Abstract: High-purity silicone ladder polymer a weight average molecular weight of 600-1,000,000 and a molecular weight distribution of no more than 10 and it contains no more than 1 ppm each of sodium, potassium, iron, copper, lead and chlorine and no more than 1 ppb each of uranium and thorium. This silicone ladder polymer is very pure, has high molecular weight and yet can be produced easily. Hence, it can advantageously be used as a material for making surface protective or inter-level insulation films in semiconductor devices.

Abstract: A plasma CVD system has a processing chamber having a thin film forming section, and a transfer section communicating with the thin film forming section through a connecting opening. The system includes a thin film forming device, located in the thin film forming section, for producing plasma to form a thin film on a substrate at the connecting opening, a transfer device, located in the transfer section, for bringing a substrate holding member into and out of the processing chamber, and a heat transfer plate which does not project beyond the edge of the substrate when moved into abutment against a rear face of the substrate held by the substrate holding member to move the substrate from the substrate holding member towards the thin film forming section. The heat transfer plate also conducts heat to the substrate.

Abstract: A colored paste composed of a silicone ladder polymer, a solvent, and an organic pigment insoluble in said solvent, said silicone ladder polymer being a polymer having an average molecular weight of 1.0.times.10.sup.3 to 3.5.times.10.sup.5. The colored paste has good storage stability and readily forms a uniform film by spin coating.

Abstract: Provided is a silicone resin composition, which is curable at a temperature of not more than 270.degree. C., consisting essentially of a silicone ladder polymer expressed in the following general formula (I): ##STR1## where R.sup.1 to R.sup.4 represent hydrogen atoms or lower alkyl groups respectively, R.sup.5 and R.sup.6 represent aryl groups, alkyl groups or alkenyl groups with alkenyl groups occupying at least 2% of 2n groups R.sup.5 and R.sup.6, and n represents an integer of 5 to 1600, an organic solvent, and/or 0.2 to 20.0 percent by weight of a catalyst with respect to the silicone ladder polymer. This composition is cured at a temperature of not more than 270.degree. C., to form a thin film having excellent solvent resistance and heat resistance.

Abstract: A vacuum coating apparatus for coating films on the surfaces of objects to be deposited under vacuum is provided with a vacuum deposition chamber, a carrier accommodated in the vacuum deposition chamber for carrying the objects, a rotary mechanism extending through the vacuum deposition chamber and being rotatable with respect to the carrier, and a container mounted on the rotary mechanism and accommodated in the vacuum deposition chamber. The container accommodates a material to be evaporated and is rotated by the rotary mechanism during a deposition operation while the objects are maintained stationary.

Abstract: High purity hydroxy-terminated phenyl and alkenyl substituted ladder polysiloxane, which contains therein 1 ppm or below of each of sodium, potassium, iron, copper, lead and chloride, and 1 ppb or below of each of uranium and thorium, and is represented by the following general formula (I): ##STR1## where: R.sub.1 is phenyl and R.sub.2 is an alkenyl group; n is an integer of from 7 to 1600; m and l are natural numbers satisfying relationships of 2n=m+l and l/m+l.gtoreq.0.02.The high purity hydroxy-terminated ladder polysiloxane contains photosensitive groups in its side chain and is useful as a protective film and as an interlayer insulating film in the production of semiconductor elements.

Abstract: A treatment method for plate-shaped substrate capable of uniformly performing the treating operation, performing a large amount of treatment, and facilitating the automation of the work independently of the surface nature of the substrate such as base plates of Si wafer for integrated circuit manufacturing use. The method is achieved by making it easier for the whole substrate surface to be wetted with the treatment liquid, through exposing the substrate to liquid or gas material which is soluble mutually with a treatment liquid prior to treatment with the treating liquid, to avoid treatment and thus uneven treatment to improve the yield.

Abstract: An apparatus for concentrating polyvinyl alcohol liquid which comprises a supply line for supplying a liquid containing polyvinyl alcohol, a filter in connection with the supply line for filtering foreign materials from the liquid, a first tank for receiving the liquid after the liquid is passed through the filter, a preliminary mixing apparatus in fluid connection with the first tank, an evaporator in fluid connection with the preliminary mixing apparatus, the evaporator including a plurality of pipes through which the liquid may flow, a steam heating assembly in connection with the evaporator for heating the liquid flowing through the plurality of pipes, a second tank in fluid connection with the evaporator, the second tank receiving the liquid from the plurality of pipes within the evaporator, a return pipe in fluid connection with the second tank for returning liquid contained within the second tank to the preliminary mixing apparatus such that the liquid may be combined within the preliminary mixing appa

Abstract: An optical scanning apparatus formed by combining a reflector and a frame in a gimbal construction and having two heart cams held in contact respectively with the reflector and the frame. The heart cams, when rotated each in a fixed direction, impart longitudinal and lateral oscillations to the reflector, enable the incident beam such as of an ultraviolet beam to provide planar scanning of the surface of a given test specimen and, at the same time, permit signals detected in the form of the amounts of oscillations of the reflector to be utilized as output signals for synchronization with a CRT.