Abstract: An electrophotoreceptor, comprises a conductive support; a photoreceptive layer, an intermediate layer provided between the conductive support and the photoreceptive layer, the intermediate layer containing N type semi-conductive fine particles and a binder resin, wherein the N type semi-conductive fine particles are subjected to plural surface treatments, and the final surface treatment is carried out employing a reactive organic silicon compound.

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams, includes: a plurality of electron guns operable to generate the electron beams; a voltage controller, electrically connected to the electron guns, operable to apply different voltages to the electron guns; and a multi-axis electron lens operable to converge the electron beams independently of each other.

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings and a plurality of dummy openings. The lens openings allow the electron beams to pass therethrough, respectively, so as to converge the electron beams independently of each other. The dummy openings allow no electron beam to pass therethrough.

Abstract: An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.

Abstract: An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.

Abstract: An electron beam exposure apparatus for exposing a wafer of the present invention includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and an illumination switching unit operable to switch whether or not electron beams are to be incident on the wafer, for each electron beam independently of other electron beams.

Abstract: An electrophotographic photoreceptor and a cleaning method of the support therefor are disclosed. The element of Si and Na remaining on the support surface, evaluated in terms of ESCA, has the following relation with a major element constituting the support;0<[Si(surf)/Xs-Si(bulk)/Xb].ltoreq.0.50<[Na(surf)/Xs-Na(bulk)/Xb].ltoreq.0.3,whereinSi(surf): ESCA measurement (silicon) of a support surface after cleaningNa(surf): ESCA measurement (sodium) of a support surface after cleaningSi(bulk): ESCA measurement (silicon) of a support bulkNa(bulk): ESCA measurement (sodium) of a support bulkXs: ESCA measurement (support surface after cleaning) of a major element constituting a supportXb: ESCA measurement (support bulk) of a major element constituting a support.

Abstract: An exposure data organizing method, and an exposure apparatus operable in accordance with the method, organizes exposure data defining a composite pattern to be exposed. The composite pattern comprises at least one compressed, repeating exposure pattern and a non-compressed, non-repeating exposure pattern each comprising plural predefined unit deflection region to which respectively corresponding portions of the exposure data relate. The exposure patterns are relatively arranged in accordance with the composite pattern and respective, individual identifying members are assigned thereto.