Abstract: Disclosed is a radiation ray sensitive resin composition comprising a water-insoluble, alkali-soluble resin, a water-insoluble, alkali-soluble low-molecular compound and a radiation ray sensitive component, in which said radiation ray sensitive component contains a mixture composed of (A) a napthoquinonediazide sulfonic acid diester of water-insoluble, alkali-soluble low-molecular compounds having three and/or four phenolic hydroxyl groups and (B) a napthoquinonediazide sulfonic acid ester of a water-insoluble, alkali-soluble low-molecular compound having from 5 to 7 phenolic hydroxyl groups, in an amount of 30% or more of said radiation ray sensitive component. The composition is a positive type photoresist having a high resolution and small film thickness dependence. This has a broad latitude for development and leaves a small resist residue after development. This has high heat resistance and is therefore highly resistant to dry etching.

Abstract: Provided is a positive photoresist composition comprising (A) an alkali-soluble resin prepared by condensation of aldehydes and a mixture of phenols, which comprises (i) thymol, isothymol or a thymol-isothymol mixture and (ii) one or more of a phenol compound represented by the following formula (I); ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group, and optionally, as a third monomer, (iii) a phenol compound other than m-cresol; (B) 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent; and (C) a low molecular weight compound having from 12 to 50 carbon atoms in all and from 2 to 8 phenolic hydroxy groups.

Abstract: Provided is a positive working photoresist composition which comprises an alkali-soluble resin and a 1,2-quinonediazide compound, with the resin being a novolak resin obtained by the condensation reaction of monomers comprising specified phenol compounds with formaldehyde.

Abstract: A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.

Abstract: A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.

Abstract: There is provided a positive working photosensitive composition suitable for photosensitive lithographic printing plate or photoresist for fine processing, which comprises a quinonediazide ester compound having the structure characterized by containing in the same molecule both quinonediazide structure and N-sulfonylamide [--C(.dbd.O)--NHSO.sub.2 --] or sulfonamide [--NHSO.sub.2 --] structure which are positioned independently of each other.

Abstract: The present invention provides a positive-working photoresist composition comprising an alkali-soluble resin and a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic ester of a specific water-insoluble alkali-soluble low molecular compound, wherein the high-performance liquid chromatography of the ester with an ultraviolet ray at 254 nm shows that the patterns corresponding to the diester components and complete ester component of the ester each fall within the specific range and a positive-working photoresist composition comprising a water-insoluble alkali-soluble resin, a water-insoluble alkali-soluble low molecular compound, and an ionization-sensitive radioactive compound which comprises a mixture of a naphthoquinone-diazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having three phenolic hydroxyl groups as an ionization-sensitive radioactive compound (A) and a naphthoquinonediazidesulfonic diester of a water-insoluble alkali-soluble low molecular compound having four phenoli

Abstract: A photoresist composition is disclosed containing an alkali-soluble resin and a photosensitive substance obtained by reaction of a polyhydroxy compound and (a) a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride(s), said photosensitive substance being a mixture of photosensitive compounds (1) to (3):(1) a photosensitive compound having at least one hydroxyl group per molecule and having a number ratio of 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride sulfonate groups to hydroxyl groups within the range of from 3 to 20, contained in the photosensitive substance in an amount of 50 wt % or more;(2) a photosensitive compound where all the hydroxyl groups in the polyhydroxy compound have been 1,2-naphthoquinonediazidosulfonyl-esterified, contained in the photosensitive substance in an amount of 30 wt % to 0 wt %; and(3) a photosensitive compound having three or more hydroxyl groups which have not been 1,2-naphthoquinonediazidosulfonyl-esterified per molecule, contained in the photosensitive subs

Abstract: A positive-type photoresist composition is described as including:(1) an alkali-soluble phenol novolak having a degree of dispersion of from 1.5 to 4.0;(2) a 1,2-quinone diazide compound; and(3) from 2 to 30% by weight, based on the above-mentioned novolak, of a low molecular weight compound having a total of from 12 to 50 carbon atoms per molecule and 2 to 8 phenolic hydroxyl groups per molecule. The degree of dispersion is determined from a weight-average molecular weight of the novolak and a number-average molecular weight of the novolak, both the weight-average and number-average molecular weights being obtained by gel penetration chromatography (GPC) defined by using standard polystyrene as a reference, such that the degree of dispersion is a ratio of the weight-average molecular weight to the number average molecular weight.The positive-type photoresist composition of the present invention is excellent in development latitude and has a high sensitivity and a high resolving power.

Abstract: A positive type photoresist composition which comprises an alkali soluble novolak resin and at least one light-sensitive material represented by the following general formulae (I) to (IV) to provide a resist pattern with high resolution, high reproduction fidelity, desirable sectional shape, wide latitude of development, high heat resistance and high storage stability: ##STR1## (wherein X represents --CO--, or --SO.sub.2 --; p represents an integer from 2 to 4; R's may be the same or different, each being --H, --OH, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, a substituted or unsubstituted aryl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted acyl group, a substituted or unsubstituted acyloxy group, ##STR2## provided that R always contains at least one of ##STR3## ; R.sub.

Abstract: A positive-working photoresist composition is disclosed, which comprises (1) a light-sensitive material obtained by reacting a polyhydroxy compound containing at least one group represented by the following general formula (I) per molecule with at least one of 1,2-naphthoquinonediazido-5-sulfonyl chloride and 1,2-naphthoquinonediazido-4-sulfonyl chloride, and (2) an alkali-soluble novolak resin: ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a C.sub.1 -C.sub.4 straight or branched alkyl or alkoxy group, provided that R.sub.1 and R.sub.2 do not represent hydrogen atoms at the same time; and X represents a divalent organic group.

Abstract: A light-sensitive resin composition comprising a light-sensitive substance represented by the formula (A) shown below and an alkali-soluble resin: ##STR1## wherein R.sub.1 to R.sub.8 are independently hydrogen, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an aralkyl group, an aryl group, an amino group, a monoalkylamino group, a dialkylamino group, an acylamino group, an alkylcarbamoyl group, an arylcarbamoyl group, an alkylsulfamoyl group, an arylsulfamoyl group, a carboxyl group, a cyano group, a nitro group, an acyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, an acyloxy group, -OD, or ##STR2## (wherein R is hydrogen, or an alkyl group, and D is a 1,2-naphthoquinonediazido-5-sulfonyl group or a 1,2-naphthoquinonediazido-4-sulfonyl group);R.sub.9 to R.sub.12 are independently hydrogen or a lower alkyl group; andZ is oxygen or a single bond; provided that at least one of R.sub.1 to R.sub.

Abstract: A retouchable mat film comprising a hydrophobic support which has formed thereon a mat layer containing silicon dioxide as a matting agent is disclosed. The mat layer further includes a mixture of poly(methyl methacrylate) or a copolymer containing at least 80 wt % of methyl methacrylate and a hydrophilic polymer as a binder. This mat film withstands several retouching operations in ink.

Abstract: A photographic image receiving element for a silver salt diffusion transfer process which comprises a hydrolyzable first alkali impermeable polymer layer applied on a base and an image receiving layer thereon comprising a hydrolyzable second alkali impermeable polymer layer containing silver precipitation nuclei which is prepared by hydrolyzing at least a part of the hydrolyzable second alkali impermeable polymer layer so as to be alkali permeable, the improvement wherein at least one hydrophilic copolymer layer containing at least one of gum arabic and arabic acid is coated between said first alkali impermeable polymer layer and said image receiving layer, and said first alkali impermeable polymer layer contains at least one compound represented by formula (I) or formula (II) ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.

Abstract: A retouchable mat film comprising a hydrophobic support which has formed thereon a mat layer containing silicon dioxide as a matting agent is disclosed. The mat layer further includes a mixture of poly(methyl methacrylate) or a copolymer containing at least 80 wt % of methyl methacrylate and a hydrophilic polymer as a binder. This mat film withstands several retouching operations in ink.

Abstract: An image-receiving element for a silver salt diffusion transfer process is described, having an excellent storability before and after development; said element has at least one hydrophilic polymer layer between a layer of a first hydrolyzable alkali-impermeable polymer and an alkali-permeable image-receiving layer which is obtained by hydrolysis at least a part of a layer of the second alkali-impermeable polymer, and which contains silver depositing nuclei, said first layer contains at least one diffusible organic solvent-soluble compound for modifying the photographic properties of a silver transfer image to be formed in the alkali-permeable polymer layer by photographic processing.

Abstract: A photographic element comprised of a support having provided thereon at least one silver halide emulsion layer, the element containing a development inhibitor precursor. The development inhibitor precursor is represented by the following general formula (I): ##STR1## wherein A represents an unsubstituted or substituted phenyl group or a 5-membered or 6-membered nitrogen-containing heterocyclic ring; R.sup.1 represents a hydrogen atom or a monovalent substituent; and R.sup.2 represents an organic ballasting group. The element is capable of providing color images having improved image quality particularly with respect to having a low density in the Dmin areas. The photographic element can be processed over a wide range of processing temperatures. Further, the element can be preserved for long periods of time without having a reduction in the density in the Dmax areas.

Abstract: A photographic recording material is disclosed. The material is comprised of a transparent support base and a number of layers positioned on that base. A dye ligand or a dye ligand-forming substance is positioned on the base and is associated with a light-sensitive silver halide emulsion. In addition, the material contains a mordant layer, an alkaline processing composition, and a means for releasing the composition throughout the photographic recording material in an integrated manner or as a different system. The mordant layer contains a coordination polymer composed of a ligand represented by a general formula (I) defined within the application and a metal ion. The invention makes it possible to immobilize a metal ion using inexpensive, easily available metal-chelatable ligands.

Abstract: An internal latent image silver halide emulsion is disclosed comprising core/shell silver halide particles having a chemically sensitized surface which are composed of a core of silver halide doped with metal ions and/or subjected to chemical sensitization and a shell which covers said core as far as to do at least the sensitive sites of said core and a binder, wherein said silver halide emulsions contain a polymer containing a repeating unit represented by the following general formula (I) in an amount of 2 mg to 1000 mg per mole of silver as the weight of said repeating units in said polymer: ##STR1## wherein R.sup.1 represents a hydrogen atom or an alkyl group and Q represents a group selected from the group consisting of the following (1)-(4): ##STR2## wherein q represents an integer of 2 to 4, ##STR3## wherein R.sup.2 and R.sup.3 each represents a hydrogen atom or an alkyl group, ##STR4## wherein Z.sup.

Abstract: A process for the preparation of an internal latent image type silver halide emulsion containing silver halide grains comprising a central core of silver halide doped with metal ions, chemically sensitized or a combination thereof and an outer shell of silver halide covering at least light-sensitive sites of the central core characterized in that the surface of the silver halide grains are chemically sensitized in the presence of a polymer containing the repeating unit represented by general formula (I) ##STR1## wherein symbols R.sup.1 and Q are defined in the specification.