Abstract: A vehicle traveling control apparatus for controlling following travel in which a host vehicle travels to follow a preceding vehicle traveling ahead, includes: a preceding vehicle biased travel determination unit calculating a lateral position inside a lane of the preceding vehicle, and determining whether the preceding vehicle biasedly travels while deviating from a setting range at a lane center; and a control target point setting unit setting, as a control target point of the following travel, a setting position in a vehicle width direction of the preceding vehicle in a case where it is determined that the preceding vehicle does not biasedly travel, and a position shifted as much as a predetermined shift amount from the setting position in a direction opposite to a direction in which the preceding vehicle deviates from the setting range in a case where it is determined that the preceding vehicle biasedly travels.

Abstract: A photomask blank comprising a transparent substrate (1), an etching stop film (2), a light-shielding film (3), and an etching mask film (4) has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film (2) consists of a first layer (21) which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer (22) functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.

Abstract: A vehicle traveling control apparatus for controlling following travel in which a host vehicle travels to follow a preceding vehicle traveling ahead, includes: a preceding vehicle biased travel determination unit calculating a lateral position inside a lane of the preceding vehicle, and determining whether the preceding vehicle biasedly travels while deviating from a setting range at a lane center; and a control target point setting unit setting, as a control target point of the following travel, a setting position in a vehicle width direction of the preceding vehicle in a case where it is determined that the preceding vehicle does not biasedly travel, and a position shifted as much as a predetermined shift amount from the setting position in a direction opposite to a direction in which the preceding vehicle deviates from the setting range in a case where it is determined that the preceding vehicle biasedly travels.

Abstract: A photomask blank comprising a transparent substrate (1), an etching stop film (2), a light-shielding film (3), and an etching mask film (4) has on the substrate side a reflectance of up to 35% with respect to exposure light. The etching stop film (2) consists of a first layer (21) which is disposed contiguous to the substrate and functions as an antireflective layer and a second layer (22) functioning as a fluorine-base dry etching-resistant layer, one of the first and second layers is a layer having compressive stress and the other is a layer having tensile stress.

Abstract: A wire harness manufacturing method includes a first step of covering a periphery of the wire with a molded body (13) having a thermoplastic material, and heating the molded body (13) to a temperature at which plastic deformation by thermo plasticity is possible and pressuring the molded body (13) to have predetermined cross-sectional shape and size. The method also includes a second step of, after the first step, while the molded body (13) has the temperature at which plastic deformation by thermo plasticity is possible, molding the thermoplastic material to have a predetermined axial shape, and cooling the molded body (13) having the predetermined axial shape.

Abstract: A photomask is manufactured by providing a photomask blank comprising a transparent substrate, a phase shift film, and a light-shielding film, the phase shift film and the light-shielding film including silicon base material layers, a N+O content in the silicon base material layer of the phase shift film differing from that of the light-shielding film, and chlorine dry etching the blank with oxygen-containing chlorine gas in a selected O/Cl ratio for selectively etching away the silicon base material layer of the light-shielding film.

Abstract: In conjunction with a photomask blank comprising a transparent substrate, a pattern-forming film, and an etch mask film, a set of etching conditions for the pattern-forming film is evaluated by measuring a first etching clear time (C1) taken when the etch mask film is etched under the etching conditions to be applied to the pattern-forming film, measuring a second etching clear time (C2) taken when the pattern-forming film is etched under the etching conditions, and computing a ratio (C1/C2) of the first to second etching clear time.

Abstract: Disclosed herein is a dry etching method for a work layer formed over a substrate, including the steps of forming a hard mask layer over the work layer formed over the substrate, forming a resist pattern over the hard mask layer, transferring the resist pattern to the hard mask layer by first dry etching conducted using the resist pattern, and patterning the work layer by second dry etching conducted using a hard mask pattern obtained upon the transfer to the hard mask layer, wherein after the hard mask layer is patterned by the first dry etching, the patterning of the work layer by the second dry etching is conducted through changing the concentration of an auxiliary ingredient of a dry etching gas, without changing a main ingredient of the dry etching gas, in an etching apparatus in which the first dry etching has been conducted.

Abstract: A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank.

Abstract: In a photomask blank comprising a transparent substrate, an optical film of material containing a transition metal and silicon, and a hard mask film, the hard mask film is a multilayer film including a first layer of a chromium-based material containing 20-60 atom % of oxygen and a second layer of a chromium-based material containing at least 50 atom % of chromium and less than 20 atom % of oxygen. The hard mask film having a thickness of 2.0 nm to less than 10 nm is resistant to fluorine dry etching.

Abstract: A wire harness has an exterior component (11a) that covers a certain part of at least one wires (12). The exterior component (11a) has parts having different hardness, including a relatively hard first part (111a), a relatively soft second part (112a), and a third part (113a) having an intermediate hardness between that of the first parts (111a, 112a). The first part is formed on a surface of the exterior component and functions as a shape keeping member and a protector. The second and third parts (112a, 113a) surround the certain part of the at least one wire 12 and each functions as a cushioning material and a muffler/soundproofing material. The first part (111a), the second part (112a), and the third part (113a) are formed integrally from a non-woven fabric (2) with thermo plasticity.

Abstract: An electric wire protection structure has a structure in which a branch portion of an electric wire bundle is protected. In the electric wire protection structure, a protection portion covers the branch portion of the electric wire bundle, the protection portion being formed by heating and compressing a thermoplastic material in a state of covering at least the branch portion of the electric wire bundle.

Abstract: In a photomask blank comprising a transparent substrate, an optical film of material containing a transition metal and silicon, and a hard mask film, the hard mask film is a multilayer film including a first layer of a chromium-based material containing 20-60 atom % of oxygen and a second layer of a chromium-based material containing at least 50 atom % of chromium and less than 20 atom % of oxygen. The hard mask film having a thickness of 2.0 nm to less than 10 nm is resistant to fluorine dry etching.

Abstract: A wire harness has an exterior component (11a) that covers a certain part of at least one wires (12). The exterior component (11a) has parts having different hardness, including a relatively hard first part (111a), a relatively soft second part (112a), and a third part (113a) having an intermediate hardness between that of the first parts (111a, 112a). The first part is formed on a surface of the exterior component and functions as a shape keeping member and a protector. The second and third parts (112a, 113a) surround the certain part of the at least one wire 12 and each functions as a cushioning material and a muffler/soundproofing material. The first part (111a), the second part (112a), and the third part (113a) are formed integrally from a non-woven fabric (2) with thermo plasticity.

Abstract: It is an object of the present invention to provide a wire harness that has a simple structure, that can be easily manufactured, and that includes a protective member having an extra-length absorbing function. A wire harness (1) includes an electrical wire bundle (12) and a protective member (21). The protective member (21) is a member obtained by heat-molding a nonwoven fabric, covers a portion in the longitudinal direction of the electrical wire bundle (12), and has a spiral shape or helical shape in which a curved portion is formed with a continuous turn in the longitudinal direction or has a meander shape in which a plurality of curved portions are formed with intermittent turns in the longitudinal direction.

Abstract: A wire harness protection structure includes a bundle of electric wires, and a protector formed into a tubular body that extends in a longitudinal direction of the bundle of electric wires and having a portion of the bundle of electric wires provided in an inner space of the tubular body. The protector is formed of a protection material including a base material and a binder material having a melting point lower than that of the base material. A joint portion of the protector is joined by heating and melting and then cooling and solidifying the binder material. The binder material in an inner peripheral surface is heated and melted and then cooled and solidified such that the inner peripheral surface, which faces the inner space, is harder than an outer peripheral surface of the protector.

Abstract: A wire harness includes a bundle of electric wires and a protector protecting the bundle of electric wires by extending in a longitudinal direction of the bundle of electric wires and surrounding a portion thereof. The protector includes a base material and a binder material having a lower melting point than the base material, the protector being joined in a joint portion thereof by cooling and solidifying the melted binder material. In a case where a first side portion and a second side portion are each provided as a portion along the longitudinal direction in an outer peripheral surface of the protector and the second side portion is disposed opposite the first side portion with the bundle of electric wires therebetween, a portion of the binder material in each of the first side portion and the second side portion is melted, cooled, and solidified such that the second side portion is harder than the first side portion.

Abstract: A connector fixing structure includes a connector provided at one end of an electric wire, a protector surrounding a portion of the electric wire, and a fixing portion integrally formed with the protector and fixating the connector. The protector and the fixing portion are formed of a protection material that includes a base material and a binder material having a melting point lower than that of the base material. The protector and the fixing portion are joined at each joint portion by cooling and solidifying the melted binder material.

Abstract: A wire protector is provided that is lightweight, that has a simple structure, and that is capable of covering a circumference of wires along a length direction thereof and of preventing an occurrence of noise due to contact with the wires sheathed therein. The wire protector covers the circumference of the wires in the length direction thereof, is configured with a cylindrical member made of a hot press processed non-woven fabric, is formed such that an inner surface is more pliable than an outer surface hardened by the hot press process, and has a slit from the outer surface to the inner surface formed along the entire length direction.

Abstract: A connector protection structure includes a connector electrically connected to an electric wire and a protector protecting the connector by surrounding the connector. The protector is formed of a protection material that includes a base material and a binder material having a melting point lower than that of the base material, and is joined in a joint portion thereof by cooling and solidifying the melted binder material. The connector is accommodated in an inner space formed in an inner surface of the protector. The binder material in the inner surface and outer surface is melted, cooled, and solidified such that the inner surface of the protector is harder than the outer surface of the protector.