Patents by Inventor Shinji Furukawa
Shinji Furukawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9567667Abstract: System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.Type: GrantFiled: September 18, 2014Date of Patent: February 14, 2017Assignee: Tokyo Electron LimitedInventors: Shinji Furukawa, Naoki Watanabe, Hiroshi Miki, Tooru Kitada, Yasuhiko Kojima
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Patent number: 9551060Abstract: A film forming apparatus, for forming a metal oxide film on an object, includes a holding unit and a heating unit. The holding unit includes a first heater and holds the object in a processing chamber. A first heater power supply supplies power to the first heater. A target electrode is electrically connected to a metal target provided above the holding unit. A sputtering power supply is electrically connected to the target electrode. An introduction mechanism supplies an oxygen gas toward the holding unit. The heating unit includes a second heater for heating the object and a moving mechanism for moving the second heater between a region in a first space disposed above the holding unit and a region in a second space separated from the first space. A second heater power supply supplies power to the second heater.Type: GrantFiled: July 27, 2015Date of Patent: January 24, 2017Assignee: TOKYO ELECTRON LIMITEDInventors: Atsushi Gomi, Kanto Nakamura, Tooru Kitada, Yasunobu Suzuki, Shinji Furukawa
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Patent number: 9362167Abstract: A method of supplying cobalt to a recess formed in an insulation film of an object to be processed is disclosed. In one embodiment, the method includes forming a cobalt nitride film on a surface of the insulation film comprising a surface defining the recess, forming a cobalt film on the cobalt nitride film, and heating the cobalt film.Type: GrantFiled: February 12, 2015Date of Patent: June 7, 2016Assignee: TOKYO ELECTRON LIMITEDInventors: Atsushi Shimada, Shinji Furukawa, Tatsuo Hatano
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Publication number: 20160071707Abstract: A processing apparatus includes a processing chamber, a rotatable mounting table, a cooling mechanism and a driving mechanism. A sputtering target is provided in the processing chamber. The rotatable mounting table is provided in the processing chamber and configured to mount thereon an object to be processed. The cooling mechanism is configured to cool the mounting table. The driving mechanism is configured to change a relative position of the mounting table with respect to the cooling mechanism. The driving mechanism changes a conductivity of heat from the mounting table to the cooling mechanism at least by switching a first state in which the mounting table and the cooling mechanism are separated from each other and a second state in which the mounting table and the cooling mechanism become close to each other.Type: ApplicationFiled: September 1, 2015Publication date: March 10, 2016Inventors: Shinji FURUKAWA, Hiroyuki TOSHIMA, Tooru KITADA, Kanto NAKAMURA, Kazunaga ONO
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Publication number: 20160032446Abstract: A film forming apparatus, for forming a metal oxide film on an object, includes a holding unit and a heating unit. The holding unit includes a first heater and holds the object in a processing chamber. A first heater power supply supplies power to the first heater. A target electrode is electrically connected to a metal target provided above the holding unit. A sputtering power supply is electrically connected to the target electrode. An introduction mechanism supplies an oxygen gas toward the holding unit. The heating unit includes a second heater for heating the object and a moving mechanism for moving the second heater between a region in a first space disposed above the holding unit and a region in a second space separated from the first space. A second heater power supply supplies power to the second heater.Type: ApplicationFiled: July 27, 2015Publication date: February 4, 2016Inventors: Atsushi GOMI, Kanto NAKAMURA, Tooru KITADA, Yasunobu SUZUKI, Shinji FURUKAWA
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Publication number: 20150243556Abstract: A method of supplying cobalt to a recess formed in an insulation film of an object to be processed is disclosed. In one embodiment, the method includes forming a cobalt nitride film on a surface of the insulation film comprising a surface defining the recess, forming a cobalt film on the cobalt nitride film, and heating the cobalt film.Type: ApplicationFiled: February 12, 2015Publication date: August 27, 2015Inventors: Atsushi SHIMADA, Shinji FURUKAWA, Tatsuo HATANO
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Publication number: 20150235815Abstract: An apparatus includes a row of substrate transfer devices 3 which can deliver a wafer W within a transfer chamber; and rows of process modules PM, arranged at right and left sides of the row of the substrate transfer devices along the row, configured to perform processes to the wafer W. The rows of the process modules PM are arranged such that each of the processes can be performed by at least two process modules PM. Thus, when a single process module PM cannot be used, the wafer W can be rapidly transferred to another process module PM which can perform the same process as performed in the corresponding process module. Therefore, even when the single process module PM cannot be used, the processes can be continued to the wafers W without stopping an operation of the apparatus, so that the number of wasted wafers W can be reduced.Type: ApplicationFiled: April 30, 2013Publication date: August 20, 2015Inventors: Atsushi Gomi, Tetsuya Miyashita, Shinji Furukawa, Koji Maeda, Masamichi Hara, Naoyuki Suzuki, Hiroshi Miki, Toshiharu Hirata
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Publication number: 20150187546Abstract: The present disclosure provides a vacuum-processing apparatus for forming a metal film on a substrate by sputtering targets with ions of plasma, and then oxidizing the metal film, the apparatus including: a first target composed of a material having a property of adsorbing oxygen; a second target composed of a metal; a power supply unit configured to apply a voltage to the targets; a shutter configured to prevent particles generated from one of the targets from adhering to the other of the targets; a shielding member; an oxygen supply unit configured to supply an oxygen-containing gas to the substrate mounted on the mounting unit; and a control unit configured to perform supplying a plasma-generating voltage to the targets and sputtering the targets and supplying the oxygen-containing gas from the oxygen supply unit to the substrate.Type: ApplicationFiled: April 30, 2013Publication date: July 2, 2015Inventors: Shinji Furukawa, Atsushi Gomi, Tetsuya Miyashita, Toru Kitada, Kanto Nakamura
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Publication number: 20150114835Abstract: A film forming apparatus includes a stage provided in the processing chamber; three or more targets uniformly arranged along a circle centering around a vertical axis line that passes through a center of the stage, each of the targets having a substantially rectangular shape; a shutter provided between the targets and the stage, the shutter including an opening which allows one of the targets to be selectively exposed to the stage; and a rotation shaft coupled to the shutter, the rotation shaft extending along the vertical axis line. A width of the opening in a tangent direction to the circle centering around the vertical axis line is set such that two adjacent targets in a circumferential direction of the circle among the targets are allowed to be partially and simultaneously exposed to the stage.Type: ApplicationFiled: October 27, 2014Publication date: April 30, 2015Inventors: Atsushi GOMI, Shinji FURUKAWA, Kanto NAKAMURA, Kazunaga ONO
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Patent number: 9001236Abstract: An image processing apparatus includes an image file creation unit, a storage control unit, an extracting unit, and a display controller. The image file creation unit is configured to create a file including a plurality of images, first management information indicating a specified Exif version, and second management information including an image size and a total number of the images in the file. The storage control unit is configured to store the image file in a storage. The extraction unit is configured to extract the image from the image file in the storage based on the second management information. The display controller is configured to display the image on a display.Type: GrantFiled: September 22, 2011Date of Patent: April 7, 2015Assignee: Sony CorporationInventor: Shinji Furukawa
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Publication number: 20150075971Abstract: System and method of insulating film deposition. A sputter deposition chamber comprises a pair of targets made of the same insulating material. Each target is applied with a high frequency power signal concurrently. A phase adjusting unit is used to adjust the phase difference between the high frequency power signals supplied to the pair of targets to a predetermined value, thereby improving the in-plane thickness distribution of a resultant film. The predetermined value is target material specific.Type: ApplicationFiled: September 18, 2014Publication date: March 19, 2015Inventors: Shinji FURUKAWA, Naoki WATANABE, Hiroshi MIKI, Tooru KITADA, Yasuhiko KOJIMA
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Patent number: 8932438Abstract: The magnetic anisotropy of a magnetic layer in a spin valve tunnel magnetoresistive element or giant magnetoresistive element is enhanced. Deposition of the magnetic layer is performed by making sputtering particles obliquely incident on a substrate from a certain incident direction at a certain incident angle.Type: GrantFiled: December 20, 2010Date of Patent: January 13, 2015Assignee: Canon Anelva CorporationInventors: Koji Tsunekawa, Hiroyuki Hosoya, Yoshinori Nagamine, Shinji Furukawa, Naoki Watanabe
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Patent number: 8837924Abstract: The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (1), a halogen lamp (2) which emits heating light, a quartz window (3) for allowing the heating light to enter the vacuum chamber (1), a substrate supporting base (9) having a cooling function, and a lift pin (13) which causes the substrate (5) to stand still at a heating position P3 and a cooling position P1 and moves the substrate (5) between the heating position P3 and the cooling position P1.Type: GrantFiled: November 30, 2011Date of Patent: September 16, 2014Assignee: Canon Anelva CorporationInventors: Koji Tsunekawa, Yoshinori Nagamine, Shinji Furukawa
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Patent number: 8715417Abstract: The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.Type: GrantFiled: January 18, 2013Date of Patent: May 6, 2014Assignee: Canon Anelva CorporationInventors: Shinji Furukawa, Masahiro Shibamoto
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Patent number: 8377210Abstract: The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.Type: GrantFiled: April 18, 2011Date of Patent: February 19, 2013Assignee: Anelva CorporationInventors: Shinji Furukawa, Masahiro Shibamoto
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Publication number: 20120193071Abstract: The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (1), a halogen lamp (2) which emits heating light, a quartz window (3) for allowing the heating light to enter the vacuum chamber (1), a substrate supporting base (9) having a cooling function, and a lift pin (13) which causes the substrate (5) to stand still at a heating position P3 and a cooling position P1 and moves the substrate (5) between the heating position P3 and the cooling position P1.Type: ApplicationFiled: November 30, 2011Publication date: August 2, 2012Applicant: CANON ANELVA CORPORATIONInventors: Koji Tsunekawa, Yoshinori Nagamine, Shinji Furukawa
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Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus
Patent number: 8147924Abstract: An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.Type: GrantFiled: September 2, 2008Date of Patent: April 3, 2012Assignee: Canon Anelva CorporationInventors: Naoki Watanabe, Nobuyoshi Watanabe, Kazunori Tani, Shinji Furukawa, Hiromi Sasaki, Osamu Watabe -
Publication number: 20120008013Abstract: An image processing apparatus includes an image file creation unit, a storage control unit, an extracting unit, and a display controller. The image file creation unit is configured to create a file including a plurality of images, first management information indicating a specified Exif version, and second management information including an image size and a total number of the images in the file. The storage control unit is configured to store the image file in a storage. The extraction unit is configured to extract the image from the image file in the storage based on the second management information. The display controller is configured to display the image on a display.Type: ApplicationFiled: September 22, 2011Publication date: January 12, 2012Applicant: Sony CorporationInventor: Shinji FURUKAWA
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Patent number: 8049793Abstract: An image processing apparatus includes an image file creation unit, a storage control unit, an extracting unit, and a display controller. The image file creation unit is configured to create a file including a plurality of images, first management information indicating a specified Exif version, and second management information including an image size and a total number of the images in the file. The storage control unit is configured to store the image file in a storage. The extraction unit is configured to extract the image from the image file in the storage based on the second management information. The display controller is configured to display the image on a display.Type: GrantFiled: June 21, 2010Date of Patent: November 1, 2011Assignee: Sony CorporationInventor: Shinji Furukawa
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Publication number: 20110192344Abstract: The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.Type: ApplicationFiled: April 18, 2011Publication date: August 11, 2011Applicant: ANELVA CORPORATIONInventors: Shinji FURUKAWA, Masahiro SHIBAMOTO