Patents by Inventor Shih-Chieh Hung

Shih-Chieh Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120126775
    Abstract: A switching power converter including an upper-bridge switch, a lower-bridge switch, an impedance circuit, a first control circuit, a second control circuit and a logic circuit is provided. The impedance circuit generates an output voltage and a sensing current according to a conductive state of the upper-bridge switch and the lower-bridge switch. The first control circuit generates a first pulse signal according to the output voltage. The second control circuit has a first mode and a second mode for generating a second pulse signal and a third pulse signal individually. Furthermore, the second control circuit uses different threshold values in different modes to determine whether to switch the mode thereof, so as to form a hysteretic effect in mode switching. The logic circuit controls the upper-bridge switch by the first pulse signal, and controls the lower-bridge switch by the second pulse signal or the third pulse signal.
    Type: Application
    Filed: February 7, 2011
    Publication date: May 24, 2012
    Applicant: UPI SEMICONDUCTOR CORP.
    Inventors: Shih-Chieh Hung, Hua-Chiang Huang, Jiun-Chiang Chen
  • Patent number: 8168480
    Abstract: An integrated structure of an IGBT and a diode includes a plurality of doped cathode regions, and a method of forming the same is provided. The doped cathode regions are stacked in a semiconductor substrate, overlapping and contacting with each other. As compared with other doped cathode regions, the higher a doped cathode region is disposed, the larger implantation area the doped cathode region has. The doped cathode regions and the semiconductor substrate have different conductive types, and are applied as a cathode of the diode and a collector of the IGBT. The stacked doped cathode regions can increase the thinness of the cathode, and prevent the wafer from being overly thinned and broken.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: May 1, 2012
    Assignee: Anpec Electronics Corporation
    Inventors: Wei-Chieh Lin, Ho-Tai Chen, Jen-Hao Yeh, Li-Cheng Lin, Shih-Chieh Hung
  • Patent number: 8049273
    Abstract: A power semiconductor device includes a backside metal layer, a substrate formed on the backside metal layer, a semiconductor layer formed on the substrate, and a frontside metal layer. The semiconductor layer includes a first trench structure including a gate oxide layer formed around a first trench with poly-Si implant, a second trench structure including a gate oxide layer formed around a second trench with poly-Si implant, a p-base region formed between the first trench structure and the second trench structure, a plurality of n+ source region formed on the p-base region and between the first trench structure and the second trench structure, a dielectric layer formed on the first trench structure, the second trench structure, and the plurality of n+ source region. The frontside metal layer is formed on the semiconductor layer and filling gaps formed between the plurality of n+ source region on the p-base region.
    Type: Grant
    Filed: February 15, 2009
    Date of Patent: November 1, 2011
    Assignee: Anpec Electronics Corporation
    Inventors: Wei-Chieh Lin, Ho-Tai Chen, Li-Cheng Lin, Jen-Hao Yeh, Hsin-Yen Chiu, Hsin-Yu Hsu, Shih-Chieh Hung
  • Publication number: 20110129918
    Abstract: The present invention relates to a novel method for expanding mesenchymal stem cells (MSCs) in low-density and hypoxic condition as compared to normal air conditions traditionally used in cell culture. The present method provides rapid and efficient expansion of human MSCs without losing cellular proliferation and stem cell properties, including increase in proliferation, decrease in senescence, and increase in differentiation potential both in vitro and in vivo. The expanded MSCs by the present method may maintain normal karyotyping, and will not form tumor when transplanted into mamma.
    Type: Application
    Filed: November 30, 2009
    Publication date: June 2, 2011
    Inventor: Shih-Chieh Hung
  • Publication number: 20110107605
    Abstract: A structure of scissors includes a body and two elastic elements. The body includes two blades at one side of a pivot for opening and closing with respect to each other and two holding sections at an opposite side of the pivot for driving movement of the blades about the pivot for opening and closing the scissors. Each of the two holding sections has two ends each forming a connection section to allow the two holding sections of the body to be connected to coupling sections formed on ends of the two elastic elements, whereby the two elastic elements and the two holding sections form finger holes for receiving fingers to be positioned therein for operating the two blades to open and close. As such, easy operation of the scissors can be realized for swinging and waving and reducing the reaction forces acting on the fingers.
    Type: Application
    Filed: October 6, 2010
    Publication date: May 12, 2011
    Inventor: SHIH-CHIEH HUNG
  • Publication number: 20100301386
    Abstract: An integrated structure of an IGBT and a diode includes a plurality of doped cathode regions, and a method of forming the same is provided. The doped cathode regions are stacked in a semiconductor substrate, overlapping and contacting with each other. As compared with other doped cathode regions, the higher a doped cathode region is disposed, the larger implantation area the doped cathode region has. The doped cathode regions and the semiconductor substrate have different conductive types, and are applied as a cathode of the diode and a collector of the IGBT. The stacked doped cathode regions can increase the thinness of the cathode, and prevent the wafer from being overly thinned and broken.
    Type: Application
    Filed: September 21, 2009
    Publication date: December 2, 2010
    Inventors: Wei-Chieh Lin, Ho-Tai Chen, Jen-Hao Yeh, Li-Cheng Lin, Shih-Chieh Hung
  • Publication number: 20100289075
    Abstract: A semiconductor device having integrated MOSFET and Schottky diode includes a substrate having a MOSFET region and a Schottky diode region defined thereon; a plurality of first trenches formed in the MOSFET region; and a plurality of second trenches formed in the Schottky diode region. The first trenches respectively including a first insulating layer formed over the sidewalls and bottom of the first trench and a first conductive layer filling the first trench serve as a trenched gate of the trench MOSFET. The second trenches respectively include a second insulating layer formed over the sidewalls and bottom of the second trench and a second conductive layer filling the second trench. A depth and a width of the second trenches are larger than that of the first trenches; and a thickness of the second insulating layer is larger than that of the first insulating layer.
    Type: Application
    Filed: August 6, 2009
    Publication date: November 18, 2010
    Inventors: Wei-Chieh Lin, Li-Cheng Lin, Hsin-Yu Hsu, Ho-Tai Chen, Jen-Hao Yeh, Guo-Liang Yang, Chia-Hui Chen, Shih-Chieh Hung
  • Publication number: 20100117142
    Abstract: A power semiconductor device includes a backside metal layer, a substrate formed on the backside metal layer, a semiconductor layer formed on the substrate, and a frontside metal layer. The semiconductor layer includes a first trench structure including a gate oxide layer formed around a first trench with poly-Si implant, a second trench structure including a gate oxide layer formed around a second trench with poly-Si implant, a p-base region formed between the first trench structure and the second trench structure, a plurality of n+ source region formed on the p-base region and between the first trench structure and the second trench structure, a dielectric layer formed on the first trench structure, the second trench structure, and the plurality of n+ source region. The frontside metal layer is formed on the semiconductor layer and filling gaps formed between the plurality of n+ source region on the p-base region.
    Type: Application
    Filed: February 15, 2009
    Publication date: May 13, 2010
    Inventors: Wei-Chieh Lin, Ho-Tai Chen, Li-Cheng Lin, Jen-Hao Yeh, Hsin-Yen Chiu, Hsin-Yu Hsu, Shih-Chieh Hung
  • Patent number: 7682903
    Abstract: A method of forming a power device includes providing a substrate, a semiconductor layer having at least a trench and being disposed on the substrate, a gate insulating layer covering the semiconductor layer, and a conductive material disposed in the trench, performing an ion implantation process to from a body layer, performing a tilted ion implantation process to from a heavy doped region, forming a first dielectric layer overall, performing a chemical mechanical polishing process until the body layer disposed under the heavy doped region is exposed to form source regions on the opposite sides of the trench, and forming a source trace directly covering the source regions disposed on the opposite sides of the trench.
    Type: Grant
    Filed: December 14, 2008
    Date of Patent: March 23, 2010
    Assignee: Anpec Electronics Corporation
    Inventors: Wei-Chieh Lin, Hsin-Yu Hsu, Hsin-Yen Chiu, Shih-Chieh Hung, Ho-Tai Chen, Jen-Hao Yeh, Li-Cheng Lin
  • Publication number: 20100055857
    Abstract: A method of forming a power device includes providing a substrate, a semiconductor layer having at least a trench and being disposed on the substrate, a gate insulating layer covering the semiconductor layer, and a conductive material disposed in the trench, performing an ion implantation process to from a body layer, performing a tilted ion implantation process to from a heavy doped region, forming a first dielectric layer overall, performing a chemical mechanical polishing process until the body layer disposed under the heavy doped region is exposed to form source regions on the opposite sides of the trench, and forming a source trace directly covering the source regions disposed on the opposite sides of the trench.
    Type: Application
    Filed: December 14, 2008
    Publication date: March 4, 2010
    Inventors: Wei-Chieh Lin, Hsin-Yu Hsu, Hsin-Yen Chiu, Shih-Chieh Hung, Ho-Tai Chen, Jen-Hao Yeh, Li-Cheng Lin
  • Publication number: 20090311782
    Abstract: A method for promoting a differentiation of stem cells into insulin producing cells is provided. The method includes steps of suspending the stem cells in a first culture medium, aggregating the stem cells to form a cell pellet, and culturing the cell pellet in a second culture medium to promote the differentiation of the stem cells of the cell pellet into the insulin producing cells.
    Type: Application
    Filed: December 9, 2008
    Publication date: December 17, 2009
    Applicant: TAIPEI VETERANS GENERAL HOSPITAL
    Inventors: Shih-Hwa Chiou, Yu-Show Fu, Larry Low-Tone Ho, Shih-Chieh Hung
  • Publication number: 20020045260
    Abstract: The invention discloses a novel method of isolating mesenchymal stem cells (MSCs), which is characterized by purifying pluripotent MSCs based on physical characters and biological properties and without the uses of antibodies. The present invention also relates to the application of the isolated MSCs to serve as tissue replacement or gene therapy for tissues damaged by age, trauma, and disease.
    Type: Application
    Filed: January 17, 2001
    Publication date: April 18, 2002
    Inventors: Shih-Chieh Hung, Wai-Hee Lo