Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that determines preprocessing to be performed on the sensor data, by selecting an analyzer according to the environment of the odor sensor 40, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.

Abstract: Provided is a purification material capable of highly efficiently removing contaminant components from water. A water purification material has a composition represented by a mixing ratio of zeolite, ferric hydroxide, activated carbon, titanium oxide, and magnesium hydroxide of 6 to 7:1 to 2:0.5 to 1:0.01 to 0.05:0.01 to 0.10 in terms of weight ratio.

Abstract: Provided is a purifying material capable of highly efficiently removing contaminant components from wastewater. A water purifying material having a composition of 30 to 40% total iron, 1 to 5% titanium, 0.1 to 1% magnesium, and 0.1 to 0.8% silica (silicon), and a method for manufacturing the water purifying material including: adding caustic soda to a solution containing 200 to 100 mg/L of bivalent iron, 20 to 100 mg/L of titanium ions, 5 to 50 mg/L of magnesium, and 3 to 30 mg/L of silica under conditions of 30 to 50° C. and pH 6.8 to 7.2 to carry out neutralization and reaction; separating and collecting an obtained solid at 100° C. or less; and drying the collected solid.

Abstract: To mitigate degradation in the accuracy of a prediction model by re-learning the prediction model with consideration given to the characteristics of a detection value of a sensor. This prediction model re-learning device comprises: a calculation unit that, on the basis of data related to smell detection by a sensor, calculates an index for determining whether or not to re-learn a prediction model for smell; and a re-learning unit that re-learns the prediction model in cases where the calculated index satisfies a predetermined condition.

Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that selects an analyzer, determines preprocessing to be performed on the sensor data, according to the selected analyzer, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data from the terminal apparatus, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.

Abstract: A terminal apparatus 20 includes a sensor data collection unit 21 that collects sensor data from an odor sensor 40 that outputs the sensor data in reaction to a plurality of types of odors, an analyzer acquisition unit 22 that, in the case where an analyzer capable of analyzing a designated odor analysis target is transmitted thereto from a server apparatus 10 that holds a plurality of analyzers for analyzing odor analysis targets by analyzing the sensor data, acquires the analyzer transmitted thereto, an analysis execution unit 23 that executes analysis processing of the designated odor analysis target, by applying the acquired analyzer to the collected sensor data, and an analysis result holding unit 24 that holds information indicating a result of the analysis processing.

Abstract: An odor detection apparatus 100 includes a first odor sensor 10 provided with a sensitive membrane, a second odor sensor 20 provided with an identical sensitive membrane, and a control device 30. The control device 30 includes a sensor data acquisition unit 31 that acquires first sensor data output by the first odor sensor 10 and second sensor data output by the second odor sensor, a calculation processing unit 32 that calculates a difference between the first sensor data and the second sensor data, and a determination unit 33 that determines, when the sensitive membrane of one of the odor sensors is in a steady state, whether the sensitive membrane of the other odor sensor is in a steady state, based on the difference.

Abstract: A terminal apparatus 20 includes a sensor data collection unit 21 that collects sensor data from an odor sensor 40 that outputs the sensor data in reaction to a plurality of types of odors, an analyzer acquisition unit 22 that, in the case where an analyzer capable of analyzing a designated odor analysis target is transmitted thereto from a server apparatus 10 that holds a plurality of analyzers for analyzing odor analysis targets by analyzing the sensor data, acquires the analyzer transmitted thereto, an analysis execution unit 23 that executes analysis processing of the designated odor analysis target, by applying the acquired analyzer to the collected sensor data, and an analysis result holding unit 24 that holds information indicating a result of the analysis processing.

Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that selects an analyzer, determines preprocessing to be performed on the sensor data, according to the selected analyzer, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data from the terminal apparatus, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.

Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that determines preprocessing to be performed on the sensor data, by selecting an analyzer according to the environment of the odor sensor 40, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.

Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.

Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.

Abstract: There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).

Abstract: A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.

Abstract: Provided is a method for packing a cable having a static friction coefficient of 0.15 or more and 0.50 or less, a dynamic friction coefficient of 0.10 or more and 0.40 or less and a bending rigidity of 60 gf or more and 350 gf or less. The method includes the steps of: (1) winding the cable into a figure-of-eight shape to form a cylindrical cable bundle, (2) winding a wrapping film as a restraining member, which restrains the cable bundle, around an outer circumferential portion of the cable bundle, (3) winding a wrapping film as a closing member which closes openings on both ends of the cable bundle, and (4) housing the cable bundle being wound with the restraining member and the closing member in a housing container.

Abstract: Provided is a retreaded tire that uses cushion rubber for retread that is able to further improve the prevention of separation failure while effectively suppressing blowout within the cushion rubber layer. The retreaded tire includes cushion rubber for retread, a base tire, and precured tread rubber formed of at least one rubber layer, and is characterized by: the aforementioned cushion rubber for retreaded tires being formed from a rubber composition containing specific quantities of a highly reinforcing carbon black of at least HAF grade, and natural rubber and/or synthetic polyisoprene rubber; the 100% modulus (AM) of the rubber layer (A) that comprises the aforementioned cushion rubber for retread being at least 3.0 MPa and less than 6.0 MPa; and the outermost layer (B) of the aforementioned base tire and the innermost layer (C) of the aforementioned precured tread rubber being formed from a rubber composition containing specific quantities of natural rubber and/or synthetic polyisoprene rubber.

Abstract: There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately. (In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1).

Abstract: A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a forth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.

Abstract: There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A? is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).

Abstract: There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately. (In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1.