Patents by Inventor Shin Yamaguchi
Shin Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220415693Abstract: A substrate support includes an electrostatic chuck formed of ceramics and holding a substrate by electrostatic attraction, a base supporting the electrostatic chuck, and a flow path through which a heat exchange medium flows. An upper surface of the flow path is formed of ceramics.Type: ApplicationFiled: June 22, 2022Publication date: December 29, 2022Inventors: Hideto SAITO, Makoto KATO, Shin YAMAGUCHI, Takashi KANAZAWA, Ryoma MUTO
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Publication number: 20220406576Abstract: A substrate processing apparatus is provided. The apparatus comprises a chamber; a substrate support which is arranged in the chamber and has at least one first gas supply path; and at least one control valve configured to control a flow rate or pressure of gas supplied through the at least one first gas supply path. The substrate support includes a base, and an electrostatic chuck which is arranged on the base and has an upper surface. The upper surface has a plurality of protrusions and a first annular groove group. The first annular groove group comprises a first inner annular groove, a first intermediate annular groove, and a first outer annular groove. Any one of the first inner annular groove, the first intermediate annular groove, and the first outer annular groove communicates with the at least one first gas supply path.Type: ApplicationFiled: June 22, 2022Publication date: December 22, 2022Applicant: Tokyo Electron LimitedInventors: Kohei OTSUKI, Shin YAMAGUCHI, Daisuke SATAKE
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Publication number: 20220384155Abstract: A plasma processing apparatus includes a plasma processing chamber; a base disposed in the plasma processing chamber; an electrostatic chuck, disposed on the base, having a substrate support portion and an edge ring support portion on which an edge ring is disposed so as to surround a substrate; a first clamping electrode disposed in the substrate support portion; a first bias electrode disposed below the first clamping electrode in the substrate support portion; a second clamping electrode disposed in the edge ring support portion; a second bias electrode disposed below the second clamping electrode in the edge ring support portion; a first power source electrically connected to the first bias electrode; and a second power source electrically connected to the second bias electrode.Type: ApplicationFiled: August 8, 2022Publication date: December 1, 2022Applicant: Tokyo Electron LimitedInventors: Yasuharu SASAKI, Tsuguto Sugawara, Shin Yamaguchi, Hajime Tamura
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Publication number: 20220371384Abstract: A pneumatic tire comprises a first sound damper fixed to a tire inner surface and being made of a sponge material; a second sound damper disposed on a tire internal space side of the first sound damper, and being made of a sponge material; and a communication device retained between the first sound damper and the second sound damper. The second sound damper has a hardness in a range of greater than 25N and no greater than 55N. The first sound damper has a hardness in a range of no less than 25N and less than 55N. The hardness of the second sound damper is greater than the hardness of the first sound damper. The hardness is measured in accordance with the Method A in Section 6.4 of the test methods as defined under the Hardness Tests in Section 6 of JIS K6400-2 (2012).Type: ApplicationFiled: August 8, 2022Publication date: November 24, 2022Applicant: BRIDGESTONE CORPORATIONInventors: Masanao SHIBATA, Jun WATANABE, Shin SUKEGAWA, Takayuki OHARA, Suguru YAMAGUCHI, Hiroki HORI, Sho MITSUDA
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Patent number: 11476095Abstract: An electrostatic chuck of an embodiment includes a base, a dielectric layer, and a chuck main body. The dielectric layer is provided on the base, and is fixed to the base. The chuck main body is mounted on the dielectric layer. The chuck main body has a ceramic main body, a first electrode, a second electrode, and a third electrode. The ceramic main body has a substrate mounting region. The first electrode is provided in the substrate mounting region. The second electrode and the third electrode form a bipolar electrode. The second electrode and the third electrode are provided in the ceramic main body, and are provided between the first electrode and the dielectric layer.Type: GrantFiled: September 21, 2020Date of Patent: October 18, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Shin Yamaguchi, Akiyoshi Mitsumori
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Patent number: 11446967Abstract: A pneumatic tire in accordance with the present disclosure comprises a first sound damper fixed to a tire inner surface and being made of a sponge material; a second sound damper disposed on a tire internal space side of the first sound damper, and being made of a sponge material; and a communication device retained between the first sound damper and the second sound damper, wherein the second sound damper has a hardness greater than a hardness of the first sound damper.Type: GrantFiled: June 27, 2018Date of Patent: September 20, 2022Assignee: BRIDGESTONE CORPORATIONInventors: Masanao Shibata, Jun Watanabe, Shin Sukegawa, Takayuki Ohara, Suguru Yamaguchi, Hiroki Hori, Sho Mitsuda
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Publication number: 20220285138Abstract: A substrate support includes a base, a substrate support layer disposed on the base, the substrate support layer being formed of an insulating material, and an electrostatic internal electrode layer disposed in the substrate support layer, the electrostatic internal electrode layer including a body portion and a plurality of protruding portions, the body portion having a circular shape in a plan view, and the plurality of protruding portions radially protruding from the body portion.Type: ApplicationFiled: March 2, 2022Publication date: September 8, 2022Inventors: Shin YAMAGUCHI, Yasuharu SASAKI, Koei ITO
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Patent number: 11437223Abstract: A stage includes an electrostatic chuck that supports a substrate and an edge ring; and a base that supports the electrostatic chuck. The electrostatic chuck includes a first region having a first upper surface and supports the substrate placed on the first upper surface; a second region having a second upper surface, provided integrally around the first region, and supports the edge ring placed on the second upper surface; a first electrode provided in the first region to apply a DC voltage; a second electrode provided in the second region to apply a DC voltage, and a third electrode to apply a bias power.Type: GrantFiled: June 18, 2020Date of Patent: September 6, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Yasuharu Sasaki, Tsuguto Sugawara, Shin Yamaguchi, Hajime Tamura
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Publication number: 20220255085Abstract: The present invention addresses the problem of providing: a porous carbon structure that has a high micropore volume and can be self-contained; a manufacturing method therefor; a positive electrode material using the same; and a battery (particularly an air battery) using the same. The present invention is a porous carbon structure that is for a positive electrode for an air battery and has voids and a skeleton formed by incorporating carbon, the porous carbon structure satisfying all of the following conditions (a) to (d). (a) The t-plot external specific surface area is within the range of 300m2/g to 1600m2/g; (b) the total volume of micropores having a diameter of lnm to 200 nm is within the range of 1.2 cm3/g to 7.0cm3/g; (c) the total volume of micropores having a diameter of lnm to 1000 nm is within the range of 2.3cm3/g to 10.0 cm3/g; and (d) the overall porosity is within the range of 80% to 99%.Type: ApplicationFiled: May 21, 2020Publication date: August 11, 2022Applicant: National Institute for Materials ScienceInventors: Eiki Yasukawa, Takashi Kameda, Shoichi Matsuda, Shoji Yamaguchi, Shin Kimura, Kimihiko Ito, Yoshimi Kubo
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Patent number: 11404251Abstract: A cooling table includes a first portion, a second portion, a first path, a second path and a third path. An electrostatic chuck is provided on the first portion, and the first portion is provided on the second portion. The first path is provided within the first portion, and the second path is provided within the second portion. The third path is connected to the first path and the second path. A chiller unit is connected to the first path and the second path. The first path is extended within the first portion along the electrostatic chuck, and the second path is extended within the second portion along the electrostatic chuck. A coolant outputted from the chiller unit passes through the first path, the third path and the second path in sequence, and then is inputted to the chiller unit.Type: GrantFiled: February 1, 2018Date of Patent: August 2, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Shin Yamaguchi, Akiyoshi Mitsumori, Takehiko Arita, Koichi Murakami
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Patent number: 11390245Abstract: A tire anti-theft system includes a transmitter attached to a tire and configured to transmit tire ID information; a first database configured to store vehicle ID information and tire ID information of a tire mounted on the vehicle; a second database configured to store the tire ID information and tire status information indicating whether or not the tire identified with the tire ID information is stolen tire; and a vehicle control apparatus, in which the vehicle control apparatus includes a reader configured to perform near field communication with the transmitter attached to the tire mounted on a vehicle to be controlled and acquire the tire ID information, and a controller configured to, in a case where the reader acquires the tire ID information, restrict operation of the vehicle to be controlled if information indicating that the tire is stolen tire is stored in association with the tire ID information.Type: GrantFiled: September 12, 2018Date of Patent: July 19, 2022Assignee: BRIDGESTONE CORPORATIONInventors: Jun Watanabe, Shin Sukegawa, Takayuki Ohara, Kenji Matsuo, Kotaro Yamada, Satoshi Hirajima, Suguru Yamaguchi
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Patent number: 11236420Abstract: The step of removing the reaction product includes a step of loading a dummy wafer on the loading table, a step of increasing the temperature of the loading table, and a step of removing the reaction product after increasing the temperature of the loading table. In the step of increasing the temperature of the loading table, the temperature of the loading table is increased by opening an expansion valve between an output terminal of a condenser and an input terminal of the heat exchange unit, inputting heat to the loading table, opening a flow dividing valve between an output terminal of a compressor and the input terminal of the heat exchange unit, and adjusting an opening degree of the flow dividing valve.Type: GrantFiled: April 2, 2019Date of Patent: February 1, 2022Assignee: TOKYO ELECTRON LIMITEDInventors: Akiyoshi Mitsumori, Shin Yamaguchi
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Publication number: 20210327741Abstract: A substrate support is provided that includes: a base; an electrostatic chuck on which a substrate is placed; an electrode provided in the electrostatic chuck; a contact portion of the electrode; an adhesive layer that bonds the electrostatic chuck with the base and that does not cover the contact portion; and a power supply terminal contacting the contact portion of the electrode without being fixed to the contact portion.Type: ApplicationFiled: September 3, 2019Publication date: October 21, 2021Inventors: Akira NAGAYAMA, Yasuharu SASAKI, Taketoshi TOMIOKA, Shin YAMAGUCHI
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Publication number: 20210327747Abstract: A heat exchange unit performs heat exchange using a coolant and is disposed inside a placing table and equipped with heat exchange chambers. The heat exchange chambers are disposed in regions, respectively, set on the placing table. The regions are set along a placing surface of the placing table. A chiller device circulates the coolant with respect to the heat exchange chambers. A temperature detection device includes temperature detectors. The temperature detectors are disposed in the regions, respectively, between the respective heat exchange chambers and the placing surface. A control device controls the chiller device to adjust a pressure of the coolant such that a temperature of the placing table reaches a first temperature range, and controls the chiller device to individually adjust flow rates of the coolant supplied to the heat exchange chambers, respectively, such that all of temperatures measured by the temperature detectors reach the first temperature range.Type: ApplicationFiled: September 5, 2019Publication date: October 21, 2021Inventors: Shin Yamaguchi, Akiyoshi Mitsumori
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Publication number: 20210319990Abstract: A temperature adjustment method includes adjusting a temperature of a placing table on which a target object is placed. The placing table is divided into regions and equipped with temperature detectors. The regions are set along a placing surface of the placing table. The temperature detectors are disposed in the regions, respectively. The placing table is equipped with heat exchange chambers each configured to perform heat exchange by a coolant. The heat exchange chambers are disposed in the regions, respectively. The adjusting of the temperature of the placing table includes adjusting a pressure of the coolant such that the temperature of the placing table reaches a first temperature range; and individually adjusting, after the adjusting of the pressure of the coolant, flow rates of the coolant supplied to the heat exchange chambers, respectively, such that all of temperatures measured by the temperature detectors reach the first temperature range.Type: ApplicationFiled: September 5, 2019Publication date: October 14, 2021Inventors: Shin Yamaguchi, Akiyoshi Mitsumori
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Publication number: 20210305025Abstract: The disclosed substrate support includes a first region, a second region, a first electrode, and a second electrode. The first region is configured to hold a substrate placed thereon. The second region is provided to surround the first region and configured to hold an edge ring placed thereon. The first electrode is provided in the first region to receive a first electrical bias. The second electrode is provided in at least the second region to receive a second electrical bias. The second electrode extends below the first electrode to face the first electrode within the first region.Type: ApplicationFiled: March 2, 2021Publication date: September 30, 2021Applicant: Tokyo Electron LimitedInventors: Hajime TAMURA, Yasuharu SASAKI, Shin YAMAGUCHI, Tsuguto SUGAWARA, Katsuyuki KOIZUMI
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Patent number: 11060770Abstract: A cooling system configured to circulate a coolant under a placing surface of a placing table includes a heat exchange unit within the placing table and configured to perform a heat exchange by the coolant via the placing surface; a chiller unit connected to the heat exchange unit. The heat exchange unit comprises a reservoir chamber configured to store the coolant; and an evaporation chamber configured to evaporate the coolant stored in the reservoir chamber. The reservoir chamber is connected to the chiller unit and communicates with the evaporation chamber. The evaporation chamber is connected to the chiller unit, extended along the placing surface and includes discharge holes. The discharge holes are arranged such that the coolant is discharged toward a heat transfer wall as a placing surface-side inner wall of the evaporation chamber. The discharge holes are dispersed within the placing surface.Type: GrantFiled: February 12, 2019Date of Patent: July 13, 2021Assignee: TOKYO ELECTRON LIMITEDInventors: Shin Yamaguchi, Akiyoshi Mitsumori
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Publication number: 20210005432Abstract: An electrostatic chuck of an embodiment includes a base, a dielectric layer, and a chuck main body. The dielectric layer is provided on the base, and is fixed to the base. The chuck main body is mounted on the dielectric layer. The chuck main body has a ceramic main body, a first electrode, a second electrode, and a third electrode. The ceramic main body has a substrate mounting region. The first electrode is provided in the substrate mounting region. The second electrode and the third electrode form a bipolar electrode. The second electrode and the third electrode are provided in the ceramic main body, and are provided between the first electrode and the dielectric layer.Type: ApplicationFiled: September 21, 2020Publication date: January 7, 2021Applicant: Tokyo Electron LimitedInventors: Shin YAMAGUCHI, Akiyoshi MITSUMORI
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Publication number: 20200402777Abstract: A stage includes an electrostatic chuck that supports a substrate and an edge ring; and a base that supports the electrostatic chuck. The electrostatic chuck includes a first region having a first upper surface and supports the substrate placed on the first upper surface; a second region having a second upper surface, provided integrally around the first region, and supports the edge ring placed on the second upper surface; a first electrode provided in the first region to apply a DC voltage; a second electrode provided in the second region to apply a DC voltage, and a third electrode to apply a bias power.Type: ApplicationFiled: June 18, 2020Publication date: December 24, 2020Applicant: TOKYO ELECTRON LIMITEDInventors: Yasuharu SASAKI, Tsuguto SUGAWARA, Shin YAMAGUCHI, Hajime TAMURA
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Patent number: 10825660Abstract: An electrostatic chuck of an embodiment includes a base, a dielectric layer, and a chuck main body. The dielectric layer is provided on the base, and is fixed to the base. The chuck main body is mounted on the dielectric layer. The chuck main body has a ceramic main body, a first electrode, a second electrode, and a third electrode. The ceramic main body has a substrate mounting region. The first electrode is provided in the substrate mounting region. The second electrode and the third electrode form a bipolar electrode. The second electrode and the third electrode are provided in the ceramic main body, and are provided between the first electrode and the dielectric layer.Type: GrantFiled: May 23, 2018Date of Patent: November 3, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Shin Yamaguchi, Akiyoshi Mitsumori