Abstract: An engine is configured to ignite an air-fuel mixture with an electric spark to ignite an air-fuel mixture. The engine includes: a cylinder head including a chamber partition wall having through holes and defining a main combustion chamber and a sub-combustion chamber; a fuel injector that injects fuel into the main combustion chamber; an air injector that injects air into the sub-combustion chamber; an ignition device causes an electric discharge between an ignition electrode and the chamber partition wall; and a control system that controls the fuel and air injectors, and the ignition device. At a compression stroke during a warm-up operation, the fuel is injected throughout a first period, and the air is injected throughout a second period at least partially overlapping the first period. At a power stroke during the warm-up operation, the electric discharge is caused after the fuel is injected.

Abstract: An analyzing method includes preparing measured position information that is position information of a plurality of measured-parts formed on a substrate, and fitting a reference function, which is a sum of at least one function obtained by multiplying a criterion function expressed using a first type Bessel function by a proportional coefficient, to the measured position information and calculating an optimum value of at least one of the proportional coefficient.

Abstract: A cooling structure includes a block-side water jacket formed in a cylinder block, a head-side water jacket formed in a cylinder head, an introducing portion which introduces a cooling liquid from an end of the cylinder block to the block-side water jacket, a discharging portion which discharges a cooling liquid from the other end of the cylinder block to the head-side water jacket, and a spacer member accommodated in the block-side water jacket, and including a peripheral wall which forms an exhaust-side passage and an intake-side passage between a cylinder bore wall and the peripheral wall. The spacer member includes a distribution adjustment mechanism which distributes a cooling liquid introduced to the block-side water jacket between the exhaust-side passage and the intake-side passage.

Abstract: A cooling structure of a multi-cylinder engine is provided. The engine has cylinders and a cylinder block formed with a cylinder bore wall. The cooling structure includes a water jacket formed in the cylinder block and defined by the cylinder bore wall and a jacket outer surface surrounding the cylinder bore wall, a water pump for feeding a coolant to the water jacket, an introduction portion formed in the cylinder block, having an introduction port opening to the jacket outer surface, and for introducing the coolant to the water jacket, and a spacer member accommodated inside the water jacket. The spacer member has a spacer main body surrounding the cylinder bore wall, and a dividing wall protruding toward the jacket outer surface from an outer circumferential surface of the spacer main body. The dividing wall extends in a circumferential direction at a position opposing the introduction port.

Abstract: A cooling structure includes a block-side water jacket formed in a cylinder block, a head-side water jacket formed in a cylinder head, an introducing portion which introduces a cooling liquid from an end of the cylinder block to the block-side water jacket, a discharging portion which discharges a cooling liquid from the other end of the cylinder block to the head-side water jacket, and a spacer member accommodated in the block-side water jacket, and including a peripheral wall which forms an exhaust-side passage and an intake-side passage between a cylinder bore wall and the peripheral wall. The spacer member includes a distribution adjustment mechanism which distributes a cooling liquid introduced to the block-side water jacket between the exhaust-side passage and the intake-side passage.

Abstract: A cooling structure of an internal combustion engine includes a cylinder block, a cylinder head and a gasket. In a cross-section defined through an inter-bore region and perpendicular to the cylinder bank center line, a first end and a second end which face a cylinder bank center line are disposed nearer to the cylinder bank center line than a third end and a fourth end which face the cylinder bank center line, respectively. In the cross-section, a fifth end of a first communication hole facing the cylinder bank center line is provided between the first end of the head opening and the third end of the block opening. In the cross-section, a sixth end of a second communication hole facing the cylinder bank center line is provided between the second end of the head opening and the fourth end of the block opening.

Abstract: A cooling structure of a multi-cylinder engine is provided. The engine has cylinders and a cylinder block formed with a cylinder bore wall. The cooling structure includes a water jacket formed in the cylinder block and defined by the cylinder bore wall and a jacket outer surface surrounding the cylinder bore wall, a water pump for feeding a coolant to the water jacket, an introduction portion formed in the cylinder block, having an introduction port opening to the jacket outer surface, and for introducing the coolant to the water jacket, and a spacer member accommodated inside the water jacket. The spacer member has a spacer main body surrounding the cylinder bore wall, and a dividing wall protruding toward the jacket outer surface from an outer circumferential surface of the spacer main body. The dividing wall extends in a circumferential direction at a position opposing the introduction port.

Abstract: An intake apparatus for an internal combustion engine includes a plurality of branch pipes connected at downstream ends thereof to an engine main body, an intake chamber to which upstream ends of the branch pipes are connected, and a common intake air introducing part connected to the center of the intake chamber in a cylinder arrangement direction. The intake chamber includes a projecting part projecting toward the engine main body relative to the common intake air introducing part. An EGR introducing passage is connected to the center of the projecting part in the cylinder arrangement direction. A downstream end of the EGR introducing passage is directed toward a wall of the projecting part on the common intake air introducing part side.

Abstract: A cooling structure of an internal combustion engine includes a cylinder block, a cylinder head and a gasket. In a cross-section defined through an inter-bore region and perpendicular to the cylinder bank center line, a first end and a second end which face a cylinder bank center line are disposed nearer to the cylinder bank center line than a third end and a fourth end which face the cylinder bank center line, respectively. In the cross-section, a fifth end of a first communication hole facing the cylinder bank center line is provided between the first end of the head opening and the third end of the block opening. In the cross-section, a sixth end of a second communication hole facing the cylinder bank center line is provided between the second end of the head opening and the fourth end of the block opening.

Abstract: An intake apparatus for an internal combustion engine includes a plurality of branch pipes connected at downstream ends thereof to an engine main body, an intake chamber to which upstream ends of the branch pipes are connected, and a common intake air introducing part connected to the center of the intake chamber in a cylinder arrangement direction. The intake chamber includes a projecting part projecting toward the engine main body relative to the common intake air introducing part. An EGR introducing passage is connected to the center of the projecting part in the cylinder arrangement direction. A downstream end of the EGR introducing passage is directed toward a wall of the projecting part on the common intake air introducing part side.

Abstract: Disclosed is a step-and-scan exposure method improved in exposure at a periphery of a wafer. An area illuminated by an exposure beam is made to relatively scan a shot area positioned at the wafer periphery from the outside of the wafer to the inside. Predetermined measurement points of a sensor for detecting positional information of a wafer with respect to a focal position of a projection optical system in the direction of the optical axis of the projection optical system are made to relatively scan along with the illumination area of the exposure beam. Focus control is performed to make the wafer move in the direction of the optical axis when only part of the selected predetermined measurement positions reach the wafer, and leveling control is performed in addition to adjust the tilt of the wafer when all of the selected predetermined measurement positions reach the wafer.

Abstract: Disclosed is a step-and-scan exposure method improved in exposure at a periphery of a wafer. An area illuminated by an exposure beam is made to relatively scan a shot area positioned at the wafer periphery from the outside of the wafer to the inside. Predetermined measurement points of a sensor for detecting positional information of a wafer with respect to a focal position of a projection optical system in the direction of the optical axis of the projection optical system are made to relatively scan along with the illumination area of the exposure beam. Focus control is performed to make the wafer move in the direction of the optical axis when only part of the selected predetermined measurement positions reach the wafer, and leveling control is performed in addition to adjust the tilt of the wafer when all of the selected predetermined measurement positions reach the wafer.

Abstract: The present invention relates, to an exposure method, exposure apparatus, and the like having a configuration for effectively preventing color inconsistencies from occurring due to defocusing upon scanning exposure. In particular, the exposure method and apparatus according to the present invention control the scanning exposure according to the positional relationship between a substrate and a detection area for detecting a focus state of the substrate, the positional relationship between individual shot areas on the substrate the positional relationship between a shot area on the substrate and an edge of the substrate, or the like.

Abstract: An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate.

Abstract: An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate.

Abstract: In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

Abstract: In exposure by a scanning exposure system, when the pattern of a reticle is exposed onto shot areas on a wafer while reading ahead to detect the focus positions at read-ahead regions before an exposure region 16, 116 with respect to the scanning direction, (1) for each of shot areas S10, S1-S4, S5, S23, S28, S29-S32 on the peripheral region of the wafer 15, the exposure is performed by scanning the wafer 15 so that a slit-like exposure region 16 moves relatively from the inside to the outside of the wafer 15; or, (2) when the absolute value of the difference between the focus position at the read-ahead region 135 and the focus position of an imaging plane 139 in the exposure region exceeds an allowable value, the height of the wafer 15 is fixed at the height set until then while ignoring the read-ahead data.

Abstract: An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate.

Abstract: A projection exposure apparatus comprises a projection optical system for projecting a pattern of a mask on a photosensitive substrate, a stage, for holding the photosensitive substrate, movable in an optical-axis direction of the projection optical system and in a direction perpendicular to the optical axis, a position detection system for outputting a detection signal corresponding to a deviation of the projection optical system in the optical-axis direction between an imaging plane of the projection optical system and the surface of the photosensitive substrate by projecting a beam of light assuming a predetermined shape on the photosensitive substrate and, at the same time, photoelectrically detecting the reflected light from the photosensitive substrate, a fiducial member provided on the stage and having a fiducial pattern assuming a predetermined shape, and a device for detecting an irradiation position of the light beam within a plane perpendicular to the optical axis of the projection optical system o

Abstract: A step-and-scan exposure method and a scanning exposure apparatus in which a mask has a plurality of patterns and the number of patterns to be transferred to each shot area of a photosensitive substrate varies. The scanning and stepping movements are controlled in accordance with the number of patterns transferred, and dimensions of a pattern illumination area are varied in accordance with the patterns to be transferred. Transfer of a pattern to a shot area is omitted when an image of the pattern on the shot area would extend beyond the photosensitive substrate. Elimination of exposure scanning movements for patterns that are not to be transferred permits rapid movements of the mask and the substrate to scanning start positions.