Patents by Inventor Shigeo Kimura

Shigeo Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210028434
    Abstract: A short-circuit prevention member has electrical insulation and is attachable to and detachable from at least one of the positive electrode connecting member and the negative electrode connecting member, and in a state in which the short-circuit prevention member is mounted on the positive electrode connecting member and/or the negative electrode connecting member, the short-circuit prevention member covers at least one end portion of the positive electrode connecting member and/or the negative electrode connecting member in an extending direction and the tab of the positive electrode and/or the tab of the negative electrode located closest to the end portion.
    Type: Application
    Filed: January 31, 2018
    Publication date: January 28, 2021
    Inventors: Shigeo AONE, Nobunaga TSUJII, Tetsuya KIMURA
  • Publication number: 20210018479
    Abstract: An odor detection apparatus 100 includes a first odor sensor 10 provided with a sensitive membrane, a second odor sensor 20 provided with an identical sensitive membrane, and a control device 30. The control device 30 includes a sensor data acquisition unit 31 that acquires first sensor data output by the first odor sensor 10 and second sensor data output by the second odor sensor, a calculation processing unit 32 that calculates a difference between the first sensor data and the second sensor data, and a determination unit 33 that determines, when the sensitive membrane of one of the odor sensors is in a steady state, whether the sensitive membrane of the other odor sensor is in a steady state, based on the difference.
    Type: Application
    Filed: February 22, 2019
    Publication date: January 21, 2021
    Applicant: NEC CORPORATION
    Inventors: Junko WATANABE, Riki ETO, Hidetaka HANE, Shigeo KIMURA, Shintarou TSUCHIYA
  • Publication number: 20200336543
    Abstract: A terminal apparatus 20 includes a sensor data collection unit 21 that collects sensor data from an odor sensor 40 that outputs the sensor data in reaction to a plurality of types of odors, an analyzer acquisition unit 22 that, in the case where an analyzer capable of analyzing a designated odor analysis target is transmitted thereto from a server apparatus 10 that holds a plurality of analyzers for analyzing odor analysis targets by analyzing the sensor data, acquires the analyzer transmitted thereto, an analysis execution unit 23 that executes analysis processing of the designated odor analysis target, by applying the acquired analyzer to the collected sensor data, and an analysis result holding unit 24 that holds information indicating a result of the analysis processing.
    Type: Application
    Filed: October 2, 2018
    Publication date: October 22, 2020
    Applicant: NEC CORPORATION
    Inventors: Junko WATANABE, Riki ETO, Hidetaka HANE, Shigeo KIMURA, Shintarou TSUCHIYA
  • Publication number: 20200322435
    Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that selects an analyzer, determines preprocessing to be performed on the sensor data, according to the selected analyzer, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data from the terminal apparatus, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.
    Type: Application
    Filed: October 2, 2018
    Publication date: October 8, 2020
    Applicant: NEC CORPORATION
    Inventors: Junko WATANABE, Riki ETO, Hidetaka HANE, Shigeo KIMURA, Shintarou TSUCHIYA
  • Publication number: 20200300798
    Abstract: A server apparatus 10 is communicably connected to a terminal apparatus 20 that collects sensor data from an odor sensor 40. The server apparatus 10 includes an analyzer holding unit 11 that holds a plurality of analyzers for analyzing specific odor analysis targets, based on sensor data, an analyzer management unit 12 that determines preprocessing to be performed on the sensor data, by selecting an analyzer according to the environment of the odor sensor 40, and causes the terminal apparatus 20 to execute the preprocessing, an analysis execution unit 13 that executes analysis processing of the designated odor analysis target, by applying the selected analyzer to the preprocessed sensor data, and an analysis result transmission unit 14 that transmits information indicating a result of the analysis processing to the terminal apparatus 20.
    Type: Application
    Filed: October 2, 2018
    Publication date: September 24, 2020
    Applicant: NEC CORPORATION
    Inventors: Junko WATANABE, Riki ETO, Hidetaka HANE, Shigeo KIMURA, Shintarou TSUCHIYA
  • Publication number: 20200119333
    Abstract: A disclosed film electrode includes an electrode base, and an active material layer formed on the electrode base, and a resin layer adhering to at least one of a peripheral portion of the active material layer and a surface of the active material layer in a direction extending along a plane of the electrode base.
    Type: Application
    Filed: March 5, 2018
    Publication date: April 16, 2020
    Inventors: Masahiro MASUZAWA, Toru USHIROGOCHI, Hideo YANAGITA, Yuu ZAMA, Aya YOSHIDA, Shigeo TAKEUCHI, Anna HIROWATARI, Okitoshi KIMURA, Kohji MATSUOKA, Keigo TAKAUJI, Miku OHKIMOTO
  • Patent number: 10437151
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: October 8, 2019
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto Ogata, Shigeo Kimura, Yuki Usui, Tomoya Ohashi, Takahiro Kishioka
  • Publication number: 20180081274
    Abstract: There is provided a composition for forming a resist underlayer film for lithography that can be used as an underlayer anti-reflective coating that decreases the reflection of irradiated light during exposure from a semiconductor substrate toward the photoresist layer that is formed on the semiconductor substrate and in particular, can be suitably used as a flattening film for flattening a semiconductor substrate having a recess and a project by embedding, in a lithography process for production of a semiconductor device. A resist underlayer film-forming composition for lithography comprising (A) an alicyclic epoxy compound having an alicyclic skeleton and one or more epoxy groups, and a light absorption moiety, in the molecule, (B) a thermal acid generator, and (C) a solvent.
    Type: Application
    Filed: March 18, 2016
    Publication date: March 22, 2018
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Hiroto OGATA, Shigeo KIMURA, Yuki USUI, Tomoya OHASHI, Takahiro KISHIOKA
  • Patent number: 9822330
    Abstract: There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanion or a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: November 21, 2017
    Assignees: NISSAN CHEMICAL INDUSTRIES, LTD., UNIVERSITY OF TOYAMA
    Inventors: Takahiro Kishioka, Shigeo Kimura, Yoshiomi Hiroi, Yuki Usui, Hiromi Kitano, Tadashi Nakaji, Makoto Gemmei
  • Patent number: 9793131
    Abstract: A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a fourth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
    Type: Grant
    Filed: August 27, 2014
    Date of Patent: October 17, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tomoya Ohashi, Shigeo Kimura, Yuki Usui, Hiroto Ogata
  • Patent number: 9604742
    Abstract: Provided is a method for packing a cable having a static friction coefficient of 0.15 or more and 0.50 or less, a dynamic friction coefficient of 0.10 or more and 0.40 or less and a bending rigidity of 60 gf or more and 350 gf or less. The method includes the steps of: (1) winding the cable into a figure-of-eight shape to form a cylindrical cable bundle, (2) winding a wrapping film as a restraining member, which restrains the cable bundle, around an outer circumferential portion of the cable bundle, (3) winding a wrapping film as a closing member which closes openings on both ends of the cable bundle, and (4) housing the cable bundle being wound with the restraining member and the closing member in a housing container.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: March 28, 2017
    Assignees: FURUKAWA ELECTRIC CO., LTD., NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Tetsuya Yasutomi, Masayoshi Tsukamoto, Noboru Okada, Shigeo Kimura, Shigeo Kihara, Keiichiro Sugimoto, Shinichi Niwa
  • Patent number: 9573423
    Abstract: Provided is a retreaded tire that uses cushion rubber for retread that is able to further improve the prevention of separation failure while effectively suppressing blowout within the cushion rubber layer. The retreaded tire includes cushion rubber for retread, a base tire, and precured tread rubber formed of at least one rubber layer, and is characterized by: the aforementioned cushion rubber for retreaded tires being formed from a rubber composition containing specific quantities of a highly reinforcing carbon black of at least HAF grade, and natural rubber and/or synthetic polyisoprene rubber; the 100% modulus (AM) of the rubber layer (A) that comprises the aforementioned cushion rubber for retread being at least 3.0 MPa and less than 6.0 MPa; and the outermost layer (B) of the aforementioned base tire and the innermost layer (C) of the aforementioned precured tread rubber being formed from a rubber composition containing specific quantities of natural rubber and/or synthetic polyisoprene rubber.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: February 21, 2017
    Assignee: BRIDGESTONE CORPORATION
    Inventor: Shigeo Kimura
  • Patent number: 9534140
    Abstract: There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately. (In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1).
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: January 3, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tomoya Ohashi, Shigeo Kimura, Hiroto Ogata
  • Publication number: 20160218013
    Abstract: A pattern forming method which uses a resist underlayer film having resistance to a basic aqueous hydrogen peroxide solution. A pattern forming method including: a first step of applying a resist underlayer film-forming composition containing a solvent and a polymer having a weight average molecular weight of 1,000 to 100,000 and an epoxy group on a semiconductor substrate that may have an inorganic film on the surface, followed by baking, to form a resist underlayer film; a second step of forming a resist pattern on the resist underlayer film; a third step of dry etching the resist underlayer film using the resist pattern as a mask to expose a surface of the inorganic film or the semiconductor substrate; and a forth step of wet etching the inorganic film or the semiconductor substrate using the dry-etched resist underlayer film as a mask and a basic aqueous hydrogen peroxide solution.
    Type: Application
    Filed: August 27, 2014
    Publication date: July 28, 2016
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tomoya OHASHI, Shigeo KIMURA, Yuki USUI, Hiroto OGATA
  • Patent number: 9340561
    Abstract: There is provided a novel organic silicon compound that can be used for a silane coupling agent. An organic silicon compound of Formula (1): (where A? is Formula (2) or Formula (3): E is Formula (4) or Formula (5): R1 and R2 are each independently a C1-5 alkyl group, R3 is a hydrogen atom or a methyl group, R4 and R5 are each independently a C1-5 alkyl group, m, n, and p are each independently an integer of 1 to 5, and q is an integer of 1 to 3).
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: May 17, 2016
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Makiko Umezaki, Daisuke Sakuma, Taito Nishino, Takahiro Kishioka, Yoshiomi Hiroi, Shigeo Kimura, Tomoya Ohashi, Yuki Usui
  • Publication number: 20150337164
    Abstract: There is provided a resist underlayer film-forming composition having excellent solubility in a solvent containing propylene glycol monomethyl ether as a main component. A resist underlayer film-forming composition comprising a polymer having a structural unit of Formula (1a) or Formula (1c) and a structural unit of Formula (1b) and a solvent containing more than 50% by mass of propylene glycol monomethyl ether, wherein in the polymer, the structural unit of Formula (1a) or Formula (1c) and the structural unit of Formula (1b) are arranged alternately. (In Formulae (1a) and (1b), Q is a phenylene group or a naphthylene group, m is 1 or 2, and each of n is independently 0 or 1.
    Type: Application
    Filed: December 17, 2013
    Publication date: November 26, 2015
    Inventors: Tomoya OHASHI, Shigeo KIMURA, Hiroto OGATA
  • Patent number: 9181417
    Abstract: Provided are a rubber composition suitable for cushion rubbers of retreaded tires in which tread rubbers of tires such as truck and bus tires (TBR) and aircraft tires are replaced for reuse, and a rubber composition which is suitable for adhesion carried out by interposing the rubber composition between vulcanized rubber members and covulcanizing them in a tire prepared by adhering separately vulcanized rubber members and which is excellent in a productivity. The rubber composition is characterized by comprising 0.3 to 2.5 parts by mass of aldehydeamines, 0.1 to 1.5 part by mass of at least one compound selected from a group consisting of tetra(2-ethylhexyl)thiuram disulfide, 1,6-bis(N,N?-dibenzylthiocarbamoyldithio)-hexane and 1,6-bis{N,N?-di(2-ethylhexyl)thiocarbamoyldithio}-hexane, and 0.1 to 2.5 parts by mass of a thiazole type vulcanization accelerator based on 100 parts by mass of a rubber component.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: November 10, 2015
    Assignee: BRIDGESTONE CORPORATION
    Inventor: Shigeo Kimura
  • Publication number: 20150267159
    Abstract: There is provided a new material that can form a finer pattern and can be applied to adsorption/adhesion control of various cell species, proteins, viruses, and the like without the limitation of the light source. A light-degradable material comprising: a moiety that is capable of bonding to a surface of a substrate through a siloxane bond; and a structural unit of Formula (2-a) and/or Formula (2-b): (where R2 to R4 are saturated linear alkyl groups; X is a hydrogen atom or an alkyl group; Z is a carbanionor a sulfo anion; Q is an ester bond group, a phosphodiester bond group, an amido bond group, an alkylene group, or an phenylene group or a combination of these divalent groups; m1 is an integer of 1 to 200, and n is an integer of 1 to 10).
    Type: Application
    Filed: October 11, 2013
    Publication date: September 24, 2015
    Inventors: Takahiro Kishioka, Shigeo Kimura, Yoshiomi Hiroi, Yuki Usui, Hiromi Kitano, Tadashi Nakaji, Makoto Gemmei
  • Patent number: 9140989
    Abstract: A material forms a pattern by applying a photosensitive composition to a base material and drying to form a photosensitive coating and performing exposure and development, and a method for forming the pattern. A photosensitive composition includes water-soluble organic particles, and a solvent, wherein the solvent is a poor solvent for the water-soluble organic particles. Preferably, the water-soluble organic particles of the photosensitive composition includes a polymer which contains a unit structure (A) for forming organic particles, a unit structure (B) for forming interparticle crosslinkage, and a unit structure (C) for imparting dispersibility, and the photosensitive composition further includes a photoacid generator.
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: September 22, 2015
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Takahiro Kishioka, Makiko Umezaki, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui
  • Patent number: 9023583
    Abstract: There is provided a composition for forming a monolayer or a multilayer on the substrate. A composition for forming a monolayer or a multilayer containing a silane compound of Formula (1A) or Formula (1B): [where R1s are independently a methyl group or an ethyl group; Xs are independently a C1-10 linking group; and Zs are independently a C1-10 alkyl group or a phenyl group optionally having a substituent, where X optionally contains at least one oxygen atom or sulfur atom in the main chain thereof, and when Z is an alkyl group, at least one hydrogen atom of the alkyl group is optionally substituted with a fluorine atom] and an organic solvent.
    Type: Grant
    Filed: October 7, 2011
    Date of Patent: May 5, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takahiro Kishioka, Daisuke Sakuma, Shigeo Kimura, Hirokazu Nishimaki, Tomoya Ohashi, Yuki Usui