Abstract: According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 ?m. The first surface includes an unevenness.

Abstract: According to one embodiment, a pattern formation material is included in a polymer layer to be provided between a block copolymer layer and a substrate. The block copolymer layer includes a block copolymer including a plurality of blocks. The pattern formation material includes a pattern formation polymer. The pattern formation polymer consists of a main chain including an acrylic backbone, and a side chain. One of the plurality of blocks include a plurality of polymer components. The plurality of polymer components are of mutually-different types. A solubility parameter of the pattern formation material is between a maximum value and a minimum value of a solubility parameter of the polymer components.

Abstract: According to one embodiment, a pattern formation method includes forming a structure body on a first surface of a patterning member, the structure body having protrusions and a recess. The protrusions are arranged at a first pitch along a first direction. The first direction is aligned with the first surface. The recess is between the protrusions. The method further includes forming a resin film of a block copolymer on the structure body. The block copolymer includes first portions and second portions. The first and second portions are arranged alternately at a second pitch along the first direction. The structure body includes first and second regions. The first portions are on the first regions. The second portions on the second regions. The method further includes removing the second portions and the second regions, introducing a metal to the first regions, and etching the patterning member using the first regions.

Abstract: A template defect inspection method using an optical system includes emitting linearly polarized light to a template having a metal film formed on at least part of a concave-convex structure that is formed on a substrate and that has a line-and-space pattern, acquiring information on a polarization-rotated component, which is different from linearly polarized light incident on the template, of light reflected by the template in accordance with the emission thereto, converting the acquired information on the polarization-rotated component into an electrical signal, and processing the electrical signal.

Abstract: A template defect inspection method using an optical system includes emitting linearly polarized light to a template having a metal film formed on at least part of a concave-convex structure that is formed on a substrate and that has a line-and-space pattern, acquiring information on a polarization-rotated component, which is different from linearly polarized light incident on the template, of light reflected by the template in accordance with the emission thereto, converting the acquired information on the polarization-rotated component into an electrical signal, and processing the electrical signal.

Abstract: An example magnetoresistive element includes a nonmagnetic conductive layer; a first magnetic layer connected to the nonmagnetic conductive layer; a second magnetic layer connected to the nonmagnetic conductive layer so as to be distant from the first magnetic layer; a third magnetic layer connected to the nonmagnetic conductive layer so as be distant from the first magnetic layer; and first to third magnetic electrodes connected to the first to third magnetic layers respectively. A voltage is applied between the third magnetic electrode and the first magnetic electrode through the third magnetic layer, the nonmagnetic conductive layer, and the first magnetic layer, and a current is caused to flow between the third electrode and the second magnetic electrode through the third magnetic layer, the nonmagnetic conductive layer, and the second magnetic layer. The nonmagnetic conductive layer decreases in volume toward the one end face.

Abstract: A recording head of a disk device includes a main magnetic pole, a write shield which faces the main magnetic pole with a write gap interposed therebetween, a coil configured to generate a magnetic field in the main magnetic pole, and a spin torque oscillator which is arranged in the write gap. The spin torque oscillator includes an intermediate layer formed on the main magnetic pole, a field generation layer formed on the intermediate layer, a spin injection layer, and an interface magnetic layer. The field generation layer and the spin injection layer are arranged in parallel to each other in the direction which intersects with the gap length direction of the write gap, and the spin injection layer is electrically connected with the write shield.

Abstract: A spin valve element according to an embodiment includes: a nonmagnetic base layer; a first terminal including a first magnetic layer connecting to a portion near one of opposing end faces of the nonmagnetic base layer; a second terminal including a second magnetic layer disposed and connecting to the nonmagnetic base layer so as to be at a distance from the first terminal; a third terminal including a third magnetic layer disposed and connecting to the nonmagnetic base layer so as to be at distances from the first and second terminals, the second terminal and the third terminal connecting to a current source that passes a sense current, and the first terminal and one of the second terminal and the third terminal connecting to a voltage detection unit that detects a voltage.

Abstract: A recording head of a disk device includes a main magnetic pole, a write shield which faces the main magnetic pole with a write gap interposed therebetween, a coil configured to generate a magnetic field in the main magnetic pole, and a spin torque oscillator which is arranged in the write gap. The spin torque oscillator includes an intermediate layer formed on the main magnetic pole, a field generation layer formed on the intermediate layer, a spin injection layer, and an interface magnetic layer. The field generation layer and the spin injection layer are arranged in parallel to each other in the direction which intersects with the gap length direction of the write gap, and the spin injection layer is electrically connected with the write shield.

Abstract: A magnetoresistive element according to an embodiment includes: a nonmagnetic conductive layer; a first magnetic layer connected to the nonmagnetic conductive layer; a second magnetic layer connected to the nonmagnetic conductive layer so as to be distant from the first magnetic layer; a third magnetic layer connected to the nonmagnetic conductive layer so as be distant from the first magnetic layer; and a first to third magnetic electrodes connected to the first to third magnetic layers respectively; a voltage being applied between the third magnetic electrode and the first magnetic electrode through the third magnetic layer, the nonmagnetic conductive layer, and the first magnetic layer, and a current being caused to flow between the third electrode and the second magnetic electrode through the third magnetic layer, the nonmagnetic conductive layer, and the second magnetic layer, the nonmagnetic conductive layer decreasing in volume toward the one end face.

Abstract: A spin valve element according to an embodiment includes: a nonmagnetic base layer; a first terminal including a first magnetic layer connecting to a portion near one of opposing end faces of the nonmagnetic base layer; a second terminal including a second magnetic layer disposed and connecting to the nonmagnetic base layer so as to be at a distance from the first terminal; a third terminal including a third magnetic layer disposed and connecting to the nonmagnetic base layer so as to be at distances from the first and second terminals, the second terminal and the third terminal connecting to a current source that passes a sense current, and the first terminal and one of the second terminal and the third terminal connecting to a voltage detection unit that detects a voltage.

Abstract: According to one embodiment, a magnetic head manufacturing method includes forming a protective layer on the surfaces of a main magnetic pole layer, a processed spin torque oscillator, and a mask formed on the spin torque oscillator, and further performing ion beam etching on the main magnetic pole layer and the protective layer on the surface of the main magnetic pole layer through the mask such that the protective layer is left behind on the side surfaces of the spin torque oscillator and removed from the surface of the main magnetic pole layer, thereby processing the main magnetic pole layer such that its side surfaces have a shape tapered toward the substrate.

Abstract: According to one embodiment, an ultraviolet curing curable resin material for pattern transfer is provided. The resin contains isobornyl acrylate, an acrylate having a fluorene skeleton, a polyfunctional acrylate, and a polymerization initiator.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.

Abstract: According to one embodiment, an ultraviolet curing curable resin material for pattern transfer is provided. The resin contains isobornyl acrylate, an acrylate having a fluorene skeleton, a polyfunctional acrylate, and a polymerization initiator.

Abstract: According to one embodiment, a stamper manufacturing method comprises electroless plating by using a master includes a substrate, a conductive underlayer formed on the substrate and having catalytic activity, projecting patterns having no catalytic activity and partially formed on a surface of the conductive underlayer having catalytic activity, and regions in which the conductive underlayer having catalytic activity is exposed between the projecting patterns to deposit selectively an amorphous conductive layer between the projecting patterns and in the regions in which the conductive underlayer is exposed, and forming stamper projections, electroplating on the stamper projections includes the projecting patterns and the amorphous conductive layer by using the amorphous conductive layer and the conductive underlayer as electrodes to form a stamper main body made of a crystalline metal, and releasing a stamper includes the stamper projections and the stamper main body from the master.

Abstract: According to one embodiment, a magnetic recording head manufacturing method includes forming a spin torque oscillator layer on a main magnetic pole layer, forming a mask on the spin torque oscillator layer, processing the spin torque oscillator layer by performing ion beam etching through the mask, and partially modifying the main magnetic pole layer through the mask. The partially modifying the main magnetic pole layer makes it possible to decrease the saturation flux density of the main magnetic pole layer in the modified portion, and form an unmodified main magnetic pole portion covered with the mask, and a modified portion around the main magnetic pole.

Abstract: According to one embodiment, a magnetic head manufacturing method includes forming a protective layer on the surfaces of a main magnetic pole layer, a processed spin torque oscillator, and a mask formed on the spin torque oscillator, and further performing ion beam etching on the main magnetic pole layer and the protective layer on the surface of the main magnetic pole layer through the mask such that the protective layer is left behind on the side surfaces of the spin torque oscillator and removed from the surface of the main magnetic pole layer, thereby processing the main magnetic pole layer such that its side surfaces have a shape tapered toward the substrate.

Abstract: According to one embodiment, a magnetic recording head manufacturing method characterized by includes processes of forming a main pole, forming, on the main pole, an insulating layer having a gap for forming a spin torque oscillator, forming a spin torque oscillator in the gap, and forming an auxiliary magnetic pole on the spin torque oscillator is provided.

Abstract: The present invention provides such a formation method that an antireflection structure having excellent antireflection functions can be formed in a large area and at small cost. Further, the present invention also provides an antireflection structure formed by that method. In the formation method, a base layer and particles placed thereon are subjected to an etching process. The particles on the base layer serve as an etching mask in the process, and hence they are more durable against etching than the base layer. The etching rate ratio of the base layer to the particles is more than 1 but not more than 5. The etching process is stopped before the particles disappear. It is also possible to produce an antireflection structure by nanoimprinting method employing a stamper. The stamper is formed by use of a master plate produced according to the above formation method.