Patents by Inventor Shingo Takahashi
Shingo Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240145517Abstract: Provided is a solid-state image capturing element including a semiconductor substrate and first and second photoelectric conversion parts configured to convert light into electric charge. The first and the second photoelectric conversion parts each have a laminated structure including an upper electrode, a lower electrode, a photoelectric conversion film sandwiched between the upper electrode and the lower electrode, and an accumulation electrode facing the upper electrode through the photoelectric conversion film and an insulating film.Type: ApplicationFiled: December 19, 2023Publication date: May 2, 2024Applicants: SONY GROUP CORPORATION, SONY SEMICONDUCTOR SOLUTIONS CORPORATIONInventors: Kenichi MURATA, Masahiro JOEI, Fumihiko KOGA, Iwao YAGI, Shintarou HIRATA, Hideaki TOGASHI, Yosuke SAITO, Shingo TAKAHASHI
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Patent number: 11968846Abstract: A photoelectric conversion element according to an embodiment of the present disclosure include a first electrode, a second electrode opposed to the first electrode, and an organic photoelectric conversion layer provided between the first electrode and the second electrode and formed using a plurality of materials having average particle diameters different from each other, the plurality of materials including at least fullerene or a derivative thereof, and a particle diameter ratio, of a first material having a smallest average particle diameter among the plurality of materials with respect to a second material having a largest average particle diameter among the plurality of materials, is 0.6 or less.Type: GrantFiled: May 2, 2022Date of Patent: April 23, 2024Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATIONInventor: Shingo Takahashi
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Patent number: 11959147Abstract: A top-blowing lance nozzle is configured to freely switch an adequate expansion condition so as to control an oxygen-blowing amount and a jetting velocity independently of each other without requiring a plurality of lance nozzles or a mechanically movable part. A lance nozzle is configured to blow refining oxygen to molten iron charged in a reaction vessel while a gas is blown from a top-blowing lance to the molten iron. One or more blowing holes for blowing a working gas are on an inner wall side surface of the nozzle, at a site where the lance nozzle has a minimum cross-sectional area in a nozzle axis direction or at a neighboring site of the site.Type: GrantFiled: April 2, 2020Date of Patent: April 16, 2024Assignee: JFE STEEL CORPORATIONInventors: Yumi Murakami, Nobuhiko Oda, Yusuke Fujii, Goro Okuyama, Shota Amano, Shinji Koseki, Shingo Sato, Yukio Takahashi, Ryo Kawabata, Naoki Kikuchi, Atsuo Yuasa
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Publication number: 20240112847Abstract: To suppress a decrease in mounting strength of a coil component, a coil component includes a drum core including a winding core portion, and first and second flange portions. The coil component includes a first metal terminal which includes a bonding portion, a connecting portion, and a mounting portion. The bonding portion is bonded to the first flange portion with an adhesive. The mounting portion is closest to the first positive direction side in the first metal terminal and is separated from the first flange portion toward the first positive direction side. The connecting portion connects the bonding and mounting portions. The first flange portion has a facing surface that faces the mounting portion, a bonding surface, and a first inclined surface between the facing and bonding surfaces. The distance from the facing surface increases in a direction parallel to the first axis toward the bonding surface.Type: ApplicationFiled: September 26, 2023Publication date: April 4, 2024Applicant: Murata Manufacturing Co., Ltd.Inventors: Takuma SAGARA, Katsuyuki TAKAHASHI, Shingo NAKAMOTO
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Publication number: 20240087433Abstract: A lighting system includes a plurality of lighting devices and a control device. The plurality of lighting devices are installed in a facility. The control device controls the plurality of lighting devices. The control device controls lighting light projected by at least one lighting device, belonging to the plurality of lighting devices, into colored lighting light, of which a color is different from a color white, to give, upon acquiring information about an event in question, a sign depending on the event in question.Type: ApplicationFiled: January 22, 2022Publication date: March 14, 2024Inventors: Takanori AKETA, Kenichiro TANAKA, Jin YOSHIZAWA, Shingo NAGATOMO, Kazuki KITAMURA, Tatsuya TAKAHASHI, Tatsuo KOGA, Tomonori YAMADA, Kazuto URA
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Publication number: 20240055465Abstract: A highly functional photoelectric conversion element is provided.Type: ApplicationFiled: December 14, 2021Publication date: February 15, 2024Inventors: Kenichi MURATA, Masahiro JOEI, Shintarou HIRATA, Shingo TAKAHASHI, Yoshiyuki OHBA, Takashi KOJIMA, Tomiyuki YUKAWA, Yoshifumi ZAIZEN, Tomohiro SUGIYAMA, Masaki OKAMOTO, Takuya MASUNAGA, Yuki KAWAHARA
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Patent number: 11888012Abstract: Provided is a solid-state image capturing element including a semiconductor substrate and first and second photoelectric conversion parts configured to convert light into electric charge. The first and the second photoelectric conversion parts each have a laminated structure including an upper electrode, a lower electrode, a photoelectric conversion film sandwiched between the upper electrode and the lower electrode, and an accumulation electrode facing the upper electrode through the photoelectric conversion film and an insulating film.Type: GrantFiled: July 25, 2019Date of Patent: January 30, 2024Assignees: SONY CORPORATION, SONY SEMICONDUCTOR SOLUTIONS CORPORATIONInventors: Kenichi Murata, Masahiro Joei, Fumihiko Koga, Iwao Yagi, Shintarou Hirata, Hideaki Togashi, Yosuke Saito, Shingo Takahashi
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Publication number: 20230377844Abstract: A plasma processing apparatus disclosed includes a chamber, a substrate support, a radio-frequency power supply, and a bias power supply. The substrate support includes an electrode and is provided in the chamber. The radio-frequency power supply supplies radio-frequency power for generating plasma from a gas in the chamber. The bias power supply is electrically coupled to the electrode of the substrate support. The radio-frequency power supply is configured to supply the radio-frequency power in an ignition period in which the plasma is ignited in the chamber. The bias power supply is configured to sequentially apply a plurality of bias pulses, each of which has a negative voltage, to the electrode of the substrate support, and stepwisely or gradually increase absolute values of voltage levels of the plurality of bias pulses in the ignition period.Type: ApplicationFiled: August 3, 2023Publication date: November 23, 2023Applicant: Tokyo Electron LimitedInventors: Shingo TAKAHASHI, Jenhung HUANG
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Publication number: 20230337783Abstract: A footwear includes: a foot bed portion that supports a sole of a foot of a wearer and has a ground contact surface; and a foot cover portion that covers an instep of the foot of the wearer. At least a part of the foot bed portion and at least a part of the foot cover portion are formed of a single additively manufactured product produced by a stereolithography-type three-dimensional additively manufacturing method, and a protruding portion is provided on an outer surface defined by the additively manufactured product of the foot cover portion.Type: ApplicationFiled: April 11, 2023Publication date: October 26, 2023Applicant: ASICS CORPORATIONInventors: Genki HATANO, Kenta TATENO, Waka INOUE, Shingo TAKAHASHI, Masaki OOHARA, Norihiko TANIGUCHI
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Publication number: 20230298898Abstract: A disclosed etching method includes (a) generating plasma of a processing gas in a chamber of a plasma processing apparatus. The plasma is generated in a state where a substrate is placed on a substrate support having a lower electrode in the chamber. The substrate has a film and a mask. The mask is provided on the film. The etching method further includes (b) etching the film by supplying ions from the plasma to the substrate by periodically applying a pulse of a voltage to a lower electrode. In the operation (b), a level of a voltage of the pulse is changed at least once such that an absolute value of a negative potential of the substrate has a tendency to increase according to progress of etching of the film.Type: ApplicationFiled: May 30, 2023Publication date: September 21, 2023Applicant: Tokyo Electron LimitedInventors: Shingo TAKAHASHI, Shogo YAMAYA
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Patent number: 11755448Abstract: Provided an apparatus configured to calculate a periodicity of time series data, generate a plurality of subsequences, from the time series data, a length of each subsequence set to the periodicity, calculate feature values of the plurality of subsequences; categorize the plurality of subsequences, based on the feature values thereof, into one or more groups, find a periodicity of the subsequences belonging in common to one group, based on an occurrence order of the subsequences belonging in common to the one group and perform missing event detection by identifying the subsequence, occurrence of which is expected according to the periodicity of the subsequences belonging in common to the one group, but not found.Type: GrantFiled: January 27, 2021Date of Patent: September 12, 2023Assignee: NEC CORPORATIONInventors: Murtuza Petladwala, Shingo Takahashi, Shigeru Koumoto
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Publication number: 20230279681Abstract: A binding machine includes: a rotation shaft driven by a motor to rotate; a movable body that moves in an axial direction of the rotation shaft in conjunction with the rotation of the rotation shaft and that rotates about the rotation shaft; an elastic body that is compressed by the movement of the movable body along the axial direction of the rotation shaft and that is configured to apply tension to a wire adapted to bind an object to be bound by an expanding force; and a prevention member configured to prevent generation of a force for twisting the elastic body by the rotation of the movable body.Type: ApplicationFiled: March 1, 2023Publication date: September 7, 2023Applicant: MAX CO., LTDInventors: Makoto KOSUGE, Shingo Takahashi, Terufumi Hamano
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Publication number: 20230251184Abstract: A sensor system includes a sensing element, an illumination optical system including a light source, the illumination optical system being configured to obliquely illuminate the sensing element, and a detector device configured to detect light reflected off the sensing element. The sensing element includes a chemical sensing layer configured to change in an optical characteristic in response to contact with a target substance, a reflection layer configured to reflect at least part of incident light, and an intermediate layer located between the reflection layer and the chemical sensing layer. The detector device is configured to separately detect p-polarized light and s-polarized light reflected off the sensing element.Type: ApplicationFiled: February 1, 2023Publication date: August 10, 2023Applicant: TIANMA JAPAN, LTD.Inventors: Koki TAKAHASHI, Nobuya SEKO, Satoshi MIURA, Koji SHIGEMURA, Ken SUMIYOSHI, Haruki YAMANE, Satoshi YANASE, Kiyoshi YAMAKAWA, Shingo TAKAHASHI
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Patent number: 11705339Abstract: A disclosed etching method includes (a) generating plasma of a processing gas in a chamber of a plasma processing apparatus. The plasma is generated in a state where a substrate is placed on a substrate support having a lower electrode in the chamber. The substrate has a film and a mask. The mask is provided on the film. The etching method further includes (b) etching the film by supplying ions from the plasma to the substrate by periodically applying a pulse of a voltage to a lower electrode. In the operation (b), a level of a voltage of the pulse is changed at least once such that an absolute value of a negative potential of the substrate has a tendency to increase according to progress of etching of the film.Type: GrantFiled: September 14, 2021Date of Patent: July 18, 2023Assignee: Tokyo Electron LimitedInventors: Shingo Takahashi, Shogo Yamaya
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Patent number: 11586703Abstract: A feature transformation apparatus includes at least a combination storage part that stores a combination with respect to a set of features, wherein data is approximately represented as a sum of the combination of the features; and a transformation part that transforms at least the combination so as not to change the sum of the combination of the set of features.Type: GrantFiled: February 8, 2018Date of Patent: February 21, 2023Assignee: NEC CORPORATIONInventors: Ryota Suzuki, Shingo Takahashi, Murtuza Petladwala, Shigeru Koumoto
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Patent number: 11585795Abstract: An optical detection type chemical sensor includes a light source, a detection element and a photodetector. The detection element is constituted of a laminate in which a multilayer film including a chemical detection layer, an optical interference layer, and a half mirror layer is formed on a transparent substrate. At least one of the layers includes a magnetic material. Light from the light source is applied to the detection element under the condition that the light enters inside of the detection element from the rear surface of the transparent substrate on which the laminate is not formed and multiple reflection occurring in the laminate intensifies the magneto-optical effect. A subject is detected by using the photodetector to detect a magneto-optical signal indicating a change in reflected light from the laminate resulting from a change in an optical property resulting from a reaction in the chemical detection layer.Type: GrantFiled: August 3, 2021Date of Patent: February 21, 2023Assignee: TIANMA JAPAN, LTD.Inventors: Haruki Yamane, Kiyoshi Yamakawa, Shingo Takahashi, Koki Takahashi, Satoshi Miura, Koji Shigemura, Nobuya Seko, Ken Sumiyoshi
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Publication number: 20220384154Abstract: In a disclosed plasma processing apparatus, an electrostatic chuck provided in a chamber includes a first region on which a substrate is placed and a second region on which an edge ring is placed. The first region includes a first electrode provided therein. The second region including a second electrode provided therein. A first feed line connects the first electrode and a bias power supply generating a pulse of a voltage applied to the first electrode to each other. A second feed line connects the second electrode and the bias power supply or another bias power supply generating a pulse of the voltage applied to the second electrode to each other. The second feed line includes one or more sockets and one or more feed pins. The one or more feed pins have flexibility in a radial direction thereof and are fitted into the one or more sockets.Type: ApplicationFiled: May 25, 2022Publication date: December 1, 2022Applicant: Tokyo Electron LimitedInventors: Yusuke HAYASAKA, Atsushi SASAKI, Kazuya MATSUMOTO, Shingo TAKAHASHI, Koichi NAGAMI
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Patent number: 11507795Abstract: A recording medium records a simulation program for causing a computer to execute a process including: arranging an agent, which has cognitive information and behaves in a virtual space based on the cognitive information, in the virtual space in which a plurality of guidance displays is set; when, with respect to each of the plurality of guidance displays, the agent enters within a first range of the respective guidance displays, and first guidance information corresponding to the first range is related with a destination of the agent, changing cognitive information up to the destination of the agent; and when, with respect to each of the plurality of guidance displays, the agent enters within a second range different from the first range, and second guidance information corresponding to the second range is related with the destination of the agent, changing cognitive information not directly related with the destination of the agent.Type: GrantFiled: October 1, 2019Date of Patent: November 22, 2022Assignee: FUJITSU LIMITEDInventors: Kotaro Ohori, Shohei Yamane, Hiroaki Yamada, Shingo Takahashi
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Publication number: 20220271245Abstract: A photoelectric conversion element according to an embodiment of the present disclosure includes: a first electrode; a second electrode opposed to the first electrode; and an organic photoelectric conversion layer provided between the first electrode and the second electrode and formed using a plurality of materials having average particle diameters different from each other, the plurality of materials including at least fullerene or a derivative thereof, and a particle diameter ratio, of a first material having a smallest average particle diameter among the plurality of materials with respect to a second material having a largest average particle diameter among the plurality of materials, is 0.6 or less.Type: ApplicationFiled: May 2, 2022Publication date: August 25, 2022Inventor: SHINGO TAKAHASHI
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Patent number: D1022418Type: GrantFiled: October 6, 2022Date of Patent: April 16, 2024Assignee: ASICS CORPORATIONInventors: Genki Hatano, Kenta Tateno, Waka Inoue, Shingo Takahashi, Masaki Oohara, Norihiko Taniguchi