Patents by Inventor Shinichi Hamaguchi

Shinichi Hamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170229285
    Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen.
    Type: Application
    Filed: January 10, 2017
    Publication date: August 10, 2017
    Inventors: Shinichi Hamaguchi, Hitoshi Tanaka, Atsushi Tokuno, Shinichi Kojima, Akio Yamada
  • Publication number: 20170168428
    Abstract: The present invention relates to an intermediate transfer member and an image forming apparatus. The intermediate transfer member is an intermediate transfer member having a resin-made base material layer and a surface layer; the surface layer is a cured substance of a composition containing a radically polymerizable vinylic compound and a metal oxide fine particle; and the vinylic compound has a structural unit represented by the following formula (1): wherein each R1 independently denotes a C2-8 alkylene group; each R2 independently denotes a hydrogen atom or a methyl group; and m denotes a positive number, and n denotes a positive number of 10 or more.
    Type: Application
    Filed: November 29, 2016
    Publication date: June 15, 2017
    Inventors: Akihiro HONYA, Shinichi HAMAGUCHI, Shinichi YABUKI
  • Patent number: 9511335
    Abstract: A manufacturing method of an organic-inorganic composite material includes a flocculation and fusion step to flocculate and fuse composite particles in a liquid medium, the composite particles being formed by inorganic fine particles being coated by coating layers. In one embodiment, an average particle diameter of the inorganic fine particles is 1 nm or larger and 30 nm or smaller.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: December 6, 2016
    Assignee: KONICA MINOLTA, INC.
    Inventors: Shingo Fujimoto, Fumitaka Mochizuki, Shinichi Hamaguchi, Go Yamaguchi, Yohei Ohno, Ito Koga, Naoko Uemura
  • Patent number: 9478396
    Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.
    Type: Grant
    Filed: December 5, 2014
    Date of Patent: October 25, 2016
    Assignee: Advantest Corp.
    Inventors: Shinichi Hamaguchi, Masaki Kurokawa, Shinji Sugatani, Akio Yamada
  • Patent number: 9400457
    Abstract: An intermediate transfer element is included in an image formation apparatus, has a shape like an endless belt, and includes at least a resin base material layer and a surface layer. The surface layer is composed of a cured (meth)acrylic resin, the cured (meth)acrylic resin contains a constitutional unit derived from a polyfunctional (meth)acrylic monomer, the polyfunctional (meth)acrylic monomer contains n alkylene oxide structures and m (meth)acryloyl groups, with relation of n/m?5 and m?3 (n and m being a positive integer) being satisfied, and the alkylene oxide structure contains an alkylene group having a carbon number not smaller than 2.
    Type: Grant
    Filed: January 11, 2016
    Date of Patent: July 26, 2016
    Assignee: KONICA MINOLTA, INC.
    Inventors: Akihiro Honya, Shinichi Hamaguchi
  • Publication number: 20160209781
    Abstract: An intermediate transfer element is included in an image formation apparatus, has a shape like an endless belt, and includes at least a resin base material layer and a surface layer. The surface layer is composed of a cured (meth)acrylic resin, the cured (meth)acrylic resin contains a constitutional unit derived from a polyfunctional (meth)acrylic monomer, the polyfunctional (meth)acrylic monomer contains n alkylene oxide structures and m (meth)acryloyl groups, with relation of n/m?5 and m?3 (n and m being a positive integer) being satisfied, and the alkylene oxide structure contains an alkylene group having a carbon number not smaller than 2.
    Type: Application
    Filed: January 11, 2016
    Publication date: July 21, 2016
    Inventors: Akihiro HONYA, Shinichi HAMAGUCHI
  • Publication number: 20160038636
    Abstract: The present invention relates to water soluble quaternized chitosan derivatives which form hydrogel matrix with broad antimicrobial properties for the protection and coating of medical device. Hydrogel is attractive as an antimicrobial coating since its hydrophilicity intrinsically prevents the reversible nonspecific attachment of microbes. In order to achieve hydrogel formation, quaternized chitosan can be grafted with polymerizable groups, especially photocrosslinkable groups, such as methacrylates, PEG derivatives and be converted into hydrogels through a thermal or UV polymerization process. Hydrogels are hydrated cross-linked polymeric systems that contain water in an equilibrium state forming cushion water shield. The present invention is widely used in many medical devices.
    Type: Application
    Filed: October 26, 2015
    Publication date: February 11, 2016
    Inventors: Chan Bee Eng Mary, Poon Yin Fun, Mouad Lamrani, Shinichi Hamaguchi
  • Patent number: 9213240
    Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.
    Type: Grant
    Filed: February 26, 2015
    Date of Patent: December 15, 2015
    Assignee: Advantest Corp.
    Inventors: Shinichi Hamaguchi, Masaki Kurokawa, Masahiro Takizawa
  • Patent number: 9201320
    Abstract: Disclosed is a production process of an organic photoreceptor which can suppress occurrence of uneven density and image defects. The production process of an organic photoreceptor, the organic photoreceptor including an intermediate layer and an organic photosensitive layer on the intermediate layer, includes: applying a coating liquid for forming the intermediate layer to a conductive support to form a coating film, the coating liquid being obtained by dissolving a binder resin in a solvent and dispersing first and second metal oxide fine particles therein; and drying the coating film. The Pe number of the first metal oxide fine particles is two or more times larger than that of the second metal oxide fine particles.
    Type: Grant
    Filed: June 3, 2014
    Date of Patent: December 1, 2015
    Assignee: KONICA MINOLTA, INC.
    Inventors: Hiroshi Nakahara, Shinichi Hamaguchi, Tomoo Sakimura, Mayuko Matsusaki
  • Patent number: 9199000
    Abstract: The present invention relates to water soluble quaternized chitosan derivatives which form hydrogel matrix with broad antimicrobial properties for the protection and coating of medical device. Hydrogel is attractive as an antimicrobial coating since its hydrophilicity intrinsically prevents the reversible nonspecific attachment of microbes. In order to achieve hydrogel formation, quaternized chitosan can be grafted with polymerizable groups, especially photocrosslinkable groups, such as methacrylates, PEG derivatives and be converted into hydrogels through a thermal or UV polymerization process. Hydrogels are hydrated cross-linked polymeric systems that contain water in an equilibrium state forming cushion water shield. The present invention is widely used in many medical devices.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: December 1, 2015
    Assignee: Nanyang Technological University
    Inventors: Chan Bee Eng Mary, Poon Yin Fun, Mouad Lamrani, Shinichi Hamaguchi
  • Publication number: 20150243482
    Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.
    Type: Application
    Filed: February 26, 2015
    Publication date: August 27, 2015
    Inventors: Shinichi Hamaguchi, Masaki Kurokawa, Masahiro Takizawa
  • Patent number: 9116434
    Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.
    Type: Grant
    Filed: October 17, 2013
    Date of Patent: August 25, 2015
    Assignee: Advantest Corp.
    Inventors: Shinichi Hamaguchi, Masaki Kurokawa, Masahiro Takizawa
  • Publication number: 20150200074
    Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.
    Type: Application
    Filed: December 5, 2014
    Publication date: July 16, 2015
    Inventors: Shinichi Hamaguchi, Masaki Kurokawa, Shinji Sugatani, Akio Yamada
  • Publication number: 20150174609
    Abstract: Disclosed is a manufacturing method of an organic-inorganic composite material including a flocculation and fusion step to flocculate and fuse composite particles in a liquid medium, the composite particles being formed by inorganic fine particles being coated by coating layers.
    Type: Application
    Filed: December 15, 2014
    Publication date: June 25, 2015
    Inventors: Shingo FUJIMOTO, Fumitaka MOCHIZUKI, Shinichi HAMAGUCHI, Go YAMAGUCHI, Yohei OHNO, Ito KOGA, Naoko UEMURA
  • Patent number: 9063448
    Abstract: The present invention provides an electrophotographic photoconductor including an electrically conductive substrate, an intermediate layer, and a photosensitive layer that are formed on the electrically conductive support, the intermediate layer including first titanium oxide particles surface-treated with a first reactive organic silicon compound, second titanium oxide particles surface-treated with a second reactive organic silicon compound different from the first reactive organic silicon compound, and a binder resin. The first reactive organic silicon compound is methyl hydrogen polysiloxane. The second reactive organic silicon compound is a compound represented by the following general formula (1): R—Si—(X)3??(1) R represents a alkyl group having 1 to 10 carbon atoms substituted by at least one of acryloxy and methacryloxy groups or unsubstituted; and X represents an alkoxy group having 1 to 4 carbon atoms or a halogen atom.
    Type: Grant
    Filed: July 19, 2013
    Date of Patent: June 23, 2015
    Assignee: KONICA MINOLTA, INC.
    Inventors: Shinichi Hamaguchi, Tomoo Sakimura, Mayuko Matsusaki, Hiroshi Nakahara
  • Patent number: 9038839
    Abstract: A box includes a first cover and a second cover have engaging mechanisms which engage the one end of the first cover to the one end of the second cover, and have retaining mechanisms which retain the other end of the first cover to the other end of the second cover. The first cover and the second cover are fit to each other in a normal state when the engaging mechanisms are engaged with each other and the retaining mechanisms are retained normally. When an engagement between the engaging mechanisms is in an abnormal state, a projection abuts against at least the other of the one end of the first cover and the one end of the second cover so that a gap is formed and the interior component housed in the internal space can be seen through the gap.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: May 26, 2015
    Assignee: YAZAKI CORPORATION
    Inventors: Makoto Nakayama, Shinichi Hamaguchi
  • Publication number: 20140377702
    Abstract: Disclosed is a production process of an organic photoreceptor which can suppress occurrence of uneven density and image defects. The production process of an organic photoreceptor, the organic photoreceptor including an intermediate layer and an organic photosensitive layer on the intermediate layer, includes: applying a coating liquid for forming the intermediate layer to a conductive support to form a coating film, the coating liquid being obtained by dissolving a binder resin in a solvent and dispersing first and second metal oxide fine particles therein; and drying the coating film. The Pe number of the first metal oxide fine particles is two or more times larger than that of the second metal oxide fine particles.
    Type: Application
    Filed: June 3, 2014
    Publication date: December 25, 2014
    Applicant: Konica Minolta, Inc.
    Inventors: Hiroshi NAKAHARA, Shinichi HAMAGUCHI, Tomoo SAKIMURA, Mayuko MATSUSAKI
  • Patent number: 8808954
    Abstract: The present invention provides an electrophotographic photoconductor that can improve unevenness in image density and reduce image defects such as fogging and dots. The electrophotographic photoconductor includes a conductive support, an intermediate layer, and a photosensitive layer. The intermediate layer includes metal oxide particles surface-treated with a titanium chelate compound represented by the following formula (1): Ti(OR)n(L)4-n??(1) wherein R at each occurrence independently represents a C1-16 aliphatic hydrocarbon group; L at each occurrence independently represents a ligand derived from a chelating agent selected from the group consisting of ?-ketoester represented by the following formula (1a): ?-diketone represented by the following formula (1b): and a C3-10 alkylene glycol; n represents an integer of 1 to 3; if n is 2 or more, two Rs may be coupled to each other.
    Type: Grant
    Filed: May 8, 2012
    Date of Patent: August 19, 2014
    Assignee: Konica Minolta Business Technologies, Inc.
    Inventors: Mayuko Matsusaki, Tomoo Sakimura, Shinichi Hamaguchi
  • Publication number: 20140193476
    Abstract: The present invention relates to water soluble quaternized chitosan derivatives which form hydrogel matrix with broad antimicrobial properties for the protection and coating of medical device. Hydrogel is attractive as an antimicrobial coating since its hydrophilicity intrinsically prevents the reversible nonspecific attachment of microbes. In order to achieve hydrogel formation, quaternized chitosan can be grafted with polymerizable groups, especially photocrosslinkable groups, such as methacrylates, PEG derivatives and be converted into hydrogels through a thermal or UV polymerization process. Hydrogels are hydrated cross-linked polymeric systems that contain water in an equilibrium state forming cushion water shield. The present invention is widely used in many medical devices.
    Type: Application
    Filed: March 13, 2014
    Publication date: July 10, 2014
    Applicants: NANYANG TECHNOLOGICAL UNIVERSITY, MENICON CO., LTD.
    Inventors: Chan Bee Eng Mary, Poon Yin Fun, Mouad Lamrani, Shinichi Hamaguchi
  • Publication number: 20140178809
    Abstract: According to the present invention, an electrophotographic photoreceptor comprising an intermediate layer is provided. The intermediate layer is a single layer and contains first metal oxide particles, second metal oxide particles having higher electron-transporting properties than those of the first metal oxide particle and a binder resin. The first metal oxide particles are unevenly distributed in the thickness direction of the intermediate layer.
    Type: Application
    Filed: November 27, 2013
    Publication date: June 26, 2014
    Applicant: Konica Minolta, Inc.
    Inventors: Mayuko MATSUSAKI, Tomoo SAKIMURA, Shinichi HAMAGUCHI, Hiroshi NAKAHARA