Abstract: A solder paste for fabricating bumps includes a flux and metallic alloy powder. The metallic alloy powder includes a plurality of low eutectic metallic alloy granules, and the size of these metallic alloy granules is 20-60 &mgr;m and the average size of the metallic granules is 35 &mgr;m to 45 &mgr;m.

Abstract: The present invention relates to an under bump structure comprising a wafer surface including a plurality of pads; a plurality of passivation layers covering the wafer surface around the pads; a dielectric layer covering the wafer surface and the passivation layers, each of the passivation layer and the dielectric layer having a first opening at a position corresponding to that of each pad for exposing the pad; and an under bump metallurgy layer covering the dielectric layer, the pads and the passivation layers to connect the pads.

Abstract: In a method for manufacturing an under-bump metallurgy (UBM) layer, a plate having a plurality of openings is prepared. Then, the plate is placed on the wafer. Finally, the material of the under-bump metallurgy layer is sputtered on the wafer using the plate as a sputter mask so as to quickly form the under-bump metallurgy layer.

Abstract: A semiconductor device having a bump electrode comprising a substrate having a dielectric layer formed thereon, an aluminum contact pad on the substrate wherein at least a portion of the aluminum contact pad is exposed through the dielectric layer on the substrate. The aluminum contact pad is provided with an under bump metallurgy including a aluminum layer formed on the exposed portion of the aluminum contact pad, a nickel-vanadium layer formed on the aluminum layer and a titanium layer formed on the nickel-vanadium layer. A gold bump formed on the titanium layer acts as the bump electrode.

Abstract: A ball grid array semiconductor package includes a substrate, a die mounted on the substrate and electrically connected to the substrate by bonding wires, a heat ring mounted on the substrate to surround the die and the bonding wires, and a heat slug mounted on the heat ring to entirely cover the die and the bonding wires thereby providing improved heat dissipation efficiency and overall electrical performance. Encapsulation material is filled into an inner space surrounded by the heat ring, heat slug and substrate to form an encapsulant for protecting the die and bonding wires. The heat ring and heat slug has at least a portion of surface area sequentially coated with a metal medium layer and an insulation layer to enhance the bonding degree between the encapsulant and the heat ring and heat slug.