Abstract: An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.

Abstract: A chair type stretching apparatus in this invention comprises a seat, a backrest, a flexible sheet, a tension means, and a controller. The flexible sheet is disposed on a top of the seat to extend an entire width of the seat. The tension means is provided on the seat and is configured to apply tensional force to the flexible sheet so as to move a center of the flexible sheet toward an upper direction of the seat. The controller is configured to control the tension means in order to move the center of the flexible sheet to a vertical direction. The tension means is provided on at least one width end of the seat in order to apply the tensional force along a width direction of the seat to the flexible sheet, whereby the tension means moves the center of the flexible sheet to the vertical direction.

Abstract: A chair-type massage machine includes a seat on which a user sits; a leg rest whose one end portion is pivotally connected with a front portion of the seat for pivotal movement up and down, the leg rest supporting calves of the user; a driving unit for pivotally moving the leg rest with respect to the seat; a footrest pivotally connected with the other end portion of the leg rest for pivotal movement up and down, the footrest supporting feet of the user; and a massage means provided to at least one of the leg rest and the footrest. Also, a stopper unit is provided for restricting a pivotal movement range of the footrest with respect to the leg rest, and a biasing unit is disposed for applying a biasing force to the footrest in either an upward or downward a direction of the pivotal movement.

Abstract: The chair type stretching apparatus in this invention comprises a seat, a backrest, a flexible sheet, a tension means, and a controller. The backrest has a width. The flexible sheet is disposed in front of the backrest to be movable between a normal position and a projected position. The flexible sheet in the normal position lies in a close relation with a front surface of the backrest. The flexible sheet in the projected position is spaced away from the front surface of the backrest. The tension means is provided on the backrest in order to apply tensional force to the flexible sheet so as to move a center of the flexible sheet toward a front direction of the backrest. The tension means is provided on at least one width end of the backrest in order to apply tensional force along a width direction of the backrest to the flexible sheet.

Abstract: A chair type massage machine that enables a massager to effectively perform massages, ensures safety, reduces costs, and allows for easy attachment and removal of a cushion to and from a backrest. The massage machine includes a massage unit (5) that may be raised and lowered in a backrest (2). The massage unit (5) includes a massager (7) projecting toward the front from the backrest (2). A cushion (4) is formed to be generally U-shaped and arranged on a front surface of the backrest (2). The cushion (4) includes an opening (8) in which is arranged the massager (7), which is lowered and raised with the massage unit (5). The massager (7) is movable in the opening (8) of the cushion (4). A fastening means fastens the cushion (4) to the front surface of the backrest (2). The fastening includes hook-and-loop fasteners (10, 11) that are separated by application of downward external force of a certain amount or more to a lower rim of the opening (8) in the cushion (4).

Abstract: A massage chair has a seating surface, a backrest and armrests at the opposite left and right sides. A covering member vertically displaceable to be opened and closed is provided on the upper surface of an armrest main body of each armrest. A massaging device is provided on at least either one of the lower surface of each covering member and the upper surface of the corresponding armrest main body. The massaging devices are driven with hands and arms tightly held between the lower surfaces of the covering members and the upper surfaces of the armrest main bodies, and the upper surfaces of the covering member serve as arm resting surfaces with the covering members closed and the massaging means not driven. There can be provided a massage chair whose arm resting positions are not restricted when the massage chair is not used to massage the hands and arms.

Abstract: A chair-type massage machine includes a seat on which a user sits; a leg rest whose one end portion is pivotally connected with a front portion of the seat for pivotal movement up and down, the leg rest supporting calves of the user; a driving unit for pivotally moving the leg rest with respect to the seat; a footrest pivotally connected with the other end portion of the leg rest for pivotal movement up and down, the footrest supporting feet of the user; and a massage means provided to at least one of the leg rest and the footrest. Also, a stopper unit is provided for restricting a pivotal movement range of the footrest with respect to the leg rest, and a biasing unit is disposed for applying a biasing force to the footrest in either an upward or downward a direction of the pivotal movement.

Abstract: A chair-type massage machine with a seat, a backrest and an armrest comprises an upper member which is disposed above and in spaced-apart relation to the armrest with a distance allowing a hand and/or arm to be inserted therebetween, to extend in the same direction as that of the armrest. A lower air bag adapted to be inflated/deflated by an air pressure is attached onto a top surface of the armrest. First and second upper air bags adapted to be inflated/deflated by an air pressure are attached onto a bottom surface of the upper member to form a line along a longitudinal direction of the upper member. The total surface area of the upper air bags and the total volume of the upper air bags in their inflated state are set to be less than the surface area of the lower air bag and the volume of the lower air bag in its inflated state, respectively.

Abstract: This massage machine comprises a seat 20, a leg-rest 50, a footrest 60, an electric extendable mechanism 80, a link mechanism 70, and a controller. The footrest is movably linked to a lower end of the leg-rest to be movable relative to the leg-rest, and is provided with air bags 63 configured to restrain a foot of the user. The electric extendable mechanism and the link mechanism are configured to move the footrest relative to the leg-rest. The controller gives the user a leg stretching mode, and in the leg stretching mode, the controller controls the electric extendable mechanism and the air bags such that the electric extendable mechanism moves the footrest relative to the leg-rest while the air bags restrains the foot of the user.

Abstract: A leg rest 5 is pivotally secured to a front portion of a seat 2 of a chair 1 for pivotal movement up and down and operable to support calves of a seat occupant sitting on the seat 1, and a footrest 6 is pivotally secured to a front end of the leg rest 5 for supporting feet of the seat occupant sitting on the seat 2 ranging from ankles to toes and soles. The leg rest 5 and the footrest 6 are provided with respective massaging means 7 and 8 incorporated therein. Also, the leg rest 5 is provided with the distance thereof relative to the seat 2 being adjustable, and the footrest 6 is maintained substantially horizontally at all times regardless of the angle and the position of the leg rest 5.

Abstract: An exposure apparatus which forms a pattern on an object includes an exposure head structure in which a plurality of elemental exposure units each including at least one light source and an optical element which forms an image of the light source on the object are arrayed, a sensor which detects the surface position of the object, and a controller which controls exposure by the exposure head structure based on the detection result by the sensor. The controller forms a pattern on the object while selectively operating one of the plurality of elemental exposure units, which satisfies a predetermined condition.

Abstract: This massage machine comprises a seat 20, a leg-rest 50, a footrest 60, an electric extendable mechanism 80, a link mechanism 70, and a controller. The footrest is movably linked to a lower end of the leg-rest to be movable relative to the leg-rest, and is provided with air bags 63 configured to restrain a foot of the user. The electric extendable mechanism and the link mechanism are configured to move the footrest relative to the leg-rest. The controller gives the user a leg stretching mode, and in the leg stretching mode, the controller controls the electric extendable mechanism and the air bags such that the electric extendable mechanism moves the footrest relative to the leg-rest while the air bags restrains the foot of the user.

Abstract: A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral support.

Abstract: A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a periphery of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.

Abstract: A massage chair has a seating surface, a backrest and armrests at the opposite left and right sides. A covering member vertically displaceable to be opened and closed is provided on the upper surface of an armrest main body of each armrest. A massaging device is provided on at least either one of the lower surface of each covering member and the upper surface of the corresponding armrest main body. The massaging devices are driven with hands and arms tightly held between the lower surfaces of the covering members and the upper surfaces of the armrest main bodies, and the upper surfaces of the covering member serve as arm resting surfaces with the covering members closed and the massaging means not driven. There can be provided a massage chair whose arm resting positions are not restricted when the massage chair is not used to massage the hands and arms.

Abstract: A scanning exposure apparatus includes an illumination optical system for illuminating a pattern on a mask using arc-shaped illumination light, a projection optical system for projecting the pattern on the mask illuminated by the illumination optical system onto a plate, a mask stage for scanning the mask, a plate stage for scanning the plate, the scanning exposure apparatus scanning the mask stage and plate stage synchronously relative to the projection optical system, a mask support mechanism for supporting a peripheral of the mask, and a mask stage tilt mechanism for arranging the pattern in an area illuminated by the arc-shaped illumination light in an object-surface-side focal plane of the projection optical system, wherein the mask deforms due to its own weight from the peripheral supported.

Abstract: A massage device capable of applying favorable pressure stimulation owing to expansion and shrinking of air bags irrespective of thickness of portions to be massaged such as legs or arms. The massage device has supporting bodies, strap bodies made of pliable material that are attached to the supporting bodies at their ends to form U-shaped sections, air bags provided at inner surfaces of strap bodies for receiving portions of a human body such as legs or arms to be massaged, and an air supply means for expanding and shrinking of the air bags. Upon locating portions to be massaged on the strap bodies, the strap bodies assume shapes that fit along the shapes of the portions of the body to be massaged to thus support the portions to be massaged on the strap bodies. Pressuring stimulation can then be applied to the portions to be massaged by making the air bags perform expansion and shrinking.

Abstract: An in-line processing system having an exposure processing unit and a coating and development processing unit is provided with a conveyance arm for transferring a workpiece between these units. The conveyance arm can access to each of these units, and these units have horizontal workpiece holding planes of substantially the same level. The workpiece can be conveyed between these units while being kept laid horizontally.

Abstract: An exposure method and apparatus for transferring a pattern of a mask onto a substrate to be exposed, with projection through a projection optical system. The apparatus includes a stage being movable while carrying the substrate thereon, a laser interferometer for measuring a position of the stage, wherein a measurement position of a laser beam of the laser interferometer deviates relative to a focal plane of the projection optical system, with respect to a direction of an optical axis of the projection optical system, a memory for memorizing, with respect to each of different positions of the stage, information related to an Abbe error produced in accordance with the deviation of the focal plane and the measurement position of the laser interferometer, and a controller for controlling the stage on the basis of a corrected value corresponding to a measured value of the laser interferometer as corrected by the Abbe error.

Abstract: An exposure apparatus for exposing an exposure member or wafer to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the exposure member. The apparatus includes an XY stage for moving the wafer in X- and Y-directions, a .theta. stage for moving the wafer in a rotational direction relative to the XY stage, laser interferometers for measuring an amount of movement of the wafer by the XY stage, in each of the X- and Y-directions, by use of a mirror member mounted on the .theta. stage, and a carriage for carrying the XY and .theta. stages and a portion of the interferometers to move the wafer relative to an exposing system for effecting the scan-exposure on the region of the wafer. The mirror member is placed on the .theta. stage, and another portion of the interferometers is mounted on a fixed system independent of the carriage.