Patents by Inventor Shinya Ueda

Shinya Ueda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11139519
    Abstract: A sealed cell includes a bottomed cylindrical outer casing can. The outer casing can is formed by nickel-plated iron, and a lead connected to one of a positive electrode and a negative electrode, and the outer casing can, are welded by a welding part formed from the outside surface of the outer casing can toward the lead. The welding part is formed by molten traces and has a first layer and a second layer having a higher nickel concentration than the first layer. The first layer is formed from the lead through to the inside of the outer casing can, the second layer is formed so as to adjoin the first layer on the outside surface side of the outer casing can, and the whole of the first layer is covered with the second layer when the welding part is viewed from the outside of the outer casing can.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: October 5, 2021
    Assignees: SANYO Electric Co., Ltd., PANASONIC CORPORATION
    Inventors: Yusuke Tominaga, Kazumichi Shimizu, Shota Ikeda, Kyosuke Miyata, Atsushi Ueda, Sadahiro Hattori, Shinya Mori, Ryunosuke Yokoo, Koji Funami, Takaaki Kassai
  • Publication number: 20210300650
    Abstract: A packaging material having a contact surface formed of a thermoplastic resin that is adapted for contacting a viscous content. The contact surface is a mirror surface having a roughness Sa of not more than 100 nm and a water contact angle of not less than 60° C. at 20° C.
    Type: Application
    Filed: April 19, 2018
    Publication date: September 30, 2021
    Applicant: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Shinya SEITO, Takayuki ISHIHARA, Saya SUGIOKA, Kousuke UEDA, Kota OKAMOTO
  • Patent number: 11110885
    Abstract: A gas generator includes an igniter, a cup-shaped member, and a fixing member. The cup-shaped member accommodating an enhancer agent bursts or melts at the time of activation. The fixing member fixing a filter does not burst and melt even at the time of activation. Ra and Ha satisfy a condition of Ra/Ha 1.00 where Ra represents an inner diameter of a sidewall portion of the cup-shaped member and Ha represents a distance between a top wall portion of the cup-shaped member and the igniter. The sidewall portion includes a first region surrounded by a partition wall portion of the fixing member and a second region not surrounded by the partition wall portion. The partition wall portion has an end portion arranged closer to a top plate portion than the igniter. A gas generating agent is arranged to face the top wall portion, the second region, and the partition wall portion.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: September 7, 2021
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Hiroaki Koyama, Shinya Ueda, Satoshi Ohsugi, Makoto Tsuruta, Motohiro Kanaji, Hirotaka Mukunoki
  • Publication number: 20210221324
    Abstract: A gas generator includes a housing constructed by combining and joining a plurality of shell members. One of the plurality of shell members includes a cylindrical portion and a flange portion. The cylindrical portion is provided with a plurality of gas discharge openings including gas discharge openings different in opening area from one another. The flange portion is shaped such that a distance from an axial line of the cylindrical portion to an outer edge of the flange portion is non-uniform. When a perpendicular line is drawn to the axial line from a maximum outer geometry position in the outer edge of the flange portion most distant from the axial line, a gas discharge opening arranged closest to the perpendicular line is a gas discharge opening other than a gas discharge opening largest in opening area among the plurality of gas discharge openings.
    Type: Application
    Filed: April 7, 2021
    Publication date: July 22, 2021
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Shinya UEDA, Satoshi OHSUGI, Hiroaki KOYAMA, Haruki TAKIZAWA
  • Patent number: 11067289
    Abstract: A water receiving member is reduced in size and is therefore made difficult to visually recognize. A cooking device (1) includes a main body (11), a front door (12), and a waste receiving member (41). The front door (12) has a water droplet restraining part (33) provided on a lower portion of an inner surface of the front door (12) which inner surface faces the heating room (13). While the front door (12) is closed, the water droplet restraining part (33) protrudes diagonally downwardly or horizontally from the inner surface of the front door (12) toward a rear side of the main body (11).
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: July 20, 2021
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Hiroki Kitayama, Kazuya Kitatani, Masayuki Uno, Shinya Ueda, Masayuki Iwamoto
  • Publication number: 20210143003
    Abstract: Methods for depositing on a surface of a substrate are disclosed. Exemplary methods include depositing a silicon oxide material using a cyclical deposition process, and reflowing the material during one or more of the step of depositing and a post-deposition anneal step. Structures including a layer of the material are also disclosed.
    Type: Application
    Filed: November 9, 2020
    Publication date: May 13, 2021
    Inventors: Hideaki Fukuda, Shinya Ueda, Kazuhiro Kimura
  • Patent number: 11001224
    Abstract: A gas generator includes a housing constructed by combining and joining a plurality of shell members. One of the plurality of shell members includes a cylindrical portion and a flange portion. The cylindrical portion is provided with a plurality of gas discharge openings including gas discharge openings different in opening area from one another. The flange portion is shaped such that a distance from an axial line of the cylindrical portion to an outer edge of the flange portion is non-uniform. When a perpendicular line is drawn to the axial line from a maximum outer geometry position in the outer edge of the flange portion most distant from the axial line, a gas discharge opening arranged closest to the perpendicular line is a gas discharge opening other than a gas discharge opening largest in opening area among the plurality of gas discharge openings.
    Type: Grant
    Filed: March 13, 2018
    Date of Patent: May 11, 2021
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Shinya Ueda, Satoshi Ohsugi, Hiroaki Koyama, Haruki Takizawa
  • Publication number: 20210088222
    Abstract: A water receiving member is reduced in size and is therefore made difficult to visually recognize. A cooking device (1) includes a main body (11), a front door (12), and a waste receiving member (41). The front door (12) has a water droplet restraining part (33) provided on a lower portion of an inner surface of the front door (12) which inner surface faces the heating room (13). While the front door (12) is closed, the water droplet restraining part (33) protrudes diagonally downwardly or horizontally from the inner surface of the front door (12) toward a rear side of the main body (11).
    Type: Application
    Filed: January 19, 2017
    Publication date: March 25, 2021
    Inventors: HIROKI KITAYAMA, KAZUYA KITATANI, MASAYUKI UNO, SHINYA UEDA, MASAYUKI IWAMOTO
  • Patent number: 10845058
    Abstract: Provided is a heating cooker that can efficiently apply steam to the entire food and can also cook the food quickly. A heating cooker (1A) includes a toasting grill (16) provided within a cooking chamber (10) and a lower heater (17b) provided at a lower section within the cooking chamber (10). Steam is blown between the toasting grill (16) and the lower heater (17b) from a steam outlet (25) provided in at least one sidewall of the cooking chamber (10).
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: November 24, 2020
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Shinya Ueda, Masayuki Uno, Masayuki Iwamoto
  • Publication number: 20200357631
    Abstract: Methods of depositing material on a surface of a substrate are disclosed. The methods include exposing a surface of the substrate to a precursor within a reaction chamber to form adsorbed species on the surface and removing at least a portion of the adsorbed species prior to introducing a reactant to the reaction chamber.
    Type: Application
    Filed: May 5, 2020
    Publication date: November 12, 2020
    Inventor: Shinya Ueda
  • Publication number: 20200321209
    Abstract: A method for fabricating a layer structure in a trench includes: simultaneously forming a dielectric film containing a Si—N bond on an upper surface, and a bottom surface and sidewalls of the trench, wherein a top/bottom portion of the film formed on the upper surface and the bottom surface and a sidewall portion of the film formed on the sidewalls are given different chemical resistance properties by bombardment of a plasma excited by applying voltage between two electrodes between which the substrate is place in parallel to the two electrodes; and substantially removing the sidewall portion of the film by wet etching which removes the sidewall portion of the film more predominantly than the top/bottom portion according to the different chemical resistance properties.
    Type: Application
    Filed: June 17, 2020
    Publication date: October 8, 2020
    Inventors: Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun, YongMin Yoo, YoonKi Min, SeYong Kim, JongWan Choi
  • Patent number: 10759377
    Abstract: A gas generator includes a housing containing an accommodation space, a gas generating agent, an igniter, and a sealing tape. The housing includes a cylindrical circumferential wall portion including plural gas discharge openings and the plural gas discharge openings are closed by the sealing tape. The plural gas discharge openings include gas discharge openings set to be different from one another in opening pressure so as to be opened stepwise with increase in pressure in the accommodation space as a result of burning of the gas generating agent. A condition of T?1.8 [mm] and SA?60 [mm2] is satisfied where T represents a thickness of a portion of the housing and SA represents a total opening area of the plurality of gas discharge openings. At least one of the plural gas discharge openings is in a shape of an elongated hole.
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: September 1, 2020
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Satoshi Ohsugi, Shinya Ueda, Haruki Takizawa
  • Patent number: 10730474
    Abstract: A gas generator includes a plurality of gas discharge openings arranged in a circumferential wall portion along a circumferential direction as not overlapping with each other. The plurality of gas discharge openings consist of one group or two or more groups of first gas discharge openings, one group or two or more groups of second discharge openings, and one group or two or more groups of third gas discharge openings. The gas discharge openings included in each of the groups of first to third gas discharge openings are set to be opened at an identical opening pressure. The second gas discharge openings are higher in opening pressure than the first gas discharge openings and lower in opening pressure than the third gas discharge openings. The gas discharge openings included in each group of gas discharge openings are evenly arranged in rotation symmetry at an angle not greater than 120°.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: August 4, 2020
    Assignee: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Haruki Takizawa, Shinya Ueda, Satoshi Ohsugi
  • Patent number: 10720322
    Abstract: A method for fabricating a layer structure in a trench includes: simultaneously forming a dielectric film containing a Si—N bond on an upper surface, and a bottom surface and sidewalls of the trench, wherein a top/bottom portion of the film formed on the upper surface and the bottom surface and a sidewall portion of the film formed on the sidewalls are given different chemical resistance properties by bombardment of a plasma excited by applying voltage between two electrodes between which the substrate is place in parallel to the two electrodes; and substantially removing the sidewall portion of the film by wet etching which removes the sidewall portion of the film more predominantly than the top/bottom portion according to the different chemical resistance properties.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: July 21, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun, YongMin Yoo, YoonKi Min, SeYong Kim, JongWan Choi
  • Publication number: 20200180548
    Abstract: A gas generator includes a housing constructed by combining and joining a plurality of shell members. One of the plurality of shell members includes a cylindrical portion and a flange portion. The cylindrical portion is provided with a plurality of gas discharge openings including gas discharge openings different in opening area from one another. The flange portion is shaped such that a distance from an axial line of the cylindrical portion to an outer edge of the flange portion is non-uniform. When a perpendicular line is drawn to the axial line from a maximum outer geometry position in the outer edge of the flange portion most distant from the axial line, a gas discharge opening arranged closest to the perpendicular line is a gas discharge opening other than a gas discharge opening largest in opening area among the plurality of gas discharge openings.
    Type: Application
    Filed: March 13, 2018
    Publication date: June 11, 2020
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Shinya UEDA, Satoshi OHSUGI, Hiroaki KOYAMA, Haruki TAKIZAWA
  • Publication number: 20200139925
    Abstract: A gas generator includes an igniter, a cup-shaped member, and a fixing member. The cup-shaped member accommodating an enhancer agent bursts or melts at the time of activation. The fixing member fixing a filter does not burst and melt even at the time of activation. Ra and Ha satisfy a condition of Ra/Ha 1.00 where Ra represents an inner diameter of a sidewall portion of the cup-shaped member and Ha represents a distance between a top wall portion of the cup-shaped member and the igniter. The sidewall portion includes a first region surrounded by a partition wall portion of the fixing member and a second region not surrounded by the partition wall portion. The partition wall portion has an end portion arranged closer to a top plate portion than the igniter. A gas generating agent is arranged to face the top wall portion, the second region, and the partition wall portion.
    Type: Application
    Filed: March 13, 2018
    Publication date: May 7, 2020
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Hiroaki KOYAMA, Shinya UEDA, Satoshi OHSUGI, Makoto TSURUTA, Motohiro KANAJI, Hirota ka MUKUNOKI
  • Publication number: 20200130335
    Abstract: A composite material 100 is obtained by laminating and tightly adhering a fabric 60 containing fibers made of spider silk fibroin and a synthetic resin film 50 having a tensile elongation equal to or greater than that of the fabric 60.
    Type: Application
    Filed: July 3, 2018
    Publication date: April 30, 2020
    Applicants: Spiber Inc., Kojima Industries Corporation
    Inventors: Kazuhiro Uchida, Masahiro Asakawa, Hiroyuki Mori, Wataru Ishida, Shinya Ueda
  • Publication number: 20200121112
    Abstract: A steam supplying device includes: a heater that heats fluid; and a heating tube through which the fluid flows, the heating tube being spirally wound around the heater.
    Type: Application
    Filed: October 15, 2019
    Publication date: April 23, 2020
    Inventors: SHINYA UEDA, MASAYUKI UNO
  • Patent number: 10580645
    Abstract: Methods for forming silicon nitride films are provided. In some embodiments, silicon nitride can be deposited by atomic layer deposition (ALD), such as plasma enhanced ALD. One or more silicon nitride deposition cycle comprise a sequential plasma pretreatment phase in which the substrate is sequentially exposed to a hydrogen plasma and then to a nitrogen plasma in the absence of hydrogen plasma, and a deposition phase in which the substrate is exposed to a silicon precursor. In some embodiments a silicon hydrohalide precursors is used for depositing the silicon nitride. The silicon nitride films may have a high side-wall conformality and in some embodiments the silicon nitride film may be thicker at the bottom of the sidewall than at the top of the sidewall in a trench structure. In gap fill processes, the silicon nitride deposition processes can reduce or eliminate voids and seams.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: March 3, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Shinya Ueda, Taishi Ebisudani, Toshiya Suzuki
  • Patent number: 10529554
    Abstract: A method for fabricating a layer structure in a trench includes: simultaneously forming a dielectric film containing a Si—N bond on an upper surface, and a bottom surface and sidewalls of the trench, wherein a top/bottom portion of the film formed on the upper surface and the bottom surface and a sidewall portion of the film formed on the sidewalls are given different chemical resistance properties by bombardment of a plasma excited by applying voltage between two electrodes between which the substrate is place in parallel to the two electrodes; and substantially removing either one of but not both of the top/bottom portion and the sidewall portion of the film by wet etching which removes the one of the top/bottom portion and the sidewall portion of the film more predominantly than the other according to the different chemical resistance properties.
    Type: Grant
    Filed: May 11, 2017
    Date of Patent: January 7, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Dai Ishikawa, Atsuki Fukazawa, Eiichiro Shiba, Shinya Ueda, Taishi Ebisudani, SeungJu Chun, YongMin Yoo, YoonKi Min, SeYong Kim, JongWan Choi