Mori
-
Publication number: 20120292290Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.Type: ApplicationFiled: August 2, 2012Publication date: November 22, 2012Applicant: TOKYO ELECTRON LIMITEDInventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
-
Patent number: 8257601Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.Type: GrantFiled: March 28, 2011Date of Patent: September 4, 2012Assignee: Tokyo Electron LimitedInventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
-
Patent number: 8124539Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.Type: GrantFiled: August 4, 2010Date of Patent: February 28, 2012Assignee: Tokyo Electron LimitedInventors: Shosuke Endoh, Noriyuki Iwabuchi, Shigeaki Kato, Tomoya Okubo, Jun Hirose, Koichi Nagakura, Chishio Koshimizu, Kazuki Denpoh
-
Publication number: 20120040436Abstract: The present invention provides an improved type protease which comprises an amino acid sequence that is at least 75% identical to SEQ ID NO:3, said improved type protease has at least one mutation selected from the group consisting of: (A) replacement of glutamine corresponding to glutamine at position 265 in SEQ ID NO: 3 with an acidic amino acid; and (B) replacement of glutamine at position 266 in SEQ ID NO: 3 with an acidic amino acid, and wherein said improved type protease has milk-clotting activity.Type: ApplicationFiled: March 19, 2010Publication date: February 16, 2012Applicant: Meito Sangyo Co., Ltd.Inventors: Kazunori Harada, Hiroyuki Kobayashi, Taro Suga, Hiroyuki Yamaguchi, Akira Tsunoda, Shigeaki Kato
-
Patent number: 8030016Abstract: The present invention relates to a screening method for a compound and includes a step of detecting binding between a vitamin D receptor and CDP. A novel method enabling screening in vitro of a compound having strong bone forming action and low side effects, a compound participating in osteoblast differentiation and selected by the method of screening, a therapeutic agent containing the compound for diseases intervening in the increase in vitamin D-mediated transcriptional activity by a complex of a vitamin D receptor and CDP, and a kit for performing the screening method are provided.Type: GrantFiled: July 30, 2007Date of Patent: October 4, 2011Assignees: Teijin Pharma Limited, The University of TokyoInventors: Eiji Ochiai, Kazuyoshi Yamaoka, Ken-ichiro Takagi, Yu Tsushima, Shigeaki Kato, Hirochika Kitagawa, Ichiro Takada
-
Publication number: 20110176127Abstract: In at least one embodiment, a flow cytometer includes a flow cell defining a sheath flow encompassing a dyed biological particle, a first optical source irradiating first light onto the flow cell, a second optical source irradiating second light onto the flow cell downstream where the first light is irradiated, a first optical detector detecting scattered light or fluorescence from the biological particle to output a first electrical signal corresponding thereto, a plurality of second optical detectors arranged along the flow cell, each of the second optical detectors detecting fluorescence from the biological particle to output a second electrical signal corresponding thereto, and a signal processor summing the second electrical signals output from the plurality of the second optical detectors in a plurality of time windows estimated based upon when the first optical detector detects the scattered light or the fluorescence, thereby to increase the second electrical signals of the fluorescence from the biologType: ApplicationFiled: October 4, 2010Publication date: July 21, 2011Inventors: Masahiko Kanda, Shigeaki Kato, Sari Fujiyama, Kei Izumikawa, Toshihiro Chikanishi
-
Publication number: 20110171830Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.Type: ApplicationFiled: March 28, 2011Publication date: July 14, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: SEIICHI KAISE, NORIYUKI IWABUCHI, SHIGEAKI KATO, HIROSHI NAKAMURA, TAKESHI YOKOUCHI, MARIKO SHIBATA, AKIRA OBI
-
Publication number: 20110000883Abstract: A plasma processing apparatus having a focus ring, enables the efficiency of cooling of the focus ring to be greatly improved, while preventing an increase in cost thereof. The plasma processing apparatus is comprised of a susceptor which has an electrostatic chuck and the focus ring. A wafer W to be subjected to plasma processing is mounted on the electrostatic chuck. The focus ring has a dielectric material portion and a conductive material portion. The dielectric material portion forms a contact portion disposed in contact with the electrostatic chuck. The conductive material portion faces the electrostatic chuck with the dielectric material portion therebetween.Type: ApplicationFiled: August 4, 2010Publication date: January 6, 2011Applicant: TOKYO ELECTRON LIMITEDInventors: Shosuke Endoh, Noriyuki Iwabuchi, Shigeaki Kato, Tomoya Okubo, Jun Hirose, Koichi Nagakura, Chishio Koshimizu, Kazuki Denpoh
-
Publication number: 20100298183Abstract: An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR1R2 or the like, provided that W and Z are not both hydrogen atoms. R1 and R2 each represents a hydrogen atom, a hydrocarbyl or a hydrocarbylcarbonyl or the like, and n and m each represents an integer of 0 to 5.Type: ApplicationFiled: May 7, 2008Publication date: November 25, 2010Applicant: KYOWA HAKKO CHEMICAL CO., LTD.Inventors: Satoshi Hiyoshi, Shingo Nakayama, Nobuhito Amemiya, Shigeaki Kato, Toshihiro Inayama, Yukihiro Isogai, Ichiro Minami, Shigeyuki Mori
-
Patent number: 7555406Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).Type: GrantFiled: November 12, 2004Date of Patent: June 30, 2009Assignee: Tokyo Electron LimitedInventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
-
Patent number: 7386423Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).Type: GrantFiled: November 12, 2004Date of Patent: June 10, 2008Inventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
-
Publication number: 20060090703Abstract: A substrate processing method is used for a substrate processing system having a substrate processing device and a substrate transfer device. The substrate processing method includes a substrate transfer step of transferring a substrate and a substrate processing step of performing a predetermined process on the substrate. The substrate transfer step and the substrate processing step include a plurality of operations, and at least two operations among the plurality of the operations are performed simultaneously. Preferably, the substrate processing device includes an accommodating chamber, a mounting table placed in the accommodating chamber to be mounted thereon the substrate, and a heat transfer gas supply line for supplying a heat transfer gas to a space between the substrate mounted on the mounting table and the mounting table.Type: ApplicationFiled: November 1, 2005Publication date: May 4, 2006Applicant: TOKYO ELECTRON LIMITEDInventors: Seiichi Kaise, Noriyuki Iwabuchi, Shigeaki Kato, Hiroshi Nakamura, Takeshi Yokouchi, Mariko Shibata, Akira Obi
-
Patent number: 6954716Abstract: According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S110). If it is judged through the diagnosis performed in S110 that no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S130). If the processing has been completed, the processing apparatus is stopped (S140). If, on the other hand, it is judged through the diagnosis performed in S110 that an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S120). The processing apparatus is then stopped (S140).Type: GrantFiled: July 4, 2001Date of Patent: October 11, 2005Assignee: Tokyo Electron LimitedInventors: Hisato Tanaka, Akira Obi, Akira Iwami, Kazushi Tahara, Shigeaki Kato
-
Publication number: 20050186617Abstract: A system in which a ligand is formed by the expression of a polypeptide that converts a ligand precursor into a ligand, and the ligand thus formed binds to a nuclear receptor to thereby induce the expression of a reporter gene located downstream of the target sequence is constructed. Searching a gene library using this system can isolate a gene encoding a polypeptide capable of converting a ligand precursor into a ligand. This system, which takes the advantage of the transcriptional regulatory function of a nuclear receptor, enables screening a ligand that binds to a nuclear receptor and to examine whether or not a test compound is a ligand that binds to the nuclear receptor, and also screening genes that encode polypeptides capable of converting an inactive form of a wide range of transcriptional regulatory factors into an active form.Type: ApplicationFiled: March 24, 2005Publication date: August 25, 2005Inventors: Shigeaki Kato, Ken-Ichi Takeyama, Sachiko Kitanaka
-
Publication number: 20050158705Abstract: A system in which a ligand is formed by the expression of a polypeptide that converts a ligand precursor into a ligand, and the ligand thus formed binds to a nuclear receptor to thereby induce the expression of a reporter gene located downstream of the target sequence is constructed. Searching a gene library using this system can isolate a gene encoding a polypeptide capable of converting a ligand precursor into a ligand. This system, which takes the advantage of the transcriptional regulatory function of a nuclear receptor, enables screening a ligand that binds to a nuclear receptor and to examine whether or not a test compound is a ligand that binds to the nuclear receptor, and also screening genes that encode polypeptides capable of converting an inactive form of a wide range of transcriptional regulatory factors into an active form.Type: ApplicationFiled: January 5, 2005Publication date: July 21, 2005Inventors: Shigeaki Kato, Ken-Ichi Takeyama, Sachiko Kitanaka
-
Patent number: D1019768Type: GrantFiled: December 24, 2021Date of Patent: March 26, 2024Assignee: SEIKO EPSON CORPORATIONInventors: Shigeaki Isobe, Manabu Kawahara, Hideki Kato